Tanner Tools

L-Edit / Technology Setups

V7.12
Location: \TECH\
index.txt This file.
EXT_devc.md A model list file for Layout vs. Schematic (LVS)
verification. This file is being referred during an LVS
execution. It is not a SPICE model file for simulation.
EXT_SubC.elm An element file containing all of the cells in the Tanner
Standard Cell Libraries. For Sub-Circuit Level LVS when
layout are extracted with L-Edit/EXT's Recognize Subcircuit
Extract option.

Directory \TECH\MOSIS\
--------------------------------------
MOSIS Process Setups using Scalable Design Rules:
Status: Most contents in this directory is in current release, except
mHP_nS3 mAMIn08 and mAMIn12 are to be further updated according to
MOSIS' final updated design guidelines and rule exceptions. Please
refer to Tanner Tools sales' latest marketing announcement.
mHP_nS3.tdb Technology setup files for MOSIS/Hewlett Packard n-well 0.35
mHP_nS3.ext micron process. (Technology = SCN3M_SUBM, LAMBDA = 0.20
mHP_n03.xst micron)
mHP_nS5.tdb Technology setup files for MOSIS/Hewlett Packard n-well 0.5
mHP_nS5.ext micron process. (Technology = SCN3M_SUBM, LAMBDA = 0.30
mHP_n05.xst micron) Also support Linear Capacitor Option (LC)
mHP_n05.tdb Technology setup files for MOSIS/Hewlett Packard n-well 0.5
mHP_n05.ext micron process. (Technology = SCN3M, LAMBDA = 0.35 micron)
mHP_n05.xst
mHP_nS8.tdb Technology setup files for MOSIS/Hewlett Packard n-well 0.8
mHP_nS8.ext micron process. (Technology = SCN3M_SUBM, LAMBDA = 0.40
mHP_n08.xst micron)
mAMIn08.tdb Technology setup files for MOSIS/AMI n-well 0.8 micron
mAMIn08.ext process. (Technology = SCNPC, LAMBDA = 0.6 micron)
mAMIn08.xst
mHP_n12.tdb Technology setup files for MOSIS/Hewlett Packard n-well 1.2
mHP_n12.ext micron process. (Technology = SCNLC, LAMBDA = 0.60 micron)
mHP_n12.xst
mHP_n12.tdb Technology setup files for MOSIS/Hewlett Packard n-well 1.2
mHP_n12.ext micron process. (Technology = SCNLC, LAMBDA = 0.60 micron)
mHP_n12.xst
mORBn12.tdb Technology setup files for MOSIS/Orbit n-well 1.2 micron
mORBn12.ext process. (Technology = SCNA, LAMBDA = 0.60 micron)
mORBn12.xst
mAMIn12.tdb Technology setup files for MOSIS/AMI n-well 1.2 micron
mAMIn12.ext process. (Technology = SCNA, LAMBDA = 0.6 micron)
mANIn12.xst
mORBn20.tdb Technology setup files for MOSIS/Orbit n-well 2.0 micron
mORBn20.ext process. (Technology = SCNA, LAMBDA = 1.00 micron)
mORBn20.xst

Directory \TECH\ORBIT\
---------------------------------------
Orbit/Foresight Process Setups using Scalable Design Rules:
Status: In current release.
ORBTp12.tdb Technology setup files for Orbit/Foresight p-well 1.2 micron
ORBTp12.ext process. (Technology = P122P2M, LAMBDA = 0.60 micron)
ORBTp12.xst
ORBTn20.tdb Technology setup files for Orbit/Foresight n-well 2.0 micron
ORBTn20.ext process. (Technology = N202P2MNPN, LAMBDA = 1.00 micron)
ORBTn20.xst
ORBTp20.tdb Technology setup files for Orbit/Foresight p-well 2.0 micron
ORBTp20.ext process. (Technology = P202P2MNPN, LAMBDA = 1.00 micron)
ORBTp20.xst

Directory \TECH\ORBIT2\
----------------------------------------
Orbit/Foresight Process Setups using Orbit' Non-Scalable Design Rules:
Status: The contents of this directory is under development.
Please refer to Tanner Tools sales' latest marketing announcement.
ORBTn06.tdb Technology setup files for Orbit/Foresight
ORBTn06.ext n-well 0.6 micron process.
ORBTn06.xst
ORBTn08.tdb Technology setup files for Orbit/Foresight
ORBTn08.ext n-well 0.8 micron process.
ORBTn08.xst

Directory \TECH\CHARTRD8\
-------------------------------
Chartered Semiconductor Process Setups:
Status: In current release.
The complete setups and a SCMOSLib digital library edition for t
his
process technology is distributed as a seperate Tanner Library
Product.
CHRTn08.tdb Technology setup files for Chartered Semiconductor
CHRTn08.ext n-well 0.8 micron process.
CHRTn08.xst

Directory \TECH\MITEL_15\
-------------------------------
MITEL Semiconductor Process Setups:
Status: In current release.
Only to be distributed for L-Edit end-users who have NDAs with
Mitel. This set of technology setups is distributed as a seperat
e
Tanner Library Product.
MITLp15.tdb Technology setup files for Chartered Semiconductor
MITLp15.ext p-well 1.5 micron process.
MITLp15.xst

Directory \TECH\SYMBIOS\
------------------------------
Symbios Logic Procees Setups:
Status: In current release.
Only to be distributed for L-Edit end-users who have NDAs with
Symbios Logic. This set of technology setups is distributed as
a
seperate Tanner Library Product.
CMOS8n05.tdb Technology setup files for Symbios Logic's CMOS8
CMOS8n05.ext n-well 0.5 micron process.
CMOS8n05.xst
CMOS8n05.elm
CMOS7n08.tdb Technology setup files for Symbios Logic's CMOS7
CMOS7n08.ext n-well 0.8 micron process.
CMOS7n08.xst
CMOS7n08.elm

Directory \TECH\CHINA_HJ\
-------------------------------
China Hua-Jing Microelectronics Group Corp Process Setups
Status: In current release.
This set of technology setups is distributed as a seperate Tanne
r
Library Product.
CHJ_p30.tdb Technology setup files for China Hua-Jing Microelectronics
CHJ_P30.ext Group, Co. Toshiba 3-micron single-poly, single-metal
process.

Directory \TECH\MUMPS\
-------------------------------
MCNC/MUMPS MEMS Process Setups:
Status: In current release.
mumps.tdb Contains technology and DRC setups.
Contains illustrations to the L-Edit/DRC setups for M
CNC
MUMPS (Multi-User MEMS Processes) version 4.0.
Contains an example layout to test the cross-section viewer.
mumps.xst Contains the process file to work with the cross-section
viewer.
examples.tdb Contains a few examples of MEMS devices generated using
CaMEL (MCNC) library generator.

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