True 3D Laser Lithography

2 µm
 Company Background
Company

Nanoscribe is a research spin-off of the Karlsruhe

Institute of Technology (KIT), the merger of the
University of Karlsruhe (TH) and the Forschun-
gszentrum Karlsruhe GmbH (National Labora-
tory of the Helmholtz Association).
The company was founded in 2007 by lead-
ing scientists in the field of photonic crystals
and metamaterials. A close interdisciplinary
collaboration with scientists both in Karlsruhe
and internationally provides the basis for fore-
front technical developments specially designed
for the needs of researchers. In 2008, following
a close collaboration, Carl Zeiss AG invested into
2 this innovative technology, now holding 40% of
the company’s shares.

Company Philosophy Contact Persons

Nanoscribe is set on transferring cutting-edge Please feel invited to contact us in case of any
technology to versatile and user-friendly systems questions or inquiries.
for three-dimensional (3D) nano- and microfabri- »» Martin Hermatschweiler (CEO)
cation. We pay particular attention to the needs management, finance, press
of our customers: Nanoscribe cultivates intense »» Dr. Georg von Freymann (CTO)
connections with customers, partners and com- technology, production, teaching
ponent suppliers to develop the best solution for »» Steffen Holtwick (CMO)
your application. sales, marketing
We assure highest quality and fast cycles of inno- »» Dr. Holger Fischer
vation, expanding our market leadership and engineering, service
technological leadership in 3D laser lithography.

True 3D Laser Lithography Systems
Nanoscribe develops and manufactures compact
and easy to operate laser lithography systems,
allowing for true 3D micro- and nanostructures
in various commercially available photoresists.
Applications are, e.g., in photonics, micro-optics,
micro-fluidics and life sciences.
Our unique technology is specially designed for …
»» … true 3D micro- and nanostructuring
»» … ultra-precise fabrication with feature sizes
ranging down to 100 nm
»» … compact, comfortable and easy to use laser
lithography systems
Portfolio
3
Fabrication of Custom-Built Structures
Nanoscribe manufactures samples at cus-
tomer order and compiles custom designs for
specific structures. These samples comprise, e.g.,
photonic crystals as well as artificial extra-cellular
matrices for various experiments in life sciences.
Advanced Photoresists
Nanoscribe conducts intensive research and
development on novel photoresists for 2D and
3D lithographic applications. Complete photo-
resist systems comprising samples and appro-
priate developers or etchants are provided.
Casting and Coating
Nanoscribe has in-depth knowledge of a broad
bandwidth of casting and coating processes, e.g.,
single and double inversion of polymer struc-
tures into dielectrics as well as metals. We offer
expert advice on the implementation of custom-
ized installations.
Technology
Basic Principles of Direct Laser Writing
The technique of direct laser writing allows for
the fabrication of almost arbitrary 3D nanostruc-
tures in suitable photoresists. It is based on multi-
photon polymerization, a non-linear optical effect.
The center wavelength of the laser is chosen so
that the photoresist is transparent since the one-
photon energy lies well below the absorption
edge of the material. By tightly focusing the light
of an ultra-short pulsed laser, the intensity within
the very focus is sufficiently high to expose the
photoresist by multi-photon absorption. This
process causes a chemical and / or physical
change of the photoresist within a small volume
pixel (“voxel”) that can be scaled by the laser
power.
This voxel typically is of ellipsoidal shape and is
the basic building block for the fabrication of
3D structures. By moving the sample relative to
the fixed focal position, arbitrary paths can be
written into the material. You can consider this
like using a nanometer-sized pen that draws in
three dimensions.
The movement of the sample and the adjust-
ment of the laser intensity are synchronized by
a computer. Later on, the material change due to
exposure to the laser light and potentially a sub-
sequent thermal treatment leads to a chemical
selectivity between unexposed and exposed
volumes inside a developer bath. Depending on
the photoresist, either exposed (positive-tone
resist) or unexposed regions (negative-tone
resist) are removed.
The advantages of multi-photon polymerization
are evident:
»» Ability to structure truly three-dimensional, no
matter how complex your structure may be.
»» Superior resolution due to the non-linear
response of the photoresists.
»» Flexibility: The ability to structure truly 3D
implies also the special, simplified cases of
planar structuring (2D) or complex surface
topologies that are suited for mass fabrication
via pattern transfer technique (2½ D).

Sample Fabrication Procedure
The course of sample fabrication is simple:
Blanks are usually produced by spin coating of a
photoresist onto a glass substrate and subse-
quent mounting in matched substrate holders
which are again inserted into the lithography
system. The desired structures are typically
programmed in a specialized general writing
language (GWL) that is well adapted for 3D struc-
tures. Alternatively, the structure data is imported
3D
2D
2½ D
Technology
5
from common CAD data format (DXF) or a stereo
lithography file (STL). The system visualizes the
loaded structure data, automatically approaches
the designated sample and adjusts the focus
to the interface. By command the lithography
system exposes the sample. The system is capa-
ble of automatically processing multiple samples
in succession. Finally, the samples are developed
and post-processed.
In mathematics and physics,
the dimension of a space or
object is informally defined as
the minimum number of coor-
dinates needed to specify each
point within it. Thus an array
of lines has a dimension of 2
2½ D (2 D) since two coordinates are
needed to specify a point on it.
2½ D is the construction of a
3 D environment from 2 D reti-
nal projections.
Photonic Professional

Photonic
Professional
True 3D Laser Lithography System

6
Photonic Professional
7
 Basic Features
Photonic Professional

The Nanoscribe 3D laser lithography system

“Photonic Professional” is designed for true 3D
micro- and nanostructuring of photosensitive
media, e.g., organic photoresists (like SU-8, IP-L,
IP-G), hybrid materials (ormocere) or the amor-
phous semiconductor As2S3—materials which
are capable of two-photon polymerization.

PerfectShape™
PerfectShape™ is a routine of our control soft-
ware NanoWrite (see also page 9), automatically
adjusting the laser power with respect to the
8 actual writing speed while preventing over- or
underexposure of the resist in the case of varying
writing speeds (e.g., at the beginning and the end
of lines or during sharp turns). It also ensures a high
positioning accuracy along the writing path,
where sharp corners and bends may appear (see
images below).
PerfectShape™ OFF
PerfectShape™ ON
Autofocus
A unique feature of Nanoscribe’s laser litho-
graphy systems is an autofocus. Due to patented
technology, the interface between substrate and
photoresist is determined exactly and autono-
mously. This establishes the basis for reliable
anchoring of your structures to the substrate—
may these structures be 2D or 3D.
The lithography systems automatically approach
the focusing objectives to the blanks and adjust
the focus to a designated elevation in reference
to the interface. Based on this unique techno-
logy, the lithography systems also offer a fully
automated substrate tilt measurement and
correction feature.
A motorized scanning stage combined with the
autofocus system and tilt correction allows for
the automated fabrication of large-area struc-
tures on numerous samples in a row.
 Photonic Professional
9

NanoWrite
One of the key features of Nanoscribe’s laser
lithography systems is the user-friendly software.
A functional and intuitive user interface consid-
erably simplifies the realization of your structure
design. The software provides easy access to all
adjustable features of the lithography system.
NanoWrite has the ability to load GWL files (script
language developed by Nanoscribe to define
the writing of 3D structures, specialized on the
writing tasks in two and three dimensions) and
to import CAD data from common DXF files as
well as stereo lithography files (STL). The user
interface provides a visualization of the structure
data as well as a live camera view of the sample.
DeScribe
DeScribe is our GWL script editor which helps to
build command lists for the NanoWrite software.
Its main features are:
»» GWL syntax highlighting
»» Well-arranged list of all GWL commands
»» Completion proposal
»» Add code with help comments
»» Text comparison (e.g., old script file and
recently updated script)
»» Bookmarking
»» Advanced text search and replacement
»» Simple inclusions of pre-defined
template files
»» Open files via drag-and-drop and via an
internal file explorer
Photonic Professional

10

Isointensity curves Isointensity curves

without SRF 600 by using an SRF 600

400 400

200 200
axial (nm)

axial (nm)

0 0

-200 -200

-400 -400

-600 -600

-500 0 500 -500 0 500

lateral (nm) lateral (nm)
The basic building The basic building
block geometry 500 block geometry 500
(“voxel”) without (“voxel”) by using
SRF an SRF
z (nm)

z (nm)

0 0

-500 -500
200 200
0 200 0 200
0 0
m) m)
y

x (n x (n
(n

-200 -200
(n

-200 -200
m

m
)

)
Options
Besides the aforementioned standard compo-
nents and features of Nanoscribe’s Photonic
Professional system, we offer the following
additional options which can be adapted to your
specific needs.
Shaded-Ring Filter
Nanoscribe’s shaded-ring filters (SRFs) are spe-
cially designed to achieve a maximal resolu-
tion in three dimensions. The axial resolution
is increased by more than 28% with respect to
operation without this special optic. This com-
ponent is essential if you intend to work at the
physical boundaries of photolithography.
Positioning Systems
In addition to the piezo-electrical scanning stage
and the manual stage, further positioning solu-
tions are available. A motorized scanning stage
with a travel range of 130 mm by 100 mm is
fully controllable via the software and allows for
laterally stitching together neighboring writing
volumes of the piezo to large sample areas as
well as direct writing by moving the motorized
scanning stage which is especially favorable for
large-scale microstructuring. Additionally, con-
secutive and automated processing of multiple
samples is possible.
Substrate Holders
Nanoscribe offers several specially designed sub-
strate holders. The most established version is a
holder for 10 round cover slips with 30 mm diam-
eter. Individual designs for particular substrates
can easily be implemented for dimensions of up
to 125 x 125 x 3 mm3.
Photonic Professional
Objectives
The microscope possesses an automated objec-
tive revolver that is controlled by the software.
A variety of oil immersion and air objectives are
available. Depending on feature sizes, processing
speed, and substrate properties, your lithography
system is tooled up with dedicated objectives. 11
Coupling of External Lasers
If you already have a suitable femtosecond-laser,
the lithography system can be adapted to be
operated with this external light source. Please
contact us regarding the eligibility of your laser.
Vibration Isolating Tables
We strongly recommend operating the system
on a vibration isolated table. Suitable optical
tables can be obtained from us on request.
Auxiliary Equipment
Auxiliary equipment for the sample preparation
(spin coater, hot plate, developer glassware) as
well as measuring tools (e.g., to determine the
sample thickness) can also be provided by Nano-
scribe. We are glad to assist you in order to make
your entrance into the third nano-dimension as
smooth and comfortable as possible.
 Areas of Application
Areas of Application

Courtesy of T. Striebel and M. Bastmeyer, KIT (Germany)

The advantages of multi-photon polymeriza-

tion recommend our systems not only the ideal
candidate for highly specialized tasks, but also
an excellent generalist for manifold demands
and activities, e.g., in instrument pools of nano-
fabrication centers. This versatility is also
reflected in the field of applications.

Most prominently one can find our systems

actively in operation in following research areas:
»» Photonics
photonic crystals, metamaterials, diffractive
optics, distributed feedback lasers, photonic
Courtesy of F. Klein and M. Bastmeyer, KIT (Germany)
ring resonators
12
»» Micro Optics
micro optical devices, integrated optics
»» Micro Fluidics
lab-on-a-chip systems, development of
substances, analysis
»» Life Sciences
cell migration / stem cell differentiation / cell
growth studies, tissue engineering
»» Nano- and Microtechnology
mask manufacturing, examination of Gecko
and Lotus effect
10 µm

Courtesy of F. Klein, T. Striebel, and M. Bastmeyer, KIT (Germany)

10 µm
 Areas of Application
See also: M. Thiel et al., Adv. Mater. 21, 4680 (2009)

13

10 µm
 Applicable Photoresists
Photoresists
Nanoscribe continuously evaluates and develops
photoresists for 2D and 3D applications. Listed in
the following is a series of standard resists either
commercially available from Nanoscribe or other
suppliers. Please consult us to identify the photo-
resist best fitting your requirements.
10 µm
14
1. IP-L and IP-G
Nanoscribe’s family of IPx photoresists is
specifically designed for the demands of true 3D
laser lithography by two-photon polymerization:
Extraordinary resolution in three dimensions
combined with high mechanical stability. Both
formulations available (IP-L, IP-G) are acrylic-
based negative-tone resists—ideal candidates,
e.g., in the field of photonics.
Basic Features:
»» Feature sizes smaller than 100 nm
»» Low proximity effect
»» Low stress
»» Little shrinkage
»» Good adhesion on glass substrates
»» Easy handling:
drop-casting of the photoresist
no pre-bake (IP-L)
no post-exposure bake (IP-L, IP-G)
Courtesy of I. Staude and M. Wegener, KIT (Germany)
1 µm
 Photoresists
2. SU-8 (25, 50, 100, 3000-series)
The resists of the SU-8 series are common
negative-tone resists provided by MicroChem
Corp. They are commercially available, inexpen-
sive and their handling is unpretentious.
SU-8 is available in different viscosities, depend-
ing on the desired film thickness. The mechanical
and chemical properties make it ideally suited for
many different applications in the field of micro-
fabrication.

See also: M. Thiel et al., Opt. Lett. 35, 166 (2010) See also: M. Thiel et al., Appl. Phys. Lett. 91, 123515 (2007)

15

5 µm 4 µm

M. Deubel, PhD thesis (2006), KIT (Germany) See also: M. Thiel et al., Opt. Lett. 32, 2547 (2007)

2 µm 10 µm
Photoresists

See also: S. Wong et al., Chem. Mater. 19, 4213 (2007)

16
500 nm

See also: S. Wong et al., Adv. Mater. 18, 265 (2006) 3. Chalcogenide Glass (As2S3)
Nanoscribe provides a high refractive index
resist system for 3D micro- and nanolithography.
This negative-tone photoresist system is based
on arsenic trisulfide (As2S3) and has a refractive
index of 2.45. In combination with the 3D laser
lithography system, it enables the fabrication
of manifold structures such as photonic wave-
guides, couplers, splitters, resonators, and 3D
photonic crystals, all of which benefit from a
500 nm
material with an inherently high refractive index.

See also: S. Wong et al., Adv. Mater. 18, 265 (2006) Basic Features:
»» High refractive index:
n = 2.45 (at 1550 nm wavelength)
»» Feature sizes down to 200 nm
»» Low stress
»» Little shrinkage
»» Easy handling:
no pre-bake
no post-exposure bake

1 µm
 Photoresists
Courtesy of T. Striebel and M. Bastmeyer, KIT (Germany) Courtesy of T. Striebel and M. Wegener, KIT (Germany)

17
10 µm 2 µm

4. Ormocere
These organically modified ceramics are devel-
oped by the Fraunhofer-Institut für Silicat-
forschung (ISC) Würzburg, Germany.
Please contact us or refer to www.ormocer.de for
detailed information.

5. PDMS
Polydimethylsiloxane is a silicon-based organic
polymer with variable physical properties. This
viscoelastic and inert resist is biocompatible and
particularly applicable in life-sciences.

6. AZ MiR 701, AR-P-3120

Thin film positive-tone resists used in semicon-
ductor industry for 2D structuring.

7. AZ 5214
Thin film negative-tone resist for 2D structuring.

8. AZ 9260
Thick film positive-tone photoresist used for, e.g.,
electrodeposition in the resulting air voids.
2 µm
Service and Casting
18
Services
Design and Manufacturing of Samples
Nanoscribe offers the services of designing and
manufacturing client-specific samples in com-
mercially available photoresists. Customers may
submit complete structures as CAD, STL or GWL
data or solely provide descriptions and blue-
prints as guideline for the implementation of
the structure by Nanoscribe. The expenses for
structures depend on size, complexity, substrate
and resist material. Please inquire for a customized
quotation.
Casting and Coating
Nano- and microstructured devices often solely
reveal their full functionality when not only their
shape is given but also the material requirement
is fulfilled. In the last decade, a broad variety of
casting techniques has been developed in order
to transfer complex photoresist structures into
materials such as metals, semiconductors or
oxides. Nanoscribe has in-depth knowledge
in casting and coating processes and offers
expert advice on process know-how and the
implementation of customized installations.
For example, the casting of a polymer structure
into silicon can be achieved by two alternative
routes: The structure can either be inverted via a
single-inversion method (SI, left column on page
19) or replicated via a double-inversion method
(DI, right column on page 19).
Both processes involve pulsed-layer deposition
of silica which is done at room temperature.
The silica coating protects the template from
high temperatures and aggressive chemicals. For
the DI method, it also serves as an inverse tem-
plate. After this intermediate step, silicon is de-
posited in the remaining interstitial air voids via
chemical-vapor deposition. Finally, the interme-
diate materials silica (DI) as well as the polymer
(SI) are removed. As a result, the inverse of the
original structure transferred into silicon (SI) or
its replica (DI).
 Service and Casting
See also:
M. Hermatschweiler et al., Adv. Funct. Mater. 17, 2273 (2007)
N. Tétreault et al., Adv. Mater. 18, 457 (2006)

19
500 nm
20

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Germany

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Version 2.1
12/01/2010
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