Beruflich Dokumente
Kultur Dokumente
Course MICROELECTRONICS
Chapter: CMOS
Michael E. Auer
Source of figures:
Jaeger/Blalock: Microelectronic Circuit Design,
McGraw-Hill
Michael E.Auer
01.05.2007
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MICROELECTRONICS - CMOS
Course Content
Introduction and Milestones in Microelectronics
Solid-state Electronics
Solid-state Diodes and Diode Circuits
Field-effect Transistors (FET)
Bipolar Junction Transistors (BJT)
Integrated Transistor circuits
Introduction to Digital Microelectronics
NMOS Logic Circuits
Complemetary MOS Logic (CMOS)
Bipolar Logic Circuits
Semiconductor Memories
Application Specific Integrated Circuits (ASIC)
Microelectronic Technology
Michael E.Auer
01.05.2007
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MICROELECTRONICS - CMOS
Chapter Content
The CMOS Inverter / CMOS Inverter
Dynamic Behavior / Dynamisches Verhalten
CMOS NOR and NAND Gates / CMOS NOR und NAND Gatter
Complex CMOS Logic Gates / Komplexe CMOS Gatter
CMOS Transmission Gate / CMOS Transmission Gate
Michael E.Auer
01.05.2007
MET09
MICROELECTRONICS - CMOS
Chapter Content
The CMOS Inverter / CMOS Inverter
Dynamic Behavior / Dynamisches Verhalten
CMOS NOR and NAND Gates / CMOS NOR und NAND Gatter
Complex CMOS Logic Gates / Komplexe CMOS Gatter
CMOS Transmission Gate / CMOS Transmission Gate
Michael E.Auer
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MICROELECTRONICS - CMOS
CMOS Technology
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MICROELECTRONICS - CMOS
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MICROELECTRONICS - CMOS
CMOS Inverter
(a)
(b)
(c)
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MICROELECTRONICS - CMOS
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NMOS Transistor
NMOS
(v GS VTN )
PMOS
Saturation Region :
Michael E.Auer
W
v
vGS VTN DS v DS
L
2
K n' W
2
iD =
(vGS VTN ) (1+ v DS )
2 L
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iD = K 'p
(v GS VTP )
W
v
vGS VTP DS v DS
L
2
K 'p W
2
iD =
(vGS VTP ) (1+ v DS )
2 L
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MICROELECTRONICS - CMOS
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MICROELECTRONICS - CMOS
Region 1: vO = VH
vI < VTN
Region 2: |vDS| |vGS VTP|
Region 4: vDS vGS VTN
Region 5: vO = VL
vI > VDD |VTP|
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MICROELECTRONICS - CMOS
Michael E.Auer
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The simulation
results show the
varying VTC of the
inverter as VDD is
changed
The minimum
voltage supply for
CMOS technology is
VDD = 2VT ln(2) V
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MICROELECTRONICS - CMOS
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Polysilicon is used to
form common gate
connections, and metal
is used to tie the two
drains together
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MICROELECTRONICS - CMOS
Michael E.Auer
01.05.2007
Polysilicon is used to
form common gate
connections, and metal
is used to tie the two
drains together
MET09
MICROELECTRONICS - CMOS
Chapter Content
The CMOS Inverter / CMOS Inverter
Dynamic Behavior / Dynamisches Verhalten
CMOS NOR and NAND Gates / CMOS NOR und NAND Gatter
Complex CMOS Logic Gates / Komplexe CMOS Gatter
CMOS Transmission Gate / CMOS Transmission Gate
Michael E.Auer
01.05.2007
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MICROELECTRONICS - CMOS
Michael E.Auer
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MICROELECTRONICS - CMOS
p =
Michael E.Auer
VH VTN
= RonN C ln 4
VH + VL
1
=
K n (VH VTN )
PHL + PLH
2
2VTN
1 +
VH VTN
= PHL
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MICROELECTRONICS - CMOS
t f = 2 PHL
Symmetrical inverter:
t r = 2 PLH
Michael E.Auer
tf = tr
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1)
Capacitive load
charging at a
frequency f given
by: PD = CV2DDf
The current that
occurs during
switching which can
be seen in the figure
2)
Michael E.Auer
01.05.2007
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MICROELECTRONICS - CMOS
Chapter Content
The CMOS Inverter / CMOS Inverter
Dynamic Behavior / Dynamisches Verhalten
CMOS NOR and NAND Gates / CMOS NOR und NAND Gatter
Complex CMOS Logic Gates / Komplexe CMOS Gatter
CMOS Transmission Gate / CMOS Transmission Gate
Michael E.Auer
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MICROELECTRONICS - CMOS
Y=A+B
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Y=A+B+C
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MICROELECTRONICS - CMOS
Y=AB
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Y=ABCDE
Michael E.Auer
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MICROELECTRONICS - CMOS
Chapter Content
The CMOS Inverter / CMOS Inverter
Dynamic Behavior / Dynamisches Verhalten
CMOS NOR and NAND Gates / CMOS NOR und NAND Gatter
Complex CMOS Logic Gates / Komplexe CMOS Gatter
CMOS Transmission Gate / CMOS Transmission Gate
Michael E.Auer
01.05.2007
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MICROELECTRONICS - CMOS
Michael E.Auer
01.05.2007
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MICROELECTRONICS - CMOS
Y = A + B (C + D)
Michael E.Auer
01.05.2007
MET09
MICROELECTRONICS - CMOS
Chapter Content
The CMOS Inverter / CMOS Inverter
Dynamic Behavior / Dynamisches Verhalten
CMOS NOR and NAND Gates / CMOS NOR und NAND Gatter
Complex CMOS Logic Gates / Komplexe CMOS Gatter
CMOS Transmission Gate / CMOS Transmission Gate
Michael E.Auer
01.05.2007
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MICROELECTRONICS - CMOS
Michael E.Auer
01.05.2007
The CMOS
transmission gate
(T-gate) is a useful
circuits for both analog
and digital applications
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REQ =
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Ronp Ronn
Ronp + Ronn
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Summary
Michael E.Auer
In CMOS logic each gate contains both an NMOS and a PMOS switching network and every
logical input is connected to at least one NMOS and one PMOS transistor.
The high and low output voltage are VDD and VSS and therefore the noise margins are
maximal.
NAND gates, NOR gates and complex CMOS logic gates can all be designed as for NMOS
circuitry. The NMOS and the PMOS switching networks are behavioral or structural dual.
CMOS power dissipation is determined by the energy required to charge and discharge the
load capacitance at the desired switching frequency. The static power dissipation is nearly
disappearing.
During switching of the CMOS gate a pulse of current occursbetween the positive and
negative power supplies. This current causes an additional component of the power
dissipation in CMOS gates that can be as much as 20 to 30 percent of the dissipation
resulting from charging and discharging the load capacitance.
A new bidirectional circuit element, the CMOS transmission gate that utilizes the parallel
connection of an NMOSand a PMOS transitor was introduced. When the transmission gate
is on, it provides a low-resistance connection between its input and output terminals over
the entire input voltage range.
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