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P. Ehrhart, F. Fitsilis, et. al. “Growth of (Ba,Sr)TiO3 Thin Films by MOCVD: Stoichiometry effects”, Integrated Ferroelectrics Vol. 45, p. 59-68 (2002)
Originaltitel
Growth of (Ba,Sr)TiO3 Thin Films by MOCVD: Stoichiometry effects
P. Ehrhart, F. Fitsilis, et. al. “Growth of (Ba,Sr)TiO3 Thin Films by MOCVD: Stoichiometry effects”, Integrated Ferroelectrics Vol. 45, p. 59-68 (2002)
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P. Ehrhart, F. Fitsilis, et. al. “Growth of (Ba,Sr)TiO3 Thin Films by MOCVD: Stoichiometry effects”, Integrated Ferroelectrics Vol. 45, p. 59-68 (2002)
Copyright:
Attribution Non-Commercial (BY-NC)
Verfügbare Formate
Als PDF, TXT herunterladen oder online auf Scribd lesen