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Electrochimica Acta
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Article history:
Received 8 October 2013
Received in revised form 10 January 2014
Accepted 14 January 2014
Available online 28 January 2014
Keywords:
Photo-electrochemical reactor
spray pyrolysis
titanium
iron oxide
hydrogen
The behaviour of titanium substrates was investigated as replacements for transparent uorine-doped
tin oxide-coated glass substrates, the low conductivity of which causes inhomogeneous spatial distributions of potential and current densities on scaling up photo-electrodes in photo-electrochemical reactors.
Hence, Fe2 O3 (ca. 23 nm thick) was deposited by spray pyrolysis onto the titanium surface at 450 C in
air, causing growth of (less photo-active) rutile by thermal oxidation, the thickness being measured as ca.
20 nm by secondary ion mass spectrometry. Anodising titanium in aqueous phosphoric acid enabled ca.
12 nm anatase TiO2 to be grown prior to spray pyrolysis, limiting the subsequent thermal growth of rutile,
so the overall TiO2 thickness was ca. 16 nm. 23 nm thick Fe2 O3 deposited on a 22 nm TiO2 | Ti substrate
after heat treatment at 500 C for 1 hour was found to produced greater current densities than Fe2 O3
deposited onto TEC-8 uorine-doped tin oxide coated on glass; uv absorption by TiO2 and reection by
the titanium substrate contributed to measured photo-current densities.
2014 Elsevier Ltd. All rights reserved.
1. Introduction
Photo-electrochemical production of hydrogen [1] from water
using solar energy and its subsequent use in fuel cells, could obviate
the predicted consequences of CO2 emissions from fossil-fuelled
power stations. The feasibility of such solar-powered processes is
well established; suitable semiconducting lms in contact with
water absorb photons with energies greater than their band gap
energy, produce electron-hole pairs (excitons) by:
semiconductor + h
absorption
semiconductor(hv+b + ecb
)
(1)
recombination
(2)
2H + + 2ecb
H2
(3)
Corresponding author.
E-mail addresses: g.kelsall@imperial.ac.uk, ock86@yahoo.com (G.H. Kelsall).
0013-4686/$ see front matter 2014 Elsevier Ltd. All rights reserved.
http://dx.doi.org/10.1016/j.electacta.2014.01.086
267
Nomenclature
Symbol
Ai
C
eE
H
I
I0
I
ji
kB
K
L
N
ND
Ri
ti
T
U
Wa
X
0
sc
Subscript
A
Anode
Cb
Conduction band
Electrolyte
E
FTO
Fluorine-doped tin oxide substrate
Vb
Valence band
(4)
If the ratio of I1 and I2 is unity, the potential and current distribution would be uniform. The Wagner number [7] can be dened
by the ratio of area specic resistances Ra due to the faradaic reaction at the anode and that of the electrolyte Re , for the case when
the anode has metallic conductivity:
Ra
Wa =
=
Re
Aa da
dI
h/e
(5)
Wa =
(6)
Re =
h
e
(7)
L
L 2
L h1 =
FTO tFTO
FTO tFTO h1
RFTO =
(8)
L 2
h
L 2 e + h FTO tFTO
+
=
FTO tFTO
e
e FTO tFTO
(9)
A d
a
a
dI
e FTO tFTO
L 2 e + h FTO tFTO
(10)
L 2 e
1+
h FTO tFTO
(11)
268
Fig. 2. Equivalent analogue circuit of photo-electrochemical reactor describing potential distribution due to the sheet resistance of FTO.
a) The distance between the mid-point of the electrode to the current collector, L is smaller;
b) The conductivity of the substrate is greater;
c) The thickness of the FTO substrate is increased/its resistance is
decreased;
d) The electrolyte conductivity is smaller;
e) The distance between the anode and cathode is larger.
Option (c) does not apply to transparent conductive oxides glass,
as thicker material would make the substrate opaque and defeats
the purpose of having the photoactive material on a transparent
substrate.
Options (d) and (e) are not desirable, as lower electrolyte conductivity and increasing the distance between the anode and
cathode will increase the ohmic potential drop between the two
electrodes, and hence increase the required cell potential difference
for oxygen and hydrogen evolution reaction at constant current
density, or decrease current densities at constant potential difference.
The ratio of the Wagner numbers is an important scale-up
parameter to maintain active area of the photo-electrode. One possible means to obviate the problem of potential distribution due to
the FTO substrates sheet resistance is to replace it with a metallic
substrate, such as titanium and stainless steel. The choice of metallic substrate would be determined by the stability of such metals
in alkaline solution and under oxygen evolution conditions.
In the derivation of these Wagner numbers, light absorption by
a photo-electrode was not considered. It was assumed that the
optical window would be larger than the semiconductor used as
photo-electrode, and the photon ux to the semiconductor would
be uniform and impeded by any obstruction between the light
source and semiconductor. Shadows cast on a photo-electrode
surface would generate spatially inhomogeneous photocurrents
and photovoltages, the effects of which were ignored in this
analysis.
water, then immersed in 0.5 M oxalic acid for 15 minutes to minimise the thickness of the surface oxide layer by its dissolution as
(predominantly) TiO(C2 O4 ) and [TiO(C2 O4 )2 ]2 species. The TiO2 /Ti
substrates were then clamped to the hot plate for Fe2 O3 deposition
by spray pyrolysis [8]. In order to study the effect of the interfacial
TiO2 thickness, TiO2 was grown electrochemically on an oxalic acid
treated titanium plate in H3 PO4 , prior to Fe2 O3 being deposited and
its photo-electrochemical behaviour determined [9].
3.2. Preparation of Fluorine-doped Tin Oxide on Glass Substrates
The behaviour of Fe2 O3 spray-pyrolysed onto TEC-8 uorinedoped tin oxide (FTO) on glass [Hartford Glass Inc., USA] was
compared with that on titanium substrates. The FTO was rst
cleaned with acetone and then with high purity water in the ultrasonic bath for 15 minutes.
3. Experimental
3.1. Preparation of Titanium substrate
A 0.89 mm thick titanium foil (Alfa Aesar) was polished rst
with p600 and p1200 silicon carbide paper, then with 0.3 m
Al2 O3 and 50 nm Al2 O3 , until a mirror-like nish was achieved.
The titanium foil was then cleaned with acetone and high purity
269
Fig. 5. Picture of Fe2 O3 deposited on titanium substrate, before and after heat
treatment.
270
Fig. 8. Cyclic photo-voltammograms (10 mV s1 ) for 1 mol NaOH dm3 | Fe2 O3 | TiO2
| Ti electrode, under 40 W m2 white (Xe) light illumination.
Fig. 9. Mott-Schottky plots for 1 mol NaOH dm3 | Fe2 O3 | TiO2 | Ti electrode at
10 kHz.
Fig. 10. Mott-Schottky plots (at 10 kHz) for 1 mol NaOH dm3 | Fe2 O3 | TiO2 | Ti
electrodes with 7 nm and 15 nm thick TiO2 interfacial layers.
Fig. 11. Cyclic photo-voltammograms (10 mV s1 ) for 1 mol NaOH dm3 | Fe2 O3 |
TiO2 | Ti electrode, under 40 W m2 white (Xe) light illumination.
271
Table 1
Summary of measured thicknesses of interfacial TiO2 of non-heat treated and heat
treated Fe2 O3 | TiO2 | Ti electrodes.
Pre-grown TiO2 lm
thickness/nm
0
6
12
E EFB
kB T
e
(11)
Heat treated
8
7
15
20
22
16
Fig. 13. Band structure of n-n semiconductor junction when A) applied electrode potential U is positive to Fermi energy levels/e of Fe2 O3 and TiO2 ; B) applied electrode
potential is positive to the Fermi energy level/e of TiO2 but negative to that of Fe2 O3 .
272
Fig. 14. Cyclic voltammogram (10 mV s1 ) of Fe2 O3 | TiO2 | Ti and Fe2 O3 | FTO
electrodes under 42 W m2 white (Xe) light irradiation, in 1 M NaOH solution.
with Fe2 O3 , because the energy of the TiO2 conduction band edge
lies at a greater energy level than the conduction band edge of Fe2 O3
[22], creating a Schottky barrier as shown schematically in Fig. 13.
Fig. 13 shows 2 different possible band structures at the n-n
semiconductor junction. In both cases, photo-generated electrons
would need to overcome the resulting Schottky barrier. However,
depending on the applied electrode potential, which determines
the net Fermi energy level, the majority of the electrons could
accumulate in the bulk of Fe2 O3 (Fig. 13A), or at the n-n junction
(Fig. 13B) and recombine with photo-generated holes. The ideal
structure would be fabricated by depositing ca. 63 nm of Fe2 O3 onto
a Ti substrate with minimum thickness (< 1 nm to allow electron
tunnelling [23]) of TiO2 at the interface. Spray pyrolysis may not
be the best choice of Fe2 O3 deposition technique, as the growth of
TiO2 is dependent on the temperature and time [21] for which the
titanium substrate remains on the hot plate.
4.1.3. Comparison of Fe2 O3 on FTO and Titanium Substrates
Fig. 14 shows a comparison of the photo-electrochemical performances of Fe2 O3 | TiO2 | Ti and Fe2 O3 | FTO, with the former
photo-anode producing higher normalised photocurrents (since
photocurrents were linearly proportional to the light intensity [24])
at electrode potentials greater than 0.3 V (vs. HgO|Hg). At 0.5 V (vs.
HgO|Hg), the normalised photocurrent density of Fe2 O3 | TiO2 | Ti
was ca. 3 102 A W1 , which was 3 times greater than the normalised photocurrent density of Fe2 O3 | FTO material with almost
the same thickness (ca. 23 nm) of Fe2 O3 . An exponential increase
in current density for Fe2 O3 | FTO above 0.65 V (vs. HgO|Hg) was
detected, due to the increase in dark current.
The SEM image in Fig. 15A shows that the Fe2 O3 on FTO had an
open structure, and by contrast, the Fe2 O3 | TiO2 | Ti (Fig. 15B) was
a rather dense material. The morphological differences probably
resulted from the differences in thermal conductivities, and hence
in local temperature gradients during spray pyrolysis, between the
FTO and Ti substrates.
Anatase TiO2 is an intrinsic n-type semiconductor (band gap
3.2 eV [20]), which absorbs light at wavelengths < 390 nm, so would
also have contributed to the measured photocurrent. Since the
Fe2 O3 was only ca. 23 nm thick (Fig. 7), most of the incident photons would have passed through it, been absorbed by the TiO2 and
reected by the mirror-like titanium substrate for further absorption by Fe2 O3 .
Fig. 16 shows that with a UV lter and using the Beer-Lambert
law to correct current densities for absorption due to reection,
current densities of Fe2 O3 | 22 nm TiO2 | Ti matched those of Fe2 O3
| (TEC-8) FTO after absorption in the second pass of light (Fig. A.1.),
assuming the absorption coefcient of Fe2 O3 to be 1.6 107 m1
[19]. Calculations of multiple pass light absorption can be found in
supplementary data.
Predictions of the extent of potential distributions developed in section 2 can be applied to photo-anodes on FTO
and titanium substrates for the following parameter values:
e = 23 S m1 [25], FTO = 4.5 105 S m1 [6], Ti = 2.5 106 S m1
[25], tFTO = 3 107 m [6], tTi = 8.9 104 m, h = 2 102 m. For
electrodes with L = 103 m, the ratio of Wagner numbers Wa/Wa
for FTO and titanium substrates are predicted by equation (11) as
1.01 and 1.00, respectively, whereas for L = 5 102 m, those ratios
become 22.3 and 1.00, respectively. Hence, the use of FTO substrates
Fig. 15. SEM image of 23 nm of Fe2 O3 deposited onto A) TEC-8 FTO substrate; B) 22 nm TiO2 | Ti substrate.
273
Fig. 18. Voltammograms (10 mV s1 ) of heat treated Fe2 O3 deposited on 0.1 0.1
m2 FTO substrate, operating in dark (solid line) and under solar simulator (- - - -).
274
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