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Manufacturability
z Strategic Position:
Professional MEMS Technology Developer (Co‐Development)
& Manufacturing Platform Provider (Foundry Service)
z The First Professional MEMS Foundry in Taiwan
z The First 200mm MEMS Foundry in Taiwan
z MEMS Manufacturing Platforms Available
MEMS Industry
• Growing market, but fragmented: “Unique product with unique functions &
processes”
• Number of fab-less MEMS companies is growing
• Foundry and fab-less MEMS companies form manufacturing partnership.
• From 2007-2008, 25% MEMS units growth was accompanied with “only”
9% increase in value.
Unknown
failures Yield
IP Successful
protection Schedule Product
delay launch
Stiction
Funding
Material
Processing compatibility
Insufficient
difficulty Electronic
Design
Automation
Working with Foundry with Process Integration
Volume
production with
size & cost
3D WLP & CMOS reduction
integration
Thru-wafer (wafer thinning
Complexity
Bulk
Micromachining
Processing Trends
TMT’s Core Process Technology
TMT’s Core Process Technology
Interposer Platform
• An advance passive component targeting at high performance,
small form factor passive-only circuits.
Key Features:
z Ultra thin glass substrate (as thin as 150um)
z Thick Cu (10 um) as for inductor coil
z High‐Q Inductor: Q>50@6.4GHz
z High density MIM capacitor: 350pF/mm2
z Enabling Capacitors design with two types of
Capacitance Density ( 350pF/mm2& 4pF/mm2)
z Design kit / shuttle bus available
TMT’s Integrated Solutions
z CMOS‐MEMS & WLP Platform
Applications
z Accelerometer / Gyro / Inertial Sensor
z Micro‐mirror
z Microphone and oscillators
MEMS
z Nozzles / Micro‐channel
CMOS
z Silicon Optical Bench platform
Applications
z LED Light Engine / Display
MEMS Integration Strategy
Source: Chipworks
MEMS-CMOS Monolithic Integration
• Interleaved MEMS and CMOS
− inserting MEMS process before the back-end interconnect
metallization
− Ex. Analog Devices
− Challenges: MEMS processes intervene CMOS processes;
long development cycles
• MEMS First
− MEMS devices made prior to CMOS
− Ex. Sandia National Lab, SiTime
− Challenges: Surface topography, wafer cleanliness,
material property change
MEMS-CMOS Monolithic Integration
MEMS Via
MEMS Device
Top-1 metal
Top-2 metal
CMOS Circuitry
Flexible CMOS-MEMS platform
Cap Layer
MEMS Via
MEMS Device
Top-1 metal
Top-2 metal
Top-1 metal
Top-2 metal CMOS Circuitry
CMOS Circuitry
Summary