Beruflich Dokumente
Kultur Dokumente
Synthetic Metals
journal homepage: www.elsevier.com/locate/synmet
Graduate School of Optoelectronics Engineering, National Yunlin University of Science and Technology, Yunlin 64002, Taiwan
Graduate School of Engineering Science and Technology, National Yunlin University of Science and Technology, Yunlin 64002, Taiwan
Department of Electronic Engineering, National Yunlin University of Science and Technology, Yunlin 64002, Taiwan
A R T I C L E I N F O
Article history:
Received 1 March 2016
Received in revised form 21 May 2016
Accepted 27 May 2016
Available online 17 June 2016
Keywords:
Chemical vapor deposition (CVD)
Nickel foam (NiF)
Graphene
Carbon nanotubes (CNTs)
Composite lm
A B S T R A C T
The research is to deposit carbon on porous 3-D nickel foam (NiF) as a gas diffusion electrode (GDE) by
chemical vapor deposition (CVD). Effects of three different preparations of the nickel (Ni) catalyst and
two pre-treatments of oxidation and reduction for carbon deposition were investigated. In the rst
method, the carbon was deposited on NiF with and without sputtering a Ni seed layer before the CVD. In
the second method, the NiF was oxidized, then reduced by hydrogen into Ni particle as a catalyst and the
carbon also was deposited by CVD. In the third method, a thin lm of SiO2 was deposited on the NiF as a
separation layer, then the Ni catalyst was deposited and nally, carbon was also deposited by CVD. The
results exhibited large grain sizes of Ni catalyst cannot grow carbon nanotube (CNTs) during CVD. Pretreatment of oxidation and the reduction reduce the grain size of the Ni catalyst, and an oxidation
temperature equal or higher than the reduction temperature always makes it easy to grow CNTs. A
smooth SiO2 thin lm was used as a separation layer to deposit the Ni catalyst to grow the SWCNTs and a
low area ratio of ID/IG for a non-crystallized sp3 graphite microstructure always creates a graphene
microstructure. A suitable hydrogen gas could help the amount of growth of CNTs. Anyway, the specied
Ni catalysis could promise strategy the selective synthesis of CNTs/graphite or CNTs/multi-graphene
composites on NiF.
2016 Elsevier B.V. All rights reserved.
1. Introduction
Carbon could be synthesized to a lot of structures such as
graphene, graphene oxide, graphite, oxided graphite and carbon
nanotubes (CNTs). In which graphene and CNTs have good
electricity and CNTs could become mature the 3-D structure.
Since graphene and CNTs combine a nanoscale size with unique
electrical, optical, mechanical, and electrochemical properties,
making them ideal candidate materials for high-impact applications in various elds, such as optoelectronics, energy, biomedicine, aerospace and so on [13]. With the raising of environmental
consciousness on the greenhouse effect and carbon dioxide
pollution in recent years, green-energy also catches the attention
as a project for our lives. Among these issues, hydrogen energy is
also a spotless energy; especially when applied as a fuel battery [4
Table 1
The deposition conditions for the rst method.
Pre-treatment
(reduction)
Gas ow
(sccm)
N2
H2
0
80
0
20
Synthesis
Temp
( C)
Time (min)
0
800
0
5
Gas ow
(sccm)
N2
H2
C2H2
65
75
10
25
Temp
( C)
Time (min)
450
700
30
hydrogen (H2) was reduced from the carbon lm during the CVD.
The deposition temperatures in the furnace were 450 C and 700 C
for without and with reduction of H2, respectively.
2.1.2. The second method
Nickel foam substrate underwent pre-treatment of oxidization
with oxygen and then reduction by hydrogen, and then carbon was
deposited on the NiF by CVD. The clean NiF was oxidized and
reduced by H2 and carbon was deposited by CVD in the horizontal
furnace. The process involved oxidization, reduction and deposition of carbon by CVD; all were completed in the horizontal
furnace. The total experimental processes are shown in Fig. 2, and
relative fabrication parameters are listed in Table 2. The oxidation
temperature varied from 600 C, 650 C to 700 C, and the
reduction temperatures changed from 600 C, 650 C to 700 C.
The optimum oxidation and reduction temperatures were all the
same at 700 C. However, the synthesis temperatures of CVD varied
from 450 C, 500 C, 550 C, to 650 C and the synthesis times
changed from 5, 30, to 60 min at the same oxidation and reduction
temperatures of 700 C.
(1)
(2)
125
Fe;Co;Ni
6C 3H2
126
Table 2
The deposition conditions for the second method.
Pre-treatment
(oxidation)
Gas ow
(sccm)
Pre-treatment
(reduction)
Gas ow
(sccm)
Temp
( C)
Time (min)
N2
H2
60
80
60
Synthesis
Gas ow
(sccm)
Temp
( C)
Time (min)
N2
H2
C2H2
20
700
60
65
10
80
20
60
65
60
60
N2
O2
60
30
60
30
600
700
750
700
60
30
700
60
80
20
600
700
750
700
60
30
700
60
80
20
700
Temp
( C)
Time (min)
25
450
30
10
25
450
30
65
10
25
30
65
10
25
450
500
550
650
450
5
30
60
the excitation source. The Raman spectra could see the G and D
bands of carbon and the area ratio of ID/IG by Lorentzian tting
curvature.
3. Results and discussion
3.1. SEM images
The surface morphology of all lms was investigated by eld
emission SEM for carbon deposition with three different
Synthesis
Temp
( C)
Time (min)
Gas ow
(sccm)
Temp
( C)
Time (min)
30
N2
H2
N2
H2
C2H2
80
20
700
75
25
80
20
700
75
25
700
800
700
80
20
700
75
0
5
40
25
700
5
15
30
5
deposition methods. The grain size, diameter size, and microstructures were all studied with different deposition conditions.
3.1.1. The rst method
The SEM images of Figs. 4(a)-(d) were of the clean NiF, 5 nm Ni
sputtering on NiF, and carbon deposited on NiF without and with a
5 nm Ni sputtering catalyst by CVD, respectively. In Figs. 4(a) and
(b) the grain size of the clean NiF was about 15 mm in the righttop drawing with the yardstick of 2 mm, so the grain size was too
big to synthesize the growth of CNTs but only grew graphite sheet.
Although 5 nm Ni catalyst on NiF could change grain structure to
515 nm Ni sheet it was also not easy to grow CNTs; only grew
multi-graphene and sometimes a very small amount of CNT
appeared, as shown in Figs. 4(c) and (d). People know the grain size
of 5 nm Ni sputtering seed also depends on both grain size and 3-D
structure of the NiF substrate, so the structure was too complex to
synthesize the CNTs. However, the 5 nm Ni sputtering seed allowed
smooth multi-graphene deposition on the clear NiF rather than no
sputtering seed, as shown in Figs. 4(b) and (d).
127
Fig. 4. The SEM images of surface morphology of (a) clean NiF, (b) carbon deposited on NiF, (c) NiF with 5 nm Ni sputtering catalyst, and (d) carbon deposited on Ni/NiF.
128
Fig. 5. The SEM images of carbon lm with different oxidation temperatures from (a) 600 C, (b) 700 C to (c) 750 C and reduction temperatures from (d) 600 C, (e) 700 C to
(f) 750 C.
Fig. 6. The SEM images of surface morphology of carbon lm with different synthesis temperatures of (a) 450 C, (b) 500 C, (c) 550 C, and (d) 650 C during CVD.
129
Fig. 7. The SEM images of surface morphology of carbon lm with different synthesis times of (a) 5, (b) 30, and (c) 60 min after CVD.
the diameter of CNTs to become large which is not good for the
growth of CNTs, as seen in Fig. 9(f).
3.2. Measurement of X-ray diffraction (XRD)
Fig. 8. The SEM images of surface morphology of CNTs with different deposition temperatures of (a) 700 C and (b) 800 C after CVD.
130
Fig. 9. The SEM images of CNTs with different synthesis times of (a) 5, (b) 15 and (c) 30 min and hydrogen ows of (d) 0, (e) 5, and (f) 40 sccm.
(4)
1
Fig. 10. XRD spectra of carbon deposition by the second method with different
oxidization temperatures of (a) 600 C, (b) 700 C, and (c) 750 C, and reduction
temperatures of (d) 600 C, (e) 700 C, and (f) 750 C.
C
The G-band usually appears at around 1600 cm for the C
tangential stretching (TM) mode from the sp2 graphite-like
microstructure; the area of the G-band (IG) shows the level of
graphite. The D-band appears at around 1300 cm1 for the defect
Fig. 11. XRD spectra of carbon deposition by the second method with different
synthesis temperatures of (a)450 C, (b)500 C, (c)550 C and (d)650 C during CVD.
131
Fig. 14. XRD spectra of SiO2/Ni/CNT lm with different synthesis times of (a) 5, (b)
15 (c) 30 min and H2 ows of (d) 0, (e) 5 and (f) 40 sccm at a reduction and synthesis
temperature of 800 C and 700 .
Table 4
Nanotube diameter with different frequency for SWCNTs.
WRBM (cm1)
dt (nm)
125.79
1.97
130.01
1.90
162.34
1.52
183.84
1.35
196.74
1.26
Table 5
The ID/IG area ratio for the second method with different conditions.
Condition/Item
Fig. 12. XRD spectra of carbon deposition by the second method with different
synthesis times of (a)5, (b)30 and (c)60 min during CVD.
Oxidation temp. ( C)
Reduction:700 C
Synthesis:450 C
Time:30 min
Reduction temp. ( C)
Oxidation:700 C
Synthesis:450 C
Time:30 min
Synthesis temp. ( C)
Oxidation:700 C
Reduction:700 C
Time:30 min
Sample No.
D-band (cm1)
G-band (cm1)
ID/IG
(a)
(b)
(c)
600
700
750
1331.67
1329.67
1326.55
1579.85
1575.28
1577.12
3.37
2.00
1.99
(a)
(b)
(c)
600
700
750
1328.22
1329.67
1326.17
1576.68
1575.28
1575.51
1.82
2.00
2.22
(a)
(b)
(c)
(d)
450
500
550
650
1329.67
1325.29
1337.71
1337.01
1575.28
1574.16
1566.05
1564.47
2.00
1.91
0.06
0.45
5
30
60
1328.46
1329.67
1325.40
1577.12
1575.28
1571.98
2.14
2.00
1.89
Table 6
The ID/IG area ratio for the third method with different conditions.
Condition/Item
Sample No.
D-band (cm1)
G-band (cm1)
ID/IG
Synthesis temp. ( C)
Reduction:800 C
Time:30 min
Synthesis time (min)
Reduction:800 C
Synthesis:700 C
Fig. 13. XRD spectra of the SiO2/Ni/CNT lm with different synthesis temperatures
of (a) 700 C and (b) 800 C at a reduction temperature of 800 C.
induced band and dispersive from the sp3 microstructure; the area
of the D-band (ID) shows the defect of the graphite. The 2D band is
its second-order harmonic band and is highly dispersive always
appearing at 2700 cm1 [38,39]. Hence, Tables 5 and 6 exhibit the
H2 ow (sccm)
Reduction:800 C
Synthesis:700 C
Time: 5 min
(a)
(b)
700
800
1326.99
1335.45
1571.31
1562.63
1.64
0.09
(a)
(b)
(c)
5
15
30
1332.71
1326.87
1326.99
1573.92
1571.19
1571.31
1.22
1.49
1.64
(a)
(b)
(c)
0
5
40
1332.71
1329.94
1326.47
1573.92
1572.54
1570.62
1.22
1.28
1.76
132
Fig. 15. Raman spectra of the second method with different oxidation temperatures from(a) 600 C, (b) 700 C to (c)750 C and reduction temperatures from (d) 600 C, (e)
700 C to (f)750 C.
values of both band lines of G & D and the area ratio of IG/ID for the
second and third methods.
3.3.1. Raman spectra for the second method
Figs. 15 show the Raman spectra of carbon deposition with
different oxidization and reduction temperatures, respectively. In
Fig. 15(a)(c), the carbon structure was graphite at an oxidization
temperature of 600 C, and the structure changed from high
graphite to low graphite with the increase in oxidation temperature to 750 C by the appearance of 2D peaks, as seen in Fig. 15(c)
[40,41]. Simultaneously, the area ratio of ID/IG decayed from 3.37,
2.00, to 1.99 for the different oxidation temperatures of 600 C,
700 C and 750 C, and they were all graphite or CNTs/graphite
composite structure. In Fig. 15(d),(e), the carbon structure was
changed from low graphite to high graphite by the increase in the
reduction temperature from 600 C, 700 C, to 750 C with the
disappearance of 2D peaks at 750 C, as seen in Fig. 15(d),(e).
Simultaneously, the area ratio of IG/ID increased from 1.82, 2.00
2.22 at reduction temperatures from 600 C, 700 C, to 750 C. The
phenomenon shows the growth condition for CNTs at an oxidation
temperature equal to the reduction temperature of 700 C. These
phenomena also could be observed by SEM images and XRD
spectra. Fig. 16 shows the Raman spectra of carbon deposition with
different synthesis temperatures during CVD. It was found that the
microstructure changed from CNTs/graphite to CNTs/M-graphene
composite
at
synthesis
temperatures
above
550 C.
Fig. 16. Raman spectra of the second method with different synthesis temperatures
of (a) 450 C, (b) 500 C, (c) 550 C and (d) 650 C during CVD.
Fig. 18. Raman spectra of the third method with different synthesis temperatures of
(a) 700 C and (b) 800 C during CVD.
Fig. 17. Raman spectra of the second method with different synthesis times of (a)5,
(b)30, and (c)60 min during CVD.
133
Fig. 19. Raman spectra of the third process with different synthesis times of (a) 5, (b) 15 and (c) 30 min and H2 ows of (d) 0, (e) 5 and (f) 40 sccm during CVD.
134
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