New AML in-situ, ‘RAD’ technology for Low Temperature Bonding
Better than a plasma
· More stable, reliable, better bond & bond uniformity
· Larger more useful process window after activation & subsequent bonding · Activation without surface roughening! No change in AFM topographical roughness after activation · Reduced handling – higher yields · No exposure to energetic ions or electric fields reducing the risk of surface damage · In-situ promotes higher yields due to reduced risk of hydrocarbon contamination
Only AML can:
Align, Activate and Bond in One chamber, in One machine!
APPLIED MICROENGINEERING LTD. (AML)
It’s Radical Unit 8, Library Avenue, Didcot, Oxon, OX11 0SG, UK