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VDD
PMOS transistors only
In1
pull-up: make a connection from VDD to F
In2 PUN
…
One and only one of the networks (PUN or PDN) maybe conducting in steady
state (output node is always a low-impedance node in steady state).
Threshold Drops
VDD VDD
PUN
S D
VDD
S D
The two circuits on the right cut-off before the ideal voltage level is reached
(when |VGS| < |VT|).
Construction of PDN
NMOS devices in series implement a NAND function
A•B
A
A+B
A B
A+B=A•B
A•B=A+B
A B F
0 0 1
A B
0 1 1
1 0 1
A•B
A 1 1 0
A
B
A B F
B
0 0 1
A 0 1 0
A+B 1 0 0
1 1 0
A B
A
B
B
A
C
D
OUT = !( D + A(B + C) )
A
D
B C
Since OUT = D + A(B + C), i.e. has long bar, we draw PDN first. Then we
synthesize PUN from the PDN structure.
OAI21 Logic Graph
X PUN
A
j C
B C
X i VDD
X = !( C(A + B) )
C
i B A
j
A B
PDN
A GND
B
C
OAI is short for OrAndInvert. 21 refers the number of inputs for the OR gates (in
this case only one OR gate exists because 1-input OR gate is equivalent to a
wire).
The diagram on the right is called a logic graph. The diagram can be used as a
systematic approach to derive order of input signal wires so gate can be laid out
to minimize area. For the gate above, a bad ordering is B, C, A. An example of
good ordering is C, A, B.
Note that PUN and PDN are duals (parallel <-> series).
A C B A B C
VDD VDD
X X
GND GND
Input ordering of A, C, B is a bad ordering (see previous slide for the only other
bad ordering).
Layout area for the arrangement on the right is minimized because the Active
layer for NMOS (also called n-diffusion layer) is continuous. Arrangement on the
left requires two separate n-diffusion layers, hence a gap between the two
strips.
We use green for n-diffusion, brown for p-diffusion, red for polysilicon, blue for
metal1, purple for metal2, and black square for Contact-to-Active, Contact-to-
Poly, and via1.
Consistent Euler Path
An uninterrupted diffusion strip is possible only if there exists
a Euler path in the logic graph
Euler path: a path through all nodes in the graph such that each edge
is visited once and only once.
X
C
i
X VDD
B A
j A, B, C ordering
GND
For a single poly strip for every input signal, the Euler paths in
the PUN and PDN must be consistent (the same).
CSE477 Static CMOS, Ratioed Logic.12 Irwin&Vijay, PSU, 2002
The sequence of signals on the path (in this example: A, B, C) is the signal
ordering for the inputs to be used in stick diagram.
If we can define a Euler path, then we can generate a layout with no diffusion
breaks.
Referring to the stick diagram on the right in previous slide (redrawn here):
For PDN, we begin with node i, then we meet signal A (i.e. polysilicon wire),
then we meet node GND, then we meet signal B (i.e. polysilicon wire), then we
meet node i again (hence both nodes are connected together using metal1
layer), then we meet signal C (i.e. polysilicon wire), then we meet node X.
For PUN, we begin with node VDD, then we meet signal A (i.e. polysilicon wire),
then we meet node j, then we meet signal B (i.e. polysilicon wire), then we meet
node X (this node is connected to the previous X node using metal1 layer), then
we meet signal C (i.e. polysilicon wire), then we meet node VDD again.
A B C
Exercise: Draw stick diagram with C, A, B input ordering. VDD
GND
OAI22 Logic Graph
X PUN
A C
B D D C
X VDD
X = !( (A+B)(C+D) )
C D
B A
A B PDN
A GND
B
C
D
A B D C
VDD
GND
Since no consistent Euler path exists for y = a + bc+ de, it is impossible to draw
a single strip of n-diffusion and p-diffusion, with the same polysilicon ordering for
both NMOS and PMOS. The best we can do is to have a single strip for n-
diffusion and two strips of p-diffusions.
VTC characteristics are dependent upon the gate inputs (so the noise margins
are also data dependent!)
Cases 2 & 3 - only one of the pull-up devices is on. So the VTC is shifted left as
a result of the weaker PUN.
A Req
A
Rp
Rp Rp
B
A B Rp
A Rp Cint
Rn CL A
A Rn CL
A Rn Rn CL
Rn
Cint
A B
B
NOR2
NAND2 INV
Note capacitance on the internal node – due to the source and drain diffusion
capacitances and overlap and channel capacitances of the series transistors.
Input Pattern Effects on Delay
Delay is dependent on the pattern
of inputs
Low to high output transition
Rp Rp both inputs go low
A B - delay is 0.69 Rp/2 CL
one input goes low
Rn CL - delay is 0.69 Rp CL
A=1, B=0→1 70
A= 0→1, B=1 70
A=B=1→0 80
Reason for difference in the last two delays is due to internal node capacitance
of the pull-down stack. When A transitions from 1 0, the pull-up only has to
charge CL; when A = 1 and B transitions, pull-up has to charge up both CL and
Cint.
For output high-to-low transitions (first three cases) delay depends on state of
Cint. Delay is worst when internal node is charged up to VDD – VT2 (refer circuit
on p. 15).
Rp Rp Rp
2 A B 2 4 B
Rn Rp Cint
CL 4
2 A
B
Rn Rn Rn CL
2 Cint
1
A A B 1
For an inverter, to get equal resistances for both pull-up and pull-down, W p =
2W n.
Our goal is to design circuits with worst case delay equal to that of the reference
inverter. The number besides each transistor in the circuits above denotes the
size of W of each transistor relative to the size of W for the inverter.
For NAND circuit, W for NMOS is doubled so that equivalent resistance of each
transistor is halved. Since we have two transistors in series, total pull-down
resistance is equal to that of the inverter, thus equal high-to-low delay.
Rp
2 A
1 Rn CL
A
Transistor Sizing of Complex CMOS Gate
B 8
A 4
C 8
D 4
OUT = D + A • (B + C)
A 2
D 1
B 2 C 2
Also note structure of pull-up and pull-down. The circuit is designed as above to
minimize diffusion cap at output (only one PMOS drain is connected to output).
Very slow circuit if D PMOS is moved up, and B & C NMOS also moved up. In
this case we have at the output node
for pull-up: drain capacitances of A & C transistors
for pull-down: drain capacitances of D, B & C transistors
Fan-In Considerations
A B C D
A CL Distributed RC model
B C3 (Elmore delay)
C C2 tpHL = 0.69 Reqn(C1+2C2+3C3+4CL)
D C1
Propagation delay deteriorates
rapidly as a function of fan-in –
quadratically in the worst case.
NAND gate
1250
quadratic
1000
Gates with a
750 tpHL fan-in greater
tp (psec)
500
than 4 should
be avoided
250 tpLH
linear
0
2 4 6 8 10 12 14 16
fan-in
Each NAND gate has fan-out of one inverter (W n = 0.5 micron, W p = 1.5 micron)
tpLH increases linearly due to the linearly increasing value of the diffusion
capacitance of PMOS transistors
Transistor sizing
As long as fan-out capacitance dominates. Otherwise no delay
gain because while we reduce resistance, we also increase
capacitance!
Progressive sizing
M1 has to carry the discharge current from M2, M3, …, MN and CL so make it
the largest transistor.
0→1
1 In1
In3 M3 CL charged M3 CL charged
1 1
In2 M2
In2 M2 C2 discharged
C2 charged
1
In1 In3 M1 C1 discharged
M1 C1 charged
0→1
F = ABCDEFGH
Alternative 2
Alternative 1
CSE477 Static CMOS, Ratioed Logic.25 Irwin&Vijay, PSU, 2002
Reduction in fan-in offsets, by far, the extra delay incurred by the NOR gate
(second configuration).
Only simulation will tell which of the last two configurations is faster, lower
power.
Ratioed Logic
V DD V DD VD D
V SS V SS VS S
(a) resistive load (b) depletion load NMOS (c) pseudo-NMOS
Goal: to reduce the num ber of devices over complem entary CMOS
V DD
• N transistors + Load
Resistive
Load • VOH = VDD
RL
R PDN
• V OL =
R PDN + R L V DD
F • Assymmetrical response (tr > tf)
V SS
V DD V DD
Depletion PMOS
Load VT < 0 V Load
VSS
F F
In1 In1
In2 PDN In2 PDN
In3 In3
VSS VSS
The left diagram shows the usage of depletion load NMOS as load device. Yes,
all transistors are NMOS. Depletion mode NMOS has VT < 0 V. This method
was used during the NMOS era. The depletion NMOS is ON when VGS = 0 V. In
this case, the depletion load transistor is always on.
The PMOS is driven by VGSP = -VDD resulting in higher load current, compared to
the other circuit, hence better rise time.
For pseudo-NMOS inverter, assuming VOL is quite close to VSS when Vin = VDD,
we make assumption that NMOS is linear and PMOS is velocity saturated.
Equate currents
V 2DSATp
( )
2
V OL
k n (V DD − V Tn )V OL −
= k p V DD − V Tp V DSATp −
2 2
Assuming VDD – VTn >> VOL, VDD – |VTp| >> VDSATp, and VTn = |VTp|
kp
V OL ≈ V DSATp
kn
Load Lines of Ratioed Gates
From Rabaey 1st ed.
1
Current source
0.75
IL(Normalized)
Pseudo-NMOS
0.5
Depletion load
0.25
Resistive load
0
0.0 1.0 2.0 3.0 4.0 5.0
V out (V)
When using resistive load, IL = (VDD - VOUT)/Rl. The current drops as the output rises.
Pseudo-NMOS NOR Gate
VDD
F
CL
A B C D
3.0
2.5
2.0 (W/L)p = 4
1.5
Vout [V]
(W/L)p = 2
1.0
(W/L)p = 0.5
0.5
The VTC is for pseudo-NMOS inverter with NMOS size of 0.5 m/0.25 m. It
demonstrates the effect of load transistor size on VTC.
From the curves, higher (W/L)p gives higher VOL and higher static power
consumption (and vice versa).
Exercise: Calculate VOL using approx. eq. on p. 4 for case (W/L)p = 4. Use
transistor parameters on MOSFET transparency p. 22. Hint: Answer in text
p. 266 is wrong!