What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Optical lithography
Robin Nagel
TUM

12. Januar 2009

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

1 / 22

What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

What is optical lithography? The optical system Production process Future and limits of optical lithography References

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

What is optical lithography?

Lithography (from the Greek - lithos: stone + grapho: to write) optical lithography is a process used to selectively remove parts of a thin lm. Until now, it is the only way for industrial mass production of computer chips

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

The optical system

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Mask making process

Exposure

Develop

Etch

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Photoresist

The photoresist (DiazoNaphtoQuinon-(DNQ)Sulfonat) reacts under the inuence of the light to an Inden-carboxylic acid The carboxylic acid has in orders of magnitude a higher solubility The bonding of the SO2 R group denes the absorbed wavelength

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Defects
Particles in the photoresist (dust,old photoresist)

Bubbles Rough substrate

Tear-o

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Kinds of photoresist

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Oxidation and exposure

Lightsources can be: Mercury lamps with a wavelength of 365nm state-of-the-art light sources are Argon Fluoride (ArF) Excimer lasers with a wavelength of 193nm

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Etch process

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

10 / 22

What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Diusion and implant

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Deposition

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

12 / 22

What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Oxidation

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Interconnects

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Metallization

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Chemical mechanical planarization

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Interconnects and layers

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Future and limits of optical lithography

Rayleigh equation: - k= resolution factor k - = wavelengh W = NA - NA= Numerical aperture For example: =193nm, NA=0.93 and k=0.25 0.25 193nm = 52nm 0.93 Use of Extrem UV lights (13nm) or X-Ray (0.5nm) W = Use of new materials and techniques (such as immersion lithography)

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

Robin Nagel (TUM)

Optical lithography

12. Januar 2009

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What is optical lithography?

The optical system

Production process

Future and limits of optical lithography

References

References
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lecture nanoelectronics by Prof. Lugli at the Tum Intel, The High-k Solution, 2007 Paolo A. Gargini, Silicon nanoelectronics and beyond,2004 Gordon E. Moore, Cramming more components onto integrated circuits, 1965 Reed Business Information, 32 nm Marked by Litho, 2008 Daniel Bratton, Da Yang, Junyan Dai and Christopher K. Ober,Recent progress in high resolution lithography,2006 Yong Chen, Anne Pepin, Nanofabrication:Conventional and nonconventional methods,2001 icknowledge, Technology backgrounder: Immersion Lithography, 2003 Microchemicals, Lithograe, 2007
Robin Nagel (TUM) Optical lithography 12. Januar 2009 22 / 22