Fiber Fabrication:

The basic techniques for fabrication of all glass optical waveguide are:

1. Outside Vapor Phase Oxidation:

In this method, a layer of SiO2 particles called ‘soot’ is deposited from a burner into a
rotating graphite or ceramic mandrel. The glass soot adheres to this bait rod and layer by layer
porous glass preform is built up. By property controlling the constituents of the metal halide
vapor stream during the deposition process, the glass compositions and dimensions desired for
the core and cladding can be incorporated into the perform. When the deposition process is
completed, the mandrel is removed and the porous tube is then vitrified in a dry atmosphere at a
high temperature (above 1400 ° ) to a clear perform and it is mounted in a fiber – drawing
tower and made into a fiber.

2. Vapor Phase Axial Deposition (VAD):

It is nearly like OVPO method. In this method, SiO2 particles are formed in the
same way. As these particles emerge from the torches, they are deposited onto the end of surface
of a silica glass rod which acts as a seed. A porous perform is grown in the axial direction by
moving the rod upward. When it moves upward, it is transformed into a solid, transparent rod
perform by zone melting with the carbon ring heater. Any fiber, step index or graded index, can
be made by this VAD method.
Advantages:

1) The preform has no central hole.

2) The preform can be fabricated in continuous lengths which can effect process costs and
product yields.
3) The deposition chamber and zone melting ring heater are tightly connected to each other in the
same enclosure allows the clean environment.

3. Modified Chemical Vapor Deposition (MCVD):

The MCVD was widely adopted to produce very low loss graded
index fibers. The glass vapor particles arising from the reaction of the constituent metal halide
gases and oxygen flow through the inside of a revolving silica tube. As SiO2 particles are
deposited, they are sintered to a clear glass layer by a oxy hydrogen torch which travels back and
forth along the tube. When the desired thickness of glass has been deposited, the vapor flow is
shut off and the tube is heated strongly to cause it to collapse into a solid rod perform.

4. Plasma Activated Chemical Vapor Deposition:

In PCVD, a non isothermal microwave plasma operating at low pressure initiates the chemical
reaction. With the silica tube held at temperatures in the range of 1000 – 1200 ° C to reduce
mechanical stresses in the growing glass films, a moving microwave resonator operating at 2.45
GHz generates plasma inside the tube to activate the chemical reaction. This process deposits
clear glass material directly on the tube wall, there is no soot formation.