Scribd Logo
Hochladen

Willkommen bei Scribd!

  • SU-8 Microfabrication Trial 1

    Hochgeladen von

    John Hilker
    90 Ansichten6 Seiten
    This document describes the steps of a trial for microfabricating structures on alumina substrates using the photoresist SU-8. The process involves: 1) Spin coating SU-8 photoresist and performing a softbake. 2) Exposing the photoresist to UV light through a mask. 3) Performing a post-exposure bake. 4) Developing the photoresist to create microstructures, followed by rinsing and drying. 5) Hard baking the photoresist to complete the process. Four operators are listed as participating in the trial.

    Originalbeschreibung:

    Originaltitel

    Runcard_Microfab_SU_8.pdf

    Copyright

    © © All Rights Reserved

    Verfügbare Formate

    PDF, TXT oder online auf Scribd lesen

    Stufen Sie dieses Dokument als nützlich ein?

    Sind diese Inhalte unangemessen?

    Dieses Dokument melden
    This document describes the steps of a trial for microfabricating structures on alumina substrates using the photoresist SU-8. The process involves: 1) Spin coating SU-8 photoresist and performing a softbake. 2) Exposing the photoresist to UV light through a mask. 3) Performing a post-exposure bake. 4) Developing the photoresist to create microstructures, followed by rinsing and drying. 5) Hard baking the photoresist to complete the process. Four operators are listed as participating in the trial.

    Copyright:

    © All Rights Reserved
    Als PDF, TXT herunterladen oder online auf Scribd lesen
    Markieren Sie unangemessene Inhalte
    90 Ansichten6 Seiten

    SU-8 Microfabrication Trial 1

    Hochgeladen von

    John Hilker
    This document describes the steps of a trial for microfabricating structures on alumina substrates using the photoresist SU-8. The process involves: 1) Spin coating SU-8 photoresist and performing a softbake. 2) Exposing the photoresist to UV light through a mask. 3) Performing a post-exposure bake. 4) Developing the photoresist to create microstructures, followed by rinsing and drying. 5) Hard baking the photoresist to complete the process. Four operators are listed as participating in the trial.

    Copyright:

    © All Rights Reserved
    Als PDF, TXT herunterladen oder online auf Scribd lesen
    Markieren Sie unangemessene Inhalte
    von 6

    Projet : Microfabrication of Silcon Wayfer SU-8 Trial 1

    Operator : Ben Taylor, Katie Flowers, Rob Brunner and John Hilker
    Created : 06.02.2017 Last revision : 06.02.2017
    Substrates : Alumina

    Step N Description Equipement Program / Parameters Target Actual Remarks Name Date
    0 WAFER PREPARATION
    0.1 Stock out Alumina
    Salare Systems
    0.2 Clean Acetone and IPA
    Wethood
    1 PHOTOLITHOGRAPHY - Mask 1
    1) 0 to 1745 rpm with an acceleration =100 rpm/s
    Brewer Sciences Spin
    1.1 Spin coat SU-8(-PR) 2) 1745 rpm during 40sec 15um
    Developer
    3) 1745 rpm to 0 with a deceleration =100 rpm/s
    Salare Systems
    1.2 Relax 10 min
    Wethood
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.3 Softbake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 35min
    Nuetronix Model Q- Second mask, HC, 450 mJ/cm2
    1.4 Expose to UV light
    7000-IR (Time=0.450/Watts)
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.5 Post Exposure Bake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 30min
    Salare Systems
    1.6 Delay 10 min
    Wethood
    Salare Systems
    1.7 Develop SU-8 PGMEA 120sec (Should be clear)
    Wethood
    Salare Systems
    1.8 Clean Develop SU-8 PGMEA Clean Solution 12sec
    Wethood
    Salare Systems Submerge in IPA untill white traces are gone
    1.9 Rinse
    Wethood (Remove immediately or SU-8 will unstick
    Salare Systems
    1.1 Dry Let dry in ambient air
    Wethood
    Brewer Sciences Spin
    1.11 Hard Bake SU-8 135C 120min
    Developer
    Projet : Microfabrication of Silcon Wayfer SU-8 Trial 1
    Operator : Ben Taylor, Katie Flowers, Rob Brunner and John Hilker
    Created : 06.02.2017 Last revision : 06.02.2017
    Substrates : Alumina

    Step N Description Equipement Program / Parameters Target Actual Remarks Name Date
    0 WAFER PREPARATION
    0.1 Stock out Alumina
    Salare Systems
    0.2 Clean Acetone and IPA
    Wethood
    1 PHOTOLITHOGRAPHY - Mask 1
    1) 0 to 1745 rpm with an acceleration =100 rpm/s
    Brewer Sciences Spin
    1.1 Spin coat SU-8(-PR) 2) 1745 rpm during 40sec 15um
    Developer
    3) 1745 rpm to 0 with a deceleration =100 rpm/s
    Salare Systems
    1.2 Relax 10 min
    Wethood
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.3 Softbake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 35min
    Nuetronix Model Q-
    1.4 Expose to UV light Second mask, HC, 400 mJ/cm2 (Time=0.4/Watts)
    7000-IR
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.5 Post Exposure Bake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 30min
    Salare Systems
    1.6 Delay 10 min
    Wethood
    Salare Systems
    1.7 Develop SU-8 PGMEA 120sec (Should be clear)
    Wethood
    Salare Systems
    1.8 Clean Develop SU-8 PGMEA Clean Solution 12sec
    Wethood
    Salare Systems Submerge in IPA untill white traces are gone
    1.9 Rinse
    Wethood (Remove immediately or SU-8 will unstick
    Salare Systems
    1.1 Dry Let dry in ambient air
    Wethood
    Brewer Sciences Spin
    1.11 Hard Bake SU-8 135C 120min
    Developer
    Projet : Microfabrication of Silcon Wayfer SU-8 Trial 1
    Operator : Ben Taylor, Katie Flowers, Rob Brunner and John Hilker
    Created : 06.02.2017 Last revision : 06.02.2017
    Substrates : Alumina

    Step N Description Equipement Program / Parameters Target Actual Remarks Name Date
    0 WAFER PREPARATION
    0.1 Stock out Alumina
    Salare Systems
    0.2 Clean Acetone and IPA
    Wethood
    1 PHOTOLITHOGRAPHY - Mask 1
    1) 0 to 1745 rpm with an acceleration =100 rpm/s
    Brewer Sciences Spin
    1.1 Spin coat SU-8(-PR) 2) 1745 rpm during 40sec 15um
    Developer
    3) 1745 rpm to 0 with a deceleration =100 rpm/s
    Salare Systems
    1.2 Relax 10 min
    Wethood
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.3 Softbake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 35min
    Nuetronix Model Q- Second mask, HC, 475 mJ/cm2
    1.4 Expose to UV light
    7000-IR (Time=0.475/Watts)
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.5 Post Exposure Bake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 30min
    Salare Systems
    1.6 Delay 10 min
    Wethood
    Salare Systems
    1.7 Develop SU-8 PGMEA 120sec (Should be clear)
    Wethood
    Salare Systems
    1.8 Clean Develop SU-8 PGMEA Clean Solution 12sec
    Wethood
    Salare Systems Submerge in IPA untill white traces are gone
    1.9 Rinse
    Wethood (Remove immediately or SU-8 will unstick
    Salare Systems
    1.1 Dry Let dry in ambient air
    Wethood
    Brewer Sciences Spin
    1.11 Hard Bake SU-8 135C 120min
    Developer
    Projet : Microfabrication of Silcon Wayfer SU-8 Trial 1
    Operator : Ben Taylor, Katie Flowers, Rob Brunner and John Hilker
    Created : 06.02.2017 Last revision : 06.02.2017
    Substrates : Alumina

    Step N Description Equipement Program / Parameters Target Actual Remarks Name Date
    0 WAFER PREPARATION
    0.1 Stock out Alumina
    Salare Systems
    0.2 Clean Acetone and IPA
    Wethood
    1 PHOTOLITHOGRAPHY - Mask 1
    1) 0 to 500 rpm with an acceleration =100 rpm/s
    2) 500 rpm during 10sec
    3) 500 to 1745 rpm with an acceleration =100 rpm/s
    Brewer Sciences Spin
    1.1 Spin coat SU-8(-PR) 4) 1745 rpm for 30sec 15um
    Developer
    5) 2745 rpm for 1sec
    6) 1745 rpm for 30sec
    7) 1745 rpm to 0 with a deceleration =100 rpm/s
    Salare Systems
    1.2 Relax 10 min
    Wethood
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.3 Softbake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 35min
    Nuetronix Model Q-
    1.4 Expose to UV light Second mask, HC, 450 mJ/cm2 (Time=0.450/Watts)
    7000-IR
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.5 Post Exposure Bake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 30min
    Salare Systems
    1.6 Delay 10 min
    Wethood
    Salare Systems
    1.7 Develop SU-8 PGMEA 120sec (Should be clear)
    Wethood
    Salare Systems
    1.8 Clean Develop SU-8 PGMEA Clean Solution 12sec
    Wethood
    Salare Systems Submerge in IPA untill white traces are gone
    1.9 Rinse
    Wethood (Remove immediately or SU-8 will unstick
    Salare Systems
    1.1 Dry Let dry in ambient air
    Wethood
    Brewer Sciences Spin
    1.11 Hard Bake SU-8 135C 120min
    Developer
    Projet : Microfabrication of Silcon Wayfer SU-8 Trial 1
    Operator : Ben Taylor, Katie Flowers, Rob Brunner and John Hilker
    Created : 06.02.2017 Last revision : 06.02.2017
    Substrates : Alumina

    Step N Description Equipement Program / Parameters Target Actual Remarks Name Date
    0 WAFER PREPARATION
    0.1 Stock out Alumina
    Salare Systems
    0.2 Clean Acetone and IPA
    Wethood
    1 PHOTOLITHOGRAPHY - Mask 1
    1) 0 to 500 rpm with an acceleration =100 rpm/s
    2) 500 rpm during 10sec
    3) 500 to 1745 rpm with an acceleration =100 rpm/s
    Brewer Sciences Spin
    1.1 Spin coat SU-8(-PR) 4) 1745 rpm for 30sec 15um
    Developer
    5) 2745 rpm for 1sec
    6) 1745 rpm for 30sec
    7) 1745 rpm to 0 with a deceleration =100 rpm/s
    Salare Systems
    1.2 Relax 10 min
    Wethood
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.3 Softbake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 35min
    Nuetronix Model Q-
    1.4 Expose to UV light Second mask, HC, 400 mJ/cm2 (Time=0.4/Watts)
    7000-IR
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.5 Post Exposure Bake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 30min
    Salare Systems
    1.6 Delay 10 min
    Wethood
    Salare Systems
    1.7 Develop SU-8 PGMEA 120sec (Should be clear)
    Wethood
    Salare Systems
    1.8 Clean Develop SU-8 PGMEA Clean Solution 12sec
    Wethood
    Salare Systems Submerge in IPA untill white traces are gone
    1.9 Rinse
    Wethood (Remove immediately or SU-8 will unstick
    Salare Systems
    1.1 Dry Let dry in ambient air
    Wethood
    Brewer Sciences Spin
    1.11 Hard Bake SU-8 135C 120min
    Developer
    Projet : Microfabrication of Silcon Wayfer SU-8 Trial 1
    Operator : Ben Taylor, Katie Flowers, Rob Brunner and John Hilker
    Created : 06.02.2017 Last revision : 06.02.2017
    Substrates : Alumina

    Step N Description Equipement Program / Parameters Target Actual Remarks Name Date
    0 WAFER PREPARATION
    0.1 Stock out Alumina
    Salare Systems
    0.2 Clean Acetone and IPA
    Wethood
    1 PHOTOLITHOGRAPHY - Mask 1
    1) 0 to 500 rpm with an acceleration =100 rpm/s
    2) 500 rpm during 10sec
    3) 500 to 1745 rpm with an acceleration =100 rpm/s
    Brewer Sciences Spin
    1.1 Spin coat SU-8(-PR) 4) 1745 rpm for 30sec 15um
    Developer
    5) 2745 rpm for 1sec
    6) 1745 rpm for 30sec
    7) 1745 rpm to 0 with a deceleration =100 rpm/s
    Salare Systems
    1.2 Relax 10 min
    Wethood
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.3 Softbake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 35min
    Nuetronix Model Q-
    1.4 Expose to UV light Second mask, HC, 475 mJ/cm2 (Time=0.475/Watts)
    7000-IR
    1) 20C to 65C at 2C/min
    Brewer Sciences Spin 2) Stay at 65C for 10min
    1.5 Post Exposure Bake
    Developer 3) Go from 65C to 95C at 2C/min
    4) Stay at 95C for 30min
    Salare Systems
    1.6 Delay 10 min
    Wethood
    Salare Systems
    1.7 Develop SU-8 PGMEA 120sec (Should be clear)
    Wethood
    Salare Systems
    1.8 Clean Develop SU-8 PGMEA Clean Solution 12sec
    Wethood
    Salare Systems Submerge in IPA untill white traces are gone
    1.9 Rinse
    Wethood (Remove immediately or SU-8 will unstick
    Salare Systems
    1.1 Dry Let dry in ambient air
    Wethood
    Brewer Sciences Spin
    1.11 Hard Bake SU-8 135C 120min
    Developer

    Das könnte Ihnen auch gefallen