Adam Marc Munder am121dca8@westpost.net College Address 255 Fuller Rd. Albany, NY 12206 Home Address 232 E.

Witchwood Ln. Lake Bluff, IL 60044 Objective An engineering position in which I can apply my technical experience, education, and ability to work well with others in teams to use e-beam lithography exposur e. Education College of Nanoscale Science and Engineering at the University at Albany M.S. in Nanoengineering, expected May 2011 Graduate Concentration: Nanoscale Lithography Thesis: Cost-Effective Imprint Template Fabrication for Step and Flash Imprint L ithography Research Advisor: Dr. John G. Hartley Relevant Courses: Integrated Circuit Manufacturing, E-beam system architecture, Nanoscale Device Principles, Charged Particle Optics, Scanning Electron Microsco py, Geometric Optics, Modeling of Micro-electromechanical systems (MEMS) Rochester Institute of Technology B.S. in Mechanical Engineering Technology A.A.S. in Automation Technologies - Applied Robotics & Semiconductor Technology May 2008 with GPA: 3.2/Major GPA 3.5 Research Interests Nanofabrication, Photon-based Lithography, E-Beam Lithography, Systems Engineeri ng, Mask Lithography and Process Engineering for 1X Imprint Template, 4X Mask an d EUV Mask. Qualifications Hand on Vistec VB300 E-Beam lithography, etchers, cleaning processes. Understan d the principle of complex E-Beam lithography system including proximity effect corrections, heating effects, writing strategy, and healthy operating condition. Fracture and prepare mask data for e-beam exposures. Use metrology instrument s for analyzing the resist & material characterizations. Analyze SEM micrograph s for any defects, optimal E-Beam exposure and optimal engineering processes. K nowledge of PLC and electronics. Demonstrate creativity in the design of manufa cturing systems, components and processes. Use CAD and simulations software for mechanical designs, thermal and mechanic structures. Knowledge of precision ma chining techniques and GDT required. Design and fabricate precision electromech anical systems. Research Experience Winter 2010 - Present Imprint Template Fabrication for Step and Flash Imprint Lithography (Internation al Sematech)

Investigating feasibility of patterning 16nm half pitch lines including applied proximity correction. Developing a quartz wafer development process for E-Beam lithography, etcher and cleaning steps to create Imprint Templates designed for Molecular Imprints Imprio 300 Step and Flash Imprint Lithography Spring - Summer 2010 Proof of Concept Demonstrations using E-Beam Lithography (NYSTAR, INDEX and NRI) Explored the feasibility of using different electron beam resists (HSQ, SU8, NEB ) for patterning sub-10nm features resulting in an external publication. Create d small gap pattern for post-CMOS physics devices and arrays of 10nm spaced dots for biological screening test Fall 2009 - Winter 2010 Mask Holder Design Optimization for VB300 E-Beam Lithography Developed models for the mechanical and thermal stresses on mask holders using s imulations created using COMSOL Multiphysics software. Used models to predict r esulting true grid image placement for the Vistec VB300 E-beam Lithography and o ptimized the mask holder design. Presented results for Dr. John G. Hartley's pr oposal to Vistec Lithography Group Fall 2008 - Fall 2009 EUV Mask Flatness Metrology System (International Sematech) Designed and fabricated the precision electromechanical system working with a 6axis robot for loading/unloading EUV masks into an Automated EUV Mask Metrology System onto an electrochuck located in a vacuum chamber. Measured and experimen ted the EUV mask flatness resulting in an external publication. Developed initi al simulations on COMSOL Multiphysics software to understand the clamping respon se of EUV mask flatness Publications Ravi Bonam, Peter Verhagen, Adam Munder and J. Hartley, "Performance Optimizatio n of Sub-10nm Electron Beam lithography", J. Vac. Sci. Technol. B, Vol. 28, No. 6, Nov/Dec 2010 Sudhar Raghunathan, Adam Munder, John Hartley, Jaewoong Sohn, Kevin Orvek, "Corr elation of overlay performance and reticle substrate non-flatness effects in EUV lithography", Photomask Technology 2009, Proceedings of the SPIE, Volume 7488, pp. 748816-748816-9 (2009) Tool Experience Vistec VB300 E-Beam Lithography System Trion Minilock III Etcher EUV Flatness Mask Metrology System FEI E-SEM NovaNanosem 600 PlasmaTherm Vesalock 700 Etcher LEO 1550 SEM Varian E-beam Evaporator Hitachi 4800 SEM S-Cubed photoresist processing system Hitachi CDSEM KLA Tencor Alpha Profilometer Woolman RC2 Ellipsometer Imprio300 Step and Flash Imprint Lithography Veeco AFM Software Skills

Programming Labview, C/C++, Python, Visual Basic, HTML, PLC, BS2 stamp Analyzing MS Excel, PTC MathCAD, MATLAB, EUV Technology - SuMMIT Mask Layout Layout Editor, L-Edit E-beam data preparation GenISys - Layout Beamer, Synopsys - CATS, Sceleton - Mon te Carlo Simulator from XLith, Proxecco - E-beam Proximity Correction from Viste c Computer Aided Design Pro/E, Solidworks, AUTOCAD Modeling Simulations Mechanic Structure and Thermal Structure Modules on COMSOL Multiphysics, Mechanic Structure Module on Pro/E, Intellisuite, Monte Carlo Work Experience College of Nanoscale Science and Engineering, SUNY, Albany Fall 2009 - Current Graduate Research Assistant Math & Physics Tutor Rochester Institute of Technology 2007-2008 Tutored deaf and hard of hearing students in algebra, geometry, trigonometry, ca lculus and physics focusing on mechanics. UG Research Asst. Micro/Nano Manufacturing Lab (NSF), Texas A&M University, Summer 2007 Investigated the feasibility of using EDM for 3D microfabrication. Optimized th e operating parameters and revised procedures for EDM application such as microt urbomachinery Coop Mech. & Manuf Engr. Yaskawa Motoman Robotics Summer - Winter 2006 Worked for Technology Advancement Team that connects Product Solution Group and Advanced System Group. Studied, developed, tested, and reported on innovative a utomation technologies to spread important information across world as a result of information learned. Supported sales/marketing initiative through standard a nd custom demonstrations, process development, trade show support. Worked for Pr oduct Solution Group on new prototype products - robotic positioners and RoboBAR TM. Developed a standard report for testing prototypes. CAD Tutor Rochester Institute of Technology 2005-2006 Tutored students for SolidWorks CAD. Achievements 2006-2007 Dean's List, 2006 Award Scholarship for above 3.4 GPA, 2003-2007 Award for 3.0 plus GPA for Delta Sigma Phi Fraternity, 2003-2007 RIT/NTID Scholarship , 2003 RIT Dean's Merit Scholarship Prof. Associations eBeam Initiative, National Society of Professional Engineers, America Society of Mechanical Engineering, RIT's Multi-Disciplinary Robotics Club, a brother of De lta Sigma Phi Fraternity