PHOTONIC PROFESSIONAL

TECHNOLOGY & KEY FEATURES

Compact and user-friendly laser lithography system True 3D micro- and nanofabrication via two-photon polymerization Ultra-precise piezo controlled structuring Dip-in laser lithography (DiLL) for highest resolution and minimum feature size throughout the complete writing volume Easy structure alignment Live view of the writing process High degree of automation: Automatic substrate tilt correction Autofocus system PerfectShapeTM for highest structure accuracy
Photonic Professional system

TRUE 3D LASER LITHOGRAPHY

CAD import via DXF, STL file format CE certified Laser safety class 1 for the whole system

COMPONENTS
Optical breadboard Electronics Optics cabinet Piezo stage (xyz-stage) Inverted microscope

OPTIONS
Motorized xy-scanning stage (100 x 100 mm2) Various objectives (air, oil immersion, DiLL) Various sample holders Turn-key femtosecond fiber lasers Microscope camera Cleanroom configuration
Brandenburg Gate Professional system. written with a Photonic

OPTICS & RESOLUTION

3D lateral feature size: 200 nm; typically 150 nm 2D lateral feature size: 150 nm; typically 120 nm 2D lateral resolution: 500 nm; typically 300 nm Vertical resolution: 1 m; typically 800 nm Piezo range: 300 x 300 x 300 m3 Motorized xy-scanning stage range: 100 x 100 mm2
1 m

Grating of parallel lines, with a center-to-center rod distance of 300 nm and line widths < 100 nm. OCTOBER 2012 PHOTONIC PROFESSIONAL 1/6

MATERIALS
Specially designed proprietary UV-curable photoresists: IP-L (780), IP-G (780) and IP-Dip SU-8 (25, 50, 100, ) Ormocere AZ MiR 701, AR-P 3210 AZ 5214, AZ 9260 Chalcogenide glass (As2S3) PEG-DA, PETA And many others

APPLICATIONS
Micro-optics Photonic crystals & metamaterials Free form surfaces Photonic waveguides / wire bonds Scaffolds for cell biology Biomimetics Micro-/nanofluidics Micro-robotics Mechanical metamaterials, ultralight materials Rapid prototyping And many others
Courtesy of Prof. Christian Koos, Karlsruhe Institute of Technology (KIT/IPQ), Germany References: N. Lindenmann, G. Balthasar, D. Hillerkuss, R. Schmogrow, M. Jordan, J. Leuthold, W. Freude, and C. Koos, Photonic wire bonding: a novel concept for chip-scale interconnects, Opt. Express 20, 17667-17677 (2012)

DIRECT LASER WRITING (DLW) BY TWO-PHOTON POLYMERIZATION

The technique of 3D Direct Laser Writing (DLW) is based on twophoton polymerization in photosensitive materials triggered by ultrashort laser pulses. The absorbed energy causes a chemical and / or physical change of the photoresist within a small volume pixel (voxel), which may be scaled by the laser power. The laser lithography system thus fabricates structures by exposing the photosensitive material along trajectories and/or points defined by the designed 3D structure. You may consider this procedure like using a nanometer-sized pen drawing in three dimensions.

OCTOBER 2012

PHOTONIC PROFESSIONAL

2/6

HARDWARE 1. Optical Table

The Photonic Professional system is a stationary unit. The system is installed on an optical breadboard which is passively vibration isolated by a self-leveling system optical table frame. Nanoscribe also supplies special cleanroom compatible breadboards and optical table frames. For the passive vibration isolation a compressed air supply with 5 - 7 bars air pressure is required.

2. Electronics
The electronic rack is typically placed below the optical table. It contains the Photonic Professional controller, the computer and the laser controller. The system is powered with a standard power cord (AC 110 240 V, 50 60 Hz).

3. Optics Cabinet
The laser and the optics are housed by the optics cabinet fixed on the breadboard. The protective housing is equipped with an electrical interlock switch for laser safety. The complete system is certified laser class 1, thus no special safety measures are required to run the Photonic Professional system.

height

length width

OCTOBER 2012

PHOTONIC PROFESSIONAL

3/6

4.

a) Piezo Stage

During the writing process the position of the laser focus is controlled with nanometer precision using a piezo stage. The volume addressed by the piezo measures 300 x 300 x 300 m. The positioning repeatability within the complete writing volume is better than 10 nm. Inertia related patterning artifacts are compensated via Nanoscribes PerfectShapeTM technology.

4. b) Motorized Stage
The Photonic Professional system is typically equipped with a motorized positioning stage (xy-stage) which allows for addressing different substrates and/or different positions on a substrate with a repeatability of +/- 1 m. The range of the motorized stage is 100 x 100 mm. For patterning large surface structures the motorized stage can be used in combination with the z-drive of the piezo.

5. Microscope and Autofocus

The lithography system is based on an inverted microscope. Carl Zeiss optics is used for diffraction limited focusing of the laser into the photosensitive material. The microscope is equipped with an autofocus system which allows for precise vertical positioning of the focal spot relative to the substrate surface. The writing process in Nanoscribes photoresists can be monitored in realtime using an optional microscope camera. Structural features and exposure doses can thus be easily optimized on the fly.

6. Laser
All Photonic Professional systems are equipped with a pulsed erbium doped femtosecond fiber laser source at a center wavelength of 780 nm. The laser power ranges between 45 - 120 mW at a pulse length between 120 - 250 fs, depending on the choice of laser. The turnkey lasers are completely integrated into the 3D laser lithography systems by Nanoscribe.

7. Sample Holders
Nanoscribe provides a variety of sample holders for different substrate types. The standard holder holds up to ten cover slips of 30 mm diameter with a thickness of 170 m. Further sample holders are available for 1, 2 and 4 wafers, 5 masks, microscope object slides, microfluidic channels and for our patent-pending DiLL-technology. Nanoscribe also designs holders for your specific applications on request.

OCTOBER 2012

PHOTONIC PROFESSIONAL

4/6

SOFTWARE
The software package comprises the control interface to the laser lithography system NanoWrite, the CAD-data-format STL converter tool Nanoslicer, and the editor DeScribe for syntax-highlighted programming in GWL - the systems native scripting language. An intuitive user interface together with software compatibility to CAD data format (STL and DXF) guarantees easy handling. Tilt correction, autofocus, substrate positioning, PerfectShapeTM and exposure dose are controlled by NanoWrite for a complete automation of the writing process.
Main application window of NanoWrite 1.6.

DIP-IN LASER LITHOGRAPHY (DiLL)

With its patent-pending Dip-in Laser Lithography (DiLL) technology, Nanoscribe pushes the frontiers of 3D nano-/micro-lithography: Photoresists are commonly not perfectly index-matched to the oil immersion system. This results in aberrations which lead to a loss of resolution and laser power with increasing writing depth. To overcome this problem, Nanoscribe developed and introduced a new route in 3D microfabrication: Dip-in laser lithography (DiLL). In the DiLL process the objective lens is directly dipped into a liquid photoresist serving as immersion and photosensitive medium at the same time. Even in case of a non-index-matched photoresist the homogeneity of the writing process is preserved along the optical axis. Using a dedicated DiLL objective, structure heights in the millimeter range have been achieved. Combined with our index matched DiLL photoresist IP-Dip, highest resolution is assured. DiLL-equipped Photonic Professional systems will allow you to fabricate structures with constant resolution over the full structure volume. Thus high aspect ratios have become feasible that have previously been unheard of in optical lithography.
Calculated laser intensity distribution of the laser focus within an index-matched photoresist.

2 m

2 m

Fractionated cube and fractionated pyramid produced with a Photonic Professional system, using the potential of the DiLL-technology.

3D polymer micro-truss along the publication Ultralight Metallic Microlattices of T.A. Schaedler et al. in Science 334, 962 (2011).

OCTOBER 2012

PHOTONIC PROFESSIONAL

5/6

TECHNICAL DETAILS
ELECTRICAL PROPERTIES main voltage main frequency power consumption main supply overvoltage grounding equipment conductor electrical safety AMBIENT CONDITIONS operating conditions operating temperature temperature stability storage temperature maximum relative humidity vibration isolation WEIGHTS AND MEASURES total weight dimensions (Photonic Professional system without working desk) weight (Photonic Professional system without electronic rack) dimensions (electronic rack) weight (electronic rack) minimum wall distance SPECIFICATIONS 3D lateral feature size 2D lateral resolution vertical resolution piezo range accessible writing area OBJECTIVES oil immersion objective Dip-in objective air objective other objectives on request FEMTOSECOND FIBER LASER pulse length (depending on the laser type) maximum laser power (depending on the laser type) laser center wavelength laser repetition rate (depending on the laser type) OPTICAL TABLE FRAME dimensions weight air pressure cleanroom

PHOTONIC PROFESSIONAL
AC 110 240 V 50 60 Hz typically ~ 800 VA; at maximum 1,000 VA category II required according to DIN EN 61010-1:2001

indoors 22 C ( 4 C) 1 C 20 C ( 10 C) 60 % required (see optical table frame)

270 kg 110 x 110 x 140 cm (W x L x H) 220 kg 56 x 60 x 64 cm (W x L x H) 50 kg 30 cm

200 nm; typically 150 nm 500 nm; typically 300 nm 1 m; typically 800 nm 300 x 300 x 300 m up to 100 x 100 mm

100x; NA=1.4; WD=170 m 100x; NA=1.3; WD=370 m 63x; NA=0.75; WD=1.7 mm

120 - 250 fs 45 - 120 mW 780 10 nm 40 - 100 MHz

110 x 110 x 80 cm (W x L x H) 70 kg 5 - 7 bar special optical tables available

CONTACT
Nanoscribe GmbH Hermann-von-Helmholtz-Platz 1 76344 Eggenstein-Leopoldshafen OCTOBER 2012 Germany Tel Fax +49 721 60 82 88 40 +49 721 60 82 88 48 E-Mail Web sales@nanoscribe.de www.nanoscribe.de
6/6

PHOTONIC PROFESSIONAL