Mocvd Precusor

MOCVD, CVD & ALD
Precursors
Strem Chemicals, Inc. manufacturers and markets specialty chemicals of high
purity. Our products are used for research and development as well as
commercial scale applications, especially in the pharmaceutical, microelectronic
and chemical/petrochemical industries. We also provide custom synthesis and
cGMP manufacturing services. For more information, visit Strem Chemicals at
www.strem.com.
Our 40+ years of experience in the manufacture of inorganic and

organometallic chemicals has allowed us to expand our product offering of
MOCVD, CVD, and ALD precursors. We are continually adding new products for
this dynamic and exciting field. Our range of products are presented in this
brochure (sorted by key element) and include:
▪Metal alkyls ▪Volatile metal carbonyls

▪Metal alkyl amides ▪Fluorinated derivatives
▪Metal alkoxides ▪Electronic grade chemicals
▪Metal beta-diketonates ▪Single source precursors for
▪Volatile organometallics mixed metal oxides
We also offer electropolished stainless steel

bubblers at 150ml, 300ml, 600ml and 1000ml
capacities (See page 28). Standard bubblers are
equipped with valves rated to 200°F (KEL-F stem
tips). High temperature bubblers equipped with
valves rated to 600°F (metals tips) are also
available.
To request a free copy of our catalog, email catalog@strem.com or visit our website at
www.strem.com.
We welcome your custom synthesis or bulk manufacturing inquiries.
Ephraim S. Honig, Ph.D., M.B.A.

Chief Operating Officer
CVD0309
©2009 Strem Chemicals, Inc.
info@strem.com ▪ technical@strem.com ▪ quotation@strem.com 1

MOCVD, CVD & ALD PRECURSORS
INDEX OF PRECURSOR TYPES
Metal Alkyls Page #
34-0380 Diethyldiselenide ..........................................................................................................................21
93-3030 Diethylzinc, min. 95% ...................................................................................................................27
97-4525 Diethylzinc, elec. gr. (99.999%-Zn) PURATREM .........................................................................27
13-1600 Dimethylaluminum i-propoxide, 98% (99.99+%-Al) ........................................................................5
97-5040 Dimethylcadmium, elec. gr. (99.995+%-Cd) PURATREM ..............................................................8
48-5040 Dimethylcadmium, min. 97% ..........................................................................................................8
80-1800 Dimethylmercury ..........................................................................................................................17
97-4486 Dimethylselenide, elec. gr. (99.99+%-Se) PURATREM ...............................................................22
34-0550 Dimethylselenide, 99% .................................................................................................................21
97-5060 Dimethylzinc, elec. gr. (99.999%-Zn) PURATREM.......................................................................27
97-5061 Dimethylzinc, min. 95% ................................................................................................................27
32-2050 Tetra-n-butylgermane, min. 98% ..................................................................................................13
93-3227 Tetraethylgermane, 99% ..............................................................................................................13
32-2125 Tetramethylgermane, 99% ...........................................................................................................13
50-1900 Tetramethyltin, 98%......................................................................................................................24
93-1358 Tri-i-butylaluminum, min. 95% ........................................................................................................5
98-1855 Triethylaluminum, elec. gr. (99.999+%-Al) PURATREM ................................................................5
13-1850 Triethylaluminum, min. 93% ...........................................................................................................5
98-1857 Triethylarsine, elec. gr. (99.999%-As) PURATREM .......................................................................6
33-3400 Triethylarsine, 99%.........................................................................................................................6
93-0540 Triethylboron, 98% .........................................................................................................................8
98-1862 Triethylgallium, elec. gr. (99.9999%-Ga) PURATREM .................................................................12
31-1500 Triethylgallium, min. 97% .............................................................................................................12
13-1900 Triethyl(tri-sec-butoxy)dialuminum(contains diethyl(tetra-sec-butoxy)dialuminum and
tetraethyl(di-sec-butoxy)dialuminum).............................................................................................5
98-1955 Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM .............................................................6
93-1360 Trimethylaluminum, min. 98% ........................................................................................................6
98-1960 Trimethylantimony, elec. gr. (99.999%-Sb) PURATREM ...............................................................6
98-1975 Trimethylarsine, elec. gr. (99.995%-As) PURATREM ....................................................................6
33-3750 Trimethylarsine, 99%......................................................................................................................6
98-1988 Trimethylboron, elec. gr. (99.999%-B) PURATREM.......................................................................8
93-0567 Trimethylboron, 98% ......................................................................................................................8
98-2000 Trimethylgallium, elec. gr. (99.9999%-Ga) PURATREM ..............................................................12
31-2000 Trimethylgallium, 99+% ................................................................................................................12
98-2010 Trimethylindium, elec. gr. (99.999%-In) PURATREM...................................................................14
49-2010 Trimethylindium, 98+% (99.9+%-In) .............................................................................................14
Metal Alkylamides
31-2030 Bis(µ-dimethylamino)tetrakis(dimethylamino)digallium, 98% ..............................................................12
73-0800 Pentakis(dimethylamino)tantalum(V), 99%...................................................................................23
22-1050 Tetrakis(diethylamino)titanium, 99%.............................................................................................25
93-4040 Tetrakis(diethylamino)zirconium, 99%..........................................................................................27
93-2240 Tetrakis(dimethylamino)titanium, 99% TDMAT ............................................................................25
40-4100 Tetrakis(dimethylamino)zirconium ................................................................................................27
39-1500 Tris[N,N-bis(trimethylsilyl)amide]yttrium (III), min. 98% (99.9%-Y) (REO)....................................26
51-5000 Tris(dimethylamino)antimony (99.99%-Sb) PURATREM ...............................................................6
33-5000 Tris(dimethylamino)arsine, 99% .....................................................................................................7
15-7800 Tris(dimethylamino)phosphine, min. 98% HMPT .........................................................................19
14-8750 Tris(dimethylamino)silane, 99+% .................................................................................................22
Volatile Metal Carbonyls

24-0180 Chromium carbonyl, 99% .............................................................................................................10
26-2800 Iron pentacarbonyl, 99.5%............................................................................................................15
25-1330 Manganese carbonyl, 98% ...........................................................................................................17
42-1350 Molybdenum carbonyl, 98% .........................................................................................................17
28-1150 Nickel carbonyl .............................................................................................................................18
75-1800 Rhenium carbonyl, 98% ...............................................................................................................20
44-1850 Ruthenium carbonyl, 99% ............................................................................................................21
74-2200 Tungsten carbonyl, 99%...............................................................................................................25
Metal Alkoxides
93-1308 Aluminum s-butoxide, 98%.............................................................................................................5
93-1370 Aluminum ethoxide, 99%................................................................................................................5
97-0139 Aluminum i-propoxide (99.99+%-Al) PURATREM..........................................................................5
93-1345 Aluminum i-propoxide, 98+%..........................................................................................................5
13-1600 Dimethylaluminum i-propoxide, 98% (99.99+%-Al) ........................................................................5
93-5113 Antimony(III) n-butoxide, 99% ........................................................................................................6
93-5115 Antimony(III) ethoxide, 99% ...........................................................................................................6
93-3206 Germanium(IV) ethoxide (99.99+%-Ge) PURATREM ..................................................................13
72-5800 Hafnium(IV) t-butoxide (99.9%-Hf) ...............................................................................................13
72-5900 Hafnium(IV) ethoxide, 99%...........................................................................................................13

Metal Alkoxides (cont.) Page #
93-4104 Niobium(V) ethoxide (99.9+%-Nb)................................................................................................18
93-7303 Tantalum(V) ethoxide (99.99+%-Ta) PURATREM ......................................................................23
93-7329 Tantalum(V) methoxide (99.99+%-Ta) PURATREM ....................................................................23
93-1451 Tetrabutoxysilane, min. 97% ........................................................................................................22
93-1454 Tetraethoxysilane, min. 98% ........................................................................................................22
93-1459 Tetramethoxysilane, 98% .............................................................................................................22
93-8105 Thallium(I) ethoxide, min. 95% .....................................................................................................24
50-2100 Tin(IV) t-butoxide (99.99%-Sn) PURATREM ................................................................................24
93-2204 Titanium(IV) n-butoxide, 98+% .....................................................................................................25
22-1170 Titanium(IV) t-butoxide (99.95%-Ti)..............................................................................................25
22-2209 Titanium(IV) ethoxide (99.99%-Ti) PURATREM...........................................................................25
93-2216 Titanium(IV) i-propoxide, min. 98% ..............................................................................................25
23-5000 Vanadium(V) tri-i-propoxy oxide, 98+%........................................................................................26
40-1750 Zirconium(IV) t-butoxide (99.99%-Zr) PURATREM ......................................................................28
40-1749 Zirconium(IV) t-butoxide, 99% ......................................................................................................28
93-4043 Zirconium(IV) ethoxide, 99+% ......................................................................................................28
Metal ß-diketonates
93-1302 Aluminum acetylacetonate, 99% ....................................................................................................5
13-0200 Aluminum hexafluoroacetylacetonate, min. 98%............................................................................5
56-5656 Barium bis(N,N,N',N',N"-pentamethyldiethylenetriamine)bis[BREW] (99.99+%-Ba).......................7
PURATREM
56-8400 Bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)barium [Ba(FOD)2] .........................7
20-8400 Bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5-octanedionate)calcium [Ca(FOD)2]........................8
56-8500 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium hydrate [Ba(TMHD)2] .....................................7
56-8600 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium tetraglyme adduct ..........................................7
(99.99%-Ba, Sr-0.5%)
56-8610 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium triglyme adduct (99.99%-Ba, Sr-0.5%) ..........7
20-1000 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)calcium [Ca(TMHD)2].................................................8
29-3000 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II), 99% [Cu(TMHD)2] ..................................11
44-0060 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)(1,5-cyclooctadiene)ruthenium(II),99%....................21
(99.9%-Ru)
82-2100 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)lead(II), 99% [Pb(TMHD)2].......................................16
12-1000 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)magnesium dihydrate, min. 98% [Mg(TMHD)2] .......16
28-0088 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), min. 98% (99.9%-Ni) [Ni(TMHD)2] ...........18
38-1000 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium hydrate [Sr(TMHD)2] ................................23
38-1010 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium tetraglyme adduct (99.99%-Sr)................23
PURATREM
38-1015 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium triglyme adduct (99.99%-Sr) ................... 23
PURATREM
30-0500 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)zinc, 99% [Zn(TMHD)2]............................................27
20-2500 Calcium hexafluoroacetylacetonate dihydrate, 97%.......................................................................9
93-5836 Cerium(III) trifluoroacetylacetonate hydrate....................................................................................9
24-0160 Chromium(III) acetylacetonate, 97.5% ...........................................................................................9
24-0400 Chromium(III) hexafluoroacetylacetonate, min. 98% ....................................................................10
29-2929 Copper(II) hexafluoroacetylacetonate hydrate, elec. gr. (99.99+%-Cu) PURATREM...................11
93-2929 Copper(II) hexafluoroacetylacetonate hydrate..............................................................................10
93-2966 Copper(II) trifluoroacetylacetonate, 97+% ....................................................................................11
77-0900 1,5-Cyclooctadiene(acetylacetonato)iridium(I), 99% (99.9%-Ir) ...................................................14
79-1500 Dimethyl(acetylacetonate)gold(III), 98% (99.9%-Au)....................................................................13
79-1600 Dimethyl(trifluoroacetylacetonate)gold(III), 98% (99.9%-Au)........................................................13
68-6900 Erbium(III) hexafluoroacetylacetonate hydrate (99.9%-Er) (REO)................................................11
93-3130 Gallium(III) acetylacetonate (99.99+%-Ga) PURATREM .............................................................12
08-2012 H-BREW (mixed propyl and butyl substituted beta-diketones) .....................................................19
93-4905 Indium(III) trifluoroacetylacetonate, 99% ......................................................................................14
93-2644 Iron(III) trifluoroacetylacetonate, 99% (99.9%-Fe)........................................................................15
93-8265 Lead(II) hexafluoroacetylacetonate, min. 98% .............................................................................16
12-1212 Magnesium (N,N,N',N'-tetramethylethylenediamine)bis[BREW] (99.99+%-Mg) PURATREM ......16
93-6005 Neodymium(III) hexafluoroacetylacetonate dihydrate (99.9%-Nd) (REO) ....................................17
93-6017 Neodymium(III) trifluoroacetylacetonate (99.9%-Nd)....................................................................17
78-1550 Platinum(II) hexafluoroacetylacetonate, 98% (99.9%-Pt) .............................................................19
93-5907 Praseodymium(III) hexafluoroacetylacetonate (99.9%-Pr) (REO) ................................................19
93-5916 Praseodymium(III) trifluoroacetylacetonate (99.9%-Pr) (REO).....................................................19
45-1800 Rhodium(III) acetylacetonate, 97+% (99.9%-Rh) .........................................................................20
93-6219 Samarium(III) trifluoroacetylacetonate (99.9%-Sm) (REO)...........................................................21
38-3838 Strontium bis(N,N,N',N',N"-pentamethyldiethylenetriamine)bis[BREW] (99.99+%-Sr) .................23
PURATREM
38-2000 Strontium hexafluoroacetylacetonate ...........................................................................................23
73-5000 Tantalum(V) tetraethoxyacetylacetonate (99.99+%-Ta) PURATREM ..........................................23
73-7373 Tantalum(V) (tetraethoxy)[BREW] (99.99+%-Ta) PURATREM ....................................................23
58-5000 Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)cerium(IV), min.97% (99.9%-Ce) (REO)............9
[Ce(TMHD)4]
41-7000 Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)niobium(IV), 99% [Nb(TMHD)4]........................18
40-5000 Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)zirconium(IV), 99% [Zr(TMHD)4] ......................28
47-2600 2,2,6,6-Tetramethyl-3,5-heptanedionato silver(I) (99.9%-Ag) [Ag(TMHD)]...................................22
81-1000 2,2,6,6-Tetramethyl-3,5-heptanedionato thallium(I), 99% [Tl(TMHD)] ..........................................24
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Metal ß-diketonates (cont.) Page #
81-2500 Thallium(I) hexafluoroacetylacetonate, 99% (99.9%-Tl) ...............................................................24
50-1977 Tin(II) acetylacetonate, min. 98% .................................................................................................24
50-1980 Tin(II) hexafluoroacetylacetonate (99.9%-Sn) ..............................................................................24
22-2222 Titanium(IV) (di-i-propoxide)bis[BREW] (99.99+%-Ti) PURATREM.............................................25
77-9700 Tris(norbornadiene)(acetylacetonato)iridium(III), 98% (99.9%-Ir).................................................14
13-5000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)aluminum, 99% (99.9%-Al) [Al(TMHD)3]...................6
83-1000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)bismuth(III), min. 98% (99.9%-Bi).............................7
[Bi(TMHD)3]
24-1500 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)chromium(III), 99% [Cr(TMHD)3] ............................10
27-3000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)cobalt(III), 99% (99.9+%-Co) [Co(TMHD)3] ............10
66-8500 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)dysprosium(III), 98+% (99.9%-Dy) (REO) ..............11
[Dy(TMHD)3]
68-8750 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)erbium(III), 99% (99.9%-Er) (REO) ........................12
[Er(TMHD)3]
93-6328 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)europium(III), 99% (99.9%-Eu) (REO)....................12
[Eu(TMHD)3]
64-5000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)gadolinium(III),99% (99.9%-Gd) .............................12
(REO) [Gd(TMHD)3]
31-5000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)gallium(III), 99% (99.999%-Ga) ..............................12
[Ga(TMHD)3]
67-5000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)holmium(III), 99% (99.9%-Ho) (REO).....................13
[Ho[TMHD)3]
49-2200 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)indium(III), 99% (99.9%-In) [In(TMHD)3].................14
26-3910 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)iron(III), 99% (99.9%-Fe) [Fe(TMHD)3]...................15
57-1000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III), 99%(99.9%-La) (REO) ...................15
57-1100 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III) tetraglyme adduct............................16
(99.9%-La) (REO) [La(TMHD)3]
25-5000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), 99% [Mn(TMHD)3] ........................17
60-8750 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)neodymium(III), 99% (99.9%-Nd) (REO)
[Nd(TMHD)3].................................................................................................................................18
93-5937 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)praseodymium(III), 99% (99.9%-Pr) (REO)
[Pr(TMHD)3]..................................................................................................................................20
44-8000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)ruthenium(III), 99% (99.9%-Ru)..............................21
[Ru(TMHD)3]
62-4000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)samarium(III) (99.9%-Sm) (REO) ...........................21
[Sm(TMHD)3]
21-1000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)scandium(III), 99% (99.9%-Sc)...............................21
(REO )[Sc(TMHD)3]
65-8000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)terbium(III), 99% (99.9%-Tb) ..................................24
(REO) [Tb(TMHD)3]
69-7000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)thulium(III), 98% (99.9%-Tm) (REO) ......................24
[Tm(TMHD)3]
22-6000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)titanium(III) [Ti(TMHD)3] .........................................25
70-0100 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)ytterbium(III), 99% (99.9%-Yb) (REO) ....................26
[Yb(TMHD)3]
39-1000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium(III), 98+% (99.9%-Y) (REO)........................26
[Y(TMHD)3]
39-1015 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium(III) triglyme adduct (99.9%-Y)(REO)...........27
47-8000 Vinyltriethylsilane(hexafluoroacetylacetonato)silver(I) (99.9%-Ag)...............................................22
70-2500 Ytterbium(III) hexafluoroacetylacetonate dihydrate (99.9%-Yb) (REO) ........................................26
39-2500 Yttrium(III) hexafluoroacetylacetonate (99.9%-Y) (REO)..............................................................27
40-3000 Zirconium(IV) hexafluoroacetylacetonate .....................................................................................28
93-4026 Zirconium(IV) trifluoroacetylacetonate, 99%.................................................................................28
Volatile Organometallics
24-0135 Bis(cyclopentadienyl)chromium, min. 95%, sublimed (Chromocene).............................................9
27-0475 Bis(cyclopentadienyl)cobalt(II), min. 98% (Cobaltocene) .............................................................10
27-0485 Bis(N,N’-di-i-propylacetamidinato)cobalt(II), min. 98% .................................................................10
29-7100 Bis(N,N’-di-sec-butylacetamidinato)dicopper(I), 99% ...................................................................10
72-0700 Bis(cyclopentadienyl)dimethylhafnium, min. 97%.........................................................................13
40-1000 Bis(cyclopentadienyl)dimethylzirconium, min. 97% ......................................................................27
26-1700 Bis(cyclopentadienyl)iron, 99% (Ferrocene).................................................................................14
26-1699 Bis(cyclopentadienyl)iron, 98% (Ferrocene).................................................................................14
97-1040 Bis(cyclopentadienyl)magnesium (99.99+%-Mg) PURATREM ....................................................16
12-0500 Bis(cyclopentadienyl)magnesium (99.9+%-Mg) ...........................................................................16
25-0200 Bis(cyclopentadienyl)manganese, 98+% (Manganocene)............................................................16
28-1301 Bis(cyclopentadienyl)nickel, 99% (Nickelocene) ..........................................................................18
76-0150 Bis(cyclopentadienyl)osmium, 99% (99.9%-Os) (Osmocene) ......................................................18
44-6200 Bis(cyclopentadienyl)ruthenium, 99% (99.9%-Ru) (Ruthenocene)..............................................20
23-0180 Bis(cyclopentadienyl)vanadium, sublimed, 95% (Vanadocene) ...................................................26
31-2030 Bis(µ-dimethylamino)tetrakis(dimethylamino)digallium, 98% ..............................................................12
44-0030 Bis(2,4-dimethylpentadienyl)ruthenium(II), 99%...........................................................................20
24-0145 Bis(ethylbenzene)chromium [mixture of (C2H5)xC6H6-x where x = 0-4)] ..........................................9
42-0200 Bis(ethylbenzene)molybdenum [mixture of (C2H5)xC6H6-x where x = 0-4)]....................................17
26-0310 Bis(ethylcyclopentadienyl)iron, min. 98% .....................................................................................14
12-0510 Bis(ethylcyclopentadienyl)magnesium, min. 98%.........................................................................16
25-0210 Bis(ethylcyclopentadienyl)manganese, min. 98% ........................................................................17

Volatile Organometallics (cont.)
Volatile Organometallics (cont.)
Page #
28-0083 Bis(ethylcyclopentadienyl)nickel, min. 98% ..................................................................................18
44-0040 Bis(ethylcyclopentadienyl)ruthenium(II), 98% (99.9%-Ru) ...........................................................20
24-0150 Bis(pentamethylcyclopentadienyl)chromium, min. 95% (Decamethylchromocene)........................9
26-0400 Bis(pentamethylcyclopentadienyl)iron, 99% .................................................................................15
97-1045 Bis(pentamethylcyclopentadienyl)magnesium, elec. gr. (99.999%-Mg) PURATREM ..................16
25-0235 Bis(pentamethylcyclopentadienyl)manganese, min. 98% (Decamethylmanganocene)................17
28-0085 Bis(pentamethylcyclopentadienyl)nickel, 98% (Decamethylnickelocene).....................................18
76-0200 Bis(pentamethylcyclopentadienyl)osmium, 99% (99.9%-Os) (Decamethylosmocene) ................19
44-0050 Bis(pentamethylcyclopentadienyl)ruthenium, 99% (99.9%-Ru) (Decamethylruthenocene)..........20
12-0550 Bis(n-propylcyclopentadienyl)magnesium, min. 98% ...................................................................16
24-0153 Bis(i-propylcyclopentadienyl)chromium, min. 98% .........................................................................9
26-0450 Bis(i-propylcyclopentadienyl)iron, min. 98% .................................................................................15
28-0086 Bis(i-propylcyclopentadienyl)nickel, min. 98%..............................................................................18
74-1250 Bis(i-propylcyclopentadienyl)tungsten dihydride, min. 98%..........................................................25
56-8460 Bis(n-propyltetramethylcyclopentadienyl)barium ............................................................................7
93-2602 n-Butylferrocene, 99% ..................................................................................................................15
26-0700 t-Butylferrocene, min. 98% ...........................................................................................................15
27-0500 Cobalt tricarbonyl nitrosyl .............................................................................................................10
42-0350 Cycloheptatriene molybdenum tricarbonyl, 99% ..........................................................................17
26-0850 Cyclohexadiene iron tricarbonyl, 98% ..........................................................................................15
26-0875 Cyclooctatetraene iron tricarbonyl, 98% .......................................................................................15
27-0550 Cyclopentadienylcobalt dicarbonyl, min. 95% ..............................................................................10
97-3425 Cyclopentadienylindium(I), elec. gr. (99.999+%-In) PURATREM.................................................14
25-0390 Cyclopentadienylmanganese tricarbonyl, 98%.............................................................................17
75-2300 Cyclopentadienylrhenium tricarbonyl, 99%...................................................................................20
81-0305 Cyclopentadienylthallium, 99% (99.9%-Tl) sublimed....................................................................24
29-5500 Cyclopentadienyl(triethylphosphine)copper(I), min. 98%..............................................................11
23-0350 Cyclopentadienylvanadium tetracarbonyl, min. 97% ....................................................................26
45-0739 Dicarbonyl(pentamethylcyclopentadienyl)rhodium(I), 99% (99.9%-Rh)........................................20
40-1110 Dimethylbis(t-butylcyclopentadienyl)zirconium, min. 98% ............................................................27
26-1600 Ethylferrocene, 98% .....................................................................................................................15
74-1350 Mesitylene tungsten tricarbonyl, 98% ...........................................................................................25
77-5000 (Methylcyclopentadienyl)(1,5-cyclooctadiene)iridium(I), 99% (99.9%-Ir) ......................................14
25-1550 Methylcyclopentadienylmanganese tricarbonyl, min. 97% ...........................................................17
75-2400 Pentamethylcyclopentadienylrhenium tricarbonyl, min. 98%........................................................20
75-2410 i-Propylcyclopentadienylrhenium tricarbonyl, min. 97%................................................................20
22-1030 Tetrachlorodiamminotitanium(IV), 99% ........................................................................................25
98-0925 Tetrakis(trifluorophosphine)platinum (0) (ampouled under PF3) ...................................................19
47-3010 Triethoxyphosphine(trifluoroacetylacetonate)silver(I), min. 98% ..................................................22
47-3025 Triethylphosphine(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl3,5-octanedionate)silver(I), min. 98% ..22
78-1350 (Trimethyl)methylcyclopentadienylplatinum(IV), 99% ...................................................................19
22-5500 (Trimethyl)pentamethylcyclopentadienyltitanium(IV), min. 97% ...................................................25
29-2930 Trimethylphosphine(hexafluoroacetylacetonato)copper(I), min. 98% ...........................................11
47-3000 Trimethylphosphine(hexafluoroacetylacetonato)silver(I), 99% (99.9%-Ag) ..................................22
93-8350 Triphenylbismuth, 99% ...................................................................................................................7
68-7000 Tris(n-butylcyclopentadienyl)erbium (99.9%-Er) (REO)................................................................11
39-4950 Tris(butylcyclopentadienyl)yttrium (99.9%-Y) (REO) ....................................................................26
58-7500 Tris(cyclopentadienyl)cerium (99.9%-Ce) (REO) ...........................................................................9
68-8000 Tris(cyclopentadienyl)erbium (99.9%-Er) (REO) ..........................................................................11
64-4000 Tris(cyclopentadienyl)gadolinium (99.9%-Gd) (REO)...................................................................12
57-3000 Tris(cyclopentadienyl)lanthanum (99.9%-La) (REO) ....................................................................15
60-5000 Tris(cyclopentadienyl)neodymium, 99% (99.9%-Nd) (REO).........................................................18
59-7500 Tris(cyclopentadienyl)praseodymium (99.9%-Pr) (REO)..............................................................19
62-3500 Tris(cyclopentadienyl)samarium (99.9%-Sm) (REO)....................................................................21
21-0900 Tris(cyclopentadienyl)scandium, min. 98% (99.9%-Sc) (REO) ....................................................21
69-6000 Tris(cyclopentadienyl)thulium (99.9%-Tm) (REO) ........................................................................24
70-0075 Tris(cyclopentadienyl)ytterbium (99.9%-Yb) (REO)......................................................................26
39-5000 Tris(cyclopentadienyl)yttrium (99.9%-Y) (REO)............................................................................26
68-8740 Tris(methylcyclopentadienyl)erbium (99.9%-Er) (REO)................................................................11
39-5050 Tris(methylcyclopentadienyl)yttrium (99.9%-Y) (REO) .................................................................26
58-8000 Tris(i-propylcyclopentadienyl)cerium (99.9%-Ce) (REO)................................................................9
68-7200 Tris(i-propylcyclopentadienyl)erbium (99.9%-Er) (REO)...............................................................11
57-4000 Tris(i-propylcyclopentadienyl)lanthanum (99.9%-La) (REO) ........................................................15
60-6000 Tris(i-propylcyclopentadienyl)neodymium (99.9%-Nd) (REO) ......................................................18
59-8000 Tris(i-propylcyclopentadienyl)praseodymium (99.9%-Pr) (REO) ..................................................20
65-7000 Tris(i-propylcyclopentadienyl)terbium (99.9%-Tb) (REO) .............................................................24
39-5100 Tris(n-propylcyclopentadienyl)yttrium (99.9%-Y) (REO)...............................................................26
58-9000 Tris(1,2,3,4-tetramethyl-2,4-cyclopentadienyl)cerium(III) (99.9%-Ce) (REO) .................................9
Other
93-0514 Boron bromide, 99+%.....................................................................................................................8

97-1725 Boron bromide, elec. gr. (99.999%-B) PURATREM .......................................................................8
06-0201 Carbon tetrabromide, vacuum sublimed (99.99%-C) PURATREM ................................................9
93-1543 Phosphorus oxychloride, 98+% ....................................................................................................19
97-8875 Phosphorus oxychloride, elec. gr. (99.999%-P) PURATREM ......................................................19
93-2305 Vanadium(V) trichloride oxide, min. 99%......................................................................................26

MOCVD, CVD & ALD Precursors - ALUMINUM
93-1302 Aluminum acetylacetonate, 99% [13963-57-0] 100g
Al(CH3COCHCOCH3)3; FW: 324.31; white pwdr.; m.p. 192-193°; 500g
b.p. dec. 320° (subl. 150°/1mm)
93-1308 Aluminum s-butoxide, 98% [2269-22-9] 100g
HAZ Al(OC4H9)3; FW: 246.33; colorless liq.; b.p. 200-206°/30 mm; 450g
f.p. 82°F; d. 0.9671
moisture sensitive
93-1370 Aluminum ethoxide, 99% [555-75-9] 25g
HAZ Al(OC2H5)3; FW: 162.17; white chunks; m.p. 130°; 100g
b.p. 210°/10 mm
moisture sensitive
13-0200 Aluminum hexafluoroacetylacetonate, min. 98% [15306-18-0] 5g
Al(CF3COCHCOCF3)3; FW: 648.169; white to off-white xtl.; 25g
m.p. 70-73°; b.p. dec. 170° (subl. 50°/0.1mm)
moisture sensitive
93-1345 Aluminum i-propoxide, 98+% [555-31-7] 250g
HAZ Al[OCH(CH3)2]3; FW: 204.25; white pwdr.; m.p. 118.5°; 1kg
b.p. 140.5°/8 mm; d. 1.0346
moisture sensitive
97-0139 Aluminum i-propoxide (99.99+%-Al) PURATREM [555-31-7] 25g
HAZ Al[(OCH(CH3)2]3; FW: 204.25; white pwdr.; m.p. 118.5°; 100g
b.p. 140.5°/8 mm; d. 1.0346
moisture sensitive
13-1600 Dimethylaluminum i-propoxide, 98% (99.99+%-Al) [6063-89-4] 1g
(CH3)2Al(OC3H7); FW: 116.14; colorless liq.; d. 0.824 5g
air sensitive; moisture sensitive
Technical Note:
1. Useful starting material for the atomic layer deposition of Al2O3 films.
Reference:
1. J. Vac. Sci. Tech. A., 2003, 21, 1366.
93-1358 Tri-i-butylaluminum, min. 95% [100-99-2] 100g
HAZ (C4H9)3Al; FW: 198.33; colorless liq.; m.p. 4°; b.p. 73°/5 mm; 225g
d. 0.781
moisture sensitive, pyrophoric
Price inc. non-ret. cyl.
13-1850 Triethylaluminum, min. 93% [97-93-8] 25g
HAZ (C2H5)3Al; FW: 114.17; colorless liq.; m.p. -52.5°; b.p. 186°; 100g
f.p. -1°F; d. 0.835 500g
98-1855 Triethylaluminum, elec. gr. (99.999+%-Al) PURATREM 100g
HAZ [97-93-8]
(C2H5)3Al; FW: 114.17; colorless liq.; m.p. -52.5°; b.p. 186°;
f.p. -1°F; d. 0.835
S. Steel bubbler extra
13-1900 Triethyl(tri-sec-butoxy)dialuminum (contains diethyl(tetra-sec- 25g
HAZ butoxy)dialuminum and tetraethyl(di-sec-butoxy)dialuminum) 100g
(C2H5)3Al2(OC4H9)3; colorless liq.; b.p. 183-186°/40mm
air sensitive, moisture sensitive
Technical Note:
1. Non-pyrophoric precursor for the chemical vapor deposition of aluminum oxide.

MOCVD, CVD & ALD Precursors - ALUMINUM
93-1360 Trimethylaluminum, min. 98% [75-24-1] 100g
HAZ (CH3)3Al; FW: 72.09; colorless liq.; m.p. 15.4°; b.p. 20°/8 mm; 225g
f.p. -1°F; d. 0.752 (20°)
98-1955 Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM 100g
HAZ [75-24-1] 200g
(CH3)3Al; FW: 72.09; colorless liq.; m.p. 15.4°; b.p. 20°/8 mm;
f.p. -1°F; d. 0.752 (20°)
13-5000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)aluminum, 99% 1g
(99.9%-Al) [Al(TMHD)3] [14319-08-5] 5g
Al(C11H19O2)3; FW: 576.80; white xtl.; m.p. 255-258°; b.p. dec. 25g
>400° (subl. 150°/0.01mm)
MOCVD, CVD & ALD Precursors - ANTIMONY

93-5113 Antimony(III) n-butoxide, 99% [2155-74-0] 5g
Sb(OC4H9)3; FW: 341.10; colorless liq.; b.p. 133-135°/4 mm 25g
moisture sensitive
93-5115 Antimony(III) ethoxide, 99% [10433-06-4] 5g
HAZ Sb(OC2H5)3; FW: 256.90; colorless liq.; b.p. 95°/11 mm; d. 1.524 25g
moisture sensitive
98-1960 Trimethylantimony, elec. gr. (99.999%-Sb) PURATREM 25g
HAZ [594-10-5] 100g
(CH3)3Sb; FW: 166.86; colorless liq.; m.p. -87.6°; b.p. 80.6°;
f.p. -1°F; d. 1.528 (15°)
pyrophoric
51-5000 Tris(dimethylamino)antimony (99.99%-Sb) PURATREM 1g
HAZ [7289-92-1] 5g
((CH3)2N)3Sb; FW: 253.99; colorless liq.; b.p. 32-34°/0.45mm 25g
MOCVD, CVD & ALD Precursors - ARSENIC

33-3400 Triethylarsine, 99% [617-75-4] 5g
amp (C2H5)3As; FW: 162.09; colorless liq.; m.p. -91°; b.p. 140°; 25g
HAZ d. 1.152
air sensitive
98-1857 Triethylarsine, elec. gr. (99.999%-As) PURATREM [617-75-4] 25g
amp (C2H5)3As; FW: 162.09; colorless liq.; m.p. -91°; b.p. 140°; 100g
HAZ d. 1.152
air sensitive
33-3750 Trimethylarsine, 99% [593-88-4] 5g
amp (CH3)3As; FW: 120.03; colorless liq.; m.p. -87.3°; b.p. 51°; 25g
HAZ f.p. 100°F; d. 1.124 100g
air sensitive
98-1975 Trimethylarsine, elec. gr. (99.995%-As) PURATREM [593-88-4] 25g
amp (CH3)3As; FW: 120.03; colorless liq.; m.p. -87.3°; b.p. 51°; 100g
HAZ f.p. 100°F; d. 1.124
air sensitive

MOCVD, CVD & ALD Precursors - ARSENIC
33-5000 Tris(dimethylamino)arsine, 99% [6596-96-9] 5g
HAZ ((CH3)2N)3As; FW: 207.15; colorless liq.; b.p. 55°/10mm 25g
MOCVD, CVD & ALD Precursors - BARIUM

56-5656 Barium bis(N,N,N',N',N''-pentathyldiethylene- 1g
triamine)bis[BREW] (99.99+%-Ba) PURATREM 5g
Ba(C9H23N3)2[CxHyC(O)CHC(O)CxHy]2 (x=3-4, y=2x +1); 25g
pale yellow liq.
moisture sensitive
Note: 13-16 wt% Ba
Technical Note: See 08-2012 (page 19)
56-8400 Bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5- 1g
HAZ octanedionate)barium [Ba(FOD)2] [36885-31-1] 5g
Ba(C10H10F7O2)2; FW: 727.71; white to off-white pwdr.; 25g
m.p. 194-198°; b.p. dec. 280-300° (subl. 210°/0.2mm)
56-8460 Bis(n-propyltetramethylcyclopentadienyl)barium 1g
HAZ [210758-43-3] 5g
Ba[(C3H7)(CH3)4C5]2; FW: 463.90; viscous yellow liq.
56-8500 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium hydrate 1g
HAZ [Ba(TMHD)2] [17594-47-7] 5g
Ba(C11H19O2)2·XH2O; FW: 503.85; white pwdr.; m.p. 195-200°; 25g
b.p. dec. 285° (subl. 225°/0.05mm)
moisture sensitive
56-8600 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium tetraglyme 1g
HAZ adduct (99.99%-Ba, Sr-0.5%) PURATREM [136629-60-2] 5g
Ba(C11H19O2)2·CH3(OCH2CH2)4OCH3; FW: 503.85 (726.13);
white xtl.; m.p. 103°
Note:
This compound is covered by U.S. Patent No. 5,225,561, and is manufactured and sold
under license from Advanced Technology Materials, Inc., Danbury, CT.
56-8610 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)barium triglyme 1g
HAZ adduct(99.99%-Ba, Sr-0.5%) PURATREM [149160-45-2] 5g
Ba(C11H19O2)2·CH3(OCH2CH2)3OCH3; FW: 503.85 (682.08);
off-white pwdr.; m.p. 88°
Note:
MOCVD, CVD & ALD Precursors - BISMUTH

93-8350 Triphenylbismuth, 99% [603-33-8] 10g
(C6H5)3Bi; FW: 440.30; white xtl.; m.p. 77-78°; b.p. dec. 310° 50g
(subl. 100°/0.2mm); d. 1.585
83-1000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)bismuth(III), 1g
min. 98% (99.9%-Bi) [Bi(TMHD)3] [142617-53-6] 5g
Bi(C11H19O2)3; FW: 758.74; off-white xtl.; m.p. 114-116°; b.p. dec. 25g
295° (subl. 150°/0.05mm)

MOCVD, CVD & ALD Precursors - BORON
93-0514 Boron bromide, 99+% [10294-33-4] 25g
HAZ BBr3; FW: 250.54; pale yellow to orange liq.; m.p. -46°; b.p. 91.3°; 100g
d. 2.6431 500g
moisture sensitive; (store cold)
97-1725 Boron bromide, elec. gr. (99.999%-B) PURATREM 25g

amp [10294-33-4] 100g
HAZ BBr3; FW: 250.54; pale yellow to orange liq.; m.p. -46°; b.p. 91.3°;
d. 2.6431
moisture sensitive
93-0540 Triethylboron, 98% [97-94-9] 100g

HAZ B(C2H5)3; FW: 98.00; m.p. -92.9°; b.p. 95°; d. 0.6961 (23°)
pyrophoric
93-0567 Trimethylboron, 98% [593-90-8] 25g

HAZ (CH3)3B; FW: 55.92; colorless gas; m.p. -161.5°; b.p. -20.2°; 100g
d. 0.625 (-100°)
pyrophoric
98-1988 Trimethylboron, elec. gr. (99.999%-B) PURATREM [593-90-8] 10g
HAZ (CH3)3B; FW: 55.92; colorless gas; m.p. -161.5°; b.p. -20.2°;
d. 0.625 (-100°)
pyrophoric
MOCVD, CVD & ALD Precursors - BROMINE

06-0201 Carbon tetrabromide, vacuum sublimed (99.99%-C) PURATREM
SEE CARBON SECTION (page 9)
MOCVD, CVD & ALD Precursors - CADMIUM

48-5040 Dimethylcadmium, min. 97% [506-82-1] 25g
HAZ (CH3)2Cd; FW: 142.88; colorless liq.; m.p. -4.5°; b.p. 105.5°; 100g
f.p. -1°F; d. 1.985 (18°)
Note: Material may contain a small amount of precipitate.
97-5040 Dimethylcadmium, elec. gr. (99.995+%-Cd) PURATREM 25g
HAZ [506-82-1] 100g
(CH3)2Cd; FW: 142.88; colorless liq.; m.p. -4.5°; b.p. 105.5°;
f.p. -1°F; d. 1.985 (18°)
Note: Material may contain a small amount of precipitate.
MOCVD, CVD & ALD Precursors - CALCIUM

20-8400 Bis(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl-3,5- 1g
octanedionate)calcium [Ca(FOD)2] [36885-29-7] 5g
Ca[C3F7COCHCOC(CH3)3]2; FW: 630.30; white pwdr.; 25g
m.p. 208-210°; b.p. dec. 250° (subl. 170°/0.1mm)
20-1000 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)calcium 1g
[Ca(TMHD)2] [36818-89-0] 5g
Ca(C11H19O2)2; FW: 406.62; white pwdr.; m.p. 220-223°; b.p. dec. 25g
280° (subl. 205°/0.1mm)

MOCVD, CVD & ALD Precursors - CALCIUM
20-2500 Calcium hexafluoroacetylacetonate dihydrate, 97% 1g
[203863-17-6] 5g
Ca(CF3COCHCOCF3)2.2H2O; FW: 454.18 (486.18); off-white 25g
pwdr.; m.p. 135-140°; b.p. dec. 230-240° (subl. 180°/0.07mm)
MOCVD, CVD & ALD Precursors - CARBON

06-0201 Carbon tetrabromide, vacuum sublimed (99.99%-C) 25g
amp PURATREM [558-13-4] 100g
HAZ CBr4; FW: 331.65; white xtl.; m.p. 88-90°; b.p. 190°
MOCVD, CVD & ALD Precursors - CERIUM

93-5836 Cerium (III) trifluoroacetylacetonate hydrate [63356-25-2] 5g
Ce(CF3COCHCOCH3)3·XH2O; FW: 599.36; yellow xtl. 25g
58-5000 Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)cerium(IV), 1g
min. 97% (99.9%-Ce) (REO) [Ce(TMHD)4] [18960-54-8] 5g
Ce(C11H19O2)4; FW: 873.20; red pwdr.; m.p. 275-280°; b.p. dec. 25g
295° (subl. 140°/0.05mm)
58-7500 Tris(cyclopentadienyl)cerium (99.9%-Ce) (REO) [1298-53-9] 1g
amp (C5H5)3Ce; FW: 335.41; pwdr.; m.p. 452° dec.; b.p. subl. 5g
230°/0.01 mm
58-8000 Tris(i-propylcyclopentadienyl)cerium (99.9%-Ce) (REO) 1g
amp [122528-16-9] 5g
[(C3H7)C5H4]3Ce; FW: 461.64
air sensitive
58-9000 Tris(1,2,3,4-tetramethyl-2,4-cyclopentadienyl)cerium(III) 1g
(99.9%-Ce) (REO) [251984-08-4] 5g
[(CH3)4C5H]3Ce; FW: 503.73; green pwdr.
air sensitive
MOCVD, CVD & ALD Precursors - CHROMIUM

24-0135 Bis(cyclopentadienyl)chromium, min. 95%, sublimed 1g
amp (Chromocene) [1271-24-5] 5g
HAZ (C5H5)2Cr; FW: 182.18; scarlet xtl.; m.p. 172-173°
pyrophoric
24-0145 Bis(ethylbenzene)chromium [mixture of (C2H5)xC6H6-x 1g
amp where x = 0-4)] 5g
HAZ [(C2H5)xC6H6-x]2Cr; dark brown liq.; b.p. 140-160°/1mm; 25g
d. 1.14-1.18
air sensitive
24-0150 Bis(pentamethylcyclopentadienyl)chromium, min. 95% 1g
amp (Decamethylchromocene) [74507-61-2] 5g
HAZ [(CH3)5C5]2Cr; FW: 322.45; brown pwdr.
air sensitive
24-0153 Bis(i-propylcyclopentadienyl)chromium, min. 98% 1g
amp [329735-69-5] 5g
HAZ [(C3H7)C5H4]2Cr; FW: 266.35; red liq.
air sensitive
24-0160 Chromium(III) acetylacetonate, 97.5% [21679-31-2] 50g
Cr(CH3COCHCOCH3)3; FW: 349.33; maroon xtl.; m.p. 214°; 250g
b.p. subl. 100°/0.2mm 1kg

MOCVD, CVD & ALD Precursors - CHROMIUM
24-0180 Chromium carbonyl, 99% [13007-92-6] 5g
HAZ Cr(CO)6; FW: 220.06; white xtl.; m.p. 154-155°; d. 1.77 25g
100g
500g
24-0400 Chromium(III) hexafluoroacetylacetonate, min. 98% 1g
[14592-80-4] 5g
Cr(CF3COCHCOCF3)3; FW: 673.14; green xtl.; m.p. 83-85°
24-1500 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)chromium(III), 1g
99% [Cr(TMHD)3] [14434-47-0] 5g
Cr(C11H19O2)3; FW: 601.82; purple xtl.; m.p. 230-232°;
b.p. dec. 270°
MOCVD, CVD & ALD Precursors - COBALT

27-0475 Bis(cyclopentadienyl)cobalt(II), min. 98% (Cobaltocene) 1g
amp [1277-43-6] 5g
HAZ (C5H5)2Co; FW: 189.12; purplish-black xtl.; m.p. 173° 25g
air sensitive, light sensitive, (store cold)
27-0485 Bis(N,N'-di-i-propylacetamidinato) (CH3)2HC 250mg
cobalt(II), min. 98% [635680-58-9] CH(CH3)2 1g
N N
(C8H17N2)2Co; FW: 341.40; green xtl.;
m.p. 72°; b.p. sublimes 50°/50mm H3C C Co C CH3
N N
CH(CH3)2
(CH3)2HC
Technical Note:
1. Precursor with metal nitrogen bonds used for the atomic layer deposition of metals,
nitrides, and oxides. See WO 2004/046417A2.
27-0500 Cobalt tricarbonyl nitrosyl [14096-82-3] 1g
amp Co(CO)3NO; FW: 172.97; dark red liq.; b.p. 50°; d. 1.47 5g
HAZ air sensitive, (store cold) 25g
27-0550 Cyclopentadienylcobalt dicarbonyl, min. 95% 2g

amp [12078-25-0] 10g
HAZ C5H5Co(CO)2; FW: 180.05; dark red liq.; b.p. 37- Co
38.5°/2 mm; f.p. 80°F; d. 1.35 OC CO
air sensitive, (store cold)
27-3000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)cobalt(III), 99% 1g
(99.9+%-Co) [Co(TMHD)3] [14877-41-9] 5g
Co(C11H19O2)3; FW: 608.74; green pwdr.; m.p. 254-256°; b.p. 250° 25g
dec. (subl. 120°/0.5mm)
MOCVD, CVD & ALD Precursors - COPPER

29-7100 Bis(N,N'-di-sec-butyl- CH3 CH3 1g
acetamidinato)dicopper(I), 99% H3CH2C H H CH2CH3 5g
C C
[695188-31-9]
(C10H21N2)2Cu2; FW: 465.67; N Cu N
colorless xtl. H3 C C C CH3
air sensitive N Cu N
Technical Note: C C
1. Precursor with metal H3CH2C H H CH2CH3
CH3 CH3
nitrogen bonds used for the
atomic layer deposition of metals, metal nitrides, and oxides. See WO 2004/046417A2.

MOCVD, CVD & ALD Precursors - COPPER
29-3000 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II), 99% 1g
[Cu(TMHD)2] [14040-05-2] 5g
Cu(C11H19O2)2; FW: 430.05; blue xtl.; m.p. 198°; b.p. dec. 315° 25g
(subl. 88°/0.05mm)
93-2929 Copper(II) hexafluoroacetylacetonate hydrate [14781-45-4] 1g
Cu(CF3COCHCOCF3)2·XH2O; FW: 477.64; green to blue xtl.; 5g
m.p. 97-99°; b.p. dec. 220° (subl. 100°/0.5mm) 25g
29-2929 Copper(II) hexafluoroacetylacetonate hydrate, elec. gr. 1g
(99.99+%-Cu) PURATREM [14781-45-4] 5g
Cu(CF3COCHCOCF3)2·XH2O; FW: 477.64; green to blue xtl.; 25g
m.p. 85-89°; b.p. dec. 220° (subl. 70°/0.05mm) hygroscopic
93-2966 Copper(II) trifluoroacetylacetonate, 97+% [14324-82-4] 5g
Cu(CF3COCHCOCH3)2; FW: 369.70; purple pwdr.; m.p. 194-196°; 25g
b.p. dec. 260° (subl. 140°/0.1mm)
29-5500 Cyclopentadienyl(triethylphosphine)copper(I), min. 98% 1g
[12261-30-2] 5g
(C5H5)CuP(C2H5)3; FW: 246.80; white to off-white xtl.; b.p. subl. 25g
60°/0.01mm
29-2930 Trimethylphosphine(hexafluoroacetylacetonato)copper(I), 5g
min. 98% [135707-05-0] 25g
Cu(CF3COCHCOCF3)P(CH3)3; FW: 346.68; orange xtl.; m.p. 65°;
b.p. (subl. 33°/10mm)
air sensitive
MOCVD, CVD & ALD Precursors - DYSPROSIUM

66-8500 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)dysprosium(III), 1g
98+% (99.9%-Dy) (REO) [Dy(TMHD)3] [15522-69-7] 5g
Dy(C11H19O2)3; FW: 712.31; off-white xtl.; m.p. 182-185°;
b.p. dec. 265°
hygroscopic
MOCVD, CVD & ALD Precursors - ERBIUM

68-6900 Erbium(III) hexafluoroacetylacetonate hydrate (99.9%-Er) 1g
(REO) [18923-92-7] 5g
Er(CF3COCHCOCF3)3·XH2O; FW: 788.45; pink xtl.
68-7000 Tris(n-butylcyclopentadienyl)erbium (99.9%-Er) (REO) 1g
amp [153608-51-6] 5g
(C4H9C5H4)3Er; FW: 530.87; yellow to orange liq.; b.p. 240°/0.1mm
68-8000 Tris(cyclopentadienyl)erbium (99.9%-Er) (REO) [39330-74-0] 1g
amp (C5H5)3Er; FW: 362.55; pink pwdr.; m.p. 285°; b.p. subl. 5g
HAZ 200°/0.01mm
68-7200 Tris(i-propylcyclopentadienyl)erbium (99.9%-Er) (REO) 1g
amp [130521-76-5] 5g
(C3H7C5H4)3Er; FW: 488.79; yellow to orange xtl.; m.p. 63-65°;
b.p. subl. 222°/10mm
68-8740 Tris(methylcyclopentadienyl)erbium (99.9%-Er) (REO) 1g
amp [39470-10-5] 5g
(CH3C5H4)3Er; FW: 404.62; yellow pwdr.
air sensitive
MOCVD, CVD & ALD Precursors - ERBIUM
68-8750 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)erbium(III), 99% 1g
(99.9%-Er) (REO) [Er(TMHD)3] [35733-23-4] 5g
Er(C11H19O2)3; FW: 717.08; pink xtl.; m.p. 168-171°; b.p. dec. 345° 25g
(subl. 160°/0.1mm)
MOCVD, CVD & ALD Precursors - EUROPIUM

93-6328 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)europium(III), 1g
99% (99.9%-Eu) (REO) [Eu(TMHD)3] [15522-71-1] 5g
Eu(C11H19O2)3; FW: 701.78; yellow pwdr.; m.p. 188-189°;
b.p. dec. 275°
MOCVD, CVD & ALD Precursors - GADOLINIUM

64-4000 Tris(cyclopentadienyl)gadolinium (99.9%-Gd) (REO) 1g
amp [1272-21-5] 5g
HAZ (C5H5)3Gd; FW: 352.54; off-white pwdr.
64-5000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)gadolinium(III), 1g
99%(99.9%-Gd) (REO) [Gd(TMHD)3] [14768-15-1] 5g
Gd(C11H19O2)3; FW: 707.07; off-white xtl.; m.p. 178-183°;
b.p. dec. 295°
MOCVD, CVD & ALD Precursors - GALLIUM

31-2030 Bis(µ-dimethylamino)tetrakis H3 C CH3 1g
(dimethylamino)digallium, 98% (H3C)2N N N(CH3)2 5g
[57731-40-5]
Ga Ga
amp C12H36Ga2N6; FW: 403.90; white xtl.
HAZ moisture sensitive (H3C)2N N N(CH3)2
H3 C CH3
Technical Note:
1. Useful precursor for the CVD and ALD of gallium oxide films, pyrolysis to GaN quantum dots, and
the preparation of gallium nitride nanoparticles. See www.strem.com for additional information.
93-3130 Gallium(III) acetylacetonate (99.99+%-Ga) PURATREM 5g
[14405-43-7] 25g
Ga(CH3COCHCOCH3)3; FW: 367.05; white to pale yellow pwdr.;
m.p. 192-194° dec. >280°; b.p. 140°/10 mm subl.; d. 1.42
31-1500 Triethylgallium, min. 97% [1115-99-7] 25g
HAZ (C2H5)3Ga; FW: 156.91; colorless liq.; m.p. -82.3°; b.p. 143°; 100g
f.p. -1°F; d. 1.0586 moisture sensitive, pyrophoric
98-1862 Triethylgallium, elec. gr. (99.9999%-Ga) PURATREM 50g

HAZ [1115-99-7] 100g
(C2H5)3Ga; FW: 156.91; colorless liq.; m.p. -82.3°; b.p. 143°;
d. 1.0586 moisture sensitive, pyrophoric
31-2000 Trimethylgallium, 99+% [1445-79-0] 25g
HAZ (CH3)3Ga; FW: 114.83; colorless liq.; m.p. -15.8°; b.p. 55.7°; 100g
f.p. -1°F; d. 1.151
98-2000 Trimethylgallium, elec. gr. (99.9999%-Ga) PURATREM 50g
HAZ [1445-79-0] 100g
(CH3)3Ga; FW: 114.83; colorless liq.; m.p. -15.8°; b.p. 55.7°;
f.p. -1°F; d. 1.151
31-5000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)gallium(III), 99% 1g
(99.999%-Ga) [Ga(TMHD)3] PURATREM [34228-15-4] 5g
Ga(C11H19O2)3; FW: 619.54; white xtl.; m.p. 219-220°; 25g
b.p. dec. 360° (subl. 170°/0.2mm)

MOCVD, CVD & ALD Precursors - GERMANIUM
93-3206 Germanium(IV) ethoxide (99.99+%-Ge) PURATREM 1g
HAZ [14165-55-0] 5g
Ge(OC2H5)4; FW: 252.85; colorless liq.; m.p. -81°; b.p. 185.5° 25g
moisture sensitive
32-2050 Tetra-n-butylgermane, min. 98% [1067-42-1] 5g
(n-C4H9)4Ge; FW: 301.05; colorless liq.; b.p. 130-133°/5 mm; 25g
d. 0.934
93-3227 Tetraethylgermane, 99% [597-63-7] 2g
HAZ (C2H5)4Ge; FW: 188.84; colorless liq.; m.p. -90°; b.p. 165.5°; 10g
f.p. 85°F; d. 1.1989
32-2125 Tetramethylgermane, 99% [865-52-1] 1g
HAZ (CH3)4Ge; FW: 132.73; colorless liq.; m.p. -88°; b.p. 43.4°; 5g
f.p. -35°F; d. 0.978 25g
MOCVD, CVD & ALD Precursors - GOLD

79-1500 Dimethyl(acetylacetonate)gold(III), 98% (99.9%-Au) 500mg
[14951-50-9] 2g
(CH3)2(C5H7O2)Au; FW: 326.60; white to off-white xtl.; m.p. 81-82°;
b.p. subl. ~25°/0.01mm
(store cold)
Technical Note:
1. Highly volatile gold source for MOCVD applications. Must ship overnight in dry ice.
79-1600 Dimethyl(trifluoroacetylacetonate)gold(III), 98% (99.9%-Au) 500mg
HAZ [63470-53-1] 2g
(CH3)2Au(CF3COCHCOCH3); FW: 380.12; white to off-white xtl.
air sensitive, heat sensitive, light sensitive, (store cold)
Technical Note:
1. Highly volatile gold source for MOCVD applications. Must ship overnight in dry ice.
MOCVD, CVD & ALD Precursors - HAFNIUM

72-0700 Bis(cyclopentadienyl)dimethylhafnium, min. 97% 500mg
[37260-88-1] 2g
(C5H5)2Hf(CH3)2; FW: 338.75; white xtl.; b.p. subl. 90°/0.1mm
72-5800 Hafnium(IV) t-butoxide (99.9%-Hf) [2172-02-3] 2g
amp Hf[OC(CH3)3]4; FW: 470.65; liq. (may contain small amount of 10g
white sediment); b.p. 90°/5 mm
moisture sensitive, light sensitive
72-5900 Hafnium(IV) ethoxide, 99% [13428-80-3] 5g
Hf4O(OC2H5)14·2C2H5OH; FW: 358.73; white to off-white xtl. 25g
moisture sensitive
72-8000 Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, 1g
HAZ <0.2% Zr) PURATREM [19962-11-9] 5g
Hf(N(CH3)2)4; FW: 709.60; colorless to pale yellow xtl.; 25g
m.p. 38-41°; b.p. 85°/0.1mm
moisture sensitive, (store cold)
MOCVD, CVD & ALD Precursors - HOLMIUM

67-5000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)holmium(III), 99% 1g
(99.9%-Ho) (REO) [Ho(TMHD)3] [15522-73-3] 5g
Ho(C11H19O2)3; FW: 714.75; off-white xtl.; m.p. 179-181°;
b.p. dec. 290°

MOCVD, CVD & ALD Precursors - INDIUM
97-3425 Cyclopentadienylindium(I), elec. gr. (99.999+%-In) 1g
HAZ PURATREM [34822-89-4] 5g
C5H5In; FW: 179.92; off-white xtl.; b.p. subl. 50°/0.01 mm
air sensitive, heat sensitive, light sensitive
93-4905 Indium(III) trifluoroacetylacetonate, 99% [15453-87-9] 1g
In(CF3COCHCOCH3)3; FW: 574.06; white pwdr.
49-2010 Trimethylindium, 98+% (99.9+%-In) [3385-78-2] 2g
amp (CH3)3In; FW: 159.92; white xtl.; m.p. 88°; f.p. -1°F; d. 1.568 10g
HAZ heat sensitive, moisture sensitive, pyrophoric, (store cold)
Note:
WARNING - Trimethylindium may undergo rapid thermal decomposition if exposed to
temperatures above 100°C. Never attempt to distill the material at atmospheric pressure.
98-2010 Trimethylindium, elec. gr. (99.999%-In) PURATREM 100g
HAZ [3385-78-2]
(CH3)3In; FW: 159.93; white xtl.; m.p. 88°; f.p. -1°F; d. 1.568
heat sensitive, moisture sensitive, pyrophoric, (store cold)
Note:
WARNING - Trimethylindium may undergo rapid thermal decomposition if exposed to
temperatures above 100°C. Never attempt to distill the material at atmospheric pressure.
49-2200 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)indium(III), 99% 1g
(99.9%-In) [In(TMHD)3] [34269-03-9] 5g
In(C11H19O2)3; FW: 664.63; white to off-white pwdr.; m.p. 167°
MOCVD, CVD & ALD Precursors - IRIDIUM

77-0900 1,5-Cyclooctadiene(acetylacetonato)iridium(I), 99% (99.9%-Ir) 100mg
[12154-84-6] 500mg
Ir(C8H12)(C5H7O2); FW: 399.49; yellow xtl.; m.p. 145-150° dec.
77-5000 (Methylcyclopentadienyl)(1,5-cyclo- CH3 250mg
octadiene)iridium(I), 99% (99.9%-Ir) 1g
[132644-88-3]
(C6H7)(C8H12)Ir; FW: 379.53; Ir
white to off-white pwdr.; m.p. 38-40°;
b.p. subl. 100°/0.05mm
Technical Note:
1. Air-stable product used in the low-temperature vapor deposition of iridium.
References:
1. J. Material Chem., 1991, 1(4), 551.
2. J. Vac. Sci. Tech. A, 2000, 18, 10.
3. Surface and Coating Technology, 2003, 163-164, 208.
4. J. of Material Research, 2001, 16(8), 2192.
77-9700 Tris(norbornadiene)(acetylacetonato)iridium(III), 98% 100mg
(99.9%-Ir) [41612-46-8] 500mg
Ir(C7H8-C7H8)(C7H8)(C5H7O2); FW: 567.75; light yellow pwdr.;
m.p. 189°
MOCVD, CVD & ALD Precursors - IRON

26-1699 Bis(cyclopentadienyl)iron, 98% (Ferrocene) [102-54-5] 500g
(C5H5)2Fe; FW: 186.04; orange xtl.; m.p. 172-173° 2kg
26-1700 Bis(cyclopentadienyl)iron, 99% (Ferrocene) [102-54-5] 100g
(C5H5)2Fe; FW: 186.04; orange xtl.; m.p. 172-173° 500g
2kg
26-0310 Bis(ethylcyclopentadienyl)iron, min. 98% [1273-97-8] 1g
[(C2H5)C5H4]2Fe; FW: 242.14; orange liq. 5g

MOCVD, CVD & ALD Precursors - IRON
26-0400 Bis(pentamethylcyclopentadienyl)iron, 99% [12126-50-0] 1g
[(CH3)5C5]2Fe; FW: 326.31; orange xtl.; m.p. 298-300° subl. 5g
air sensitive
26-0450 Bis(i-propylcyclopentadienyl)iron, min. 98% [12126-34-0] 1g
[(C3H7)C5H4]2Fe; FW: 270.20; orange liq. 5g
93-2602 n-Butylferrocene, 99% [31904-29-7] 10g
(C4H9C5H4)Fe(C5H5); FW: 242.14; orange to brown liq.; 50g
b.p. 232°/630 mm; f.p. >230°F; d. 1.172
26-0700 t-Butylferrocene, min. 98% [1316-98-9] 1g
(CH3)3CC5H4FeC5H4; FW: 242.15; dark-orange liq.; 5g
b.p. 80°/0.15mm 25g
26-0850 Cyclohexadiene iron tricarbonyl, 98% [12152-72-6] 5g
HAZ C6H8Fe(CO)3; FW: 220.01; yellow to orange liq.; m.p. 8°
26-0875 Cyclooctatetraene iron tricarbonyl, 98% [12093-05-9] 1g
HAZ C8H8Fe(CO)3; FW: 244.03; red to brown xtl.; m.p. 93-95° 5g
air sensitive
26-1600 Ethylferrocene, 98% [1273-89-8] 5g
C2H5C5H4FeC5H5; FW: 214.09; red-orange liq. 25g
26-2800 Iron pentacarbonyl, 99.5% (99.9%-Fe) [13463-40-6] 250g
HAZ Fe(CO)5; FW: 195.90; orange liq.; m.p. -20°; b.p. 103°; f.p. 5°F; 1kg
d. 1.490
™
26-2801 Iron pentacarbonyl, 99.5% (Sure/Seal bottle) [13463-40-6] 250g
HAZ Fe(CO)5; FW: 195.90; orange liq.; m.p. -20°; b.p. 103°; f.p. 5°F; 1kg
d. 1.490
93-2644 Iron(III) trifluoroacetylacetonate, 99% (99.9%-Fe) [14526-22-8] 5g

Fe(CF3COCHCOCH3)3; FW: 515.09; red xtl.; m.p. 110-112° 25g
26-3910 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)iron(III), 99% 1g
(99.9%-Fe) [Fe(TMHD)3] [14876-47-2] 5g
Fe(C11H19O2)3; FW: 605.66; red xtl.; m.p. 164°; b.p. dec. 300° 25g
MOCVD, CVD & ALD Precursors - LANTHANUM

57-3000 Tris(cyclopentadienyl)lanthanum (99.9%-La) (REO) 1g
amp [1272-23-7] 5g
(C5H5)3La; FW: 334.19; white to off-white xtl.; m.p. 295° dec.
57-4000 Tris(i-propylcyclopentadienyl)lanthanum (99.9%-La) (REO) 1g
amp [68959-87-5] 5g
(C3H7C5H4)3La; FW: 460.43; colorless to pale yellow liq.;
b.p. 180-195°/0.02mm
57-1000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III), 1g
99% (99.9%-La) (REO) [La(TMHD)3] [14319-13-2] 5g
La(C11H19O2)3; FW: 688.72; white pwdr.; m.p. 227-231°; 25g
b.p. dec. 370° (subl. 210°/0.2mm)

MOCVD, CVD & ALD Precursors - LANTHANUM
57-1100 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanum(III) 1g
tetraglyme adduct (99.9%-La) (REO) [151139-14-9] 5g
La(C11H19O2)3·CH3(OCH2CH2)4OCH3; FW: 688.72 (911.00); 25g
white to pale yellow xtl.; m.p. 59°; b.p. 125°/0.1mm
MOCVD, CVD & ALD Precursors - LEAD

82-2100 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)lead(II), 99% 1g
[Pb(TMHD)2] [21319-43-7] 5g
Pb(C11H19O2)2; FW: 573.75; white pwdr.; m.p. 126-128°; b.p. 325° 25g
dec. (subl. 134°/0.1mm)
93-8265 Lead(II) hexafluoroacetylacetonate, min. 98% [19648-88-5] 1g
Pb(CF3COCHCOCF3)2; FW: 621.29; white pwdr.; m.p. 153-158°; 5g
b.p. dec. 210° (subl. 180°/0.05 mm)
MOCVD, CVD & ALD Precursors - MAGNESIUM

97-1040 Bis(cyclopentadienyl)magnesium (99.99+%-Mg) PURATREM 1g
amp [1284-72-6] 5g
HAZ (C5H5)2Mg; FW: 154.49; white to light pink xtl.; m.p. 176°; 25g
b.p. 290° (subl. 160°/0.1mm)
12-0500 Bis(cyclopentadienyl)magnesium (99.9+%-Mg) [1284-72-6] 1g
amp (C5H5)2Mg; FW: 154.49; white to light-pink xtl.; m.p. 176°; 5g
HAZ b.p. 290° (subl. 160°/0.1mm) 25g
12-0510 Bis(ethylcyclopentadienyl)magnesium, min. 98% 1g
amp [114460-02-5] 5g
HAZ (C2H5C5H4)2Mg; FW: 210.60; liq. 25g
97-1045 Bis(pentamethylcyclopentadienyl)magnesium, elec. gr. 1g
amp (99.999%-Mg) PURATREM [74507-64-5] 5g
HAZ [(CH3)5C5]2Mg; FW: 294.77; white to yellow xtl. 25g
12-0550 Bis(n-propylcyclopentadienyl)magnesium, min. 98% 1g
amp [114504-74-4] 5g
HAZ (C3H7C5H4)2Mg; FW: 238.66; liq.
12-1000 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)magnesium 1g
dihydrate, min. 98% [Mg(TMHD)2] [21361-35-3] 5g
Mg(C11H19O2)2·2H2O; FW: 390.85 (426.88); white pwdr.; 25g
m.p. 135-150° (-H2O); b.p. dec. 290° (subl. 150°/0.05mm)
12-1212 Magnesium (N,N,N',N'-tetramethylethylenediamine)bis[BREW] 1g
(99.99+%-Mg) PURATREM 5g
Mg(C6H16N2)[CxHyC(O)CHC(O)CxHy]2 (x=3-4, y=2x+1);
pale yellow liq.
moisture sensitive
MOCVD, CVD & ALD Precursors - MANGANESE

25-0200 Bis(cyclopentadienyl)manganese, 98+% (Manganocene) 1g
amp [73138-26-8] 5g
HAZ (C5H5)2Mn; FW: 185.13; brown xtl. 25g

MOCVD, CVD & ALD Precursors - MANGANESE
25-0210 Bis(ethylcyclopentadienyl)manganese, min. 98% 1g
amp [101923-26-6] 5g
HAZ [(C2H5)C5H4]2Mn; FW: 241.23; dark red liq.
25-0235 Bis(pentamethylcyclopentadienyl)manganese, min. 98% 1g
amp (Decamethylmanganocene) [67506-86-9] 5g
[(CH3)5C5]2Mn; FW: 325.38; orange xtl.; m.p. 292°
25-0245 Bis(i-propylcyclopentadienyl)manganese, min. 98% 1g
amp [85594-02-1] 5g
HAZ [(C3H7)C5H4]2Mn; FW: 269.28; dark red liq.
25-0390 Cyclopentadienylmanganese tricarbonyl, 98% [12079-65-1] 5g
HAZ C5H5Mn(CO)3; FW: 204.06; yellow xtl.; m.p. 77° 25g
air sensitive
25-1330 Manganese carbonyl, 98% [10170-69-1] 2g
Mn2(CO)10; FW: 389.99; yellow xtl.; m.p. 152-155° 10g
air sensitive, (store cold) 50g
25-1550 Methylcyclopentadienylmanganese tricarbonyl, min. 97% 5g

HAZ [12108-13-3] 25g
(CH3C5H4)Mn(CO)3; FW: 218.09; yellow liq.; m.p. -2.2°; b.p. 233°; 100g
f.p. 205°F; d. 1.38
25-5000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)manganese(III), 1g
99% [Mn(TMHD)3] [14324-99-3] 5g
Mn(C11H19O2)3; FW: 604.74; black xtl.; m.p. 165°; b.p. dec. 255° 25g
MOCVD, CVD & ALD Precursors - MERCURY

80-1800 Dimethylmercury [593-74-8] 10g
amp (CH3)2Hg; FW: 230.68; colorless liq.; m.p. -43°; b.p. 91-92°;
HAZ f.p. 42°F; d. 2.954
(store cold)
MOCVD, CVD & ALD Precursors - MOLYBDENUM

42-0200 Bis(ethylbenzene)molybdenum [mixture of (C2H5)xC6H6-x 1g
amp where x = 0-4)] 5g
HAZ [(C2H5)xC6H6-x]2Mo; dark green liq.; b.p. 150-170°/1mm 25g
air sensitive
42-0350 Cycloheptatriene molybdenum tricarbonyl, 99% [12125-77-8] 1g
amp C7H8Mo(CO)3; FW: 272.11; orange to red xtl.; m.p. 100-101° 5g
42-1350 Molybdenum carbonyl, 98% [13939-06-5] 25g
HAZ Mo(CO)6; FW: 264.01; white xtl.; m.p. 150-151° dec. 100g
500g
MOCVD, CVD & ALD Precursors - NEODYMIUM

93-6005 Neodymium(III) hexafluoroacetylacetonate dihydrate 5g
(99.9%-Nd) (REO) [47814-18-6]
Nd(CF3COCHCOCF3)3·2H2O; FW: 765.39 (801.42); purple xtl.
93-6017 Neodymium(III) trifluoroacetylacetonate (99.9%-Nd) 1g
[37473-67-9] 5g
Nd(CF3COCHCOCH3)3; FW: 603.48; bluish-pink xtl.;
m.p. 140-142°

MOCVD, CVD & ALD Precursors - NEODYMIUM
60-5000 Tris(cyclopentadienyl)neodymium, 99% (99.9%-Nd) (REO) 1g
amp [1273-98-9] 5g
HAZ (C5H5)3Nd; FW: 339.53; blue to purple pwdr.; b.p. subl. 25g
220°/0.01mm
60-6000 Tris(i-propylcyclopentadienyl)neodymium (99.9%-Nd) (REO) 1g
amp [69021-85-8] 5g
(C3H7C5H4)3Nd; FW: 465.77; purple solid
60-8750 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)neodymium(III), 1g
99% (99.9%-Nd) (REO) [Nd(TMHD)3] [15492-47-4] 5g
Nd(C11H19O2)3; FW: 694.06; light purple xtl.; m.p. 209-212°;
b.p. dec. 270° (subl. 150°/0.1mm)
MOCVD, CVD & ALD Precursors - NICKEL

28-1301 Bis(cyclopentadienyl)nickel, 99% (Nickelocene) [1271-28-9] 5g
HAZ (C5H5)2Ni; FW: 188.90; dark green xtl.; m.p. 173-174° 25g
air sensitive, (store cold) 100g
28-0083 Bis(ethylcyclopentadienyl)nickel, min. 98% [31886-51-8] 1g

amp [(C2H5)C5H4]2Ni; FW: 244.99; green liq. 5g
HAZ air sensitive, (store cold)
28-0085 Bis(pentamethylcyclopentadienyl)nickel, 98% 1g
amp (Decamethylnickelocene) [74507-63-4] 5g
HAZ [(CH3)5C5]2Ni; FW: 329.17; greenish-black xtl.
28-0086 Bis(i-propylcyclopentadienyl)nickel, min. 98% [57197-55-4] 1g
amp [(C3H7)C5H4]2Ni; FW: 273.04; green liq. 5g
HAZ air sensitive, (store cold)
28-0088 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), 1g
min. 98% (99.9%-Ni) [Ni(TMHD)2] [41749-92-2] 5g
Ni(C11H19O2)2; FW: 425.23; purple xtl.; m.p. 223-225°; 25g
b.p. subl. 90-110°/0.1mm
hygroscopic
28-1150 Nickel carbonyl [13463-39-3] 100g
HAZ Ni(CO)4; FW: 170.73; colorless liq.; m.p. -19.3°; b.p. 43°; d. 1.32 450g
heat sensitive, pyrophoric
MOCVD, CVD & ALD Precursors - NIOBIUM

93-4104 Niobium(V) ethoxide (99.9+%-Nb) [3236-82-6] 5g
amp Nb(OC2H5)5; FW: 318.22; yellow to orange liq.; m.p. 6°; 25g
HAZ b.p. 142°/0.1mm; d. 1.32
moisture sensitive
41-7000 Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)niobium(IV), 1g
99% [Nb(TMHD)4] [41706-15-4] 5g
Nb(C11H19O2)4; FW: 826.00; black xtl.; m.p. 219-220°; 25g
b.p. dec. 325°
MOCVD, CVD & ALD Precursors - OSMIUM

76-0150 Bis(cyclopentadienyl)osmium, 99% (99.9%-Os) (Osmocene) 250mg
[1273-81-0] 1g
(C5H5)2Os; FW: 320.39; white xtl.; m.p. 226-228°

MOCVD, CVD & ALD Precursors - OSMIUM
76-0200 Bis(pentamethylcyclopentadienyl)osmium, 99% (99.9%-Os) 500mg
amp (Decamethylosmocene) [100603-32-5] 2g
[(CH3)5C5]2Os; FW: 460.66; off-white pwdr.
MOCVD, CVD & ALD Precursors - OXYGEN

08-2012 H-BREW (mixed propyl and butyl substituted beta-diketones) 5g
HyCxC(O)CH2C(O)CxHy (x=3-4) (y=2x+1); colorless to 25g
pale-yellow liq.
Technical Note:
1. H-BREW is a mixture of propyl and butyl substituted beta-diketonates capable of
forming a wide variety of metal complexes suitable for MOCVD. In most cases, the
metal complexes are liquids, are completely miscible with polar and non-polar organic
solvents and are miscible with other metal complexes in essentially all proportions.
MOCVD, CVD & ALD Precursors - PHOSPHORUS

93-1543 Phosphorus oxychloride, 98+% [10025-87-3] 250g
HAZ POCl3; FW: 153.35; colorless liq.; m.p. 2°; b.p. 105.3°; d. 1.675 1kg
moisture sensitive
97-8875 Phosphorus oxychloride, elec. gr. (99.999%-P) PURATREM 25g
amp [10025-87-3] 100g
HAZ POCl3; FW: 153.35; colorless liq.; m.p. 2°; b.p. 105.3°; d. 1.675
moisture sensitive
15-7800 Tris(dimethylamino)phosphine, min. 98% HMPT [1608-26-0] 1g
amp [(CH3)2N]3P; FW: 163.21; yellow liq.; b.p. 49-51°/12 mm; f.p. 98°F; 5g
HAZ d. 0.898
MOCVD, CVD & ALD Precursors - PLATINUM

78-1550 Platinum(II) hexafluoroacetylacetonate, 98% (99.9%-Pt) 500mg
[65353-51-7] 2g
Pt(CF3COCHCOCF3)2; FW: 609.22; orange xtl.; m.p. 143-145°;
b.p. subl. 65°/0.1mm
98-0925 Tetrakis(trifluorophosphine)platinum (0) 5g
amp (ampouled under PF3) [19529-53-4]
HAZ Pt(PF3)4; FW: 547.01; colorless to light yellow liq.; b.p. ~80°; d. 2.2
air sensitive, moisture sensitive, (store cold)
78-1350 (Trimethyl)methylcyclopentadienylplatinum(IV), 99% 500mg
[94442-22-5] 2g
(CH3)3(CH3C5H4)Pt; FW: 319.32; off-white pwdr.; m.p. 30-31°;
b.p. (subl. 23°/0.053mm)
air sensitive
MOCVD, CVD & ALD Precursors - PRASEODYMIUM

93-5907 Praseodymium(III) hexafluoroacetylacetonate (99.9%-Pr) 1g
(REO) [47814-20-0] 5g
Pr(CF3COCHCOCF3)3; FW: 762.06; light green pwdr.
93-5916 Praseodymium(III) trifluoroacetylacetonate (99.9%-Pr) (REO) 1g
[59991-56-9] 5g
Pr(CF3COCHCOCH3)3; FW: 600.15; light green pwdr.
59-7500 Tris(cyclopentadienyl)praseodymium (99.9%-Pr) (REO) 1g
amp [11077-59-1] 5g
(C5H5)3Pr; FW: 336.20; pwdr.; m.p. 427° dec.; b.p. subl.
220°/0.01mm
MOCVD, CVD & ALD Precursors - PRASEODYMIUM
59-8000 Tris(i-propylcyclopentadienyl)praseodymium (99.9%-Pr) 1g
amp (REO) [69021-86-9] 5g
(C3H7C5H4)3Pr; FW: 462.44; light green xtl.
93-5937 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)praseodymium 1g
(III), 99% (99.9%-Pr) (REO) [Pr(TMHD)3] [15492-48-5] 5g
Pr(C11H19O2)3; FW: 690.72; light green pwdr.; m.p. 212-214°;
b.p. dec. 300° (subl. 150°/0.1mm)
MOCVD, CVD & ALD Precursors - RHENIUM

75-2300 Cyclopentadienylrhenium tricarbonyl, 99% [12079-73-1] 1g
(C5H5)Re(CO)3; FW: 335.33; white xtl. 5g
75-2400 Pentamethylcyclopentadienylrhenium tricarbonyl, min. 98% 500mg
[12130-88-0] 2g
[(CH3)5C5]Re(CO)3; FW: 405.46; off-white pwdr.; m.p. 149-151°
75-2410 i-Propylcyclopentadienylrhenium tricarbonyl, min. 97% 250mg
amp [126250-68-8] 1g
(C3H7)C5H4Re(CO)3; FW: 377.41; light-yellow liq.
(store cold)
75-1800 Rhenium carbonyl, 98% [14285-68-8] 1g
Re2(CO)10; FW: 652.51; white to yellow xtl.; m.p. 170° dec.; 5g
d. 2.87 25g
MOCVD, CVD & ALD Precursors - RHODIUM

45-0739 Dicarbonyl(pentamethylcyclopentadienyl)rhodium(I), 99% 100mg
(99.9%-Rh) [32627-01-3] 500mg
(CH3)5C5Rh(CO)2; FW: 294.16; red xtl.
45-1800 Rhodium(III) acetylacetonate, 97+% (99.9%-Rh) [14284-92-5] 250mg
Rh(C5H7O2)3; FW: 400.24; yellow xtl.; m.p. 260°; b.p. dec. >280° 1g
(subl. 240°/0.1mm) 5g
MOCVD, CVD & ALD Precursors - RUTHENIUM

44-6200 Bis(cyclopentadienyl)ruthenium, 99% (99.9%-Ru) 1g
(Ruthenocene) [1287-13-4] 5g
(C5H5)2Ru; FW: 231.26; light yellow xtl.; m.p. 194-198°
44-0030 Bis(2,4-dimethylpentadienyl)ruthenium(II), 99% [85908-78-7] 250mg
(C7H11)2Ru; FW: 291.39; yellow solid; m.p. 85° 1g
Technical Note:
1. Volatile ruthenium complex, useful for the MOCVD of ruthenium and ruthenium oxide.
References:
1. Electrochemical and Solid-State Letters, 2007, 10(6).
2. ECS Transactions 2006, 1(5, Physics and Technology of High-k Gate Dielectrics III), 139-144.
3. Journal of Crystal Growth, 1998, 195(1-4), 69-73.
4. Materials Research Society Symposium Proceedings, 1998, 495(Chemical Aspects of Electronic
Ceramics Processing), 51-55 and 75-80.
44-0040 Bis(ethylcyclopentadienyl)rutheniu(II), 98% (99.9%-Ru) 500mg
[32992-96-4] 2g
[(CH3CH2)C5H4]2Ru; FW: 287.37; pale yellow liq.
Technical Note: Liquid, ruthenium CVD precursor.
44-0050 Bis(pentamethylcyclopentadienyl)ruthenium, 99% (99.9%-Ru) 500mg
(Decamethylruthenocene) [84821-53-4] 2g
[(CH3)5C5]2Ru; FW: 371.53; off-white xtl.

MOCVD, CVD & ALD Precursors - RUTHENIUM
44-0060 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)(1,5-cyclo- 1g
octadiene)ruthenium(II), 99% (99.9%-Ru) [329735-79-7] 5g
(C11H19O2)2(C8H12)Ru; FW: 575.80; yellow-orange microxtl.;
m.p. 187-190°; b.p. dec. 220° (subl. 100°/0.05mm)
Technical Note:
1. Ruthenium precursor for MOCVD. Air stable, readily sublimable organometallic
complex.
44-1850 Ruthenium carbonyl, 99% [15243-33-1] O
O 1g
O C
Ru3(CO)12; FW: 639.34; orange xtl.; C 5g
C
m.p. 150° dec. OC CO 25g
Ru Ru
OC Ru CO
OC CO
C C C
O O O
44-8000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)ruthenium(III), 1g
99% (99.9%-Ru) [Ru(TMHD)3] [38625-54-6] 5g
Ru(C11H19O2)3; FW: 650.88; orange pwdr.; m.p. 210-213°;
b.p. dec. 250° (subl. 120°/0.5mm)
MOCVD, CVD & ALD Precursors - SAMARIUM

93-6219 Samarium(III) trifluoroacetylacetonate (99.9%-Sm) (REO) 1g
[23301-82-8] 5g
Sm(CF3COCHCOCH3)3; FW: 609.59; white pwdr.
62-3500 Tris(cyclopentadienyl)samarium (99.9%-Sm) (REO) 1g
amp [1298-55-1] 5g
HAZ (C5H5)3Sm; FW: 345.69; orange pwdr.; m.p. 356°
62-4000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)samarium(III) 1g
(99.9%-Sm) (REO) [Sm(TMHD)3] [15492-50-9] 5g
Sm(C11H19O2)3; FW: 700.11; pale yellow xtl.; m.p. 191-193°;
b.p. dec. 250° (subl. 183°/1.3mm)
MOCVD, CVD & ALD Precursors - SCANDIUM

21-0900 Tris(cyclopentadienyl)scandium, min. 98% (99.9%-Sc) (REO) 1g
amp [1298-54-0] 5g
HAZ (C5H5)3Sc; FW: 240.25; pwdr.; m.p. 240°; b.p. subl. 200°/0.05mm
21-1000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)scandium(III), 500mg
99% (99.9%-Sc) (REO) [Sc(TMHD)3] [15492-49-6] 2g
Sc(C11H19O2)3; FW: 594.77; white pwdr.; m.p. 150-152°;
b.p. dec. 275°
MOCVD, CVD & ALD Precursors - SELENIUM

34-0380 Diethyldiselenide [628-39-7] 10g
HAZ C2H5SeSeC2H5; FW: 216.04; light yellow liq.; b.p. 85°/21mm; 50g
STENCH
34-0550 Dimethylselenide, 99% [593-79-3] 10g
amp (CH3)2Se; FW: 109.03; colorless liq.; b.p. 57-58°; d. 1.4077; 50g
HAZ STENCH
air sensitive, heat sensitive, (store cold)

MOCVD, CVD & ALD Precursors - SELENIUM
97-4486 Dimethylselenide, elec. gr. (99.99+%-Se) PURATREM 25g
HAZ [593-79-3] 100g
(CH3)2Se; FW: 109.03; colorless liq.; b.p. 57-58°; d. 1.4077;
STENCH
MOCVD, CVD & ALD Precursors - SILICON

93-1451 Tetrabutoxysilane, min. 97% [4766-57-8] 10g
Si(OC4H9)4; FW: 320.53; colorless liq.; b.p. 115°/3 mm; f.p. 174°F; 50g
d. 0.90 moisture sensitive
93-1454 Tetraethoxysilane, min. 98% [78-10-4] 500g
HAZ Si(OC2H5)4; FW: 208.33; colorless liq.; m.p. -77°; b.p. 165.8°; 2kg
f.p. 116°F; d. 0.934 moisture sensitive
93-1459 Tetramethoxysilane, 98% [681-84-5] 25g
HAZ Si(OCH3)4; FW: 152.20; colorless liq.; m.p. 4-5°; b.p. 121-122°; 100g
f.p. 84°F; d. 1.032 moisture sensitive
14-8750 Tris(dimethylamino)silane, 99+% [15112-89-7] 5g
HAZ [(CH3)2N]3SiH; FW: 161.32; colorless to light yellow liq.; 25g
b.p. 145-148° (4°/16mm); f.p. 77°F; d. 0.84
MOCVD, CVD & ALD Precursors - SILVER

47-2600 2,2,6,6-Tetramethyl-3,5-heptanedionato silver(I) (99.9%-Ag) 1g
[Ag(TMHD)] [79827-25-1] 5g
AgC11H19O2; FW: 291.14; gray pwdr.; m.p. 178° dec. 25g
47-3010 Triethoxyphosphine(trifluoroacetylacetonate)silver(I), 1g
min. 98% [783334-85-0] 5g
Ag(CF3COCHCOCH3)P(OCH2CH3)3; FW: 427.10; yellow solid
Technical Note:
1. Precursor for the chemical vapor deposition of silver films.
Reference:
1. Thin Solid Films, 2005, 478(1-2), 72.
47-3025 Triethylphosphine(6,6,7,7,8,8,8-heptafluoro-2,2-dimethyl- 1g
3,5-octanedionate)silver(I), min. 98% [165461-74-5] 5g
Ag(C3F7COCHCOC4H9)P(CH2CH3)3; FW: 521.20; yellow solid
Technical Note:
1. Precursor for the chemical vapor deposition of silver films.
References:
1. Microelectronic Engineering, 2005, 82(3-4), 296.
2. J. Phys.Chem., 1995, 99, 9230.
3. J. Am. Chem. Soc., 1995, 117, 4030.
47-3000 Trimethylphosphine(hexafluoroacetylacetonato)silver(I), 99% 5g
(99.9%-Ag) [148630-66-4] 25g
Ag(CF3COCHCOCF3)P(CH3)3; FW: 391.00; white to yellow xtl.;
m.p. 140-142°; b.p. subl. 95°/0.1mm
47-8000 Vinyltriethylsilane(hexafluoroacetylacetonato)silver(I) 1g
(99.9%-Ag) [177279-28-6] 5g
Ag(CF3COCHCOCF3)(C8H18Si); FW: 456.45; yellow liq.
Technical Note:
1. Precursor for the chemical vapor deposition of pure silver films.

MOCVD, CVD & ALD Precursors - STRONTIUM
38-1000 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium hydrate 1g
[Sr(TMHD)2] [199445-30-2] 5g
Sr(C11H19O2)2·XH2O; FW: 454.16; light yellow pwdr.; 25g
m.p. 200-203°; b.p. dec. 250° (subl. 230°/0.05mm)
38-1010 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium 1g
tetraglyme adduct (99.99%-Sr) PURATREM [150939-76-7] 5g
Sr(C11H19O2)2·CH3(OCH2CH2)4OCH3; FW: 454.16 (676.44);
Note:
38-1015 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)strontium triglyme 1g
adduct (99.99%-Sr) PURATREM 5g
Sr(C11H19O2)2·CH3(OCH2CH2)3OCH3; FW: 454.16 (632.39);
Note:
38-3838 Strontium bis(N,N,N',N',N''-pentamethyldiethylene- 1g
triamine)bis[BREW] (99.99+%-Sr) PURATREM 5g
Sr(C9H23N3)2[CxHyC(O)CHC(O)CxHy]2 (x=3-4, y=2x +1);
pale yellow liq.
moisture sensitive
Note: 9-11 wt% Sr
38-2000 Strontium hexafluoroacetylacetonate 1g
Sr(CF3COCHCOCF3)2; FW: 501.75; off-white pwdr.; m.p. dec. 5g
260°; b.p. (subl. 220°/0.02mm) 25g
MOCVD, CVD & ALD Precursors - TANTALUM

73-0800 Pentakis(dimethylamino)tantalum(V), 99% [19824-59-0] 1g
amp Ta[N(CH3)2]5; FW: 401.33; orange xtl.; m.p. >150° dec.; 5g
HAZ b.p. subl. 100°/0.1mm 25g
moisture sensitive
93-7303 Tantalum(V) ethoxide (99.99+%-Ta) PURATREM [6074-84-6] 10g
amp Ta(OC2H5)5; FW: 406.26; yellow liq.; m.p. 21°; b.p. 145°/0.1 mm; 50g
HAZ f.p. 87°F; d. 1.56 5 x 50g
moisture sensitive
93-7329 Tantalum(V) methoxide (99.99+%-Ta) PURATREM [865-35-0] 2g
HAZ Ta(OCH3)5; FW: 336.12; white pwdr.; m.p. 50°; b.p. 189°/10 mm 10g
moisture sensitive
73-7373 Tantalum(V) (tetraethoxy)[BREW] (99.99+%-Ta) PURATREM 1g
Ta(C2H5O)4[CxHyC(O)CHC(O)CxHy]2 (x=3-4, y=2x+1); 5g
pale brown liq.
moisture sensitive
73-5000 Tantalum(V) tetraethoxyacetylacetonate (99.99+%-Ta) 10g
HAZ PURATREM [20219-33-4] 50g
Ta(OC2H5)4(CH3COCHCOCH3); FW: 460.30; yellow solid;
m.p. 45°; b.p. 95°/0.5mm; d. 1.5
moisture sensitive

MOCVD, CVD & ALD Precursors - TERBIUM
65-7000 Tris(i-propylcyclopentadienyl)terbium (99.9%-Tb) (REO) 1g
amp [312696-25-6] 5g
(C3H7C5H4)3Tb; FW: 480.45; yellow solid
air sensitive
65-8000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)terbium(III), 99% 1g
(99.9%-Tb) (REO) [Tb(TMHD)3] [15492-51-0] 5g
Tb(C11H19O2)3; FW: 708.74; off-white xtl.; m.p. 155-156°;
b.p. dec. 275°
MOCVD, CVD & ALD Precursors - THALLIUM

81-0305 Cyclopentadienylthallium, 99% (99.9%-Tl) sublimed 1g
HAZ [34822-90-7] 5g
C5H5Tl; FW: 269.47; yellow xtl.; m.p. subl. 75°/0.1mm 25g
81-1000 2,2,6,6-Tetramethyl-3,5-heptanedionato thallium(I), 99% 1g
HAZ [Tl(TMHD)] [56713-38-3] 5g
Tl(C11H19O2); FW: 387.62; off-white xtl.; m.p. 159-164°;
b.p. dec. 260° (subl. 110°/0.1mm)
93-8105 Thallium(I) ethoxide, min. 95% [20398-06-5] 5g
HAZ Tl(OC2H5); FW: 249.43; cloudy, dense liq.; m.p. -3°; b.p. 130° 25g
dec.; d. 3.493 (20°) moisture sensitive
Note: May contain a precipitate.
81-2500 Thallium(I) hexafluoroacetylacetonate, 99% (99.9%-Tl) 1g
HAZ [15444-43-6] 5g
TlCF3COCHCOCF3; FW: 411.42; yellow xtl.; m.p. 126-128°;
b.p. dec. 220° (subl. 140°/0.1mm)
MOCVD, CVD & ALD Precursors - THULIUM

69-6000 Tris(cyclopentadienyl)thulium (99.9%-Tm) (REO) [1272-26-0] 1g
Amp (C5H5)3Tm; FW: 364.22; yellow solid 5g
69-7000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)thulium(III), 98% 1g
(99.9%-Tm) (REO) [Tm(TMHD)3] [15631-58-0] 5g
Tm(C11H19O2)3; FW: 718.75; off-white xtl.; m.p. 169-172°;
b.p. dec. 280°
MOCVD, CVD & ALD Precursors - TIN

50-1900 Tetramethyltin, 98% [594-27-4] 5g
HAZ Sn(CH3)4; FW: 178.83; colorless liq.; m.p. -54.8°; b.p. 76-78°; 25g
f.p. 9°F; d. 1.3149
50-1977 Tin(II) acetylacetonate, min. 98% [56508-29-3] 10g
Sn(CH3COCHCOCH3)2; FW: 316.93; yellow liq.; b.p. 110°/0.1mm; 50g
d. 1.45
moisture sensitive
50-2100 Tin(IV) t-butoxide (99.99%-Sn) PURATREM [36809-75-3] 1g
amp Sn(OC4H9)4; FW: 411.17; colorless solid; m.p. 45°; 5g
b.p. 65°/0.3mm; d. 1.06 25g
moisture sensitive
50-1980 Tin(II) hexafluoroacetylacetonate (99.9%-Sn) [51319-99-4] 5g
Sn(CF3COCHCOCF3)2; FW: 532.81; yellow solid; m.p. 72°; 25g
b.p. 125°/2mm

MOCVD, CVD & ALD Precursors - TITANIUM
22-1030 Tetrachlorodiamminetitanium(IV), 99% [15719-81-0] 5g
HAZ TiCl4(NH3)2; FW: 223.75; yellow pwdr.; m.p. 240° dec.; 25g
b.p. subl. 120°/0.1mm
moisture sensitive
22-1050 Tetrakis(diethylamino)titanium, 99% [4419-47-0] 5g
amp Ti[N(C2H5)2]4; FW: 336.40; yellow to orange liq.; b.p. 133°/1.2mm; 25g
HAZ f.p. -18°F; d. 0.938
moisture sensitive
93-2240 Tetrakis(dimethylamino)titanium, 99% TDMAT [3275-24-9] 1g
amp Ti[N(CH3)2]4; FW: 224.20; yellow to orange liq.; b.p. 50°/0.5 mm; 5g
HAZ f.p. -22°F; d. 0.96 25g
moisture sensitive
93-2204 Titanium(IV) n-butoxide, 98+% [5593-70-4] 500g
Ti(OC4H9)4; FW: 340.35; colorless liq.; m.p. -55°; b.p. 312° 2kg
(206°/10mm); f.p. 170°F; d. 0.994 (25°)
moisture sensitive
22-1170 Titanium(IV) t-butoxide (99.95%-Ti) [3087-39-6] 5g
Ti(OC4H9)4; FW: 340.35; colorless liq.; b.p. 70°/0.2mm; d. 0.89 25g
moisture sensitive
22-2222 Titanium(IV) (di-i-propoxide)bis[BREW] (99.99+%-Ti) 1g
PURATREM 5g
Ti(OC3H7)2[CxHyC(O)CHC(O)CxHy]2 (x=3-4, y=2x + 1);
red-orange liq. moisture sensitive
Note: 8-11 wt% Ti
22-2209 Titanium(IV) ethoxide (99.99%-Ti) PURATREM [3087-36-3] 5g
amp Ti(OC2H5)4; FW: 228.14; xtl. to pale orange liq.; m.p. 54°; 25g
HAZ b.p. 138°/5mm; f.p. 84°F moisture sensitive
93-2216 Titanium(IV) i-propoxide, min. 98% [546-68-9] 250g
HAZ Ti[OCH(CH3)2]4; FW: 284.25; colorless liq.; m.p. 20°; 1kg
b.p. 58°/1 mm; f.p. 81°F; d. 0.9550 moisture sensitive
22-5500 (Trimethyl)pentamethylcyclopentadienyltitanium(IV), 250mg
amp min. 97% [107333-47-1] 1g
HAZ (CH3)5C5Ti(CH3)3; FW: 228.22; yellow xtl. 5g
air sensitive, moisture sensitive, light sensitive, (store cold)
22-6000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)titanium(III) 1g
amp [Ti(TMHD)3] [181418-64-4] 5g
Ti(C11H19O2)3; FW: 597.70; purple xtl.; b.p. subl. 75°/0.1mm 25g
air sensitive
MOCVD, CVD & ALD Precursors - TUNGSTEN

74-1250 Bis(i-propylcyclopentadienyl)tungsten dihydride, min. 98% 250mg
amp [64561-25-7] 1g
(C3H7C5H4)2WH2; FW: 400.22; orange liq.; b.p. 122-125°/0.1mm
air sensitive
74-1350 Mesitylene tungsten tricarbonyl, 98% [12129-69-0] 1g
C9H12W(CO)3; FW: 388.08; yellow xtl.; m.p. 165° dec. 5g
74-2200 Tungsten carbonyl, 99% (<0.3%-Mo) [14040-11-0] 5g
W(CO)6; FW: 351.92; white xtl.; m.p. 169-170° dec. 25g
100g

MOCVD, CVD & ALD Precursors - VANADIUM
23-0180 Bis(cyclopentadienyl)vanadium, sublimed, 95% (Vanadocene) 1g
amp [1277-47-0] 5g
HAZ (C5H5)2V; FW: 181.13; purple xtl.; b.p. (subl. 200°/0.1mm)
23-0350 Cyclopentadienylvanadium tetracarbonyl, min. 97% 1g
amp [12108-04-2] 5g
C5H5V(CO)4; FW: 228.08; orange to red xtl.; m.p. 138°;
b.p. (subl. 80-110°/0.1mm)
93-2305 Vanadium(V) trichloride oxide, min. 99% [7727-18-6] 100g
HAZ VOCl3; FW: 173.30; orange liq.; m.p. -77°; b.p. 126.7°; d. 1.829 500g
moisture sensitive
23-5000 Vanadium(V) tri-i-propoxy oxide, 98+% [5588-84-1] 5g
HAZ VO(OC3H7)3; FW: 244.20; light yellow to light green liq.; 25g
b.p. 60-61°/0.5mm; f.p. 113°F; d. 1.035 100g
moisture sensitive
MOCVD, CVD & ALD Precursors - YTTERBIUM

70-0075 Tris(cyclopentadienyl)ytterbium (99.9%-Yb) (REO) [1295-20-1] 1g
amp (C5H5)3Yb; FW: 368.33; green xtl.; m.p. 273°; b.p. subl. 150° (vac.) 5g
HAZ air sensitive, moisture sensitive
70-0100 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)ytterbium(III), 1g
99% (99.9%-Yb) (REO) [Yb(TMHD)3] [15492-52-1] 5g
Yb(C11H19O2)3; FW: 722.86; off-white xtl.; m.p. 167-169°;
b.p. dec. 300°
70-2500 Ytterbium(III) hexafluoroacetylacetonate dihydrate 1g
(99.9%-Yb) (REO) [81849-60-7] 5g
Yb(CF3COCHCOCF3)3·2H2O; FW: 794.19 (830.22); white solid
MOCVD, CVD & ALD Precursors - YTTRIUM

39-1500 Tris[N,N-bis(trimethylsilyl)amide]yttrium(III), min. 98% 1g
amp (99.9%-Y) (REO) [41836-28-6] 5g
{[(CH3)3Si]2N}3Y; FW: 570.06; white
-4
to off-white pwdr.; 25g
m.p. 180-184°; b.p. subl. 105°/10 mm
39-4950 Tris(butylcyclopentadienyl)yttrium (99.9%-Y) (REO) 1g
amp (C4H9C5H4)3Y; FW: 452.52; yellow liq. 5g
air sensitive
39-5000 Tris(cyclopentadienyl)yttrium (99.9%-Y) (REO) [1294-07-1] 1g
amp (C5H5)3Y; FW: 284.20; off-white pwdr.; m.p. 295°; b.p. subl. 200° 5g
HAZ (vac.)
39-5050 Tris(methylcyclopentadienyl)yttrium (99.9%-Y) (REO) 1g
amp [329735-72-0] 5g
(CH3C5H4)3Y; FW: 326.27; yellow xtl.
39-5100 Tris(n-propylcyclopentadienyl)yttrium (99.9%-Y) (REO) 1g
amp [329735-73-1] 5g
HAZ (C3H7C5H4)3Y; FW: 410.44; yellow solid
39-1000 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium(III), 98+% 1g
(99.9%-Y) (REO) [Y(TMHD)3] [15632-39-0] 5g
Y(C11H19O2)3; FW: 638.72; white to off-white xtl.; m.p. 170-173°; 25g
b.p. dec. 290° (subl. 95°/0.05mm)

MOCVD, CVD & ALD Precursors - YTTRIUM
39-1015 Tris(2,2,6,6-tetramethyl-3,5-heptanedionato)yttrium(III) 1g
triglyme adduct (99.9%-Y) (REO) 5g
Y(C11H19O2)3·CH3(OCH2CH2)3OCH3; FW: 638.72 (816.94);
white xtl.; m.p. 77°; b.p. 100°/0.1mm
39-2500 Yttrium(III) hexafluoroacetylacetonate (99.9%-Y) (REO) 1g
[18911-76-7] 5g
Y(CF3COCHCOCF3)3; FW: 710.10; white xtl.; m.p. 166-170°; 25g
b.p. dec. 240° (subl. 100°/0.2mm)
MOCVD, CVD & ALD Precursors - ZINC

30-0500 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)zinc, 99% 1g
[Zn(TMHD)2] [14363-14-5] 5g
Zn(C11H19O2)2; FW: 431.93; white xtl.; m.p. 144°; b.p. dec. 250° 25g
93-3030 Diethylzinc, min. 95% [557-20-0] 100g
HAZ Zn(C2H5)2; FW: 123.49; colorless liq.; m.p. -28°; b.p. 124°;
f.p. -1°F; d. 1.18
97-4525 Diethylzinc, elec. gr. (99.999%-Zn) PURATREM [557-20-0] 100g
HAZ Zn(C2H5)2; FW: 123.49; colorless liq.; m.p. -28°; b.p. 124°;
f.p. -1°F; d. 1.18
97-5061 Dimethylzinc, min. 95% [544-97-8] 25g
HAZ Zn(CH3)2; FW: 95.44; colorless liq.; m.p. -42°; b.p. 46°; f.p. -1°F; 100g
d. 1.386 (20°)
97-5060 Dimethylzinc, elec. gr. (99.999%-Zn) PURATREM [544-97-8] 50g
HAZ Zn(CH3)2; FW: 95.44; colorless liq.; m.p. -42°; b.p. 46°; f.p. -1°F; 100g
d. 1.386 (20°)
MOCVD, CVD & ALD Precursors - ZIRCONIUM

40-1000 Bis(cyclopentadienyl)dimethylzirconium, min. 97% 1g
[12636-72-5] 5g
(C5H5)2Zr(CH3)2; FW: 251.48; white xtl.
40-1110 Dimethylbis(t-butylcyclopentadienyl)zirconium, min. 98% 1g
[68193-40-8] 5g
[(C4H9)C5H4]2Zr(CH3)2; FW: 363.70; pale yellow pwdr.
93-4040 Tetrakis(diethylamino)zirconium, 99% [13801-49-5] 5g
amp Zr[N(CH2CH3)2]4; FW: 379.74; yellow liq.; b.p. 112°/0.1mm 25g
40-4100 Tetrakis(dimethylamino)zirconium [19756-04-8] 1g
HAZ Zr[N(CH3)2]4; FW: 267.53; light yellow xtl.; m.p. 57-60°; 5g
b.p. 80°/0.1mm 25g

MOCVD, CVD & ALD Precursors - ZIRCONIUM
40-5000 Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionato)zirconium 1g
(IV), 99% [Zr(TMHD)4] [18865-74-2] 5g
Zr(C11H19O2)4; FW: 824.30; white xtl.; m.p. 318-320°; b.p. subl. 25g
180°/0.1mm
40-1749 Zirconium(IV) t-butoxide, 99% [2081-12-1] 5g
amp Zr(OC4H9)4; FW: 383.68; slightly yellow liq.; b.p. 90°/5mm; 25g
f.p. 185°F; d. 0.96 4 x 25g
40-1750 Zirconium(IV) t-butoxide (99.99%-Zr) PURATREM [2081-12-1] 2g
amp Zr(OC4H9)4; FW: 383.68; slightly yellow liq.; b.p. 90°/5mm; 10g
f.p. 185°F; d. 0.96 2 x 25g
93-4043 Zirconium(IV) ethoxide, 99+% [18267-08-8] 5g
HAZ Zr(OC2H5)4; FW: 271.47; white pwdr.; m.p. 171-173° 25g
moisture sensitive
40-3000 Zirconium(IV) hexafluoroacetylacetonate [19530-02-0] 5g
Zr(CF3COCHCOCF3)4; FW: 919.47; white to off-white xtl.; 25g
m.p. 41-43°; b.p. 225°
hygroscopic
93-4026 Zirconium(IV) trifluoroacetylacetonate, 99% [17499-68-2] 1g
Zr(CF3COCHCOCH3)4; FW: 703.54; white pwdr.; m.p. 125-128°; 5g
b.p. dec. 235° (subl. 130°/0.05mm) 25g
ELECTROPOLISHED STAINLESS STEEL BUBBLERS
Electropolished Stainless Steel Bubblers with

fill port in vertical and horizontal (in-line)
orientation – Available in 150, 300, 600, and
1000 ml. Standard bubblers are equipped
with valves rated to 200°F (KEL-F stem tips).
High temperature bubblers equipped with
valves rated to 600°F (metal tips) are also
available. Please inquire.
STAINLESS STEEL BUBBLERS

With Fill Port
Horizontal Vertical
Size Catalog #
150 96-5151 96-4151
300 96-5298 96-4290
600 96-5599 96-4598
1000 96-5998 96-4998
Above bubblers are euipped with valves rated to 200°F (KEL-F stem tips). High temperature bubblers equipped with valves rated to
600°F (metal tips) are also available.

MOCVD
&
CVD PRECURSORS
▪Metal alkyls ▪Volatile metal carbonyls
▪Metal alkyl amides ▪Fluorinated derivatives
▪Metal alkoxides ▪Electronic grade chemicals
▪Metal beta-diketonates ▪Single source precursors for
▪Volatile organometallics mixed metal oxides
We offer electropolished stainless steel bubblers at 150ml, 300ml, and 1000ml capacities.
(See page 28)
Examples:
CH3
As
CH3CH2 CH2CH3
Ir CH2CH3 Mg
77-5000 See page 14 98-1857 See page 6 97-1040 See page 16
CH3 CF3 O
C
H3 C O C OC CO
Pt Au CH W
H3C CH3 H3 C O C CO
CH3 CH3 OC C
O
H3C CH3
Et PF3
O N
OEt Pt
EtO Nb Zr F3 P PF3
H3C N PF3
OEt N CH3
O
Et H3C N CH3
H3C CH3

The Strem
Product Line
High Purity Inorganics & Alkali Metals Custom Synthesis
Metal Foils,Wires, Powders & Elements
Metal Halides, Hydrides & Deuterides FDA Inspected
Metal Oxides, Nitrates, Chalcogenides
Metal Acetates & Carbonates cGMP Facilities
Precious Metal & Rare Earth Chemicals
Fullerenes Drug Master Files
Catalysts & Chiral Catalysts
Organometallics Complete Documentation
Organophosphines & Arsines
Organofluorines
Porphines & Phthalocyanines
Metal Carbonyls & Derivatives
Ligands & Chiral Ligands
Metallocenes
Metal Alkoxides & beta-Diketonates
Metal Alkyls & Alkyl Amides
Nano Materials
Volatile Precursors for MOCVD & CVD
Electronic Grade Chemicals
Ionic Liquids
Strem Chemicals, Inc. Strem Chemicals, Inc.

7 Mulliken Way 15, rue de l’Atome
Newburyport, MA 01950-4098 67800 BISCHHEIM (France)
U.S.A. Tel.: (33) 03 88 62 52 60
Fax: (33) 03 88 62 26 81
Office Tel: (978) 499-1600 Email: info.europe@strem.com
Office Fax: (978) 465-3104
Strem Chemicals, Inc.
Toll-free Orders Postfach 1215
Tel: (800) 647-8736 77672 KEHL (Germany)
Fax: (800) 517-8736 Telefon: 0 78 51 / 7 58 79
(U.S. & Canada only)
Strem Chemicals UK
Email: info@strem.com
48 High Street
Orwell, Royston
Web Site: www.strem.com
England SG8 5QN
Tel: 01223 207430
Fax: 01223 208138
Email: stremchemicals.uk@btinternet.com
CVD
© Strem Chemicals, Inc.

Mocvd Precusor

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MOCVD, CVD & ALD

Our 40+ years of experience in the manufacture of inorganic and

▪Metal alkyls ▪Volatile metal carbonyls

We also offer electropolished stainless steel

We welcome your custom synthesis or bulk manufacturing inquiries.

Ephraim S. Honig, Ph.D., M.B.A.

info@strem.com ▪ technical@strem.com ▪ quotation@strem.com 1

Volatile Metal Carbonyls

info@strem.com ▪ technical@strem.com ▪ quotation@strem.com 1

2 Visit www.strem.com for new product announcements.

info@strem.com ▪ technical@strem.com ▪ quotation@strem.com 3

93-0514 Boron bromide, 99+%.....................................................................................................................8

4 Visit www.strem.com for new product announcements.

info@strem.com ▪ technical@strem.com ▪ quotation@strem.com 5

MOCVD, CVD & ALD Precursors - ANTIMONY

MOCVD, CVD & ALD Precursors - ARSENIC

6 Visit www.strem.com for new product announcements.

MOCVD, CVD & ALD Precursors - BARIUM

MOCVD, CVD & ALD Precursors - BISMUTH

info@strem.com ▪ technical@strem.com ▪ quotation@strem.com 7

97-1725 Boron bromide, elec. gr. (99.999%-B) PURATREM 25g

93-0540 Triethylboron, 98% [97-94-9] 100g

93-0567 Trimethylboron, 98% [593-90-8] 25g

MOCVD, CVD & ALD Precursors - BROMINE

MOCVD, CVD & ALD Precursors - CADMIUM

MOCVD, CVD & ALD Precursors - CALCIUM

8 Visit www.strem.com for new product announcements.

MOCVD, CVD & ALD Precursors - CARBON

MOCVD, CVD & ALD Precursors - CERIUM

MOCVD, CVD & ALD Precursors - CHROMIUM

info@strem.com ▪ technical@strem.com ▪ quotation@strem.com 9

MOCVD, CVD & ALD Precursors - COBALT

27-0550 Cyclopentadienylcobalt dicarbonyl, min. 95% 2g

MOCVD, CVD & ALD Precursors - COPPER

10 Visit www.strem.com for new product announcements.

MOCVD, CVD & ALD Precursors - DYSPROSIUM

MOCVD, CVD & ALD Precursors - ERBIUM

MOCVD, CVD & ALD Precursors - EUROPIUM

MOCVD, CVD & ALD Precursors - GADOLINIUM

MOCVD, CVD & ALD Precursors - GALLIUM

98-1862 Triethylgallium, elec. gr. (99.9999%-Ga) PURATREM 50g

12 Visit www.strem.com for new product announcements.

MOCVD, CVD & ALD Precursors - GOLD

MOCVD, CVD & ALD Precursors - HAFNIUM

MOCVD, CVD & ALD Precursors - HOLMIUM

info@strem.com ▪ technical@strem.com ▪ quotation@strem.com 13

MOCVD, CVD & ALD Precursors - IRIDIUM

MOCVD, CVD & ALD Precursors - IRON

14 Visit www.strem.com for new product announcements.

93-2644 Iron(III) trifluoroacetylacetonate, 99% (99.9%-Fe) [14526-22-8] 5g

MOCVD, CVD & ALD Precursors - LANTHANUM

info@strem.com ▪ technical@strem.com ▪ quotation@strem.com 15

MOCVD, CVD & ALD Precursors - LEAD

MOCVD, CVD & ALD Precursors - MAGNESIUM

MOCVD, CVD & ALD Precursors - MANGANESE

16 Visit www.strem.com for new product announcements.

25-1550 Methylcyclopentadienylmanganese tricarbonyl, min. 97% 5g

MOCVD, CVD & ALD Precursors - MERCURY

MOCVD, CVD & ALD Precursors - MOLYBDENUM

MOCVD, CVD & ALD Precursors - NEODYMIUM

info@strem.com ▪ technical@strem.com ▪ quotation@strem.com 17

MOCVD, CVD & ALD Precursors - NICKEL