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p-n Junction
p-n Junction
Depletion Widths
N aW p = N dWn
Mass Action Law valid along the whole device, through the pn junction.
p-n Junction
Field (E) and net space charge density
dE net ( x )
=
dx
E ( x) =
W p
net ( x )dx
Eo =
eN dWn
Built-in voltage
1
Vo = E0W0
2
kT N a N d
Vo =
ln
e ni2
p-n Junction
Law of the Junction
Boltzmann Statistics (only to be used
with nondegenerate semiconductors)
( E2 E1 )
N2
= exp
N1
k
T
B
n po
eVo
= exp
nno
k
T
B
nno = N d
ni2
& n po =
Na
e
e
ni
n po
n p0
eV
= exp 0
nn0
kBT
n p (0)
e(V V )
= exp 0
nn0
k
T
eV
n p ( 0 ) = n po exp
kBT
eV
pn ( 0 ) = pno exp
kBT
eV
n p ( 0 ) = n po exp
kBT
eV
pn ( 0 ) = pno exp
kBT
eV
n p ( 0 ) = n po exp
1
kBT
eV
pn ( 0 ) = pno exp
1
kBT
np(0) is the electron concentration just outside the depletion region on the p-side
pn(0) is the hole concentration just outside the depletion region on the n-side
Shockley Equation
Ideal diode (Shockley) equation
eV
J = J so exp
1
kBT
eDh eDe 2
J so =
+
ni
Lh N d Le N a
Intrinsic concentration:
ni depends strongly on the material
(e.g. bandgap) and temperature
Eg
n = N c N v exp
k
T
B
2
i
The total current anywhere in the device is constant. Just outside the depletion region it is
due to the diffusion of minority carriers.
n p0
eV
= exp 0
nn0
kBT
n p (0)
e(V V )
= exp 0
nn0
k
T
eABC
eBCD
" e(Vo V ) %
nM
= exp $
'
nno
# 2kBT &
! eV $
nM = ni exp #
&
" 2kBT %
J recom
eni
Wp Wn
eV
+ exp 2k T
h
B
e
eni Wp Wn
where J ro =
+
2 e h
eV
eV
+ J ro exp
J = J so exp
k BT
2k BT
k BT
V>
e
eV
J = J o exp
1
k BT
General diode
equation
Typical I-V characteristics of Ge, Si and GaAs pn junctions as log(I) vs. V. The slope
indicates e/(!kBT)
Reverse Bias
Reverse Bias
diff
rev
eDh
eDe 2
=
+
ni
Lh N d Le N a
ther
rev
eWni
=
g
Reverse Bias
Total Reverse Current
eDh
eDe 2 eWni
J rev =
+
ni +
g
Lh N d Le N a
0
Diffusion current in neutral regions
the Shockley reverse current
eV
J = J o exp
1
k BT
Heterojunctions
Two types of heterojunction and the definitions of band offsets, Type I and Type II between
two semiconductor crystals 1 and 2. Crystal 1 has a narrower bandgap Eg1 than Eg2 for
crystal 2. Note that the semiconductors are not in contact so that the Fermi level in each is
different. In this example, crystal 1 (GaAs) is p-type and crystal 2 (AlGaAs) is N-type.
Heterojunctions
Under open circuit and equilibrium conditions, the Fermi level EF must be uniform, i.e.
continuous throughout the device.
If EF is close to the conduction band (CB) edge, Ec, it results in an n-type, and if it is close
to the valence band (VB) edge, Ev, it results in a p-type semiconductor.
There is a discontinuity Ec in Ec, and Ev in Ev, right at the junction.
Heterojunctions
Under open circuit and equilibrium conditions, the Fermi level EF must be uniform, i.e.
continuous throughout the device.
If EF is close to the conduction band (CB) edge, Ec, it results in an n-type, and if it is close
to the valence band (VB) edge, Ev, it results in a p-type semiconductor.
There is a discontinuity Ec in Ec, and Ev in Ev, right at the junction.
UV LED
(Photos by SK)
(a) The energy band diagram of a pn+ (heavily n-type doped) junction without any bias. Builtin potential Vo prevents electrons from diffusing from n+ to p side.
(b) The applied bias potential V reduces Vo and thereby allows electrons to diffuse, be
injected, into the p-side. Recombination around the junction and within the diffusion length
of the electrons in the p-side leads to spontaneous photon emission.
(c) Quasi-Fermi levels EFp and EFn for holes and electrons across a forward biased pnjunction.