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Abstract
There are several methods to produce a white light
emitting diode (LED). The most common commercially
available white LED is made by mixing the blue light from a
GaN chip and the yellow light from the emission of a
Yttrium Aluminum Garnet:Cerium (YAG:Ce) yellow
phosphor coating. The quality of white LED using this
approach heavily depends on the optimization of packing
density, thickness and uniformity of the phosphor layer. The
present study is intended to develop a new methodology for
coating a uniform yellow phosphor layer. This newly
developed coating method is based on the concept of screenprinting. A matrix array of LEDs is firstly mounted on a
silicon substrate with the flip chip configuration. A silicon
mold plate is fabricated with etched cavities that match with
the dimensions and pattern of LED array. The silicon mold
plate is then placed over the substrate that carries the LED
array and serves as a printing mask. The yellow phosphor
powder is pushed into the apertures by a squeegee blade and
bonded to the LED with UV curable epoxy. The silicon
mold plate is released after curing. Compared with other
coating approaches, this yellow phosphor printing method is
relatively simple and can make good quality white LEDs.
1. Introduction
In the past, LEDs are mainly used for signals, decoration
and message display. Due to the improvement of brightness
and efficiency in recent years, LEDs have been used in
various lighting applications such as personal flashlight and
backlighting for flat panel display [1-2]. Compared with the
traditional incandescent light bulb and fluorescent light tube,
LEDs have the following advantages: long life, low power
consumption, compact design and high reliability [3-5].
LEDs are also regarded as enviromental friendly prodcuts as
they contain no mercury and no UV light is generated when
blue LEDs are used for white light illumination. In a recent
study, it has been demonstrated that the a single highbrightness LED (HB-LED) may have the capacity to reach
the same efficacy (~100 lm/w) as, or even higher than, the
conventional fluorescent light tube [6].
The most straightforward method to generate white light
is by combining the lights with three fundermental colors,
namely, red, green and blue (RGB). White LEDs may be
produced in this way as well [7-9]. However, this method
requires a more complicated electrical design for the control
of light intensity and uniformity. A white LED may also be
produced by coating downconverting phosphor layers onto
the surface of a LED. The principle is based on the
absorption and re-emission of light [10]. One example is to
coat the red and green phosphor layers on a blue LED chip
[11-12]. With the excitation of blue light, the phosphor
layers can emit red light and green light, respectively. The
un-absorbed blue light, combined with the excited red and
green lights, can result in white light. Similarly, an UV LED
chip coated with red, green and blue phosphor layers can
also generate white light [13]. These methods require a
precise weighting of each kind of phosphor layer in order to
give desired white light. There is another way to generate
white light using yellow phosphor (YAG:Ce) coating for
downconverting. When a blue LED is coated with a yellow
phosphor layer, the phosphor layer will absorb part of the
blue light and re-emits yellow light (see Figure 1). The reemitted yellow light will then combine with the un-absorbed
blue light, as illustrated in Figures 1 and 2, to give an
illumination of white light [14-18].
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In the present study, the printing mask was made of a 4inch double-side silicon wafer. The fabrication process of
the silicon mold plate is illustrated in Figure 5. The silicon
wafer was originally coated with 3 m thick thermal oxide
layers on both sides. After creating a ring mask, the wafer
was thinned from 400 m to a range between 120 m and
200 m, depending on the desired thickness of the printing
mask (related to the thickness of the yellow phosphor layer).
The next step was to pattern the thermal oxide on another
side of the wafer. Subsequently, through silicon apertures in
a matrix array pattern were formed by deep reactive ion
etching (DRIE). In the present study, the size of the blue
LED chip was 1.0 mm x 1.0 mm. The size of apertures on
the silicon mold plate was determined as 1.4 mm x 1.4 mm,
allowing sufficient tolerance between the LED chip and the
side walls of the aperture.
and each aperture. The current design made the pin size 10%
smaller than the silicon mold aperture size. For a steady
stamping process, the stamp was clamped on an Instron
machine as shown in Figure 9 and then lowered down. Once
the push pins were put in contact with the top of the printed
yellow phosphor layers, the silicon mold plate was lifted and
removed manually. After the removal of the mold plate, the
epoxy was fully cured by the UV lamp and then the whole
process was completed.
381
382
N.A.
N.A.
120 m
20 m
130 m
30 m
160 m
60 m
200 m
100 m
(0.264, 0.232)
465 nm
(0.346, 0.366)
568 nm
White
(0.426, 0.493)
572 nm
Greenish-yellow
(0.461, 0.516)
574 nm
Yellow
Bluish-white
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4. Conclusions
The present study was to develop a new yellow phosphor
coating method for generating white light from blue LEDs.
With this printing approach, various thicknesses of uniform
yellow phosphor coating could be deposited on blue LEDs,
resulting in different chromaticity data. The key parameter
of this method is the thickness of the yellow phosphor layer,
which is controlled by the thickness of the silicon mold
plate. The present method does not require the fine-tuning of
the mixing ratio of electrolyte/phosphor powder and the
applied voltage as in the process of EPD. The newly
developed printing technique is considered a more
convenient method for controlling the chromaticity of blue
LEDs coated with downconverting yellow phosphor powder.
Acknowledgments
This study was sponsored by a research grant of
DAG05/06.EG34 offered by the Hong Kong University of
Science and Technology (HKUST). The blue LED chips
used in this study were provided by Advanced Packaging
Technology (APT) Ltd. The measurement of chromaticity
was done at the Photonics Technology Center of HKUST.
The authors would like to acknowledge all these supports.
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