Beruflich Dokumente
Kultur Dokumente
Plasma etching
using an ICP etcher
Georgy K. Vinogradov, Masaharu Takeda, FOI Corp., Kanagawa, Japan
OVERVIEW Highly selective SiO2 etching plasma The mainstream direction of RIE tool development
processes increasingly are required in manufacturing of clearly is associated with the further increase of the RF
ultralarge scale integrated circuits, where deep etching of
silicon oxide (oxide) layers involves fluorocarbon discharge excitation frequency up to the ~30-100MHz range.
deposition. Such processes, based on unsaturated However, this solution is limited by the above-mentioned
fluorocarbons like c-C4F8, C4F6 or C5F8, have been developed
and widely used in recent years. Because of special interference between the high and low RF capacitive sheaths.
mechanisms of plasma chemical etching [1–3], it is difficult The higher frequency generates a thinner sheath (low
to etch high aspect ratio contact (HARC) holes without
etch-stop or microloading effects under the conditions of impedance), thereby preventing the lower (bias) frequency
high selectivity. In practice, thus, there is only one type of from delivering a high voltage onto the sheath.
200/300mm plasma etcher for highly selective SiO2 etch,
An apparatus for producing a planar inductively
especially for HARC holes: narrow-gap parallel-plate
capacitive. This article presents a different approach to coupled plasma (ICP) in a low-pressure process gas was
address the requirements of these processes. proposed more than a decade ago [4] that suggested: “Radio
frequency resonant current is induced in the planar coil,
Capacitive reactive ion etching (RIE) tools (also known as
which in turn produces a planar magnetic field. The
two-frequency capacitive plasma sources) have had a long,
magnetic field causes a circulating flux of electrons, which in
useful life in the industry. For more than three decades of
turn produces a planar region of ionic and radical species.”
semiconductor plasma processing, there were no competitive
tools around for one basic reason: a requirement of low gas
Planar ICP
residence time. Since a wafer size determines two dimensions
“Planar” ICP sources do not generate uniform plasma in a
(x-y), the only way to provide low gas residence time is to
narrow discharge gap because of the toroidal shape of ICP
decrease the discharge volume by shrinking the space or
discharge excitation induced by a vortex electric field.
discharge gap (z) over a wafer stage. Yet another reason is
Inductive plasma reveals its local excitation pattern under
that a parallel plate configuration is expedient for generating
narrow-gap conditions so that a process wafer sees a local
uniform RF bias sheath, crucial for a deep oxide etch.
circular current generated by the coil. Additionally, such
Capacitive etchers have some intrinsic problems and
plasma sources are prone to severe sputtering of a dielectric
limitations, though:
plate separating an ICP coil from a process chamber [5] due
a) The gas pressure range is limited at low pressures;
to undesirable RF power capacitive coupling from the coil to
b) High-density plasma cannot be generated;
plasma. The sputtering is so strong that it causes machine
c) Bulk plasma generated by a higher-frequency RF
instability and, eventually, can even break through the
power interferes with an RF bias sheath;
dielectric plate. Overall process controllability and, finally,
d) The wafer edge area is prone to severe
process yield, deteriorates. Faraday shields decrease the
nonuniformity; and
capacitive coupling while seriously downgrading the RF
e) Because of a narrow process window, one process
power transfer and discharge ignition at the same time. That
chamber usually is suitable for a single process only.
losses, which are controlled by the product P×d (where P = a semiconductor manufacturing tool?
Figure 2. Silicon oxide sputter and etch rate radial distributions on blanket 300mm wafers.
Process conditions
1670.0 nm
2045.0 nm
can be varied from
“clean” etch mode to
Results: polymer deposition
TEOS ER: 334 nm/min mode, which is preferable
PR ER (facet): 47 nm/min
(bulk) : 3 nm/min for highly selective
Sel (facet): >7
(bulk) :>119
etching with respect to
References
1. J.W. Coburn and Harold F. Winters, J. Vac. Sci. Technol. 16, 391,
1979.
2. S. Morishita, et al., Jpn. J. Appl. Phys. 37, 6899, 1998.
3. T. Tatsumi, et al., J. Vac. Sci. Technol. B 18, 1897, 2000.
4. J.S. Ogle, US patent number 4,948,458, Aug. 14, 1990.
5. M. Schaepkens, et al., J. Vac. Sci. Technol. BA 17, 3272, 1999.
6. L.D. Tsendin, Plasma Sources Sci. Technol. 12, S51, 2003.
7. G. Vinogradov, V. Menagarishvili, A. Kelly, Y. Hirano. Abstracts
of 2004 Joint Meeting of the Electrochemical Society (ECS), October
3-8, 2004, Honolulu, J1, p. 899.
8. Chin Ning Wu, G.Vinogradov, et al., Proceedings of International
Symposium on Dry Process, Nov. 30–Dec. 1, 2004, Tokyo, p. 19.