04 Matrix Modifiers For Graphite Furnace Analysis

SAP/CSC/CAM/AAS-007a
Feb 2002
MATRIX MODIFIER (MM) FOR

GRAPHITE FURNACE ANALYSIS (GFA)
This article is a guide regarding the use of MM in GFA. Although it is derived from
several sources, it is not comprehensive and final. As could be seen, more than one type of MM
can be used for each element. End-users are encouraged to try out the various types of MM, the
appropriate MM concentration as well as the furnace temperature program to suit the various
sample matrixes.
ELEMENT/SAMPLE/MM
REMARKS
Aluminium (Al)
La(NO3)3
*City H2O
10 ppm Mg(NO3)2 or 10 ppm NH4Cl;
sample : modifier = 1:1
Serum and blood

Dilute Triton X-100
Effective with alloying.
Antimony (Sb)
Cu best, Ni, Pt also effective
La(NO3)3
*City H2O
10 ppm Pd using Pd(NO3)2 or
10 ppm Ni using Ni(NO3)2;
@
Electrolytic copper ore
200 ppb La from La(NO3)3
50-1000 ppm Ni(NO3)2
Alloying.
Alloying.
Permits a higher ashing temperature,

stabilises and enhances the signal.
100 ppm Pd(NO3)2 with 2.5% ascorbic

acid
500-2000 ppm Pd solution +

reducing agent such as ascorbic acid
Permits a higher ashing temperature and

enhances the analyte signal.
Use secondary wavelength or Zeeman

background correction if interference is
expected from high Pb concentration which
may cause a measurable spectral interference
at 217.6 nm.
Arsenic (As)
Pd best, Mo, Zr, Ba also good
La(NO3)3
Mg(NO3)2, Ni(NO3)2
Coexistence with Ni is effective.

Production of As2O6 seems to be effective.
Increase ashing temperature.

(PTO)
_____________________________________________________________________________
Shimadzu (Asia Pacific) Pte Ltd, Singapore
ELEMENT/SAMPLE/MM
REMARKS
Arsenic (As) (cont)

*City H2O
10 ppm Ni using Ni(NO3)2;
@
200 ppb La from La (NO3)3
$
10 ppm Ni from Ni(NO3)2
100-2000 ppm Pd or 10 l of 500 ppm
Pd or 100-2000 ppm Pt or 50 ppm Ni or
500-2000 ppm Pd solution + reducing
agent such as ascorbic acid
Nickel nitrate
Formation of nickel arsenide which is stable

up to 900oC so that higher ashing temperature
can be used.
Permits higher ashing temperature and

enhances signal.
Samples may be subjected to losses of As

during sample preparation as elemental As and
many of its compounds are volatile. Process
spiked samples and relevant standard
reference materials to determine if the chosen
dissolution method is appropriate.
Employ with caution the selection

temperatures and times of drying and ashing
cycles.
To minimise volatilisation losses during

drying and ashing.
Employ simultaneous background correction

to avoid erroneously high results due to severe
non-specific absorption and light scattering
caused by matrix components during
atomisation.
As analysis is particularly
susceptible to these problems because of its
low analytical wavelength (193.7 nm).
Use Zeeman background correction or any

appropriate background correction technique
to overcome severe positive interference
caused by Al, especially when using D2 arc
background correction.
Clean tube by operating the furnace at full

power at regular intervals to remove memory
effect caused by analyte that is not completely
volatilised and removed from furnace during
atomisation.
_____________________________________________________________________________
ELEMENT/SAMPLE/MM
REMARKS
Barium (Ba)
La(NO3)3
Formation of less volatile barium carbide can

cause losses of sensitivity and memory effects.
Optimise furnace parameters to minimise

severe physical and chemical interferences
caused by long residence time and high
concentration of the analyte in optical path of
graphite furnace.
Do not use N2 as purge gas because of

possible chemical interference.
Do not use halide acids.
Beryllium (Be)
La(NO3)3
Optimise furnace parameters to minimise

severe physical and chemical interferences
caused by long residence time and high
concentration of the atomised sample in
optical path of graphite furnace.
Require simultaneous background correction

atomisation.
Bismuth (Bi)
Pb
1000 ppm Ni or 1000 ppm Pd
Boron (B)
$
500 ppm Ca
100 ppm Ba(OH)2 or 100 or

1000 ppm La(NO3)3/LaCl3
MIBK extract.

enhances signal.
$
May enhance sensitivity.

Enhances signal.
Cadmium (Cd)
Blood, serum, urine
Pd(NO3)2 + NH4NO3 ;
(NH4)2HPO4 + HNO3
La(NO3)3
Mg(NO3)2 ;
(NH4)H2PO4 + HNO3 or Mg(NO3)2
1% (NH4)2HPO4
ppb level
Addition of F, SO42-, PO43- effective.
Ashing temperature can be increased. (PTO)
_____________________________________________________________________________
ELEMENT/SAMPLE/MM
REMARKS
Cadmium (Cd) (cont)

*City H2O
10 ppm NH4NO3;
*Environmental H2O; Wastewater
#
Vegetables, fruits, grains, beans,
potatoes, meat, fish, fats, oils, dairy
products, spirits, alcoholic beverages,
processed food
*10 ppm Pd using Pd(NO3)2;
$
1% (w/v) (NH4)2HPO4 or
1% (w/v) (NH4)SO4 or
0.1% (w/v) (NH4)MoO4.4H2O or
1% (v/v) H2SO4 or H3PO4 can be
substituted for ammonium salt solutions.
Excess NaCl
2% NH4NO3 or 2% NH4 oxalate
By the addition of phosphate ions, ashing

temperature can be increased due to the
formation of cadmium phosphate which is
stable up to 650-800oC.
To aid in low temperature removal of NaCl

through formation of NH4Cl and NaNO3
(reduction in non-atomic absorption).
Seawater
2% (NH4)H2PO4 or 2% NH4 oxalate
Soil
3% H3PO4 or 1-2% (NH4)H2PO4 ;
40 l modifier added to 20 l sample.
Plant tissue
2% H3PO4 or 2% (NH4)H2PO4 ;
40 l modifier added to 20 l sample.
Whole Blood
2% (NH4)2H2PO4
Infant formula, skim milk powder;
Streams, Effluents
0.5% (w/v) (NH4)H2PO4
1000 ppm H3PO4 or

1000 or 5000 ppm (NH4)H2PO4

Conversion to less volatile phosphate so that

higher atomisation temperature can be used
and ensures a smooth peak.
Permits a higher ashing temperature.
Require simultaneous background correction

atomisation.
(PTO)
_____________________________________________________________________________
ELEMENT/SAMPLE/MM
Cadmium (Cd) (cont)
Ammonium
modifiers
phosphate
or
other
REMARKS
To minimise loss due to excess chloride

which may cause premature volatilisation of
Cd.
Use Cd-free pipette tips.
Cesium (Cs)
$
0.2% (v/v) H2SO4
Chromium (Cr)
La(NO3)3
*City H2O; Environmental H2O;
Wastewater
10 ppm NH4Cl; sample : modifier = 1:1
Seawater
1% Mg(NO3)2 or 1% HNO3
Seawater
2-10% NH4NO3 or 2% NH4 oxalate
Serum and blood

Dilute Triton X-100

Calcium nitrate
Cobalt (Co)
0.5% Fe(NO3)2
Seawater

Reduces background
interferences.
signal,
minimises
Low concentrations of Ca and/or phosphate

may cause interferences. At above 200 mg/L,
Cas effect is constant and eliminates the
effect of phosphate.
Do not use N2 as purge gas because of a

possible CN band interference.
May require background correction because

non-specific absorption and scattering can be
significant at analytical wavelength.
To prevent coexistence of halogenide.
Verify that interference caused by excess

chloride is absent by standard additions.
Copper (Cu)
La(NO3)3
Soil with excess NaCl
40 l of 1% NH4NO3 added to 20 l of
sample.
(PTO)
_____________________________________________________________________________
ELEMENT/SAMPLE/MM
REMARKS
Copper (Cu) (cont)
Water and seawater

3000 ppm Na2O2
Substantially reduces interferences caused

by NaClO4; alkali metal halides; Al and Mg
halides.
Seawater
Excess NaCl

reducing agent e.g. ascorbic acid

May require background correction for nonspecific absorption and scattering which can
be significant at analytical wavelength.
Gallium (Ga)
Ni
500 ppm Pd or 5 l 100 ppm Pd or
1000 ppm Ni(NO3)2
Ni checks GaO production and avoids

inorganic matter interference.
Permits higher ashing temperature, enhances

signal and increases sensitivity.
Germanium (Ge)
500 ppm Pd or 5 l of 100 ppm Pd
Permits a higher ashing temperature,

enhances signal and improves sensitivity.
Gold (Au)
0.25% Ni(NO3)2

reducing agent such as Acorbic acid

Indium (In)
Pd
La(NO3)3
$
1% (w/v) ammonium fluoride, NH4F
Pd checks production of InO sublimation.

Alloying.
$
Higher ashing temperature can be used.
A higher ashing temperature can be used and

improves sensitivity.
Iron (Fe)
Seawater

As Fe is a universal contaminant, great care

should be taken particularly at low levels.
_____________________________________________________________________________
ELEMENT/SAMPLE/MM
REMARKS
Lead (Pb)
Mg(NO3)2
La(NO3)3 ; Pd, Pt (g level)
*City H2O
10 ppm Pd from Pd(NO3)2 or
10 ppm NH4Cl;
*Environmental H2O; Wastewater
#
Vegetables, fruits, grains, beans,
potatoes, meat, fish, fats, oil, dairy
products, spirits, alcoholic beverages,
processed foods
*10 ppm Pd from Pd(NO3)2;
sample: modifier = 1:1
@
Medicines
10 ppm Pd from Pd(NO3)2
Excess NaCl
Seawater
10% ascorbic acid
Seawater
Blood
0.1% Triton X-100
Infant formula, skim milk powder;
Streams, Effluents
0.5% (w/v) (NH4)H2PO4
1000 or 5000 ppm H3PO4 or

5000 ppm (NH4)H2PO4
0.5-1% (v/v) EDTA or

0.5-1% (v/v) citrate or
0.5-1% (v/v) oxalate

Phosphoric acid
Coexistence with NaCl, KCl, MgCl, etc

prevents PbCl2 sublimation.
Effective by addition of HNO3, high
sensitivity obtained by alloying.

Suppresses matrix interferences.
Dispersing agent -facilitates dispersing.

stabilises the signal.
Stabilises Pb which atomises at a lower

temperature than does a nitrate or chloride
matrix.
Require background correction.

May be necessary if poor recoveries are
obtained.
_____________________________________________________________________________
ELEMENT/SAMPLE/MM
REMARKS
Manganese (Mn)
La(NO3)3
HNO3
Ashing temperature can be increased from

1100 to 1150oC.
*City H2O; Waste H2O

Seawater
10% ascorbic acid
Seawater
Serum and blood

Dilute Triton X-100

Must use background correction.
Mercury (Hg)
Soil
Organic acid (succinic acid, tartaric acid)
Sulfide + HNO3
HCl + H2O2
K2Cr2O7 + Na2S
Au, Pt, Pd (g level)
Se
$
Ammonium Sulfide
$
For diluent, use:

1) 1000 ppm Te in 1% HCl or
2) 0.1% K2Cr2O7 in 0.5% HNO3
$
Organo-sulfur compounds such
cysteine.
Excess (NH4)2S
reducing agent such as ascorbic acid or
1000 ppm Pd
as
Volatization prevention as HgS.

For prevention of reduction in vaporisation as
HgS.
To prevent volatization by amalgamation.
$
Volatization prevention as HgS which is

stable at 150oC to prevent loss of mercury
vapour during drying cycle.
As complexing agents to increase ashing

temperature to 500oC to minimise chemical
and bulk matrix interference.
Stabilises the signal.

enhances the signal.
Molybdenum (Mo)
*City H2O
10 ppm asorbic acid;
Seawater
10% ascorbic acid

(PTO)
_____________________________________________________________________________
ELEMENT/SAMPLE/MM
Molybdenum (Mo) (cont)
REMARKS
Use pyrolytically coated graphite tube as Mo

is prone to carbide formation.
May require cleaning of furnace after

analysis of more concentrated samples or
standards as memory effects are possible.
Nickel (Ni)
*City H2O
Seawater
1% Mg(NO3)2 or 1% HNO3
Seawater

Reduces background
interferences.
signal,
minimises
Background
correction
is
strongly
recommended as Ni can suffer from severe
non-specific absorption and scattering caused
by matrix components during atomisation.
The use of separate graphite furnace tubes

and contact rings from those used in analysis
of As and Se where nickel nitrate MM is used
is strongly recommended to minimise severe
memory effects.
Phosphorus (P)
La(NO3)3 e.g. $0.1% La from La(NO3)3

or
0.2% from nitrate

$
200 ppm Ni from Ni(NO3)2 or
5 l of 1000 ppm La
Sensitivity improves 6 times.

improves precision.
$
Higher ashing temperature can be used.
Improves precision.
Selenium (Se)
Mg(NO3)2
Al, Cu, Ni, Pd, Pt
Cu, Mo and Ni
*City H2O
10 ppm Pd; sample : modifier = 1:1
$
10 ppm from Ni(NO3)2
Coexistence with Ni is effective (NiSe

produced).
Pd particularly good, PdSe produced.
Ashing temperature can be increased from

1000 -1100oC.
$
Formation of nickel selenide which is stable

up to 900 or 1000oC.
(PTO)
_____________________________________________________________________________
10
ELEMENT/SAMPLE/MM
REMARKS
Selenium (Se) (cont)
Whole blood
Dilute blood 5 times in diluting agent
consisting of:
0.5% Triton X-100
+ 0.125% Dow Corning Antifoam B
+ 0.25% ascorbic acid.
Add 0.05% Pd as MM.
1% Ni(NO3)2 or 10 l of 500 ppm Pd
Nickel nitrate
1% Ni from nickel nitrate

Samples may be subjected to losses of Se

during sample preparation as elemental Se and
many of its compounds are volatile. Process
spiked samples and relevant standard
reference materials to determine if the chosen
dissolution method is appropriate.
Employ with caution the selection of

temperatures and times for drying and ashing
cycles.
To minimise volatilisation losses during

drying and ashing.
Requires
simultaneous
background
correction to avoid erroneously high results
due to severe non-specific absorption and light
scattering caused by matrix components
during atomisation because of its low
analytical wavelength (196.0 nm).
Zeeman background correction is useful

when high Fe levels can give overcorrections
with D2 background.
Clean tube by operating furnace at full power

at regular intervals to remove memory effect
caused by analyte that is not completely
volatilised and removed from furnace during
atomisation.
To lessen interferences caused by chlorides

(> 800 mg/L) and sulfate (> 200 mg/L).
Silicon (Si)
La(NO3)3
$
2 ppm Ba and 100 ppm La, both from
chloride salts

$
Minimise silicon carbide formation and
ashing temperature can be increased to
1000oC.
_____________________________________________________________________________
11
ELEMENT/SAMPLE/MM
REMARKS
Silver (Ag)
1% (NH4)H2PO4
500-2000 ppm Pd +

Employ simultaneous background correction

atomisation.
Should clean tube by operating furnace at

higher atomisation temperature to remove
memory effect caused by analyte that is not
completely volatilised and removed from
furnace during atomisation.
Store Ag standards in brown bottles as they

are light sensitive and have the tendency to
plate out on container walls.
Avoid HCl as silver chloride is insoluble

unless the Ag is already in solution as a
chloride complex.
Tellurium (Te)
$
0.1% or 1% Ni(NO3)2
5 l 1000 ppm Pd
To maximize ashing temperature.


Terbium (Tb)
$
0.02 mg Ni from Ni(NO3)2
Thallium (Tl)
Pd + HClO4
La(NO3)3
1% H2SO4
500-2000 ppm Pd +
Coexistence with ascorbic acid is effective, Pd

checks TlCl production.
Alloying.
Stabilises the signal.

HCl or excessive chloride will cause
volatilisation of Tl at low temperature. Verify
that losses are not occurring by spiking
samples or using standard additions method.
A suitable MM.
Pd
_____________________________________________________________________________
12
ELEMENT/SAMPLE/MM
REMARKS
Tin (Sn)
Mg(NO3)2, (NH4)2HPO4
La(NO3)3
K2MO4
NH4NO3, (NH4)2C2O4
Spirits, alcoholic beverage, processed
foods
10 ppm Pd using Pd(NO3)2
$
0.2% (w/v) K2Cr2O7 + 1% HCl or
3% HNO3 + 10% (1 : 1) NH4OH
0.1% diammonium hydrogen citrate

#
500-2000 ppm Pd solution + reducing

agent such as ascorbic acid
Use with ascorbic acid to prevent interference.

Effective by alloying.
Sensitivity improves remarkably but chloride
interference exists.
No chloride interference.
Complexes with Sn and enhances

sensitivity.
Stabilises the Sn in solution and facilitates

production of a single peak.


Vanadium (V)
Seawater
10% ascorbic acid

Clean furnace before and after analysis as Va
is refractory and prone to form carbides.
Do not use N2 as purge gas.
Yttrium (Y)
$
0.02 mg Ni from Ni(NO3)2
Zinc (Zn)
Succinic acid, oxalic acid
MaCl2 produces ZnCl2 and sublimation.

Organic acid checks it.
Should use background correction.
As Zn is a universal contaminant, great care

should be taken.
Notes:
The information is mainly taken from Shimadzu AAS Cookbook Section 2. The rest are taken
from the following:
Shimadzu AAS Cookbook Section 4 (Measuring Conditions of Elements of

Furnace Analysis Method)
Shimadzu AAS Cookbook Section 5 (Water Analysis and Air Analysis)
_____________________________________________________________________________
13
Notes (cont):
#
=
=
=
=
=
=
(PTO)
Shimadzu AAS Cookbook Section 6 (Foodstuffs Analysis, Fertilizer and Feed

Analysis)
Shimadzu AAS Cookbook Section 8 (Non-ferrous Metals Analysis)
Shimadzu AAS Cookbook Section 10 (Medicines and Biological Substances)
CRC Handbook Of Furnace AAS
Analytical Methods for Zeeman Graphite Tube Analysers
USEPA SW-846
Continue on following page
For seawater, NH4NO3 is added to aid in the low temperature removal of NaCl by the formation
of NH4Cl and NaNO3.
_____________________________________________________________________________

04 Matrix Modifiers For Graphite Furnace Analysis

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04 Matrix Modifiers For Graphite Furnace Analysis

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SAP/CSC/CAM/AAS-007a

MATRIX MODIFIER (MM) FOR

Serum and blood

Effective with alloying.

50-1000 ppm Ni(NO3)2

Permits a higher ashing temperature,

100 ppm Pd(NO3)2 with 2.5% ascorbic

500-2000 ppm Pd solution +

Permits a higher ashing temperature and

Use secondary wavelength or Zeeman

Coexistence with Ni is effective.

Increase ashing temperature.

Shimadzu (Asia Pacific) Pte Ltd, Singapore

Arsenic (As) (cont)

Formation of nickel arsenide which is stable

Permits higher ashing temperature and

Samples may be subjected to losses of As

Employ with caution the selection

To minimise volatilisation losses during

Employ simultaneous background correction

Use Zeeman background correction or any

Clean tube by operating the furnace at full

Shimadzu (Asia Pacific) Pte Ltd, Singapore

Effective with alloying.

Formation of less volatile barium carbide can

Optimise furnace parameters to minimise

Do not use N2 as purge gas because of

Do not use halide acids.

Effective with alloying.

Optimise furnace parameters to minimise

Require simultaneous background correction

1000 ppm Ni or 1000 ppm Pd

100 ppm Ba(OH)2 or 100 or

Permits a higher ashing temperature and

May enhance sensitivity.

Ashing temperature can be increased. (PTO)

Shimadzu (Asia Pacific) Pte Ltd, Singapore

Cadmium (Cd) (cont)

By the addition of phosphate ions, ashing

To aid in low temperature removal of NaCl

Infant formula, skim milk powder;

1000 ppm H3PO4 or

500-2000 ppm Pd solution +

Conversion to less volatile phosphate so that

Permits a higher ashing temperature.

Require simultaneous background correction

Shimadzu (Asia Pacific) Pte Ltd, Singapore

To minimise loss due to excess chloride

Use Cd-free pipette tips.

0.2% (v/v) H2SO4

Serum and blood

500-2000 ppm Pd solution +

500-2000 ppm Pd solution +

Effective with alloying.

Permits a higher ashing temperature.

Low concentrations of Ca and/or phosphate

Do not use N2 as purge gas because of a

May require background correction because

To prevent coexistence of halogenide.

Permits a higher ashing temperature.

Verify that interference caused by excess

Effective with alloying.