Beruflich Dokumente
Kultur Dokumente
June 8, 2010
Prof. Albert Wang
Dept. of Electrical Engineering
University of California
Copyright2009byAlbertWang,AllRightsReserved
Outlines
Summary
y
Stay in
St i touch
t h with
ith state-of-the-art
t t f th t globally,
l b ll
Discounts for IEEE conferences and journals, etc.
Chapter & local activities,
activities
Awards & Recognitions, (Early Career Award, etc.)
PhD/MS Student Fellowship Awards,
A multi-billion-$ problem
ESD failures 30%-50% IC failures
A killing factor to time-to-market
Informal ESD Failure Statistics
Assembly
.. Good
on-chip ESD protection required! tri ca. 14%
Elec 4%Ion 3
%
Fab Unknown
26% 15%
ESD/EOS
Ref: L. Brown, et al, Electronic Packaging & Production, April 1990.
37%
R Merril
R. Merril, et al
al, EOS/ESD
EOS/ESD, 1993
1993.
ND
ND
PD
Simple turn-on I-V,
PD
SD
Snapback I-V. IN
OUT
Protect EVERY I/O pad on chip!
DS
PS
NS
PS
NS
2nd Breakdown
I I
(Vt2, It2)
VSS
(ESD protection region)
Low-R dischargeg
(ESD protection region)
Low-R discharge
Turn on Holding
(Vt1, It1, t1) (Vh, Ih) Triggering
T i i
(Vt1, It1, t1)
Ref.: A. Wang, On-Chip ESD Protection for Integrated Circuits, Kluwer, ISBN: 0-7923-7647-1, 2002.
Prof. Albert Wang/UCR - IEEE-DL, Stuttgart, Germany, 06/08/2010 5
ESD Protection: Simple or Complex?!
VDD VDD
VSS
R2
Q1 ND VSS
IDz I/O PD
DZ
VSS
Q2 Rext
NS
VSS PS VSS
Ref: J. Chen, et al, IEEE IEDM Digest, 1995, pp. 337-340; Ker, et al, US Patent 5,572,394, 1996.
Prof. Albert Wang/UCR - IEEE-DL, Stuttgart, Germany, 06/08/2010 6
Moores
Moore s Law ~ ESD Protection in CMOS
7
Prof. Albert Wang/UCR - IEEE-DL, Stuttgart, Germany, 06/08/2010 7
ESD Challenges for sub
sub-90nm
90nm CMOS
Reverse trend
R d ffor <90nm
90 CMOS?
Narrower ESD design window? ESD Design Window
10% 10~
I 20%
Failure
(Vt2, It2)
VSafe
BV
VDDmax
Discharging
VDD
(RON)
Holding
(Vh, Ih) Triggering
(Vt1, It1, t1)
IDD
V
Ref.: L. Lin & A. Wang, et al, Proc. EOS/ESD Symp, pp.28-37, 2009.
Prof. Albert Wang/UCR - IEEE-DL, Stuttgart, Germany, 06/08/2010 8
E
Emerging
i Challenges
Ch ll in
i ESD Design
D i
D i optimization
Design ti i ti by
b simulation
i l ti
RF-ESD co-design
g method
Ref:
e A. Wang,
a g, e
et a
al,, IEEE Trans
a s Elec.
ec Devs.,
e s , v52,
5 , n7,, p
p1304,
30 , 2005.
005
H. Feng, et al, IEEE JSSC, v38, n6, p995, 2003.
H. Xie, MS Thesis, IIT, 2004.
Prof. Albert Wang/UCR - IEEE-DL, Stuttgart, Germany, 06/08/2010 10
Mixed Mode ESD Design: Example 1
Mixed-Mode
Chip-level
Chi l l ESD circuit
i i design
d i
No-assumptions
Cs
VHBM Rd Core
Ls ESD
ESD source
CC circuit IC
Circuit Chip
(e.g., HBM model) Ct
ESD sub-circuit
to be simulated
1.2
3
C u rre n t (A m p )
2 0.8
I( A )
0.6
1
04
0.4
0.2
0
0.E+00 2.E-07 4.E-07 6.E-07 8.E-07 1.E-06 1.E-06 0
Time (Second) 0 5 10 15 20
20 V(v)
15 B S Hot Spot D
G
V (V )
10
0
1.E-12 1.E-11 1.E-10 1.E-09 1.E-08 1.E-07 1.E-06 1.E-05
t(s)
V g (V )
1.5
0.5
1
05
0.5
0
0
1.E-14
-0.5 20 1.E-12 1.E-10 1.E-08 1.E-06
0 5 10 15
Vd(V)
( ) log(t) (s)
20 2500
2000
15
To reduce triggering Vt1 by design
1500
T m a x (K )
V d (V )
10
1000
5
500
0 0
1.E-12 1.E-10 1.E-08 1.E-06 1.E-04 1.E-02 1.E-12 1.E-10 1.E-08 1.E-06
log(t) (s) log(t) (s)
tmaxM1
tmaxM2
1100
tmaxESD
900
Tmax (K)
RF output buffer block,
700
Differential buffer with open collector
collector,
5kV SCR ESD protection 500
300
0.E+00 2.E-07 4.E-07 6.E-07 8.E-07 1.E-06 1.E-06
Time (s)
Out1
Out2
3.0
In1 I-M1
I-ESD
In2
Currrent (A)
2.0
ES
ES
SCR
SCR
SD-
SD-
bias
1.0
0.0
Ref: H. Feng, et al, IEEE JSSC, V38, N6, p995, 2003.0.E+00 2.E-07 4.E-07 6.E-07 8.E-07 1.E-06
Time (s)
Prof. Albert Wang/UCR - IEEE-DL, Stuttgart, Germany, 06/08/2010 14
RF ESD Protection Design
Unique Challenge:
Accurate CESD estimation,
Including CESD in RF IC design,
Reduce CESD over fRF
Unique Challenge:
ESD noises into RF ICs.
ESD affects
ff RF IC substantially:
b i ll
5GHz LNA for dual-band WLAN transceiver
CE-CB cascode topology
High/low gain switching
Unique double shutdown function
0.18m SiGe BiCMOS
2KV ESD protection
GSG RF
GSG RFIN
FOUT
ESD
ESD
3.5
3
LNA w/ ESD
FLNA 1
NF (dB)
0.5
NFESD 0.1 dB
0
4.5 5 5.5 6 6.5 7
Frequency (GHz)
Simulation
0.8 SCR
ggNMOS
Dx1
0.6 Dx2
CESD (pF)
dSCR
Dx5
ESD(p
0 2 4 6 8 10
0.4 f (GHz) dSCR
C
0.2 M
Measurement
t
0
0 2 4 6 8 10
f (GHz)
Prof. Albert Wang/UCR - IEEE-DL, Stuttgart, Germany, 06/08/2010 22
Example-4: 2kV CESD by Test
01
0.1 SCR
Dx1
Dx2
0 08
0.08 Dx3
Dx4
Dx5
0 06
0.06
CESD (pF))
dSCR
0 04
0.04
0 02
0.02
0
0 2 4 f (GHz) 6 8 10
Prof. Albert Wang/UCR - IEEE-DL, Stuttgart, Germany, 06/08/2010 23
Example-4:
p 2kV CESD ~ Size
2kV Layout Size Comparison
2500
2000
Layout Size (um2)
1500
1000
500
2kV CESD Comparison at 2
2.4GHz
4GHz
0
Dx1 Dx2 Dx3 Dx4
0.45 Dx5 ggNMOS SCR dSCR
ESD Structures
0.4
0.35
0.3
CEESD (pF)
0.25
02
0.2
0.15
0.1
0.05
0
Dx1 Dx2 Dx3 Dx4 Dx5 ggNMOS SCR dSCR
ESD Structures
Prof. Albert Wang/UCR - IEEE-DL, Stuttgart, Germany, 06/08/2010 24
FoM for Overall ESD Design Evaluation
Each parameter has different/conflicting meaning,
Optimization by overall ESD design performance,
Need a new FoM parameter: F-factor
F factor
kV
F
Size( m 2 ) C ESD ( pF ) NF ( dB ) 2kV F-Factor Comparison (Measured)
200
150
ctor
F-fac
100
50
0
Dx1 Dx2 Dx3 Dx4 Dx5 ggNMOS SCR dSCR
ESD Structures
Prof. Albert Wang/UCR - IEEE-DL, Stuttgart, Germany, 06/08/2010 25
Novell ESD
E Protection Design Helps
l
VDD VDD
VDD
ND/PD
ND/PD
PD ND PD
ND
DS/SD
SD DS
IN NS/PS
DS
OUT
PS NS NS/PS
PS
NS
VSS
VSS VSS
A
0
K A K A K
(PS) 1 2 (NS)
1 0 0 2
P+ N- P+ P+ N- P+
Q2 Q3
PW Rw P-well Rw
PW P-well
N-Epi Q1 Q1
N-Epi
Ref: A. Wang, et al, IEEE Electron Device Letters, Vol. 22, No. 10, pp.493-495, Oct. 2001.
A. Wang, US Patent # 6,635,931 B1, 2003.
Prof. Albert Wang/UCR - IEEE-DL, Stuttgart, Germany, 06/08/2010 27
Example 7: Low-Parasitic
Example-7: Low Parasitic Poly-Si
Poly Si SCR ESD
Cathode Anode
Polysilicon S
N+ P+ N+ P+
N5 P4 I3 N2 P1
Not to Scale)
R2
Q1
(N
Q2 R1
Field Oxide
P-Substrate
Xie, et al, A New Low-Parasitic Polysilicon SCR ESD Protection Structure for RF ICs, IEEE Electron Device
Letters, Vol. 26, No.2, pp.121-123, February 2005
0.35m
0 35m SiGe BiCMOS
BiCMOS.
3.2kV HBM ESD protection level 2.5 Simulation
using a small 750m2 poly-Si SCR
TLP Testing
a high F-factor of 42 2
the lowest reported CESD of ~92.3fF.
92.3fF.
A)
I (Anode) (A
Ajustable Vt1.
1.5
4 1
3.5
0.5
3
A)
I (Anode) (A
25
2.5 0
2 0 5 10 15 20 25
Poly Diode V (Anode) (V)
1.5 Poly SCR_1
1 Poly SCR_2
SCR 2
Poly SCR_3
0.5 Poly SCR_4
0
0 5 10 15 20 25 30 35 40
V (Anode) (V)