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The minimum HF concentration and time for proper bonding to lithium disilicate ceramics
is 5% and 20 seconds.
(=1 mm) were made on each EMX surface, lithium disilicate glass ceramic and resin cement by
which was then stored in deionized water at promoting a better infiltration to the superficial
378C for 24 hours before testing. The lSBS was irregularities of the etched ceramic surfaces.4
in a universal testing machine at a crosshead The etching efficiency of HF depends on the
speed of 1 mm/min until failure. Data were concentration, etching time, temperature, and dilu-
submitted to two-way analysis of variance, and tion of the acid solution.4,10,11,15,18 The manufacturer
multiple comparisons were performed using of IPS e.max Press (EMX; Ivoclar Vivadent, Schaan,
the Tukey post hoc test (a=0.05). One repre- Liechtenstein), a commercial brand that presents
sentative EMX sample was etched according to 670 vol% of lithium disilicate crystals dispersed in
the description of each subgroup and evaluat- an amorphous vitreous phase, recommends that
ed using scanning electron microscopy for EMX should be etched with a 4.8% HF concentration
surface characterization. The HF concentra- for 20 seconds. However, several clinical reports and
tions of 5%, 7.5%, and 10% provided significant- in vitro studies, published from 2011 to date, have
ly higher lSBS values than 1% and 2.5% reported different HF concentrations and etching
(p,0.05), regardless of the etching times. For periods on lithium disilicate ceramic, such as 10% for
1% and 2.5% HF, the etching times from 40 to 15 seconds,19 10% for 20 seconds,6,7,10,20-22 9.6% for
120 seconds increased the lSBS values com- 30 seconds,23 9.5% for 60 seconds,3 4.8% for 60
pared with 20 seconds (p,0.05), but etching seconds,24,25 5% for 60 seconds,26 and 4.8% and 5%
periods did not differ within the 5%, 7.5%, and for 20 seconds.27-29 Thus, a consensus regarding the
10% HF groups (p.0.05). The effect of re- most suitable etching protocol for glass ceramics is
etching was more evident for 1% and 2.5% HF not clear,30 especially for lithium disilicate glass
(p,0.05). Different HF concentrations/etching ceramics.
times directly influenced the bond strength
Although the effects of HF on glass ceramics are
and surface morphology of EMX.
elucidated in the literature, there have been no
reports that specifically associated different HF
INTRODUCTION
concentrations with increased etching times on the
Glass ceramic materials have been widely used in bond strength of EMX. In addition, given the
dentistry to restore lost/fractured/decayed teeth. hazardous nature of HF,17,18 it is important to
Their optimum properties, adhesion ability to discuss how lower HF concentrations and different
dental tissues,1 high esthetics, biocompatibility, etching times would influence the bonding charac-
and thermal expansion similar to the tooth struc- teristics of EMX and, consequently, guide the
ture are the key factors for their adoption by dental clinician toward the more adequate etching protocol
practioners.2-4 Glass ceramic reinforced by lithium to be adopted.
disilicate crystals has shown excellent clinical Therefore, the purpose of this study was to
outcomes with great optical/mechanical proper- evaluate the effect of different HF concentrations
ties5-7 and high survival rates over time.8,9 associated with varied etching times on the micro-
The clinical success of ceramic restorations de- shear bond strength (lSBS) and surface morphology
pends on several factors, such as ceramic composi- (scanning electron microscopy [SEM] analysis) of
tion and luting procedures.10 The ideal bonding to EMX luted with a resin cement. The hypotheses
lithium disilicate glass ceramic is achieved with the tested were 1) HF concentrations affect the lSBS
sum of etching with hydrofluoric acid (HF) followed and the etched surface morphology and 2) different
by a silane coupling agent. This protocol has been etching times affect the lSBS and the etched surface
recognized as the most accepted surface treatment morphology.
for glass ceramics.3,4,11,12 HF has the ability to
condition the ceramic surface, since it removes the METHODS AND MATERIALS
glassy matrix and exposes the lithium disilicate Fabrication of the EMX Specimens
crystals.4,13-15 As a consequence, an increased sur-
face area for micromechanical entanglement is Two hundred seventy-five ceramic blocks of EMX (8
promoted, improving the interaction between ceram- mm 3 8 mm 3 3 mm thickness), shade LT A2, were
ic and resin cement with increased bond fabricated in accordance with the manufacturer’s
strength.1,3,4,15-17 Also, the use of a thin layer of instructions and detailed in a previous study.4
unfilled resin prior to the resin cement improved After divestment, the EMX blocks were wet
bond strength and the interfacial quality between polished with silicon-carbide abrasive papers (600-,
Puppin-Rontani & Others: Hydrofluoric Acid Concentration and Bonding
1200- and 2000-grit; Norton SA, São Paulo, SP, resin cement cylinders.4 Afterward, both vertical
Brazil) in an automatic polisher (APL4; Arotec, load and glass slab were removed and the resin
Cotia, SP, Brazil) to obtain a flat and polished cement cylinders were light-cured for 40 seconds
surface. Then, all EMX blocks were ultrasonically using an LED source with an irradiance of 1000 mW/
cleaned (MaxiClean 750; Unique, Indaiatuba, SP, cm2 (Valo Cordless). All specimens were stored in
Brasil) in deionized water for 20 minutes and dried deionized water for 24 hours at 378C. Then, the
with compressed air. elastomer mold was sectioned with a No. 11 scalpel
blade and carefully removed. Each resin cement
EMX Surface Treatments cylinder interface was analyzed with optical micros-
The EMX blocks were randomly assigned into five copy (Olympus Corp, Tokyo, Japan) at 403 magni-
groups (n=50) according to the HF concentrations: fication, and those presenting any flaws or defects
1%, 2.5%, 5%, 7.5%, and 10% (Fórmula & Ação, São were eliminated and replaced. Three cylinders were
Paulo, SP, Brazil). A new random distribution was built on each EMX surface, totaling 30 cylinders for
performed into five subgroups (n=10) according to each group.
the etching times: 20, 40, 60, 120, and 20 þ 20 The lSBS test was performed in a universal
seconds. After etching, each EMX surface was rinsed mechanical testing machine (model 4411; Instron,
with oil-free compressed air/water spray for 30 Canton, MA, USA) using a thin steel wire (0.2 mm in
seconds. For the re-etched group (20 þ 20 seconds), diameter) at a crosshead speed of 1 mm/min until
the EMX surface was rinsed as described previously failure. A mounting jig was used for the parallel
and air dried before the second etching procedure, alignment of the ceramic-resin cylinder interface to
which focused on simulating the retreatment after the testing device. The steel wire was looped around
clinical contamination of the etched surface.18 After each resin cement cylinder and aligned with the
etching, all EMX blocks were ultrasonically cleaned bonding interface. The fractured specimens were
(MaxiClean 750) in deionized water for 20 minutes observed under optical microscopy (Olympus) at 403
and dried for 30 seconds. magnification, and the mode of failure was classified
One layer of a silane coupling agent (RelyX as follows: adhesive (mode 1), cohesive within
Ceramic Primer, 3M ESPE, St Paul, MN, USA) ceramic (mode 2), cohesive within resin cement
was applied to the entire etched EMX surface and (mode 3), and mixed, involving resin cement and
left in contact for 60 seconds, followed by air heat ceramic (mode 4).
drying for 60 seconds to accelerate the water/alcohol
evaporation. Then, all EMX surfaces received a thin SEM Analysis
layer of photo-activated unfilled resin4 (Scotchbond
MultiPurpose, 3M ESPE). The excess was removed One representative etched EMX specimen of each
with a microbrush and dry air from a dental syringe group was submitted to SEM analysis to depict the
for five seconds and light cured for 20 seconds using etched surface morphology. The EMX blocks were
a light-emitting diode (LED) device (Valo Cordless, mounted on aluminum stubs, sputter coated with
standard mode; Ultradent Inc, South Jordan, UT, gold (SCD 050; Balzers, Schaan, Liechtenstein) for
USA) with an irradiance of 1000 mW/cm2. 120 seconds at 40 mA, and examined by SEM (JSM
5600 LV; JEOL, Tokyo, Japan) with 20003 magni-
lSBS Testing Procedures fication and operated at 15 kV by the same operator.
Figure 1. Experimental design of the study. After etching (A), 1) silane was applied to the ceramic surface, followed by a thin layer of unfilled resin
light-cured for 20 seconds; 2) an elastomer mold with cylinder-shaped orifices was positioned onto the surface; 3) orifices were filled with resin cement
(Variolink II); 4) a mylar strip and glass slab were placed over the filled mold; 5) cementation load was applied for 2 minutes; 6) light curing of the resin
cement was carried out for 40 seconds. (C) Microshear bond strength testing.
contact for longer periods with the EMX surface, concentration for more than 60 seconds18 or for 90-
there will be more time available for ionized HF to 180 seconds.33 Such difference reaffirms that the
react with silicon (glassy matrix), thus removing etching effect of HF depends on the composition of
more vitreous phase and, consequently, creating the glass ceramic. Since EMX has a lower content of
more surface irregularities for the mechanical glassy matrix (630 vol%) than leucite-reinforced
entanglement with the resin cement by the greater glass ceramic (670 vol%), a lower formation of silicon
exposure of lithium disilicate crystals. HF etching tetrafluoride (SiF4) is expected (see reaction 1); SiF4
with 2.5% for 120 seconds was the concentration is a crystalline residue deposited on the glass
below 5% that mostly resembled 5% HF applied for ceramic surface18,30,34 that acts as a physical barrier
20 seconds. Although the lowest concentration of HF and may hamper further HF etching.
is desired because of the hazardous nature of HF,31 The increased etching times did not lead to higher
etching for 120 seconds is time-consuming, which is lSBS values for 5%, 7.5%, and 10% HF concentra-
not efficient for the clinical office. tions. It may be claimed that 1) higher HF
The results of the present study are not in concentrations do not need extended etching times,
agreement with those of previous reports, which as the amount of ionized HF is enough to properly
have found decreased bond strength when a leucite- dissolve the glassy matrix of EMX for 20 seconds,
reinforced glass ceramic was etched with 10% HF and 2) the limited effect of HF concentrations is due
Puppin-Rontani & Others: Hydrofluoric Acid Concentration and Bonding
Figure 4. SEM images (20003 magnification) of etched EMX surfaces made with 5% HF concentration. Different etching patterns can be observed
for different etching periods. (B) (5%, 40 seconds), (C) (5%, 60 seconds), and (D) (5%, 120 seconds) show a gradual increase of the vitreous phase
dissolution and the exposure of lithium disilicate crystals compared with (A) (5%, 20 seconds), which shows the lowest glassy matrix removal. (E)
(5%, 20 þ 20) shows a similar etching pattern to (B) (5%).
to the combination of buffering and dilution of the only, which presented statistically similar bond
etchant by the crystalline residue.18 For 1% and strength values to 40 seconds. Thus, renewing the
2.5% HF concentrations, the bond strength was HF may be done in the case of accidental contami-
higher when the etching period was extended, which nations of the etched surface, but if the clinician
might be explained from the reduced effect of SiF4 seeks higher bond strength values, re-etching is not
(assumed for the higher content of vitreous phase necessary.
seen on the EMX surface; Figs. 2 and 3) on the A slight increase of mixed failures was observed
etching capability of HF. Thus, it may be hypothe- for 5%, 7.5%, and 10% HF concentrations, irrespec-
sized that 1% and 2.5% HF concentrations initially tive of the etching times. The glassy matrix dissolu-
form a lower amount of SiF4 because of the lower tion is higher and the penetration of the resin
content of ionized HF available to react with the cement is adequate, although not complete.4,30 On
silicon. Hence, a lower initial physical barrier is the other hand, adhesive failures were more fre-
created, which allows HF to continue reacting with quent for the HF concentrations of 1% and 2.5%,
the glassy matrix for increased etching times, which might point to poor bonding quality for lower
leading to higher lSBS values. HF concentrations, a situation also found by Sund-
It was expected that the re-etching would increase feld Neto and others.4
the aggressiveness and depth of the glassy matrix In summary, the lSBS results and SEM analysis
dissolution.18 Furthermore, re-etching was also have shown that different etching times and HF
expected to possibly attenuate the effect of SiF4, as concentrations have significant effects on the surface
it is soluble in water35 and the air/water spray would morphology/lSBS of EMX. Adequate etching times
have removed it from the etched surface before the and HF concentrations are crucial for optimal
further new conditioning. However, re-etching pro- bonding properties and clinical performance/longev-
vided higher bond strength values for 1% and 2.5% ity. Dental professionals should take care during
Operative Dentistry
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