Samsung Foundry

Technology Innovation in Advanced Nodes

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Market/Technology Trends

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Market Trends
Convergence for mobile multimedia applications

Mobility

Computing

Higher performance & lower power in a single platform

Performance (DMIPS) 10,000

Mobile Internet Devices

GHz / Multicore

Battery Life

5,000

Power

Power Gap

2008

2010

2012

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2014

Time

Single platform benefit

One design infrastructure investment for wide range of applications
Desktop/ Server Graphic Netbook Printer Tablet DTV/STB

High Performance

High Performance Design Infra

Game Console Network

HDD

Low Power

Low Power Design Infra

Smart Phone Feature Phone Phone DSC/DVC MP3

Single Platform Design Infra

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ITRS Roadmap (2011)

Accelerating introduction of new structures and channel materials

2011 ITWG Table Timing

2007

2010

2013

2016

2019

2021

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Scaling Trend
Logic and SRAM shrinkage slow down due to patterning limitation and SRAM Vmin
Tr density(A.U in Million Trs/cm2)

Tr density;SRAM(MTr/cm2) Tr density;Logic(MTr/cm2)

32nm

22nm

16nm

11nm

8nm

2008

2010

2012

2014

2016

2018

2020

Source : ITRS 2011

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Key Challenges in Advanced node

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Challenges and Technology Breakthrough

32/28nm : HK/MG overcomes Gate dielectric scaling limit 20nm 14nm : Double patterning & MoL extend litho limit : FinFET solves Lg and Gox Scaling limit

Performance

FinFET
MoL & DPT
HK/MG
Gox

Litho

Lg Gox

32/28nm

20nm 14nm Smart & Innovative Foundry Solution

FinFET Innovation

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FinFET Benefits
Lower leakage current
at same Vth

Lower Vth
at same leakage

Planar FinFET

Planar FinFET

Ioff_Planar Ioff_FinFET

Id

Vth_FinFET

Vth_Planar

Vth

Id
Ioff

Gate Voltage (Vg)

Gate Voltage (Vg)

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AC Performance Gain
FinFET has superior characteristics over planar Lower power at same speed Faster performance at same Iddq

Lower Power

Log Iddq(a.u.)

Planar

FinFET

Faster

Delay(a.u.)

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Summary
Market and technology convergence into mobile multimedia and single platform Samsung is investing in advanced technology nodes to satisfy market requirement

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Thank You
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