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experimental stress analysisChapter 5
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MAHESH HUDALI,
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Published on Jan 6, 2017
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experimental stress analysisChapter 5
1. 1. Experimental Stress Analysis Department of Mechanical Engineering Page 1 Unit 5: THREE DIMENSIONAL PHOTOELASTICITY The stressfreezing
method: In the stress freezing method, the model deformations caused by the applied loads are locked in the model. This is made possible by the diphase
behavior of many polymeric materials when they are heated. Polymeric materials are composed of hydrocarbon molecular chains. These molecular chains
exist in the material in two essential forms. One form is a well bonded, three dimensional networks, called primary bonds. Other one are occur in a form which
is less solidly bonded and are shorter compared to the primary bonds. When load is applied at room temperature both primary and secondary bonds resist
deformation. However, as the temperature is increased, the secondary bond looses gradually their ability to resist deformation. At particular temperature called
the critical temperature, the secondary bonds break down completely and the applied load is carried entirely by the primary bonds. Primary and Secondary
Bonds Consider a model made of such a diphase polymeric material and subjected to a given system of loading. Initially, at room temperature this load is
carried by the primary bonds and the secondary bonds together. Let the temperature be raised gradually until the critical temperature for the particular material
is reached. At this temperature, the secondary bonds break down, becoming soft jellylike material. The load is now taken up entirely by the primary bond.
With the load still on, the temperature is gradually reduced to the room temperature. During this
2. 2. Experimental Stress Analysis Department of Mechanical Engineering Page 2 process, the secondary bonds gradually solidify and lock the primary bonds
tend to regain their original unreformed configuration, but this is however prevented by the secondary bonds. Consequently, an equilibrium configuration is
reached which does not differ appreciably from the deformed configuration. Hence, the deformations are locked inside the model. One can describe
graphically the behavior of the diphase material by the spring ice analogy given by Frocht. In this, at ordinary conditions, the model is made of a set of springs
embedded in ice as shown in fig. Analogy for stresslocking. (a) Unloaded model at room temperature (b) Loaded model at room temperature (c) Loaded
model at critical temperature (d) Loaded model cooled to room temperature (e) Unloaded model at room temperature (f) Sliced model after unloaded and
coming to equilibrium position When the model is subjected to load P, both ice and springs resists deformation. If the temperature is now raised with the load
P still acting, the ice becomes water and the load is entirely carried by the springs. At this configuration, the model is cooled so that the water becomes ice
completely enclosing the deformed spring. If the load P is now removed, the springs try to regain their original unreformed configuration, but are prevented
from doing so by the surrounding ice. They attain some intermediate equilibrium position which doesn’t differ much from the completely deformed
configuration due to the volume of ice and its resistance. The importance of this locking in the deformation process lies in a very useful aspect which can be
seen from the spring ice analogy. If the assembly is now cut into thin slices, each slice will
3. 3. Experimental Stress Analysis Department of Mechanical Engineering Page 3 retain the corresponding parts of the deformed springs. This experiments
shown that even very thin slices can be carefully cut and polished without destroying their locked in bifriengement characteristics. It is this important aspect
that is extensively used in threedimensional photo elastic analysis. Scattered Light Polariscopes: Scattered Light Phenomenon. A scattered light polariscopes
differs in many respect from the conventional transmitted light polariscopes, and it is therefore usually advisable to construct a new polariscopes for scattered
light application rather than modify a transmitted light polariscopes. The schematic illustration of a simple scattered light polariscopes is presented in fig
below. In a scattered light polariscopes the light beam is usually projected in the vertical direction either upwards or downwards to permit the observation of
the scattered light pattern in the horizontal plane. The light source must be quite intense because of the inefficiency of the scattering process. For this reason a
1000W mercury arc lamp or a laser light source is usually employed
4. 4. Experimental Stress Analysis Department of Mechanical Engineering Page 4 together with a condenser lenses and an adjustable light slit to provide a high
intensity sheet of light which can be used to illuminate any plane in the model. The model is placed in the immersion tank. The tank contain same refractive
index as that of the model and the fluid so that the incident light enters the model without any refraction and also the scattered light leaves the model without
any refraction. The camera located in horizontal plane should be capable of rotation about the vertical axis of the polariscopes so that the scattered light pattern
could be photographed at any arbiter angle. Moreover, the polarizer located forward of the adjustable slit should be mounted so that it can be rotated to vary
the angle. Finally, it is sometime desirable to locate a compensator or a Q.W.P or both in the light path forward of the model. Mounting for these two elements
should be provided so that they can be freely rotated. Scattered light method: Scattered Light Phenomenon
5. 5. Experimental Stress Analysis Department of Mechanical Engineering Page 5 The scattered light method of photo elasticity is based on the scattering
characteristics of a wave of light as it passes through a transparent medium. To illustrate this scattering phenomenon, consider a wave of ordinary light
propagating in the Z direction and vibrating in the xy plane, as shown in fig. however, most materials do not transmit light perfectly, and some scattering of
the light occurs. This scattering can be viewed as a secondary set of vibrations which are excited by the main wave and which propagate radially outwards
from the scattering source. For a main wave of ordinary light propagating in the Z direction, the vibrations associated with the scattered light will all lie in
planes normal to z axes. Thus, when the scattered light is viewed along any ray which is normal to the Z axes, it will be planepolarized. For the purpose of
photo elasticity it may be assumed that the photo elastic material has an infinite number of scattering sources uniformly distributed throughout the material.
Therefore, the incident light will scatter at every point and will produce a secondary source of plane polarized light which propagates radially outwards from
the source. It is possible to use this polarization produced by the scattering of the light within a photo elastic model in place of either the polarizer or the
analyzer in a photo elastic polariscopes. This utilization of scattered light, which is equivalent to locating a polarizer or an analyzer in the interior of the model,
provides an approach to the general three dimensional problems. Since either the polarizer or the analyzer can be optically positioned at arbitrary planes in the
photo elastic model, stress information can be obtained without stressfreezing or slicing of the model. Scattered Light as an Interior Polarizer: Since the light
scattered within a photo elastic model at right angle to the direction of the incident beam is plane polarized, it can be used as either a polarizer or an analyzer.
Consider a beam of unpolarized light which enters through the model at point P. as the incident light beam passes through the model, each point along the
beam acts as a source of plane polarized light, the direction of vibration being mutually perpendicular to the direction of observation and the incident beam.
Consider first the light scattered from an interior point Q in the model. If the model is stressed, the polarized light scattered from point Q is resolved into two
components along the direction of secondary principal stress and . As the light propagates outward over the distance QR, a phase difference develops between
the two components. This phase difference can be measured by inserting an analyzer between point R and the camera. In this instance = ℎ ( − ) Where ( − ) is
the average value of − over the distance Q R
6. 6. Experimental Stress Analysis Department of Mechanical Engineering Page 6 Transmission of unpolarized light through a stressed medium If the line
which is illuminated is moved from PQ to P’Q’, the relative retardation observed at the camera will be given by = ℎ + ∆ℎ ( − ) = 1 ℎ( − ) + ∆ℎ( − ) = 1 ℎ( − ) +
∆ℎ( − ) ∆ The difference in retardations is due to the additional retardation ∆ acquired by the light in transferring the distance ′ = ∆ℎ. This value of ∆ can be
obtained from above equation ∆ = −
7. 7. Experimental Stress Analysis Department of Mechanical Engineering Page 7 ∆ = 1 ℎ( − ) + ∆ℎ( − ) ∆ − ℎ ( − ) ∆ = ∆ℎ ( − ) ∆ This can be rewritten as ( − ) ∆
= ∆ ∆ℎ By determining ∆ and measuring ∆ℎ it is possible to measure − over a centralized plane of observation of thickness ∆ℎ without slicing the model. In
practice, a sheet of light is used to illuminate a plane in the model rather than a line as indicated. The use of a sheet of light permits the determination of a
fringe pattern over the whole field of the plate. Scattered Light as an Interior Analyzer: Transmission of planepolarized light through a stressed medium
8. 8. Experimental Stress Analysis Department of Mechanical Engineering Page 8 Scattering light can be utilized to optically place a temporary analyzer on any
plane in the interior of the photo elastic model. Here an incident beam or sheet of plane polarized light is employed instead of an ordinary light. In this case,
the planepolarized incident beam is resolved as it enters the model into two components along the secondary principal axes associated with and . These two
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11/9/2018 experimental stress analysisChapter 5
components travel with different velocities along the secondary principle plane, and in travelling the distance P and Q they acquire a certain relative
retardation. The scattering source located at point P acts as an analyzer since the scattered light is polarized. The resulting image observed along line QC will
an intensity dependent upon the relative retardation acquired over the path PQ. If the line of observation is moved to Q’C’, the relative retardation varies,
depending upon the additional retardation acquired over the distance QQ’. Since QQ’=∆ℎ and the additional retardation acquired over the distance ∆ℎ is ∆ ,
the ratio ∆ /∆ℎ is the space rate of formation of retardation in successive planes normal to the incident light beam or light sheet. The ratio ∆ /∆ℎ is related to
the difference in secondary principal stress − lying in the plane normal to the incident light by ( − ) ∆ = ∆ ∆ℎ
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