THE TAKE-OFF OF IMMERSION LITHOGRAPHY AT LETI

LETI DAYS LITHOGRAPHY WORSHOP | Céline Lapeyre | July 6th, 2018

 WHY IMMERSION LITHO CELL TODAY @LETI ?

Customized R&D program

Dedicated integration blocks
LETI Specific materials qualification
OFFER LETI platform access (litho platforms – metrology & defectivity)
Dedicated SW solution deployment

Prototyping & Service

Wafer prototyping with garanteed cycle time

Needs :
• Full patterning autonomy to address ADVANCED PROGRAM (CMOS 28-
14-10-7-5, MEMORY, …)
• Advanced device development at LETI
• Support our partners with relevant industrial patterning solution
• Full matching with partners lithography tool set (wafers shuttles)

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 OPTICAL LITHOGRAPHY
Above Near Below
10000 wavelength wavelength wavelength
3000
2000
Technology node
1000
1000 DUV DUV
500
l = 248nm l = 193 nm
nm
g-line I-line 350
l = 436nm l = 365nm 250
180
100 130 65
90 45
32
Single exposure Resolution limit 22
16
Pulling in feature size 10 l =EUV 13.5 nm
1 Double exposure resolution limit

1980 1990 2000 2010 2020

Year

Multipatterning : OVERLAY budget as technological driver

ALIGNMENT  more critical

parameter than resolution
 Metrology needs

IMMERSION LITHOGRAPHY : state of the art, industrial reference

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
Immersion Cell Presentation

Immersion Cell Ecosystem

Planning

Starting Projects & Roadmap

Conclusion

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 300MM IMMERSION LITHO CELL INVESTMENT IN 2018

Full patterning
autonomy to
address advanced
LETI programs &
support our
partners with
relevant industrial
patterning solution

& METRO-DEF ENVIRONMENT EVOLUTION

Scatterometry

NOVA T600

• 3D measurement
• CD measurement

2019
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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 TRACK & SCANNER CONFIGURATION

Track
Scanner
Sokudo
NXT:1970Ci
DUO
DT3000

• Coating : 18 auto lines + 2SVD system • Imaging performance : NA 1.35, best

resolution in class (CD 38nm ½ pitch)
• Bakes : 2 PAHP + 4 PQBH (150°C) +4 PQHH
(250°C) +2 PHHH (350°C) + 2 PVQBH • Overlay performance (multi-patterning
(150°C) strategy)
• Single Machine Overlay (SMO) < 2.0nm
• Positive Tone Development unit (ECO • Matched Machine Overlay (MMO) < 3.5 - 4.5nm
nozzles)
• Configuration
• Negative Tone Development unit
• Flexwave
• Pre-immersion unit : 1 SOAK (FS) + 2 BSP • Imaging optimizer
(backside cleaning) • Overlay optimizer
• Post-Immersion Rinse unit : 1 SOAK • Litho Computing Platform
• LithoInsight

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
LETI ECOSYSTEM AROUND IMMERSION PROGRAM

OPC

LITHOGRAPHY

METROLOGY

END USERS

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 IMMERSION TOOLS INSTALLATION PLANNING
2018
Apr May June Jul Aug Sept Oct
Delivery&Move-in
Y 23/04
Reception

S Installation
& Tests
T
Delivery & move-in
N Subfab mainbody Reception
08/05 15/05
X Production
Installation & Integration phase Acceptance tests
T
T
R Delivery & move-in Reception
30/05
A
MA Hook Installation & Tests Production
C -up
K
A Delivery & move-in Reception
10/07
6
Installation Production
0 & Tests
0
P
R Monitoring set-up, learning phase
O
C
E PROCESS DEVELOPMENT
S
S
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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 STARTING PROJECTS

PCRAM FDSOI Photonics Display DSA

CMOS ST + on Si Guide
PCM Leti
• Si Wave Guide
• GATD • Polarizer, • Lamellar
• WALL Masters for approach
• Grating display : Large
• GATE
• 2D curved dimension
• CNT structures network
patterns
• M1
• Work around
stitching

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
EMBEDDED MEMORY ADVANCED MEMORIS @ Leti TO EMULATE SYNAPSES

Support these developments with agressive resolution

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 MORE THAN MOORE INNOVATIVE FIELDS

INTEGRATE & STACK FUNCTIONALITIES

28nm – 12nm technology nodes baselines

FDSOI
Early system/
device
interactions

Early material/
device
interactions

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 A CHALLENGING PERSPECTIVE AROUND PHOTONIC ?

RESOLUTION

Photonic
ROUGHNESS

• Si Wave
Guide 2D CURVES RET

• Grating SPECIFICATION &

2D curved TOLERANCES
structures

LETI internal

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 DISPLAY
O
B
D J
E E
S C
I T
Display G I
N V
• Large surface
master E
• Grating S
• Stitching

Mapping : full 300mm coverage

Stitching : not visible

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 DSA CHEMOEPITAXY INTEGRATION

Spacer flow
DSA
Guide

Lamellar
approach

TiN 15nm

L18 x2 x3 x4 DSA

CDline (nm) 27 45 63
Pitch (nm) 72 108 144

Goal: Implement a vehicule test for chemoepitaxy of High-χ BCP (L0 < 20 nm)
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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 IMMERSION CELL : 1ST PROGRAM STARTUP

July Aug Sept Oct Nov Dec Jan Feb March April

Tools in Production

PCRAM process development

reticle Litho process dev on SiN/SiO2 SL wafers
Litho process dev on M5 + Liner wafers (demonstrator)

28FD process development

Q3-2019
reticle GATD
Litho process dev on E4 evaluation lot (full stack)
GATE
CNT Litho process dev on E7 lot (PMD stack)

reticle Photonics on Si

Display

DSA
NTD process New
reticle Pitch agressive
reticle

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 CONCLUSION

• Immersion cell investment @LETI is a big challenge

• Strong start-up in September with challenging projects

Memory

Imager & photonic

FDSOI
DSA
3D

Quantum Cybersecurity Other

Biochips
Mastering

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
 ACKNOWLEDGMENTS

CEA and LETI employees acknowledge Auvergne Rhône Alpes Region for
major investments that have been made in LETI microelectronic 300mm
line under NANO2022-IPCEI program.

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LETI days Lithography workshop | Céline Lapeyre | July 6th, 2018
Leti, technology research institute
Commissariat à l’énergie atomique et aux énergies alternatives
Minatec Campus | 17 rue des Martyrs | 38054 Grenoble Cedex | France
www.leti.fr