Materials Science and Engineering A 392 (2005) 340347

On the micro-drilling and turning performance of

TiN/AlN nano-multilayer films
S.H. Yaoa, , Y.L. Sub , W.H. Kaoc , T.H. Liuc
a

Department of Accounting and Information System, Chang Jung Christian University, No. 396, Section 1, Chang Jung Road, Kway Jen, Tainan 711, Taiwan
b Department of Mechanical Engineering, National Cheng Kung University, Tainan 701, Taiwan
c Department of Mechanical Engineering, Air Force Institute of Technology, Gang Shan, Kaoshiung 820, Taiwan
Received 15 July 2004; accepted 25 September 2004

Abstract
In this study, the TiN/AlN nano-multilayer films were prepared using a new sputtering set-up, that was designed and manufactured on the
basis of a newly developed technologythe high-rate reactive sputtering deposition process. This set-up featured an unbalanced magnetron
sputtering system and a balanced magnetron sputtering system. The former was employed to deposit the AlN film, and the latter the TiN film.
The aim of this study was to obtain, through controlled deposition conditions, a group of TiN/AlN nano-multilayer films with various periods
(TiN/AlN twin-layer thickness) first, and then to investigate the influence of periods on their fundamental properties and wear behavior.
Finally, two sets of field tests, micro-drilling and turning, were conducted in order to understand the feasibility of applying the multilayers on
actual machining.
The results revealed that through controlling of the deposition parameters, the TiN/AlN nano-multilayer films with periods ranging from
2.4 to 67.6 nm were obtained. At periods
3.6 nm, the multilayers had extremely high hardness, excellent adhesion and wear performance.
The field tests confirmed the nano-multilayers could provide a significant improvement in actual machining performance, as compared with
the traditional single-layer TiN film.
2004 Elsevier B.V. All rights reserved.
Keywords: TiN/AlN nano-multilayer films; Wear; Turning; Micro-drilling

1. Introduction
Today, studies and developments on nano-scale materials
are attracting attention in every field, for some materials with
nano-scale size showing anomalous properties that are very
different from the bulk state. In the meantime, progress in
the development and utilization of physical vapor deposition
(PVD) facility has made it very easy to tailor precise composition and structure of films according to service requirements
[1]. The studies on the multilayer films with variations in
nano-scale composition have found outstanding mechanical
performances, e.g. high hardness and good wear resistance
[26].
Corresponding author. Tel.: +886 6 2785123x2201;
fax: +886 6 2785683.
E-mail address: shyao@mail.cju.edu.tw (S.H. Yao).

0921-5093/$ see front matter 2004 Elsevier B.V. All rights reserved.
doi:10.1016/j.msea.2004.09.050

Jensen et al. [7] summarize that a multilayer film overcomes deficiencies of each single-layer film. The advantages
associated with a multilayer film are briefly: (1) it can have a
higher strength and toughness than that of each single-layer
film [8,9]; (2) with limited thickness, it can have mechanical strength equal to or exceeding each single-layer film, and
thus a lower deposition duration is required; (3) with desired
combinations of different kinds and compositions of singlelayer films, it can be tailored depending on application needs;
(4) an increase in the adhesion can be obtained between the
multilayer film and the substrate; (5) the residual stresses can
be reduced inside the multilayer film, and (6) a denser film
structure can be obtained [10].
Titanium nitride (TiN) with the NaCl-type crystal structure, exhibits high hardness, high chemical stability, and excellent adhesion to substrates, that make TiN the most popular
film used on cutting tools and forming molds [1113]. Alu-

S.H. Yao et al. / Materials Science and Engineering A 392 (2005) 340347

minum nitride (AlN) is one of the high temperature materials,

with Al and N atoms held by strong covalent bonds. It has
properties similar to the other III-V compounds, boron nitride
(BN) and silicon carbide (SiC), with high melting and dissolving points. It is thought that Al plays a key role to make
AlN a very good anti-oxidation material [1418]. When AlN
encounters high temperatures, the Al atoms diffuse outwards,
and form instantly an aluminum oxide (Al2 O3 ) film on the
surfaces. This oxide film possesses very high-energy barrier
to prevent further oxidation reaction.
Based on the above ideas, a TiN/AlN multilayer film is
expected to have excellent combined mechanical and oxidation resistance properties. In this study, a new set-up with
two different sputtering systems was employed to prepare
the TiN/AlN nano-multilayer films. By controlling the deposition conditionsthe nitrogen gas flow rate and the specimen holder rotation speeda group of nano-multilayer films
with different periods (TiN/AlN twin-layer thickness) was
obtained. Then, a series of experiments, including laboratoryand field-tests, were conducted to investigate the period effects on their fundamental properties, wear behavior, microdrilling and turning performance. For comparison, singlelayer TiN coated and uncoated specimens were also tested
under identical conditions.
2. Experiment
2.1. Deposition set-up
The deposition set-up was designed on the basis of a newly
developed technologythe high-rate reactive sputtering deposition process, manufactured by GENCOA Ltd. England,
type TWINLAB MIRDC. This machine featured an unbal-

341

anced magnetron sputtering system and a balanced magnetron sputtering system, as shown in Fig. 1. In the front view,
at the center is the specimen holder, on the left the unbalanced
magnetron sputtering system, and on the right the balanced
magnetron sputtering system. Each system had two targets.
The specimen holder was kept rotating during deposition to
maintain the uniformity of film thickness. The unbalanced
magnetron sputtering system was connected to an oscillator
operated at a medium frequency (mf), that was half of radio frequency (rf). The manufacturer named this an mf twin
unbalanced and balanced magnetron sputtering system. The
set-up was designed with two different systems for users to
choose a suitable system depending on the target materials.
Moreover, both systems could be operated simultaneously to
prepare multilayer films.
2.2. Deposition
In this study, Ti targets were used in the balanced magnetron sputtering system, and Al in the unbalanced magnetron
sputtering system. Both systems were operated simultaneously to grow the TiN/AlN nano-multilayer films (referred
henceforth as multilayer) with various periods. The periods
were varied by controlling the deposition conditions. Prior
to growth of the multilayer, a Ti interlayer was deposited on
the substrate to enhance the adhesion of the multilayer to the
substrate.
The substrate materials were Si wafer, and high-speed
steel (SKH51, JIS) and medium carbon steel (S45C, JIS) bars.
To avoid the substrate effects, (1 0 0) Si wafers were used to
grow multilayers for the quantitative analyses. SKH51 and
S45C substrates were machined to the desired shapes and then
heat-treated to Rockwell hardnesses of HRc 55 and HRc 28,

Fig. 1. Schematic diagram of the TWINLAB MIRDC PVD deposition set-up.

342

S.H. Yao et al. / Materials Science and Engineering A 392 (2005) 340347

respectively. SKH51 was used as the substrate for growing

the multilayers for the mechanical property measurements
and as the specimens in the wear test. S45C, without further surface treatment, was used as the specimens in the wear
experiment and the cut material in the turning test.
Before deposition, the substrates were mechanically polished to a roughness of Ra
= 0.1 m, ultrasonically cleaned
in acetone, and then kept in an electric-dryer to reduce surface pollution. For deposition, the substrates were degreased,
chemically etched and then loaded onto the substrate holder.
The distance between the substrate and the targets was 10 cm.
The deposition chamber was evacuated to 5 105 Torr, and
back-filled with argon gas (Ar) to a pressure of 3 103 Torr.
Then, arcs were induced to ionize Ar to Ar+ for further cleaning. The substrates were conditioned using Ar+ bombardment
for 10 min at a bias voltage of 350 V before deposition. To
grow 0.1 m Ti interlayer, the balanced magnetron sputtering
system was operated at the pressure 1.5 103 Torr, Ti target
current 1 A, and substrate bias voltage 50 V. Subsequently,
the multilayers were deposited under different nitrogen gas
flow rates (referred henceforth as flow rates) and specimen holder rotation speeds (referred henceforth as rotation
speeds), while keeping the other conditions constantthe
total chamber pressure 1.5 103 Torr; substrate temperature 195 C; Ti targets current 3 A; Al targets power 4 Kw;
frequency 150 kHz; and substrate bias voltage 50 V. The
multilayers corresponding to the different deposition conditions are coded, as listed in Table 1. For comparison, a singlelayer TiN was also deposited using traditional PVD [19].
2.3. Evaluation
A glow discharge optical emission spectroscopy
(GDOES) was used to analyze the composition distribution
inside the multilayers. A scanning electronic microscope
(SEM) was used to determine the cross-sectional thicknesses
of the multilayers, and to analyze the wear morphology.
X-ray diffraction (XRD) studies were carried out using an
X-ray diffractometer with Cu K radiation. The hardness
values were taken using a Vickers micro-hardness tester
equipped with a Knoop indenter operated at an applied load

10 gf. A scratch tester was used to measure the adhesion

between the multilayer and the substrate. The adhesion was
determined by the critical force (Lc), at which the multilayer
began to spall or separate from the substrate. The surface
roughness and wear depth were measured using a surface
profilameter with a diamond stylus. An optical microscope
(OM) was used to examine the geometry of the drills and
turning cutters and surface conditions before experiments,
and to measure the width of wear zone of micro-drills and
turning cutters after experiments.
2.4. Wear test
The wear performance of the multilayers was evaluated using a SRV reciprocating sliding wear tester (Schwingung Reibung and Verschleiss tester, Optimal Instruments Pruftechnik
GmbH, Germany). The details of the specimen arrangement
and the testing mode are shown schematically in Fig. 2. The
cylinder-on-plate line-contact geometric configuration was
used. The plate was fixed stationary while the cylinder was
pressed and reciprocating sliding (oscillating) on the plate.
The material of the cylinder (upper specimen) was S45C.
The material of the plate (lower specimen) was SKH51, on
which the multilayers were grown. The experimental parameters were: no lubricant, applied load 50 N, stroke 0.2 mm,
frequency 10 Hz, and duration 6 min.
2.5. Micro-drilling and turning test
In order to study the feasibility of applying the multilayers
for machining applications, some of the multilayers showing
better wear resistance in the wear test were selected for deposition on micro-drills and turning cutters for field tests.
In the micro-drill test, the WC micro-drills were used to
drill micro-holes on circuit boards. The micro-drill had a drill
body of diameter 0.3 mm, and was a product of Toshiba,

Table 1
Deposition conditions for TiN/AlN nano-multilayers
Code

Rotation speed (rpm)

Nitrogen gas flow rate (sccm)

N10
N13
N15
N17
N20

0.5

10
13
15
17
20

R1
R2
R3
R4
R5
TiN

1
2
3
20
4
5
Multi-arc plasma-aided PVDa

Refer to [19].

Fig. 2. SRV wear tester and cylinder-on-plate contact configuration.

S.H. Yao et al. / Materials Science and Engineering A 392 (2005) 340347

343

Table 2
Compositions, thicknesses and periods of TiN/AlN nano-multilayers
Code

Element (at.%)

Thickness (m)

Period (nm)

Ti

Al

N10
N13
N15
N17
N20

5
20
26
31
35

49
46
45
41
41

46
34
29
28
24

2.9
3.8
3.6
3.1
1.6

50.6
67.3
67.6
54.6
27.3

R1
R2
R3
R4
R5

44
45
48
50
50

38
39
34
34
33

18
16
18
16
17

1.5
1.5
1.3
1.3
1.4

12.7
6.4
3.6
2.7
2.4

Fig. 3. Schematic diagram of the shape of a micro-drill and the criterion of

determining drilling performancecorner wear.

TiN

47

53

Japan with a commercial code RH-RDS. Prior to testing, the

geometry and surface conditions of the micro-drill were examined. The performance of the micro-drills was determined
by the corner wear formed at the end of the cutting edges.
The shape of a micro-drill and the corner wear are shown
schematically in Fig. 3. The circuit board was also a commercial product with a code FR4. The material of the circuit
board was a composite of glass fibers bonded with epoxy
resin. To reduce the deviations that might be caused during
manufacturing process, the circuit boards were selected from
the same batch number. The drilling test was operated in a
vertical 3-axes machining center. The machining conditions
were: rotation speed 100 kr/min; vertical forward and backward feed rates, 6.8 m/min and 10 m/min, respectively.
In the turning test, the indexable WC turning cutter with
grade ISO P30 was to machine S45C bar steel. The geometry
of a turning cutter is triangle with 12 mm for each side and
5 mm in thickness. The cutter was a product of Mitsubishi
Japan with a commercial code NX55. Prior to testing, the
geometry and surface conditions of cutters were examined.
The cutter holder was manufactured by CHOUS tool company, with a commercial code WTEN2020K16. The machining performance of the turning cutter was determined by the
flank wear on the cutting edges. The turning test was operated
with a traditional lathe, which was manufactured by TaShi
mechanical company with a commercial code TSW-70K. The
machining conditions were: rotation speed 275 rpm; depth of
cut 1.0 mm; feed rate 0.1 mm/rev; and duration 7.5 min.
Each value presented in this study was an average of five
measurements, including the data obtained from the laboratory and the field tests.

as the flow rate of nitrogen gas increased, the N content increased, and the Ti content slightly decreased, while the Al
content decreased significantly. The N content in N10 was
very low, that might be due to very low nitrogen gas flow
rate. The R1R5 analyses showed that as the rotation speed
increased, the N and Ti content slightly increased and decreased, respectively, and the Al content almost remained
constant. In particular, when the elemental compositions for
N10N20 and R1R5 are compared, it is found that Al content and to some extent the Ti content in the films R1R5 has
decreased and the N content increased. It can be rationally
inferred that the increase in the N content resulted from the
increase in the rotation speed. When the rotation speed increased, the number of layers of a film increased; thus, there
were more possibility and space for N atom to be trapped
as interstitial atoms. However, the actual reason needs to be
investigated further.
The thickness of films N13N20 decreased with increasing the flow rate, with the biggest value for N13. It was noted
that the thickness reduced abruptly for N20. The N20 thickness was very low, even lower than half of thickness of N15.
The R1R5 analyses results showed that the thicknesses were
almost not affected by the changes in the rotation speeds.
According to the reports of Setoyama et al. [6] and Kim et
al. [20], the period () of a nano-multilayer can be calculated
using the relationship between the overall thickness of a nanomultilayer film and the rotation speed. The calculated periods
are also listed in Table 2. As can been seen, by controlling
the flow rates and the rotation speeds, the multilayers with
periods ranging from 2.4 to 67.6 nm were obtained.

3.2. X-ray diffraction analyses

3. Results
3.1. Characterization
The multilayers obtained under different deposition conditions were characterized, and tabulated in Table 2. The composition analyses of the N10N20 multilayers indicated that

Fig. 4 shows the X-ray diffraction patterns of the multilayers that were grown under different deposition conditions.
The diffraction pattern of N10 showed that elemental Ti and
Al are present, confirming that the nitrogen gas flow rate
is too small. Thus, the formation of TiN and AlN was not
complete. The diffraction pattern of N13 was similar to that
of N10, in which the elemental Ti and Al can be seen. In

344

S.H. Yao et al. / Materials Science and Engineering A 392 (2005) 340347

Fig. 5. Knoop hardness of TiN/AlN nano-multilayers vs. period.

Fig. 4. X-ray diffraction patterns of TiN/AlN nano-multilayers: (a) N10,

= 50.6 nm; (b) N15, = 67.6 nm; (c) N20, = 27.3 nm; (d) R1, = 12.7 nm;
(e) R3, = 3.6 nm; and (f) R5, = 2.4 nm.

the diffraction pattern of N15 (Fig. 4(b)), elemental Ti and

Al were absent. In the diffraction patterns Fig. 4(ad), TiN
(NaCl-type, a = 0.424 nm, JCPDS 381420) and Wurtzitetype AlN (a = 0.311 nm, c = 0.498 nm, JCPDS 251133) are
identified. The Wurtzite-type AlN diffraction patterns gradually disappear in the diffraction patterns from Fig. 4(d) to
(f), as the rotation speeds change from R1 to R5. For R5
(Fig. 4(e)), only one diffraction pattern exists. It is equivalent
to fcc structure and its line exists between TiN and NaCl-type
AlN (a = 0.412 nm, JCPDS 251495). The diffraction angle
2 of (1 1 1) plane of this multilayer is 37.10 . The lattice
parameter calculated from this plane is 0.419 nm.
The X-ray diffraction results (Fig. 4) indicate that at periods shorter than 3.6 nm (R3), the AlN in the multilayers gradually transforms from Wurtzite-type to NaCl-type as the periods decrease. In addition, TiN and AlN distort each other as to
cause severe effects on their crystal structures. Consequently,
the TiN (2 0 0) diffraction peak present in Fig. 4(ae) is absent
in the diffraction pattern of R5 (Fig. 4(f)). An identical experimental result has been reported by other researchers [6,20].
They conducted extensive studies using TED (transmission
electron diffraction) and FFT (fast Fourier transformation),
to analyze and confirm the crystal structure transformations
with the periods of the multilayers.

hardness increases to a high value. All the multilayers possess hardness higher than AlN. The hardness of single-layer
TiN lies between R2 and R3.
Fig. 6 shows the relationship between the critical loads
of the multilayers and the periods. As can been seen, except
N10 and N13, the Lc value of the multilayer increases with
a decrease in the period. The Lc values of N10 and N13
are relatively much lower. When the period is shorter than
3.6 nm (R3), the Lc value increases drastically. The adhesion
of single-layer TiN is near to that of R2.
The XRD analyses (Fig. 4) indicate that N10 and N13
multilayers contain Ti and Al. Fig. 5 and Fig. 6 show that the
hardness and adhesion of N10 and N13 is relatively much
lower. Therefore, these two multilayers will not be considered
in the following studies.
3.4. Wear test
Fig. 7 shows the dependence of wear depth and friction
coefficient of the multilayers on the period. It is clear that the
wear resistance of the multilayers increases with a decrease
in the period. The R3R5 multilayers with periods shorter
than 3.6 nm possess excellent wear resistance. The value of

3.3. Film hardness and adhesion

Fig. 5 shows the dependence of Knoop hardness of the
multilayers on the period. For comparison, the hardness of
sintered bulk AlN is also indicated. Considering the multilayers exclusive of N10 and N13, the hardness increases as the
period decreases. The hardness of N10 and N13 is relatively
much lower. When the period is shorter than 3.6 nm (R3), the

Fig. 6. Critical load (Lc) of TiN/AlN nano-multilayers vs. period.

S.H. Yao et al. / Materials Science and Engineering A 392 (2005) 340347

345

Fig. 7. Wear depth and friction coefficient of TiN/AlN nano-multilayers vs.

period.

the friction coefficients decreased gradually as the period decreased. For R3R5, the friction coefficient dropped abruptly;
the values are nearly equivalent to that of the single-layer
TiN. However, the wear depth values of R3R5 multilayers
are merely one third of that of the single-layer TiN, and one
fourth of that of the uncoated specimen.
The wear tests show that R3, R4 and R5 multilayers have
remarkably excellent wear performance. Thus, these three
multilayers were chosen for growth on micro-drills and turning cutters to perform field tests with an aim to approve the
feasibility of applying these multilayers on actual machining.
3.5. Micro-drilling test
Fig. 8 shows the experiment result of the micro-drilling
test. Comparing the result of R3, R4 and R5, although R4
shows a little better drilling performance, the three multilayers may be regarded as equal competitors. The multilayers
provide more improvement in drilling performance than the
single-layer TiN film. Remarkably, the multilayers largely

Fig. 9. Drilled hole morphology on circuit boards formed by micro-drills

with: (a) R4 TiN/AlN nano-multilayer, and (b) single-layer TiN film, after
successive 20,000 hole drilling.

reduce the micro-drills wear by 40%, as compared with the

uncoated micro-drill.
Fig. 9(a and b) show the hole morphology formed on
the circuit boards by R4 multilayer and single-layer TiN
coated micro-drills, respectively, after drilling 20,000 holes.
The hole formed by the R4 multilayer-coated micro-drill is
smoother than that formed by the single-layer TiN coated
micro-drill. The R4 multilayer provided more improvement
in drilling behavior than the single-layer TiN. According to
the testing results, the R3R5 multilayers are good substitutes
for single-layer TiN in micro-drilling.
3.6. Turning test

Fig. 8. Corner wear of micro-drills with different coatings vs. drilled holes.

Fig. 10 shows the experiment result of the turning test.

The flank wear value is largest for the uncoated turning cutter.
The flank wear of the uncoated turning cutter was reduced
with deposition of single-layer TiN film. When compared

346

S.H. Yao et al. / Materials Science and Engineering A 392 (2005) 340347

the morphology of cutting edge wear of the single-layer TiN

and R4 multilayer-coated cutters. These figures clearly indicate that R4 multilayer can provide more wear protection than
the single-layer TiN film. Through the field tests, it is learned
that the R3R5 multilayers could be used in machining with
better wear resistance.

4. Discussion

Fig. 10. Flank wear of turning cutters with different coatings after turning
test.

with the single-layer TiN film, the multilayers have ability of

providing 40% wear improvement. Although R4 indicates a
little better wear resistance, the difference between the three
multilayers is regarded not significant.
Fig. 11 shows the wear morphology of single-layer TiN
and R4 multilayer-coated cutters after the machining that was
observed in SEM. Fig. 11(a and b) show, respectively, the
morphology of flank wear of the single-layer TiN and R4
multilayer coated cutters. Fig. 11(c and d) show, respectively,

The hardness of AlN (Hv 1200 of bulk) is far much lower

than that of TiN (Hv 2437 PVD film). As the flow rate of
nitrogen gas increases, the content of AlN in the N15N20
multilayer decreases (Table 2). This leads to an increase in the
overall hardness of the multilayer, and thus an enhancement in
the wear resistance. In addition, the content of AlN is enough
to provide sufficient Al to form an Al2 O3 protective film for
further increase in the wear resistance, although the content
of AlN continues to decrease as the flow rate increases. The
oxidation wear is the main fracture mechanism in sliding
under dry conditions [19]. Al2 O3 has been proven to be one
of the dominant materials against oxidation wear. Therefore,
the wear performance of N15N20 multilayers is better than
that of the single-layer TiN film. N20 shows excellent wear
performance.
Form the experiment results it is found that the period
3.6 nm (R3) is a critical value. When the period is shorter

Fig. 11. Wear morphology of turning cutters with different coatings after turning tests observed under SEM: (a) flank wear, single-layer TiN; (b) flank wear,
R4 TiN/AlN nano-multilayer film; (c) cutting edge wear, single-layer TiN; and (d) cutting edge wear, R4 TiN/AlN nano-multilayer film.

S.H. Yao et al. / Materials Science and Engineering A 392 (2005) 340347

than 3.6 nm, the hardness (Fig. 5), adhesion (Fig. 6) and wear
performance (Fig. 7) increase remarkably, which results from
the transformation of AlN to cubic form in the multilayers.
The X-ray diffraction analyses shows that the period 3.6 nm
(Fig. 4(e)) is the value at which the AlN starts to transform
from Wurtzite-type to NaCl-type. As the period decreases,
the fraction of Wurtzite-type AlN decreases gradually. When
the period is as short as 2.4 nm (Fig. 4(f)), the Wurtzite-type
AlN almost transforms to NaCl-type AlN. At this period, the
hardness reaches the maximum value. These findings concerning AlN transformation with the periods have been reported before by Setoyama et al. [6] and Kim et al. [20], and
are confirmed again here.
According to the works of Paney et al. [21], Christensen et
al. [22], and Ueno et al. [23], AlN transforms from Wurtzitestructure to NaCl-structure under pressure of 16.622.9 GPa.
This is accompanied by 18% volume reduction. On the basis
of calculation of Christensen et al. [23], the bulk modulus
increases from 205 to 270 GPa, when the structure of AlN
changes from Wurtzite-type to NaCl-type. Experimentally,
hardness increases with bulk modulus, so that NaCl-type AlN
is harder than Wurtzite-type AlN.
Thus, the ultra-high hardness, excellent adhesion and wear
resistance of the R3R5 multilayers with periods
3.6 nm results from the formation of NaCl-type AlN. R3R5 multilayers applied on micro-drills for hole-drilling on circuit boards
and on turning cutters for turning medium carbon steel bars,
shows that the multilayers can be utilized on machining applications and a 40% wear improvement can be achieved.
From the practical point of view, the end users replace the
uncoated micro-drills after drilling 5000 holes. Our experience shows that the hole tolerance is too large to be accepted
after drilling to some degree more than 5000 holes. In Fig. 8,
the corner wear of uncoated micro-drills corresponding to
5000 holes is about 35 m. For the R4 multilayer-coated
micro-drills, the corner wear is only 32 m after 20,000 holedrilling. That is, the R4 multilayer-coated micro-drills have
four times longer service life than the uncoated micro-drills.

5. Conclusion
In this study, a newly developed technologythe highrate reactive sputtering deposition processwas employed to
deposit the TiN/AlN nano-multilayer films. Through controlling the nitrogen gas flow rates and the specimen holder rotation speeds, the multilayer films with periods ranging from
2.4 to 67.6 nm were obtained. At the periods
3.6 nm, the

347

multilayer films possessed ultra high hardness and adhesion,

and excellent wear behavior. The micro-drilling and turning tests proved the feasibility of applying these multilayers
on actual machining applications. A significant performance
improvement can be achieved, compared to the traditional
single layer TiN film.
Acknowledgment
The authors wish to express their thanks for the financial support by National Science Council under the contract
of NSC922212E309001. Grateful thanks are specially
dedicated to Mr. K.L. Yei for help in executing the experiments and to Mr. W.C. Liu for deposition.
References
[1] K. Holmberg, H. Ronkainen, A. Matthews, Ceram. Int. 26 (7) (2000)
787.
[2] U. Helmerson, S. Todorova, S.A. Barnett, J.E. Sundgren, L.C. Makert, J.E. Greene, J. Appl. Phys. 62 (1987) 481.
[3] P.B. Mirakami, L. Hultman, S.A. Barnett, Appl. Phys. Lett. 57 (1990)
2654.
[4] M. Shinn, L. Hultman, S.A. Barnett, J. Mater. Res. 7 (1992) 901.
[5] D. Li, X.W. Lin, S.C. Chen, et al., Appl. Phys. Lett. 68 (1996)
1211.
[6] M. Setoyama, A. Nakayama, M. Tanaka, N. Kitagawa, T. Nomura,
Surf. Coat. Technol. 8687 (1996) 225.
[7] H. Jensen, J. Sobata, G. Sorensen, J. Vac. Sci. Technol. A 15 (1997)
941.
[8] S.J. Bull, A.M. Jones, Surf. Coat. Technol. 78 (1996) 173.
[9] H. Holleck, V. Schier, Surf. Coat. Technol. 7677 (1995) 328.
[10] J.R. Baumvol, Nucl. Instr. Meth. Phys. Res. B 85 (1994) 230.
[11] J.E. Sundgren, Thin Solid Films 128 (1985) 21.
[12] M.B. Peterson, S. Ramalingam, ASM OHIO (1981) 331.
[13] B.Y. Hshue, PhD dissertation, Department of Materials and Engineering, NCKU, Taiwan, 1996.
[14] W.D. Munz, J. Vac. Sci. Technol. A 4 (1986) 2717.
[15] O. Kenotek, T. Leyendecker, J. Solid State Chem. 70 (1987) 318.
[16] Y. Tanaka, T.M. Gur, M. Kelly, S.T. Hagstrom, T. Ikeda, Thin Solid
films 228 (1993) 238.
[17] H. Ichimura, A. Kawana, J. Mater. Res. 8 (1993) 1093.
[18] S. Inoue, H. Uchida, Y. Yoshinaga, K. Koterazawa, Thin Solid films
300 (1997) 171.
[19] Y.L. Su, S.H. Yao, C.T. Wu, Wear 209 (1999) 132.
[20] Kim Do-Geun, Seong Tae-Yeon, Baik Young-Joon, Surf. Coat. Technol. 153 (2002) 79.
[21] R. Pandey, A. Sutjianto, M. Seel, J.E. Jaffe, J. Mater. Res. 8 (8)
(1922).
[22] N.E. Christensen, I. Gorczyca, Phys. Rev. B 47 (8) (1993) 4307 (II).
[23] M. Ueno, A. Onodera, O. Shimomura, K. Takemura, Phys. Rev. B
45 (17) (1992) 10123 (I).