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EXFOLIATION AND MODIFICATION OF MOLYBDENUM DISULPHIDE
GOPIKA M S
1
 & B. BINDHU
2
 
1
 Research Scholar, Department of Physics, Noorul Islam Centre for Higher Education, Kumaracoil, Tamil Nadu, India
2
Professor, Department of Physics, Noorul Islam Centre for Higher Education, Kumaracoil, Tamil Nadu, India
 
 ABSTRACT Two dimensional layered materials MoS
 2
 have attained an increasing scientific interest owing to its remarkable thermal, electrical and mechanical behaviours. Excellent property enhancement is possible on exfoliation of bulk MoS
 2
 into  monolayers. In the present work the exfoliation of MoS
 2
 into a few layers is achieved by the use of a modifier CTAB. The  treated MoS
 2
 is analysed using Fourier transform infrared spectroscopy. The presence of few layers is confirmed through TEM and SEM.  KEYWORDS: Modification, MoS
 2
 , layered materials & Exfoliation
 
Received
: Nov 28, 2019;
Accepted
: Dec 18, 2019;
Published
: Feb 07, 2020;
Paper Id
.: IJMPERDFEB202054
1. INTRODUCTION
Graphene have exceptional properties that giving rise to an extensive application of the material in many research fields. After graphene, there has been increased interest in the two dimensional layered materials. The Transition Metal Dichalcogenides and Metal Oxides have gained much importance. The transition metal in TMDs includes Molybdenum, Vanadium, Niobium etc and the chalcogens used were Sulfur, Selenium and Tellurium etc. The individual sheets are linked together by weak Van der Waals force [1]. Initially 2D graphene extraction was done using the scotch tape method and after that various exfoliation techniques with the aid of different chemicals were followed. Through these techniques Yao et al., [2] were able to produce graphene. The advantage in most of the layered materials is the strength of in-plane bonds in an individual layer and weakness of interaction between the layers due to Van der Waals force. This paves way for the separation of individual sheets having a good strength. This results in excellent property enhancement in an atomic level. Due to 2D structure, these class of material exhibit surface effects thereby paving way for suitable surface modification using different chemical surfactants. Most of them can be synthesised into
nanoflakes
and this enables its incorporation into other matrix material for the formation of composites with excellent properties [3]. Very small thickness of the material in an atomic scale enables the facile processing and application in electronic devices. The 2D layered materials may possess zero band gaps which can be exploited in optoelectronic devices. Most of them exhibit transparency, which finds application as electrodes in devices. 2D structures possess extreme strength which can be coupled with polymers for enhanced mechanical properties for a light weight applications. In this work we have chosen MoS
2
 which is a layered structure. MoS2 is a TMD which overcomes most of the drawbacks possessed by 2D layered materials especially graphene. Unlike graphene MoS
2
 possess the band gap which makes it excellent for electronic applications. It is used in energy storage, sensing and catalysis [3]. For the application of MoS
2
 the bulk layered structure is to be exfoliated into two dimensional monolayers [4]. This resulted in the research on TMDs which are layered structures and can be exfoliated by techniques similar to that
 Oi   gi  n al  A t  i   c l   e 
International Journal of Mechanical and Production Engineering Research and Development (IJMPERD) ISSN(P): 2249–6890; ISSN(E): 2249–8001 Vol. 10, Issue 1, Feb 2020, 665-674 © TJPRC Pvt. Ltd.
 
666 Gopika M S & B. Bindhu  Impact Factor (JCC): 8.8746 SCOPUS Indexed Journal  NAAS Rating: 3.11
 
of graphene. The general chemical formula for TMDs is MX2, where M denotes transition metal and X stands for chalcogens. MoS2 possesses remarkable properties like direct band gap, lubrication effect, catalyst property etc [5 - 7]. Radisavljevic et
al.,
reported that the direct band gap of single layer MoS2 is about 1.9eV, while the indirect band gap of bulk MoS2 is around 1.2eV [8]. This change in the band gap of MoS2 is possible because of the quantum confinement effect in the material. The structure of MoS
2
 is a sandwich layer of S-Mo-S, possessing strong bonds within the layers and each layer is being connected by weak Van der Waals interaction [9]. The weak interaction between the layers enables the easy exfoliation of the bulk MoS
2
 into monolayers. There are different types of exfoliation techniques like covalent functionalization, [10] ultrasonication, [3] shear mixing [11] and addition of surfactants [12]. The main advantage in exfoliation of a layered material is an increase in the surface area of the material and this paves way for more nano effect in it [13]. Though MoS2 was considered and used as a layered material, its importance and usage increased after the realization of the properties of 2D MoS2 and this resulted in a lot of research in this area. The quantum size effect of MoS2 is realized in its 2D from. Single MoS2 sheet have a centrosymmetric structure, with Molybdenum atom sandwiched between Sulphur atoms. The material becomes highly inert to Oxygen or even liquids in this state. This is because of the absence of bonds at the edge of basal surface. A Strong intralayer bonding was accompanied by a weak interlayer bonding results in very good properties. The direct band gap of the material on exfoliation is exploited in the photoluminescent applications. The charge carrier mobility of exfoliated sheets is very less than the layered form. High dielectric material can be coated on the surface of the exfoliated sheets for increasing the mobility. This was done through the suppressing coulomb scattering effect. The material through certain treatments can be used in transistors, which are applicable in a sensing application. There are
different
techniques for the preparations of 2D exfoliated MoS2 sheets [14]. The main approaches are bottom-up and top-down techniques. The solvothermal and CVD techniques are come under the bottom-up approach. The mechanical cleavage and the liquid phase exfoliation techniques are top-down approaches. Coleman proposed a method for the exfoliation of graphite that is free from the defect and which also can be useful in the exfoliation of other layered materials like MoS2 [15]. In this method the graphite dispersed in a liquid is sonicated and graphene sheets are obtained in a large scale. The stabilization of the graphene sheets are done by the addition of some solvent or polymer or some surfactant. The sheets on analysis were known to be free from oxide. The dispersive state and exfoliation of different layered structure in various solvent were analysed by Cunningham et al., and it was found that the materials exhibited variation in dispersion state with a different solvents on ultrasonication [16]. Yao et al., reported the synthesis of two dimensional material in large quantities by the ball milling technique followed by ultrasonication of the samples [2]. The ball milling separates the sheets and the sonication process creates smaller crystal structures which are stable. May et al., [17] analysed the exfoliation and stabilization of the 2D layered materials in various polymers by dissolving them into two separate solvents. They evaluated the solubility parameter of all the three phases. It was found that the polymer is stabilized when the value of solubility parameter of the exfoliated sheets, solvent and polymer are the same. There are various chemical assisted the liquid phase techniques for the exfoliation of TMDs [18]. The different types of intercalation compounds formed out of this exfoliated structures were also discussed. The merits of the chemical technique over the other
conventional
methods for the preparation of intercalation compounds were also conferred. After the exfoliation process the MoS
2
monolayers are more probable for restacking. In order to avoid this, the exfoliated MoS
2
 sheets are to be properly modified using surfactants. It is also possible to incorporate guest species in
 
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between the layers of MoS
2
. While introducing the exfoliated MoS
2
 into the guest species like polymers the uniform dispersion of the MoS
2
 is very important, because the property enhancement solely depends on the homogeneous dispersion of the filler [19]. This can be achieved through the modification of MoS
2
with the suitable modifier. 2D MoS2 can be a surface modified using certain types of surfactants. This results in stability of the MoS2 layers. But the amount of surfactant incorporated while synthesizing is also to be considered, because too much of it may destroy the stability and the core properties of the material [20]. The addition of surfactant during synthesis of MoS2 will result in sheets of larger surface area. Cetyl Trimethyl ammonium chloride (CTAC) is one of the surfactant used in the preparation of MoS2. The use of surfactant led to the exfoliation of MoS2 sheets and the thermal stability of the material will also be increased [12]. The proper choice of the surfactant is most important because, the characteristic of the material may change drastically on its incorporation. The surfactant also has the ability to control the dimension and shape of the material on synthesis stage. Thus the presence of the surfactant will boost the exfoliation and
modification
of MoS2 [20]. Tahir et al., investigated the
effect
of functionalising MoS2 using polymer ligand [21]. Different types of precursors were discussed for functionalising with MoS2 including some carboxylic acid which can be used for CNTs. The same technique can be used for functionalising TMDs, exploiting the weak Van der Waals interaction in between the layers of the material. The functionalization of MoS2 was done using Nitrilotriacetic Acid (NTA) ligand and the same method can also be used for functionalizing other layered materials. In this work we report that the liquid phase exfoliation and modification of MoS
2
 using the modifier CTAB and the samples are analysed using Fourier transform infrared spectroscopy, TEM and SEM. The modified MoS
2
 samples are coded as ct-MoS
2
. The modification of MoS
2
 using CTAB is done in different ratios. MoS
2
 and CTAB in 1:1, 1:2 and 1:4 ratios are notated as 1 ct-MoS
2
, 2 ct-MoS
2
 and 4 ct-MoS
2
 respectively.
2. EXPERIMENTAL
2.1 Materials
Molybdenum disulphide (MoS
2
) (99% purity), Molecular weight 160.06g / mol is purchased from LOBA Chemie. N, N-Dimethylformamide (DMF) (98% purity) and Cetyl trimethyl ammonium bromide (CTAB) (98% purity), Molecular weight 364.45g/mol were obtained from Aldrich.
 2.2 Exfoliation of MoS
2
Exfoliation of MoS
2
 is done through the ultrasonication process. A known amount of MoS
2
is added in the solvent DMF and is mechanically stirred for about 30 mins. The stirred solution is ultrasonicated with a bath sonicator for 8 hrs. Ultrasonication destructs the weak force in between the stacked MoS
2
sheets thereby converting the bulk MoS
2
 into nanoflakes. The solution is then centrifuged at 4000 rpm for 10 mins and the product obtained is then dried at 60ºC in vacuum oven.
2.3 Modification of MoS
2
A colloidal suspension of exfoliated MoS
2
 and DMF was prepared. Cetyl trimethyl ammonium bromide solution is prepared by dissolving CTAB 100 ml of water and the solution is added into MoS
2
 suspension while stirring and

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