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Abstract
This work presents the first detailed study of the optical dielectric
function of optically thick TiNx films using grating-coupling of
radiation
to
surface
plasmon-polaritons.
Angle-dependent
This
(e.g.
KramersKronig
analysis)
that
may
require
We
Its
However it is well
known that the plasma energy and the optical and electrical
properties of TiNx films are strongly dependent on the deposition
conditions, film thickness and titanium-nitrogen ratio [6-12]. This
2
electromagnetic
metal/dielectric interface.
fields,
propagating
along
By varying the
predicted
from
rather
simplistic
treatment
of
the
It can
grating
theory
model
which
uses
the
differential
2. Experimental
interferographic
techniques
[23].
The
method
of
past
experience,
it
is
thought
that
approximately
Previous workers, for example [11], have shown the real part of the
dielectric function of TiNx to be negative, and therefore able to
support interface modes, at wavelengths in excess of approximately
500 nm. The wave vector of the incident radiation in the dielectric
.
is nd k0 (where k0 = c = 2 0 and nd = 10003
is the refractive
index of air) and we may only couple to the SPP when the in-plane
component of this has been suitably enhanced. This mechanism is
provided by the gratings periodicity, which may increase or
decrease the in-plane component of nd k0 by integer multiples of
(1).
Here N is an integer, kSPP is the wave vector of the SPP and
of
incidence
(figure
1).
Monochromatic,
p-polarised
(2).
By fitting the reflectivity data to the modelling theory, it is possible
to parameterise the grating profile and characterise the dielectric
function of the metallic material.
more
sensitivity
to the
grating profile.
= 0 ,
incident light of
3. Results
theoretical fits, which are in very good agreement with the data
(circles). The optical properties of TiNx are often likened to those
of gold, but the off-resonance reflectivity of less than 50% is clearly
less than the ~90% to be expected from gold [26]. In addition, the
resonances themselves are broad and shallow. This indicates that
10
r .
The
TiN
= r + ii ) .
There is also a
11
works of Karlsson et al. [4] and Rivory et al. [6] both consider
opaque samples (d >100 nm) of similar stoichiometries ( x =1) ,
and use identical characterisation techniques in order to obtain the
optical constants.
and Valkonen et al. [12] have both sputtered much thinner films (
d <31 nm) and although their values of
r are comparable to
results give values for both parts of the complex dielectric function
which are smaller in magnitude than other studies. SteinmllerNethl et al. [20] used a grating-coupled SPP technique to
characterise the optical properties of their magnetron-sputtered
film at four wavelengths.
12
increase in
The
13
r ( ) = 0
p2 2
1+ 2 2
(3)
i ( ) =
p2
( 1+ 2 2 )
(4)
where is the relaxation time, p is the plasma frequency and
0 is
This can be
14
eV [4].
to
resonant
absorptions
based
on
Lorentz
r ( ) = rD ( ) + rI ( )
(5)
and
i ( ) = iD ( ) + iI ( )
(6).
We fit our data to a model that assumes only one resonant
interband transition.
15
r ( ) = 0
p2 2
1+ 2 2
2 p2 ( 02 2 )
2 ( 02 2 ) + 2
2
(7)
and
i ( ) =
p2
( 1+ 2 2 )
p2
2 ( 02 2 ) + 2
2
(8).
By rearranging equations 7 and 8 and putting 0 = 1, we eliminate
p such that
2
2 2
+ 1)
(
r ( ) 1
0
=
i ( )
2 ( 2 2 + 1) + 2 ( 02 2 ) 2 + 2
(9).
. eV and
From this it is possible to obtain the constants 0 = 39
=11
. eV
16
5. Conclusions
In this paper, for the first time, we have determined the dielectric
function of TiNx throughout the visible regime using a gratingcoupled SPP resonance technique.
A comparison of constants
Acknowlegements
References
[1] MUNZ, W. D., HOFMANN, D. and HARTIG, K., 1986, Thin Sold Films,
96, 79.
[2] KANAMORI, S., 1986, Thin Solid Films, 136, 195.
18
[3] GAGNON, G., CURRIE, J. F., BREBNER, J. L., and DARWELL, T., 1996, J.
Appl. Phys., 79, 7612.
[4] KARLSSON, B., SUNDGREN, J.-E, and JOHANSSON, B.-O, 1982, Thin Solid
Films., 87, 181.
[5] SCHLEGEL, A., WACHTER, P., NICKL, J. J., and LINGG, H., 1977, J. Phys.
C, 10, 4889.
[6] RIVORY, J., BEHAGHEL, J. M., BERTHIER, S., and LAFAIT, J., 1981, Thin
Solid Films, 78, 161.
[7]
SZCZYRBOWSKI, VON J., RGELS, S., KASTNER, A., DIETRICH, A., and
PASCUAL, E., POLO, M. C., ESTEVE, J., and BERTRAN, E., 1991,
(New York:
19
20
Table 1.
Table 2.
p and
of TiNx
21
Figure Captions
22
i against 03 for
suggests that the TiNx sample is free-electron like. However the yintercept of (a) is greater than 0 = 1, attributable to a positive
contribution to r from the occurrence of interband transitions.
The errors illustrated in the values of the dielectric constants are
dominated by an uncertainty in the grating profile.
Figure 5.
Figure 6.
associated
in
the
dielectric
function
of
TiNx
We have modelled
the
23
0
(nm
)
500
-0.20
2.41
525
-0.64
550
-1.07
575
-1.43
600
-1.91
625
-2.35
632.
8
650
-2.61
675
-3.02
0.05
0.10
0.10
0.10
0.10
0.05
0.05
0.25
0.15
0.15
0.25
0.10
0.10
0.10
0.30
0.30
0.30
0.10
-2.88
3.12
3.37
3.79
4.17
4.30
4.36
4.75
5.18
0
(nm
)
700
-3.58
5.36
725
-4.23
750
-4.84
775
-5.19
800
-5.89
825
-6.03
850
-6.67
875
-7.51
0.10
0.10
0.10
0.05
0.05
0.10
0.10
0.20
0.10
0.20
0.20
0.20
0.20
0.25
0.25
0.30
24
5.74
6.07
6.24
6.64
6.96
7.60
8.15
Sample
(eV)
(eV)
6.29
0.30
6.97.0
0.60.8
8.7
1.3
0.94
8.9
1.22
5.626.25
0.931.27
1.16
7.5
1.1
7.07.1
0.40.6
>1
5.8
1.1
[reference]
(preparation
method)
Karlsson
[4] (CVD)
Schlegel
[5] (CVD)
Rivory
[6]
(reactive
sputtering)
Bhm
[8]
(solid
solution)
Kurtz
[9]
(CVD)
Szczyrbowski
[10]
(reactive
sputtering)
Valkonen
[12]
(reactive
sputtering)
Present Data
(reactive
sputtering)
25
26
0.40
0.35
Rpp 0.30
0.25
(a)
10
15
20
25
30
27
-5
-10
-15
1.4
(a)
1.6
1.8
2.0
2.2
Energy/eV
2.4
(b)
15
i 10
5
0
1.4
1.6
1.8
2.0
2.2
Energy/eV
28
2.4
r=3.15-1.40 x 10 13.02
-2
-4
-6
-8
0.2
(a)
0.3
0.4
0.5
0.6
0.7
0.8
02/m2
8
6
i 4
2
0
0.1
(b)
0.2
0.3
0.4
0.5
03/m3
29
0.6
0.7
0.0
-0.2
(r-1)/i
-0.4
-0.6
15
1/ =1.7 x 10 Hz
15
0 =5.9 x 10 Hz
-0.8
-1.0
-1.2
-1.4
/1015 Hz
30
-2
-4
-6
-8
(a)
2.2
2.6
3.0
3.4
/10 Hz
15
3.8
6
4
2
0
2.2
(b)
2.6
3.0
3.4
/10 Hz
31
15
3.8