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13.1 Introduction
Origins
13.2 Micromachining
Substrate Micromachining • Surface Micromachining •
Polycrystalline Silicon Properties • Tribology in MEMS
13.3 MEMS Structures and Systems
MEMS Actuation Forces • MEMS for Microphotonics •
Coupling Efficiency
13.4 Berkeley Microphotonics Research
Acknowledgments
References
ABSTRACT
With the proven record of accomplishment in very large integrated circuits (VLSI) brought about by
batch-fabrication technology for electronic devices of ever-decreasing size, there is widespread enthu-
siasm about emerging opportunities to design mixed micromechanical and microelectronic systems.
New development, based heavily on integrated-circuit-related technologies, have led to rapid progress
in the development of microdynamic systems. These systems are based upon the science, technology,
and design of moving micromechanical devices, and are a subclass of what is known in the U.S. as
microelectromechanical systems (MEMS). The dimensions of the micromechanical devices in MEMS
are typically smaller than 100 µm. Recent rapid progress gives promise for new designs of integrated
sensors, actuators, and other devices that can be combined with on-chip microcircuits to make possible
high-performing, compact, portable, low-cost engineering systems. Mechanical materials for some of
the microdynamic systems that have thus far been demonstrated consist of deposited thin films of
polycrystalline silicon, silicon nitride, aluminum, polyimide, and tungsten among other materials. To
make mechanical elements using thin-film processing, microstructures are freed from the substrate
by etching a sacrificial layer of silicon dioxide. First demonstrated as a means to produce electrostatically
driven, doubly supported beam bridges, this sacrificial-layer technology has proved very versatile and
has been used to make, among other structures, laterally vibrating doubly folded bridges, gears, springs,
and impacting microvibromotors. Recently, micromirrors that consist of multiple hinged plates which
Updated, expanded, and revised version of article first published in Micro/Nanotribology and Its Applications (B.
Bhushan, ed.), NATO ASI Series, Kluwer Academic Publishers, Dordrecht, 1997.
13.1 Introduction
Microdynamic systems, that is, systems in which micromechanical elements undergo controlled motion,
are, from one very useful perspective, a logical consequence in the continued evolution of microelectronic
systems. Microdynamics offer special opportunities for the production of extremely miniaturized, highly
complex systems. The opportunities presented by microdynamics can be compared with those that
enabled the field of electronics to be revolutionized by the achievement of large-scale electronic-device
integration. The VLSI revolution has, of course, affected all of society and its multi-billion-dollar indus-
trial component continues robust growth after three decades of development. The linkage between
micromechanical methods and typical integrated-circuit processes has been developing strongly since it
was first demonstrated in seminal work done in 1982 when R. T. Howe demonstrated means to make
microbeams from polycrystalline silicon films (Howe and Muller, 1982). Following this demonstration,
Howe built the prototype polysilicon MEMS to be used as a chemical vapor sensor (Howe and Muller,
1986); see Figure 13.1.
Through the 15 ensuing years, engineers have focused on employing the key steps of batch processing
and self-assembly that underlie modern microelectronics for the development of systems composed of
micromechanical as well as microelectronic components to make microelectromechanical systems, now
typically designated by the acronym MEMS. The impact of MEMS is very broad, potentially affecting
engineering design in areas as diverse as sensing, biological, environmental, and process instrumentation,
robotics, engine control, and guidance. MEMS techniques also make possible the introduction of new
test specimens and new testing protocols that can uncover fundamental information about material
properties. As specimen dimensions shrink toward lower and lower multiples of single-crystal and
molecular sizes, their controlled fabrication and manipulation in MEMS begin to offer exciting prospects
for proving fundamental theory. The MEMS field promises to impact a wide swath of research and
industry and affect not only material scientists, but also engineers, physicists, chemists, and biologists.
13.1.1 Origins
The modern integrated circuit (IC) is the direct descendant of the planar process which, when introduced
in the 1950s, combined the arts of photolithography and silicon chemical technology to extraordinary
advantage. The productivity of this combination was made evident very early by the rapidity with which
circuits of ever-increasing complexity appeared. It was therefore easy to justify large and repeated capital
expenditures for technology and equipment and to put new ideas into development shortly after their
conception so that ICs advanced rapidly. Today, it is commonplace to find ICs built with millions of
devices; in fact IC engineers speak of the immediate future as the Gigabit Era. There is no doubt that
integrated microelectronics are keystone elements of information processing in the engineering systems
of our modern silicon age.
For the complete design of an engineering system, however, it is not only necessary to process infor-
mation. The information itself must be exchanged between a largely nonelectrical world and the electrical
processing medium of the IC. This is the job of the sensors and actuators or, taken as one, of the transducers.
In transducers we find the formidable partnership between micromechanics and microelectronics taking
shape to make possible the new level of integration into MEMS.
Some basic MEMS ideas had surfaced very early in the IC era. In fact, among the creative ideas tried
out within the first decade of IC history was the employment of microfabrication technologies to produce
a microdynamic element by a group of researchers at the Pittsburgh Westinghouse Research Laboratories.
This group employed the silicon planar process to fabricate a resonant-gate, field-effect transistor (FET)
(Nathanson et al., 1967) which consisted of a conventional silicon FET having a metal gate that was
cantilevered over a surface channel covered only by silicon dioxide. An electrostatic field pumped the
cantilever and its mechanical resonant frequency had applications as a timing source. The Westinghouse
team also designed a large-screen optical projector based upon electrostatically driven cantilever reflec-
tors. This work was very early in the development cycle of silicon microfabrication which was then (in
the 1960s) revolutionizing all aspects of circuit design. The technology for the Westinghouse micrody-
namic elements was not refined sufficiently for widespread commercial adoption and the research can
now be seen as an early harbinger rather than as a catalyst for new directions in microfabrication.
In the early 1980s, with two decades of IC development completed, the sophistication of electronics
had advanced markedly. Circuit performance that would have been astonishing in the 1960s had become
commonplace. The interfaces of these circuits with the largely nonelectrical world had become the logical
point of focus for engineering design. The advantages of silicon micromechanics had begun to show
themselves in its applications to ink-jet printing at companies like IBM, Hewlett-Packard, Canon, and
Texas Instruments and in miniature pressure sensors such as those made at Honeywell Corporation. The
impressive review of applications of silicon as a mechanical material published by Kurt Petersen (1982)
focused the interest of many engineers on this area. Petersen’s review paper established itself almost
immediately as a prime reference for the practice of silicon micromechanics.
FIGURE 13.2 Facts about the Analog Devices AD-XL50 accelerometer. (Courtesy of Richard Payne, Analog Devices,
Inc.)
A coulombic actuating force (as employed in the AD-XL50) is used frequently in the MEMS field,
especially for surface-micromachined embodiments because coulombic force (alternatively, electrostatic
force) is easily incorporated into the system and employs only an imposed voltage between two elements.
The force increases linearly with the capacitance between the electrodes and quadratically with the applied
voltage. For typical surface-micromachined parts and spacings, the force is quite small (of the order of
micronewtons) but still adequate for many applications. To increase the range of achievable forces in
MEMS, a number of alternative actuation mechanisms have been used or are under study at this time.
Most of these alternatives to coulombic force introduce complication into the fabrication technology for
the MEMS. Nonetheless, to obtain millinewton forces and higher, it is likely that these other forcing
techniques will be necessary. A listing of other actuation means that have already been applied is given
below.
FIGURE 13.5 Resonating comb drive. (Courtesy of William Tang, Jet Propulusion Laboratory.)
micromechanisms have been made in a recessed area of the chip. Then, in a subsequent CMOS process,
very high quality electronic circuits can be fabricated in a continuous-batch process.
Figure 13.6 shows a gear assemblage driven by resonant comb drives that was made at Sandia. The
tiny rotor is 55 µm in diameter and it has achieved rotation rates as high as 300,000 rpm. It can be
rotated either counterclockwise or clockwise. To gain a measure of the size of these structures, Figure 13.7
FIGURE 13.7 Rotor driver on the wheel assemblage of Figure 13.6 made at Sandia Laboratories. (Courtesy of P.
McWhorter.)
shows a photograph of the tiny driven rotor of Figure 13.6. Next to the rotor in Figure 13.7 are clumps
of red blood cells and, adjacent to the side arms, a grain of sand.
The MEMS field has begun to expand in several directions where full miniature “systems on a chip”
are being realized. Important commercial MEMS applications to accelerometry, to environmental sensing,
and to display have received fairly wide coverage in the technical and industrial product literature. An
area in which the author has worked that is just now developing into fully engineered systems is the area
of miniature integrated optical systems for communications, instrumentation, and sensing applications.
The remainder of this chapter will focus on developments in this area called microphotonics.
instituting programs to meet these opportunities using a range of technologies. Silicon-based microma-
chining, both surface and bulk, has been exploited. Work at the Berkeley Sensor & Actuator Center
(BSAC) at UC Berkeley and at UCLA has concentrated on surface micromachining with polysilicon and
has developed actuation techniques appropriate both for beam switching and for scanning using micro-
mirrors made by folding micromachined polysilicon structures out of the surface plane and covering
them with a gold reflecting surface. Figure 13.8 shows such a folded mirror suitable for use in an
interferometer.
The electrostatic comb drive has been used to move the micromirror at frequencies ranging from DC
to more than 1 kHz. Impact-actuated linear vibromotors allow mirrors to travel over large (>100 µm)
ranges with smaller than 1 µm positioning precision. These actuated mirrors have been built and operated
as components on a laser-to-fiber coupling chip and in a bar-code reader. As an alternative to electrostatic
actuation, a magnetically actuated mirror responsive to an off-chip field has also been demonstrated at
Berkeley. The mirror can be conveniently deactivated even in the presence of the field by clamping it
with an on-chip electrostatic clamp. By this means one can address individual mirrors among an array
of them (Judy and Muller, 1996).
The use of MEMS technologies has the potential of adding very significant impetus to the already
strong market for fiber-optic systems. With their proven high performance for communications and
sensing, fiber-optic systems are in high demand despite typical high costs and relatively large size. The
positive impact of MEMS on both cost and size reduction will open new opportunities that are now
unreachable because of economical or portability limitations. Researchers around the world have sensed
the opportunities in this area and have launched a research field that can broadly be labeled micropho-
tonics. By using silicon substrates and well-known IC technologies, such as anisotropic etching, “silicon-
optical bench” assembly is already an important commercial activity. Until now, however, the term silicon-
optical bench has referred to a passive assemblage of optical components that remains fixed as configured
in the final step of manufacture. Recent advances in MEMS technologies make possible a major advance
toward the design of dynamic microphotonic systems.
To build a dynamic “optical bench on chip,” high-aspect-ratio structures are required to interact with
laser beams that typically travel in free space on paths that are parallel to the surface of the silicon
substrate. To make high-aspect-ratio structures from the typically planar elements produced in surface-
micromachining technology, we use hinges (Pister et al., 1992) that permit the rotation of optical elements
out of the plane of the substrate (Tien et al., 1995; Kiang et al., 1996). Figure 13.9 shows the important
steps in the fabrication process for the hinged mirrors.
To fabricate the structures as shown in Figure 13.9, three layers of structural polysilicon above a
polysilicon ground plane are used. A layer of sacrificial LPCVD phosphosilicate glass (PSG) separates the
polysilicon layers. After deposition of sequential passivation layers of silicon oxide and silicon nitride, a
0.5 µm n+ polysilicon ground plane is deposited and patterned. The first sacrificial layer of PSG is then
deposited and patterned. Depressions are wet etched into the PSG using 5:1 hydrofluoric acid to create
dimples under the mirror (for reduced surface-to-surface contact). The dimples lessen stiction between
these structures and the substrate. Openings are also etched (usually in a fluorine-based, CF4 plasma)
for anchors between the next structural polysilicon and the substrate. Next, the first structural polysilicon
layer is deposited by LPCVD and patterned using a chlorine-based plasma etch. This layer forms the
comb-drive actuator. A second sacrificial layer is then deposited and patterned. After deposition, the
second structural polysilicon layer is etched to form the pins of the hinges. The third sacrificial layer and
the third structural layer are then deposited and patterned to complete the hinge structures and form
the mirror. The polysilicon structural layers are 2 to 5 µm thick, and the sacrificial silicon dioxide layers
range from 1 to 2 µm in thickness. The sacrificial layers are removed through wet etching in hydrofluoric
acid to release the movable structures. The last step is the evaporation of 50 nm of gold to increase mirror
reflectivity—resulting in measured reflectivities of 85% at 1.35 µm. The reduction from the theoretical
96% reflectivity of a perfect gold mirror is due to scattering caused by polysilicon surface roughness and
by etch holes and dimples in the mirror.
Movable Micromirror. Applications of these folded mirrors are for beam steering, optical alignment,
scanning, and switching functions. Figure 13.10 illustrates the concept of the optical bench on a chip.
Typical micromirror sizes are 0.5 × 0.5 mm2. If they are driven directly using comb drives as shown in
Figure 13.8, maximum movement is in the order of 10 µm. This drive is useful for harmonic cavities as,
for example, in an external-cavity laser or to scan a light source in a bar-code reader.
Precision. The positioning precision of the micromirrors by the integrated actuators has been measured
using visual observation of the micromirror displacement as the voltage applied to the comb drive is
varied. The measurements were made for two identical mirrors having differing lengths of restoring
springs in their actuators. The standard deviation of the mirror displacement with respect to applied DC
bias was lower than 0.2 µm (limited by the resolution of the measuring equipment) for the longer (and,
therefore, more flexible) spring. In either case, this mirror system is capable of submicron positioning
precision. Figure 13.11 shows results obtained with the mirrors used as scanners. Tests run at Berkeley
have exhibited 13 cycles of constructive and destructive interference in a Fabry–Perot interferometer at
a 1.3-µm wavelength. The corresponding displacement of the mirror is 8.45 µm.
The frequency response of these comb-driven mirrors in air extends to about 1 kHz. Although studies
are yet to be completed, it is expected that this upper frequency will increase markedly for mirrors
encapsulated in a low-pressure ambient. By using several comb drives to move mirrors at more than one
support point, it is possible to scan beams at angles situated in planes parallel to the substrate as well as
perpendicular to it. An example of a mirror with these capabilities is shown in Figure 13.12.
Larger movements are required for some of the other applications shown in Figure 13.10. For a laser-
to-fiber coupler or for switching applications, typical requirements are total displacements in the order
of 100 µm or greater with submicron precision. The program at Berkeley has addressed this need by
building microvibromotors — motors in which resonant energy is delivered to the load in the form of
collisions. Earlier research at BSAC had shown that polysilicon could withstand multiple collisions
without fracture and that elements could be made to slide on a silicon surface when actuated by a
microvibromotor (Houston et al., 1996). The driving energy for the vibromotors is derived from comb
drives which are built in a similar process to that described earlier. The motor and mirror carriage are
built using only two layers of polysilicon.
FIGURE 13.12 Scanning micromirror with comb drives for scanning around three axes. (Courtesy of M. H. Kiang,
and O. Solgaard, UC Berkeley.)
The impact force in a vibromotor turns out to be a useful way to overcome the sticking forces between
two polysilicon layers. These forces dominate over any inertial effects and lead to results that can be
surprising to the MEMS neophyte. Tests conducted at Hewlett-Packard Company facilities by Berkeley
researchers showed, for example, that the tiny carriages holding the folded micromirrors would not move
even under 500g loading in shock tests. Direct hammering on the carriage, however, is able to move it
FIGURE 13.14 Folded micromirror driven by four microvibromotor drivers. (Courtesy of M. Daneman, O. Solgaard,
and N. Tien, UC Berkeley.)
in steps that are only a fraction of a micrometer per blow. In the BSAC design, pairs of vibromotors
strike the carriage at 45° relative to its guiding keyway slot.
Figure 13.13, shows the concept for a microvibromotor system to drive a slider (ultimately the mount
for a micromirror) over about 100 µm displacement. Pairs of these vibromotors are used to position the
support vane of a folded mirror in the structure shown in Figure 13.14. Some details of the microvibro-
motor-driven micromirror system are indicated in Figure 13.15.
Acknowledgments
Many colleagues have contributed their thoughts, suggestions, and work to this brief review of the MEMS
field. The author especially thanks R.T. Howe, W. Tang, N. Tien, K. Lau, K. Pister, P. McWhorter, R.
Payne, O. Solgaard, M. Daneman, M.-H. Kiang, J. Judy, A. Friedberger, C. Keller, and the staff of the
Berkeley Micro Laboratory. The author’s work and time has been partially supported by the National
Science Foundation through A. Schwartzkopf, D. Crawford and M. White, by the Defense Advanced
Research Projects Agency through K. Gabriel, and by the Hewlett-Packard Company through W. Ishak,
K. Carey, and G. Trott.