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One of the first technique that allowed users to program their own devices was- and still is known as fusible-link technology. In this case the device manufactured with all of the links in place, where each link is referred to as a fuse.
The process of selectively removing the fuses is known as programming( but it may also referred to as burning or blowing)
Drawback
Devices based on the fusible link technologies are said to be one-time programmable(OTP), because once a fuse have been blown it cant be and no going
back..
Antifuse technology
This Antifuse technology is an alternative to the fusible technology
In which each configurable path has an associated link called Antifuse. In its unprogrammmed state Antifuse has high resistance that is considered to be an open circuit.
Programming an antifuse
Antifuses can be selectively grown(programmed) by applying
proper high voltages and currents to the device's inputs
Electronic systems in general and computers in particularmake use of two major classes of memory devices: read-only memory (ROM) and random-access memory(RAM) ROM: 1.nonvolatile .2.Other components in the system can read data from ROM devices, but they cant write data into them.
RAM:1. Volatile
2.By comparison data can be both written into and read out of RAM devices which are said to be volatile .
ROM
Basic ROMs are mask programmed Their construction by means of photo masking. Photo masking is used to create transistors and metal tracks
Creating the masks are very expensive They are useless, unless producing the extremely large quantities To overcome the above problem they invented programmable ROMs PROM, EPROM,EEP[ROM
PROM
Thses are used as memory devices Used to implement simple logics Cheap They designed using fusible and anti fusible technoilogies
EPROM
Theses are also called as reprogrammable devices Being introduced by Intel in 1971 Its structure is same as standard MOS transistor but with the addition of second polysilicon floating gate isolated by layers of oxide.
In its unprogrammed state , the floating gate uncharged and doesnt affect the
An EPROM is erased by discharging the electrons on that cells floating gate. The energy required to discharge the electrons by a source of ultraviolet (UV) radiation
If the area smaller amd then density increases, a larger percentage of the surface of the die is covered by metal. This makes it difficult for the EPROM cells to absorb the UV light and increase the time.
EEPROM
The E2PROM transistor is same as EPROMtransistor in that it contains a floating gate , but the insulating oxide layers surroung this gate are very much thinner. The second transistor used to erase the data.
In the first architecture using a single floating gate transistor cell with the same area as an EPRM and thinner oxide like layer like EEPROM. SO theses devices can clearing large portions of the data. The other architecture uses two-transistor cell similar to EEPROM cell to erase word by word,.
Dis Advantage: 1. It Uses significant amount of silicon because each cell comprises of four to six transistors 2. When power is removed the configured data will be lost. Advantage: Thhey can be programmed quickly and repeateadly as required.