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618-Lecture 0
ECE 618 - Microfabrication of Semiconductor Devices
T&H, 9:30 a.m. to 10:45 a.m - Swift 820 Prof. Andrew Steckl a.steckl@uc.edu Office Hours: M-F, 8:00 - 9:00 AM 899 Rhodes Hall 556-4777
Teaching Assist : Ray Wang, Ph.D. student, wangri@email.uc.edu, 910 Rhodes Hall 556-4829, email to schedule an apt. Class Notes: Microfabrication of Semiconductor Devices by A. J. Steckl hardcopy or web: www.engrlib.uc.edu/e-reserves/elec/618-steckl/index.html Lecture Notes: Reference Text: Grading:
Copyright A.J. Steckl J.C. Heikenfeld All rights reserved 2007
available before each class on www.blackboard.uc.edu Planar Processing Primer, G. Anner Van Nostrand Reinhold, 1990 2 quizzes Final Exam 50% 50%
618-Lecture 0
This is not a course on device physics, this is a course on: s/c and device fab Device integration
E or C
B
Copyright A.J. Steckl J.C. Heikenfeld All rights reserved 2007
C or E
A Few Whys
618-Lecture 0
Why semiconductors? -non-mechanical switches -control over a wide-variety of properties -efficient light emitters / detectors -etc -can be microfabricated!
Why microfabrication? Compare to bread boarding or circuit boards - speed (size) - functions (density) - cost (but large wafers!) - power or efficiency
Copyright A.J. Steckl J.C. Heikenfeld All rights reserved 2007
First transistor
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This is macrofabrication, leading edge novel device researchers still create devices like this
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1958: Jack Kilby at TI, developed the 1st IC using BJT technology (differential amplifier, 5 transistors). At nearly same time Robert Noyce at Fairchild also developed one. Parallel fabrication! Not micro yet, but using similar non-mechanical processes.
Copyright A.J. Steckl J.C. Heikenfeld All rights reserved 2007
618-Lecture 0
6 transistor SRAM cell, 45 nm tech., photo at left
Fabrication: Physics:
most -Fab techniques good for nano (just more sophisticated!) To maximize your success in fields ranging from VLSI to single device work, to even PCB integration of discrete devices, a fundamental understanding is needed in: electronics solid state physics fabrication limitations / options this course
Fab Challenges
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Micro fabrication
Fig. 0.1a Relationship between basic materials properties, semiconductor, microfabrication techniques and resulting device characteristics.
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WEDNESDAY THURSDAY Sept. 20 Class Organization Sept. 25 Introduction to -Fab Lecture 1 Oct. 2 Defects Lecture 3 Oct. 9 Epitaxy: Mechanisms Lecture 5 Oct. 16 Oxidation: Mechanisms Lecture 7 Oct. 23 Sept. 27 Crystal Structure Lecture 2 Oct. 4 Particle Kinetics Lecture 4 Oct. 11 Si epi Lecture 6 Oct. 19 Oxidation: Wet and Dry Lecture 8 Oct. 25 Diffusion I Lecture 9 FRIDAY
Quiz #1
618-Lecture 0
WEDNESDAY
THURSDAY Nov. 1 Diffusion: npn BJT Lecture 11 Nov. 8 Ion Implantation: Dose/Damage Lecture 13 Nov. 15 Etching Lecture 14
FRIDAY
Lecture 10 Nov. 6 Ion Implantation: Mechanisms Lecture 12 Nov. 13 QUIZ #2 Nov. 20 Lithography/ Resist Lecture 15 Nov. 27 Physical Vapor Deposition Lecture 16
Copyright A.J. Steckl J.C. Heikenfeld All rights reserved 2007
Dec. 3
Dec. 4
FINALS
WEEK