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Plasma focus device
The dense plasma focus devices were developed by J.W.Mather in
the USA and N.V.Filippov in former Soviet Union.
It is a device which produces an electrical discharge in a rarefied
gas with current that can vary from a few kA to several MA.
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Design of mechanical structure
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Design
Visible light
emitted by
plasma pinch.
a) Ar(11.5kV,0.95torr)
b) Ar (14.5 kV, 2torr)
c) Ne (11.5kV,1.2torr)
d) Ne (14.5kV,2.5torr)
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Experiments Insulator effect
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Results
-Effect of the insulator sleeve length on
plasma focus operation investigated by others
and the experimental results by different
diameters of insulator sleeve show that
insulator diameter can influence on plasma
pinch quality.
-optimum pressure tends to increase as we
tried to higher voltage levels for any of
working gases.
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Results
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Results
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Results
- when discharge resulted to a high intensity
plasma pinch, the first peak of signals recorded
by three magnetic probes occurred at the same
time obviously.
- when the first peak of magnetic signals
registered at the different times, occurrence of
plasma pinch disruption at the first peak of
discharge current wasn’t observed.
- there is a noticeable correlation between
plasma pinch intensity and current sheath
symmetry. 31
Results
-velocity of current sheath computed by these
recorded signals and average velocity of
current sheath at this point obtained 1.68 cm/μs
at the optimum condition.
-in the case of a symmetric plasma layer
formation between the electrodes, intensity of
HXR signal is more intense than a bad shot
which results to an asymmetric plasma
sheath.
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Results
-Close correlation among plasma sheath
symmetry, HXR intensity, and current
signal behavior illustrate that not only
quality of pinched plasma column influence
on HXR yield, but also symmetry of plasma
layer at the axial acceleration phase has a
direct relationship with the yield of HXR.
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Refrences
[1] J. W. Mather, Dense Plasma Focus, Methods of Experimental Physics, Vol.9, Part B, Academic Press,
New York, (1971), pp. 187-249
[2] J. W.Mather, Formation of high density deuterium plasma focus, Physics of Fluid, 8 (2) (1965), pp. 366-
377
[3] M. G. Haines, Dense Plasma in Z-pinches and the Plasma Focus, Philosophical Transactions of the
Royal Society of London. Series A, Mathematical and PhysicalSciences,300(1456) (1981), pp.649-663
[4] Y. H. Chen and S. Lee, Coaxial plasma gun in mode 1 operation,International journal of electronics,
35(3) (1973), pp.341-352
[5] S. Lee, T. Y. Tou, S. P. Moo, M. A. Eissa, A. V. Golap, K. H. Kwek, S. Mulyodrono, A. J. Smith, Suryadi,
W. Usada, and M. Zakaullah, A simple facility for the teaching of plasma dynamics and plasma nuclear
fusion, American Journal of Physics, 56 (1) (1988), pp. 62-68
[6] L. Soto, New trends and future perspectives on plasma focus research, Plasma Physics and Control
Fusion, 47(5A) (2005), pp. 361-381
[7] H Bruzzone , D Grondona, Magnetic probe measurements of the initial phase in a plasma focus device,
Plasma Physics and Control Fusion, 39(9) (1997), pp.1315–1326
[8] J. O. Pouzo, Application of the Dense Plasma Focus to Nuclear Fusion and Plasma Astrophysics, IEEE
TRANSACTION OF PLASMA SCIENCE, 31(6) (2003), pp.1237-1242
[9] M. Mathuthu, T. G. Zengeni, and A. V. Gholap, The Three-Phase Theory for Plasma Focus Devices,
IEEE TRANSACTION OF PLASMA SCIENCE,25(6) (1997),pp.1382-1388
[10] M. Habibi, R. Amrollahi, M. attaran, R. Etaati, Design, Construction and the First Experiments on the
Amirkabir Plasma Focus (APF) Facility, Plasma Device and Operations, 16(3) (2008), pp.163-169
[11] M. Mathuthu, T. G. Zengeni, A. V. Gholap, Measurement of magnetic field and velocity profiles in 3.6
kJ United Nations University/International Center For Theoretical Physics plasma focus fusion device,
Physics of Plasmas 3 (12) (1996),pp.4572-4576
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Thank You for Your Attention
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