Beruflich Dokumente
Kultur Dokumente
18.00
12.20
Session II Characterization I
10.40 Char.I,1 Optical and Electrical Properties of Hydrothermally Grown ZnO: Ef
fects of
Annealing in Forming Gas
DavidC. Look1,2, Michael Callahan3, Lionel Bouthillette3
1Semiconductor Research Center, Wright State University, Dayton, OH, USA
2Materials and Manufacturing Directorate, Air Force Research Lab., OH, USA
3Sensors Directorate, Air Force Research Laboratory, Hanscom AFB, MA USA
11.00 Char.I,2 Optical spectroscopy of A-plane ZnO epilayers grown on R-plane
sapphire substrates by MBE
C. Morhain1, B. Lo2, M. Teisseire1, J.-M. Chauveau1, B. Vinter1, M. Albrecht3
1 CRHEA-CNRS, Valbonne-Sophia -Antipolis, France
2 Universit Cheikh Anta, Dakar, Facult des Sciences et Techniques, Senegal
3 Institut fr Kristallzchtung, Berlin, Germany
11.20 Char.I,3 Carrier Capture by Ionized Impurities in ZnO Epilayers
Frank Bertram, Thomas Hempel, Sylke Petzold, Armin Dadgar,
Jrgen Christen, and Alois Krost
Institute of Experimental Physics, Otto-von-Guericke-University Magdeburg,
Germany
11.40 Char.I,4 Lattice dynamics of homoepitaxially grown ZnO and ZnO:Li layers
U. Haboeck1, A. Hoffmann1, C. Thomsen1, S. Lautenschlger2, J. Sann2, C.
Neumann2, and B.K. Meyer2
1Institut fr Festkrperphysik, Technische Universitt Berlin, Berlin, Germany
2I. Physikalisches Institut, Justus-Liebig-Universitt, Giessen, Germany
12.00 Char.I,5 Uniaxial Stress Effects on Hydrogen in ZnO
E.V. Lavrov, F. Brrnert, J. Weber
Technische Universitt Dresden, Dresden, Germany
12.20 14.00 Lunch
Wednesday, October 4th, 2006 Afternoon 14.00
15.20
4th International Workshop on ZnO and Related Materials, Oct 3-6, 2006, Universi
ty of Giessen, Germany
2/18
17.00
Session IV Nanostructures
15.40 Nano.1 Guided Modes for Stimulated and Spontaneous Emission from ZnO Nanor
ods
J. Fallert, R. Hauschild, A. Urban, H. Zhou and H. Kalt
Institut fr Angewandte Physik, Universitt Karlsruhe, Germany
16.00 Nano.2 ZnO nanorods and their nanodevice applications
G.-C. Yi , J. Yoo, C.H. Lee, and H.J. Kim
National CRI Center for Semiconductor Nanorods and Department of Materials
Science and Engineering, POSTECH, Pohang, Korea
16.20 Nano.3 Glucose biosensors made of ZnO nanostructures
X. W. Sun1, 2, J. X. Wang1, Y. Lei3, A. Wei1, G. Q. Lo2
1School of Electrical & Electronic Engineering, Nanyang University, Singapore
2Institute for Microelectronics, Science Park II, Singapore
3School of Chemical and Biomedical Engineering, Nanyang University, Singapore
16.40 Nano.4 Device Grade Ultra-thin ZnO Quantum Wells Grown by Pulsed Laser
Deposition
Lalit M. Kukreja, Pankaj Misra
Thin Film Laboratory, Raja Ramanna Centre f. Advanced Technology, Indore, India
Wednesday, October 4th, 2006 Evening 17.00
19.00
17.00 Poster P I
(food, drinks, cocktails)
Thursday, October 5th, 2006 On Site Registration 8.30
Morning 9.00 10.20
18.00
Session V Characterization II
9.00 Char.II,1 Processes of Stimulated Emission in ZnO
C. Klingshirn, R. Hauschild, J. Fallert, A. Urban, H. Kalt
Institut fr Angewandte Physik, Universitt Karlsruhe, Germany
9.20 Char.II,2 Ultrafast Exciton and Biexciton Dynamics in a ZnO Thin Film
Hsiang-Chen Wang1, Yen-Cheng Lu1, Cheng-Yen Chen1, Fang-Yi Jen1, C. C.
Yang1, Bao-Ping Zhang2, and Yusaburo Segawa2
1Graduate Institute of Electro-Optical Engineering, Taiwan University, Taipei,
2Photodynamics Research Center, RIKEN Sendai, Japan
4th International Workshop on ZnO and Related Materials, Oct 3-6, 2006, Universi
ty of Giessen, Germany
3/18
12.20
Session VI p-Doping
10.40 p-Doping.1 p-type Nitrogen- and Phosphorus-doped ZnO Thin Films Grown by P
ulsed
Laser Deposition on Sapphire Substrates
Jean-Paul Mosnier, S. Chakrabarti, B. Doggett, E.McGlynn, M.O. Henry
National Centre for Plasma Science and Technology, Dublin University, Ireland
11.00 p-Doping.2 Realization of p-type conductivity in ZnMgO by different method
s
Liping Zhu, Yuming Ye, Haihui Huang, Zhizhen Ye
State Key Laboratory of Silicon Materials, Zhejiang University, China
11.20 p-Doping.3 Structure and optoelectronic properties of n-type and p-type ph
osphorusdoped ZnO films
A. Allenic1, Y.B. Chen1, W. Guo1, G. Y. Zhao1, M. B. Katz1, Y. Che2, B. Liu2, Z.
D.
Hu2 and X.Q. Pan1
1Materials Science and Engineering Department, University of Michigan, MI, USA
2IMRA America, Inc., Ann Arbor, MI, USA
11.40 p-Doping.4 Growth and Characterization of undoped, Ga-doped n-type and GaN
codoped p-type ZnO thin films on ZnO wafer using RF magnetron sputtering
Il-Soo Kim1, Tae-Hwan Kim1, Sang-Hun Jeong2, Manoj Kumar1, Sang Sub Kim1
and Byung-Teak Lee1,1Photonic and Electronic Thin Film Laboratory, Gwangju, Kore
a.
2Gwangju Center, Korea Basic Science Institute, Gwangju, Korea
12.00 p-Doping.5 Doping and Compensation Effects of Nitrogen to ZnO Thin Film
Xiaonan Li1, Sally E. Asher1, Craig L. Perkins1, Lei L. Kerr2, Sukit Limpijumnon
g3,
S. B. Zhang1, Su-Huai Wei1, and Timothy J. Coutts1
1National Renewable Energy Laboratory, Golden, CO, USA
2Department of Paper and Chemical Engineering, Miami University, Oxford, OH
3School of Physics, Suranaree University of Technology, Thailand
12.20
14.00 Lunch
4th International Workshop on ZnO and Related Materials, Oct 3-6, 2006, Universi
ty of Giessen, Germany
4/18
16.00
18.00
16.00 Poster II
(coffee, beverages)
18.00 Departure to Braunfels Castle
Banquet
4th International Workshop on ZnO and Related Materials, Oct 3-6, 2006, Universi
ty of Giessen, Germany
5/18
18.00
12.20
Nrnberg, Germany
4th International Workshop on ZnO and Related Materials, Oct 3-6, 2006, Universi
ty of Giessen, Germany
9/18
Sberveglieri2
1CNR-INFM Coherentia & Dipartimento di Scienze Fisiche, Napoli, Italy
2CNR-INFM Sensor Lab & Universit di Brescia, Brescia, Italy
P 145 The preparation and unstable properties of p-type ZnO:N irradiated by diff
erent light
Y. C. Liu1, Z. Y. Xiao2, J. Y. Zhang2, C. S. Xu1, Y. X. Liu1 and C. L. Shao1
1Center for Advanced Optoelectronic Functional Material Research, Northeast Norm
al
University, Changchun, P. R. China
2Key Laboratory of Excited State Process, Changchun Institute of Optics, Fine Me
chanics and
Physics, Chinese Academy of Sciences, Changchun, P. R. China
P 146 Modification of ZnO layers by molecular adsorbates
during electrochemical deposition
T. Loewenstein1, C. Neumann2, T. Krmer2, B. K. Meyer2, T. Yoshida3, D. Schlettwei
n1
1Institut fr Angewandte Physik, Justus-Liebig-Universitt Gieen, Germany
2I. Physikalisches Institut, Justus-Liebig-Universitt Gieen, Germany
3Graduate School of Engineering, Gifu University, Japan
4th International Workshop on ZnO and Related Materials, Oct 3-6, 2006, Universi
ty of Giessen, Germany
12/18
P 147 Advances in high-quality ZnO Thin Films and Heterostructures grown by Puls
ed Laser
Deposition
Michael Lorenz1, Holger Hochmuth1, Robert Johne1, Gabriele Benndorf1, Jrg Lenzner
1, Holger
von Wenckstern1, Matthias Schubert1, 2, Marius Grundmann1
1Institut fr Experimentelle Physik II, Universitt Leipzig, Germany
2now at CMRA, University of Nebraska-Lincoln, Lincoln, NE, U.S.A.
P 148 ZnO based multimode voltage tunable SAW devices
Jun Zhu, Ying Chen, Gaurav Saraf, Nuri W. Emanetoglu, Yicheng. Lu
Department of Electrical and Computer Engineering, Rutgers University, NJ, USA
P 149 Zn1-xMgxO polycrystalline films deposited by co-sputtering
K. Matsubara, H. Tampo, S. Shibata, A. Yamada, and S. Niki
National Institute of Advanced Industrial Science and Technology, Ibaraki, Japan
P 150 Tri-buffer Approach to Obtain High-quality ZnO Epitaxial Films on Sapphire
Z. X. Mei1, X. L. Du1, Z. Q. Zeng1, H. T. Yuan1, Y. Wang1, J. F. Jia1, Q. K. Xue
1,2, Z. Zhang3
1Beijing National Laboratory for Condensed Mattter Physics, Institute of Physics
, Chinese
Academy of Sciences, Beijing, China
2Department of Physics, Tsinghua University, Beijing, China
3Beijing University of Technology, Beijing, China
P 151 Investigation of the Stability of ZnO:Al2O3 Thin Films Deposited by Reacti
ve MidFrequency Magnetron Sputtering in CIGS Solar Modules
Richard Menner1, M. Powalla1, V. Sittinger2, F. Ruske2, B. Dimmler3
1Zentrum fuer Sonnenenergie- und Wasserstoff-Forschung (ZSW), Stuttgart, Germany
2 Fraunhofer IST, Braunschweig, Germany
3 Wuerth Solar GmbH & Co. KG, Marbach/N., Germany
P 152 Effect of substrate and annealing temperature on the optical and physical
properties of
DC sputtered ZnO films
Paul Miller1,3, L.P. Schuler2, M.M. Alkaisi2 , R.J. Reeves1,3
1Department of Physicas and Astronomy, University of Canterbury, Christchurch, N
ew Zealand
2Dep. of Electrical and Computer Engineering, Univ. of Canterbury, Christchurch,
New Zealand
3The MacDiarmid Institute for Advanced Materials and Nanotechnology, New Zealand
P 210 Epitaxial Growth of m-Plane (1010) Wurtzite ZnO on Cubic (001) MgO Substra
tes
E. Cagin, W. Wang, J. Yang, and J. Phillips
EECS Department, The University of Michigan, Ann Arbor, Michigan, USA
P 211 Growth evolution of PLD Zn(Mg)O nanowire arrays and electrical characteriz
ation of ZnO
microcrystals
Andreas Rahm1, Holger von Wenckstern1, Thomas Nobis1, Michael Lorenz1, Gregor
Zimmermann1, and Marius Grundmann1
1Institut fr Experimentelle Physik II, Universitt Leipzig, Germany
P 212 Catalytic growth of ZnO nanostructures
Anton Reiser1, A. Ladenburger1, G. M. Prinz1, M. Schirra1, M. Feneberg1,
E. Mller2, D. Gerthsen2, K. Thonke1, and R. Sauer1
1Universitt Ulm, Abteilung Halbleiterphysik, Ulm, Germany
2Universitt Karlsruhe, Laboratorium fr Elektronenmikroskopie, Karlsruhe, Germany
P 213 ZnO Photonic Crystal Type Structures Fabricated by Focused Ion Beam Proces
sing of
ZnO Films Grown on c-Sapphire by Pulsed Laser Deposition
D. Rogers1,2, F. Teherani1, G. Lerondel2, C. Hubert2, S. Otari1,2, C. Collet3, W
. Nativel3, G.
Garry3, A. Lusson4, V. Sallet4, G. Amiri4, M. Peres5, A.J. Neves5 & T. Monteiro5
1Nanovation SARL, Orsay, France,
2Universit de Technologie de Troyes, Troyes, France,
3Thales Research & Technology, Palaiseau, France,
4GEMAC, CNRS Meudon, Universit de Versailles, France,
5Departamento de Fisica, FSCOSD, Universidade de Aveiro, Portugal
P 214 Optical characterization of nitrogen implanted ZnO thin films and nanowire
s
D. Stichtenoth1, S. Mller1, W. Dewald1, S. Geburt1, C. Ronning1, L. Wischmeier2,
C. Bekeny2, T.
Voss2
1II. Institute of Physics, University of Gttingen, Germany
2Institute for Solid State Physics, University of Bremen, Germany
P 215 The growth of ZnO by MOCVD using helium as carrier gas
V. Sallet, M. Chaqour, E. Chikoidze, G. Amiri, A. Lusson, G. Zribi, P. Galtier
CNRS, Groupe d tude de la matire condense (GEMaC), Meudon, France
P 216 Growth and characterization of homoepitaxially grown ZnO thinfilms
Sann, J., Neumann, C., Lautenschlger, S, Volbers, N., and Meyer, B. K.
I. Physikalisches Institut, Justus-Liebig-Universitt Gieen, Germany
P 217 EPR and magnetic properties of ZnO:Co thin films grown by MBE
P 227 ZnO in the textured back reflector of silicon thin film solar cells
R.H.J. Franken1, R.L. Stolk1, Y. Liu1, J.K. Rath1, R.E.I. Schropp1
1Utrecht University, Faculty of Science, SID-Physics of Devices, Utrecht, The Ne
therlands
P 228 Anisotropy of the band-gap of ZnO thin films
Ch. Sturm, T. Chavdarov, R. Schmidt-Grund, B. Rheinlnder, H. Hochmuth, M. Lorenz,
and M.
Grundmann
Institut fr Experimentelle Physik II, Universitt Leipzig, Germany
P 229 Thickness influence on the structural properties of ZnO thin films
M. Suchea 1,2b, S. Christoulakis 1,2a, P. Horvath1, G. Kiriakidis1,2a
1 Institute of Electronic Structure and Laser, Foundation for Research & Technol
ogy-Hellas,
Heraklion, Crete, Greece
2 University of Crete, a Physics and b Chemistry Department, Heraklion, Crete, G
reece
P 230 Growth of smooth ZnO layers by a modified low cost CVD process
Anton Reise1, A. Ladenburger, G. M. Prinz, M. Schirra, M. Feneberg, K. Thonke, a
nd R. Sauer
Abt. Halbleiterphysik, Universitt Ulm, Germany
4th International Workshop on ZnO and Related Materials, Oct 3-6, 2006, Universi
ty of Giessen, Germany
16/18
P 231 38 x 50mm transparent and conducting ZnO film MOCVD production tool
S. Sun1, D. Mentel1, L.G. Provost1, D. Sugrim1, G.S. Tompa1, P. Chan2, K. Tong2,
R. Wong2, A.
Lee2
1Structured Materials Industries, Inc., Piscataway, NJ, USA
2Podium Photonics, Ltd., Hanoi Road, Tsimshatsui, Kowloon, Hong Kong
P 232 MOCVD production of ZnO films doped with As, N, P and Sb
S. Sun1, C.E. Rice1, L.G. Provost1, G.S. Tompa1
1Structured Materials Industries, Inc., Piscataway, NJ, USA
P 233 Magnetic properties of ZnO-based dilute magnetic semiconductors from SIC-L
SDA
calculations
M. Toyoda1, H. Akai 2, K. Sato 1 and H. Katayama-Yoshida 1
Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka
, Ibaraki, Japan.
2Department of Physics, Osaka University, 1-1 Machikaneyama, Toyonaka, Japan
P 234 Comparison of vacancy defect distributions in bulk ZnO crystals grown by v
arious
methods
Filip Tuomisto1, J.-M. Mki1, David C. Look2, Andrzej Mycielski3, Krzsysztof Grasz
a3
1Laboratory of Physics, Espoo, Finland
2Semiconductor Research Center, Wright State University, Dayton, Ohio, USA
3Institute of Physics, Polish Academy of Sciences, Warsaw, Poland
P 235 Magneto-optical studies of bound exciton complexes in ZnO
M. R. Wagner1, U. Haboeck1, R. McKenna1, A. Hoffmann1
S. Lautenschlger2, J. Sann2, B. K. Meyer2, A. Rodina3
1Institut fr Festkrperphysik, Technische Universitt Berlin, Germany
2I. Physikalisches Institut, Justus-Liebig-Universitt Gieen, Germany
3Ioffe Physico-Technical Institute of RAS, St. Petersburg, Russia
P 236 On the role of contact resistances in two-terminal measurements of individ
ual ZnO
nanowires
D. Weissenberger1, F. Prez-Willard1, D. Gerthsen1
1Laboratorium fr Elektronenmikroskopie, Universitt Karlsruhe, Germany
P 237 Comprehensive study of donors states in ZnO thin films
H. von Wenckstern, M. Brandt, H. Schmidt, H. Hochmuth, M. Lorenz and M. Grundman
n
Institut fr Experimentelle Physik II, Leipzig, Germany
P 238 Photoluminescence dynamics of surface-related emission in ZnO nanorods
L. Wischmeier1, T. Voss1, I. Rckmann1, J. Gutowski1, A. C. Mofor2, A. Bakin2, A.
Waag2
1Institut fr Festkrperphysik, Universitt Bremen, Germany
2Institute of Semiconductor Technology, Technical University of Brauschweig, Ger
many
P 239 Electrical Characterization of Undoped ZnO-Layers Grown by MOCVD
S.Tiefenau, H.Witte, A.Krtschil, S.Giemsch, A.Dadgar, A.Krost, J. Christen
Institute of Experimental Physics, Otto-von-Guericke-University-Magdeburg, Germa
ny
P 240 Realization of p-type ZnO guided by first principles simulation
Ping Wu1, Zhi Gen Yu1, Hao Gong2
1Institute of High Performance Computing, The Capricorn Singapore Science Park I
I., Singapore
2Department of Materials Science and Engineering, National University of Singapo
re, Singapore
P 241 Growth and Characteristics of p-ZnO/n-GaN Heterostructure Light-Emitting D
iodes
C. C. Wu1, W. K. Wang1, S. H. Lin1, R. H. Horng2, D. S. Wuu1
1Department of Materials Engineering, National Chung Hsing University
2Institute of Precision Engineering, National Chung Hsing University, Taiwan, R.
O.C
P 242 Pulsed laser deposition and in-site annealing of zinc oxide
L. Zhao, Z. Liu, C. S. Xu, Y. X. Liu, Y. C. Liu
Center for Advanced Optoelectronic Functional Material Research, Northeast Norma
l University,
Changchun, China
4th International Workshop on ZnO and Related Materials, Oct 3-6, 2006, Universi
ty of Giessen, Germany
17/18