SPA40 3PA41

Improvement of A u Adhesion on Parylene-c and Characteristics of Plasma Generation in Air'

Si02 Substrates Using Oxygen Plasma Treatment'
K.O. Lee, and K.H. Chung
J.H. Lee",b,c,K.S. Hwang", K.H. YoonC,T.S. Kim-, and S.
Ahn6.d PTL(Physico-Technology Labomtory), KAPRA (Korea
Accelerator and Plasma Research Association) 377-3
a Microsystem Research Center, KIST, 39-1 Haweolgog-dong, Jadeung-n', Seo-myun, Cheolwon-gun, Gangwon-do 26s-843,
Seongbuk-gu, Seoul 136-791, Korea Korea
bBiomedicd Institute, Solco biomedical Co,.Ltd. 34-6
Kumam-Ri, Seotan-Myun, Pyungteak City, Kyounggi-Do, Recently many efforts to obtain atmospheric pressure plas-
451-852, Korea., mas exploiting in a number of industrial applications In this
'Department of Ceramic Engneenng, Yonsei University, paper, several methods of plasma generation under the atmo-
Seoul, 120.749, Korea spheric pressure are investigated Experiments and compar-
dSeod National University San 56-1, Shdim-Dong, isons of those methods using large area metal plate, fine-wire,
Kwanak-Gu, Seoul, 151-742, Korea. and multi-pins as electrodes are carried out. Applications of
above methods are mainly used to treatment of toxic gases
Parylene-c (Pa-c) film is a pinhole-free barrier against and VOCs(Vo1atile Organics Compounds) in environmental
moisture, chemical and biofluid. So it is candidated for low area.
dielectric materials for the application of biosensors such as
DNA and nrotein chio.
'kangokleelBhanmail.net

For electrical protein detection system, goid (Au) are

being considered for the immobilization surface of antigen-
antibody conjugation. But adhesion of Au on Pa-c and Si02
is a major hurdle in the reliable and durable performance in
the biosensors.
Pa-c and SiOZ films are deposited on Si sutxtrate using a
vapor deposition method and LPCVD, respectively. Au was
then deposited on both substrates using e-beam evaporation
method. For improvement of An adhesion on Pa-c and SiOz
surface, surface modification of Pa-c and Si02 was performed
using oxygen plasma. Pa-c and Si02 ,layers were exposed
to oxygen plasma using RIE(reactive ion etcher) at various
power and times.
Tape-test analysis was used for qualitative adhesive com- ' ' ,
parison of Au on P a x and SiOz substrates. Contact angle
measurements were performed before and after oxygen plasma
treatment. Surface roughness and microstructures were o b
served using FESEM and AFM a t various RIE treatment con-
ditions. From the results, the increase in adhesion for the Au
on oxygen plasma treated Pa-c and Si02 surfaces is attributed
to increased surface energy and roughn-.

# This research, under the contract project code MS-01-133-

01, has been supported by the Intelligent Microsystem Cen-
ter, which carries out one of the 21st century's Frontier R&D
Projects sponsored by the Korea Ministry Of Science & Tech-
nology
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