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DIGITAL ELECTRONICS
CHAPTER 1
AND
OR NAND
NOR
logical operations are referred to as Combinational Gates. Outputs depend only on the present value of the inputs.
operations are referred to as Sequential Gates. Outputs depend on the past values of the inputs as well as present values.
Buffers adjust degraded high levels to higher and degraded low levels to lower.
many logic families is 5V. Ideal Power dissipation of all logic families is zero. In actual case, the power dissipation is minimized for optimum design.
Ideally, the logical 1 output voltage is at the power supply voltage Vcc. Ideally, the logical 0 output voltage is at ground (0V).
states occurs abruptly at an input of Vcc/2. Logical input 0 is represented by the voltage range 0 VIN < Vcc/2. Logical input 1 is represented by the voltage range Vcc/2 < VIN < Vcc. VIN = Vcc/2 has an undefined output and gives unpredictable results.
logical 1, the output instantaneously switches from logical 1 to logical 0 without any delay. In actual case, the transition between states is not instantaneous and a delay between the output and input transitions is present.
of logic gates are directly dependent upon the gates input and output impedance.
multiple (identical) logic inverters. It is observed that the driving gate must provide enough output current to drive all the load gates. IOUT = NIIN where the primed terms referred to load gates. The input current is zero for a very large input impedance and driving capabilities are maximized. An infinite input impedance is desired to obtain infinite driving capability.
charged through the output resistance of the driving inverter. Thus, a smaller output resistance will provide a larger charging current for the load capacitance and a faster switching time. Ideally, the output resistance must be zero. A smaller input capacitance can also speed up the switching time of the load gates.
inverters have been standardized. VTC is the graph between Vout and VIN. On vertical axis, VOH and VOL correspond to output high and output low voltage levels respectively. On the horizontal axis, VIL is input low voltage and VIH is the input high voltage.
the maximum input voltage that provides a high output voltage (logical 1 output). VIH is the minimum input voltage that provides a low output voltage (logical 0 output). VOH, VOL, VIL and VIH are referred to as the critical voltages of the VTC.
Midpoint voltage. Midpoint voltage can be found graphically by superimposing (the unity slope) Vout = VIN and finding its intersection with the VTC.
Transition Width
The amount of voltage change that is required of the
input voltage to cause a change in the output voltage from the high to the low level (and vice versa). VTW = VIH - VIL
circuits (i.e. Logical 1 and logical 0 states) are undesirable and cause logic errors. This variation is termed as Noise.
Noise Margins
Voltage Noise Margin represents the safety margin
for the high and low voltage levels. Noise voltages must have magnitudes less than the voltage noise margins. VNMH = VOH VIH VNML = VIL - VOL
of the noise sensitivities. The high noise sensitivity is defined as the difference between input and midpoint voltage for VIN at VOH. The low noise sensitivity is defined as the difference between input and midpoint voltage for VIN at VOL. VNSH = VOH VM VNSL = VM - VOL
quotient of the noise sensitivities and the logic swing. VNIH = VNSH / VLS VNIL = VNSL / VLS
outputs. By multiple outputs we mean the output of a given gate is connected to (driving) the inputs of several load gates. FAN-IN: the number of inputs of a gate. FAN-OUT: the number of outputs of a gate. Maximum FAN-OUT depends on the input and output current of a driving gate. The maximum fan-out possible during the driving gates logical 1 output state is Nhigh = IOUT (high)/ IIN (high)
Transient Characteristics
Switching Speed Definitions
td = delay time
tr = rise time
ts = storage time tf = fall time
ton = td + tr toff = ts + tf
Transient Characteristics
Propagation Delays
When the input voltage changes from one level to
another, the output voltage response is delayed in time. This is referred to as Propagation Delay.
Transient Characteristics
The low to high propagation delay time tPLH refers
to the low to high transition of the output. The high to low propagation delay time tPHL refers to the high to low transition of the output. The overall propagation delay time tp(avg) is tp(avg) = (tPLH + tPHL) / 2
Power Dissipation
Power Dissipation for an ideal gate is obtained by
realizing that it is equal to the power supplied. This is true for a gate with single power supply. Power dissipation is different for the output high (logical 1 output) and output low (logical 0 output) states and they are termed as PCC(OH) and PCC(OL), respectively. The average power dissipation for a gate with the two possible output states as follows: PCC(avg) = (PCC(OH) + PCC(OL) )/ 2
Power Dissipation
PCC(avg) = [ (ICC(OH) + ICC(OL) ) / 2 ] x VCC
Some logic circuits have 2 power supplies, one with a positive voltage and one with a negative voltage. In this case, both currents (ICC and IEE) are obtained for
Power Dissipation
Average power supplied by the gate with two possible states is then as follows:
Faster propagation delay times are achieved at the cost of increased power dissipation.
Lower power dissipation results in longer propagation
delays. Power Delay Product is the merit for digital logic gate and is represented as follows: PD = PDISS(avg) x tp(avg) Smaller the Power Delay Product is for a gate, the more ideal the gate is. Ideally, PD equals to 0 Joules.
Introduction to MOSFET
BJTs are current-controlled devices. The
current controlling terminal is Base. FETs are voltage-controlled devices. The current controlling terminal is Gate. In FETs, the current-controlled mechanism is based on an electric field established by the voltage applied to the Gate. BJTs are Bipolar Junction transistors i.e. The current is due to the movement of both types of charge carriers e.g. Holes and Electrons.
Introduction to MOSFET
FETs are uni-polar devices i.e. The current is
due to the movement of the only one of the two types of charge carriers e.g. either due to Holes or due to Electrons. Metal-Oxide Semiconductor FET (MOSFET) is a very popular kind of FET due to the following.
MOS transistors can be made quiet small. Manufacturing process is comparatively simple.
N-MOSFET
Metal Gate N-MOSFET
The Enhancement-Type N-MOSFET is the most widely
used FET. The transistor is fabricated on p-type substrate. Two heavily doped ntype regions are created in p-type substrate. A thin layer of SiO2 (a perfect insulator) is on the surface of the substrate which ensures IG=0A.
N-MOSFET
Metal is deposited on top of the oxide layer to form
the Gate electrode of the device. Other terminals i.e. Source, Drain and substrate are also made over metal surface.
That is how the name of
N-MOSFET
Silicon Gate N-MOSFET
Most of the modern MOSFETs are fabricated using a
process known as Silicon-Gate Technology. Gate electrode is formed using a certain type of silicon named Polysilicon.
Enhancement-type N-MOSFET
Operation with No Gate Voltage
Two back to back diodes exist in series between drain
and source. One diode is formed by pn-junction between n+ drain and p-type substrate. Second diode is formed by pn-junction between n+ source and p-type substrate. These diodes prevent current conduction from drain to source when voltage VDS is applied. Both pn-junctions must be made Reverse-Biased.
Enhancement-type N-MOSFET
Creating a Channel for Current Flow
Lets have VDS = 0V (source and drain are grounded). Applying VGS (gate to source voltage) at Gate making
free holes being repelled and pushed downwards in the p-type substrate.
The Depletion
Enhancement-type N-MOSFET
When a significant number of electrons accumulate
under the Gate, an n-region is created that connects Drain and Source regions. Applying VDS, current flows through this induced nregion. This induced region will now become a Channel for current to flow from Drain region to source region. The device is now named as N-channel MOSFET. Note that the N-channel is created in p-type substrate.
Enhancement-type N-MOSFET
Device Symbol
mobile electrons accumulate in the channel region to form a conducting channel is called Threshold Voltage. It is denoted by Vt. For n-channel MOSFET, Vt is positive. To conduct current from Drain to Source terminal, the VGS must be greater than Vt. Greater the VGS from Vt, wider will be the channel and greater will be the flow of current (if VDS >0). Effective Voltage = VGS - Vt.
enhances the channel, hence the device named as Enhancement-type N-MOSFET. Gate current is negligibly small thus current entering at the drain terminal is equal to the current leaving at the source terminal.
Linear Mode
As VGS is increased above Vt, the device is in Linear
current starts levelling off and maintains level for further increase in VDS. This condition is called Pinched-off.
ID (Sat) = k[(VGS- Vt)2]/2 ID (Sat) = k[(VGS- Vt)2(1+ VDS)]/2 Where is channel-length modulation parameter
decreased to zero but the flow of current is not cut-off rather it is maintained from Drain to Source. Pinched-off occurs at VDS = VGS - Vt
Family of Curves
The ID versus VDS graph is plotted to identify
the family of curves. Three modes of operation are evident in the graph.
W and L are channels width and length respectively. The parameter k is referred to as Process Transconductance parameter and its value is set at the fabrication level.
expression:
is the electron/hole mobility in the channel. COX is the gate oxide capacitance per unit area.
Different electron mobility is set industrially for N-channel and P-channel MOSFET. Electron mobility is related to the average drift of electrons/holes under the influence of electric field.
N = 580 cm2/V.s
P-channel MOSFET, the hole mobility is
N = 230 cm2/V.s
the parallel-plate capacitor formed by the Gate electrode and the Channel.
COX = OX / tOX OX is the permittivity of the silicon oxide which is the measure of the ability of Silicon oxide to be polarized by the electric field. tOX is the thickness of the oxide layer.
thus
OX = 3.45 x 10-11 F/m
P-MOSFET
The P-channel MOSFET is fabricated on n-type
substrate.
Two heavily doped p-
type regions are created in n-type substrate. In P-MOSFET, the free charges which move from end-to-end are positively charged (holes).
P-MOSFET
The device operates in exactly the similar manner as N-MOSFET.
VGS and VDS are negative voltages.
P-MOSFET
Cutoff Mode
VSG - Vt ID = 0A
Linear Mode
VSG - Vt VSD VSG + Vt ID (Linear) = k[(VSG+ Vt) VSD (V2SD/2)]
Saturation Mode
VSG - Vt VSD VSG + Vt ID (Sat) = k(VSG+ Vt)2/2, ID (Sat) = k[(VSG+ Vt)2(1+ VSD)]/2
Junction Capacitances
CDB is the capacitance between Drain and
Exercise
Consider a process technology for which Lmin=0.4m, tox =8nm, N = 450cm2/V.s
Vt = 0.7V
a) Find Cox and kn
b) For MOSFET with Width=8m and Length=0.8m,
calculate the values of VGS and VDS(min) needed to operate the transistor in the saturation mode with a dc current (ID ) equals 100A. c) Find the value of VGS required to cause the device to operate as a 1k resistor for a very small VDS.
Depletion-Type N-MOSFET
The Depletion-Type MOSFET has a physically implanted channel.
The n-channel depletion-type MOSFET has a
n-type silicon region (channel) connecting the n+ source and n+ drain regions. The channel exists above the p-type substrate. Since the channel is present, current flows by applying VDS, when VGS = 0V
Depletion-Type N-MOSFET
Same as in enhancement-type MOSFET, the channel depth and conduction is controlled by applying VGS. Applying positive VGS enhances the channel.
Applying negative VGS reduces the channel
depth and decreases conductivity. The mode of operation (negative VGS) is called Depletion Mode. Thus the type Depletion-Type MOSFET.
Depletion-Type N-MOSFET
Threshold Voltage
As VGS is getting more negative, a value will reach
when the channel is completely depleted of all charge carriers (ID = 0A). The current remains zero for further increase in VDS. This negative value of VGS is the Threshold Voltage. The device will not work if VGS is less than the threshold voltage.
Depletion-Type N-MOSFET
The ID-VDS characteristics of a depletion-type
Depletion-Type N-MOSFET
The vertical line shows the channel is solid. When the body is connected with the source,
the right symbol will be used. The shaded area is represented the implanted channel.
Depletion-Type N-MOSFET
The ID-VGS characteristic of a depletion-type
n-channel MOSFET is shown below when the device is in saturation mode. IDSS is the drain current when the device is in saturation mode and VGS = 0V.
Depletion-Type P-MOSFET
In P-MOSFET, the polarities of all voltages
(including Vt) are reversed. In P-MOSFET, the ID flows from the source terminal and leaves at the drain terminal.
The graph shows
the behaviour of two types of MOSFETs when they are operating in saturation mode.
Exercise
For a Depletion-Type NMOS Transistor with Vt= -2V, and k = 2mA/V2, find the minimum VDS required to operate in the saturation
Exercise
The Depletion-Type MOSFET has k = 4mA/V2 and Vt= -2V. Neglecting the effect of VDS on ID in the saturation region, find the voltage that
MOSFET circuits at DC
Design the circuit so that the transistor
operates at ID = 0.4mA and VD = +1V. The NMOS transistor has Vt =2V, nCOX = 20A/V2, L = 10m and W = 400m. Neglect the channel modulation effect (=0).
MOSFET circuits at DC
Design the circuit to obtain ID = 0.4mA. Find
the value required for R and the dc voltage VD. The NMOS transistor has Vt =2V, nCOX = 20A/V2, L = 10m and W = 100m. Neglect the channel modulation effect (=0).
MOSFET circuits at DC
Design the circuit to establish drain voltage of
0.1V. What is the effective resistance between drain and source at this operating point? Let Vt =1V, kn(W/L) = 1mA/V2.
MOSFET circuits at DC
Analyse the circuit to determine the voltages
at all nodes and the currents through all branches. Let Vt =1V, kn(W/L) = 1mA/V2. Neglect the channel length modulation effect (=0)..
source as long as the device is in Saturation region. Linear Amplification is achieved by following the two steps:
DC bias the MOSFET device Superimposing the input signal to be amplified on
(Vi) is kept small to make the change in drain current proportional to the change in Vi.
Characteristics
Operation as a Switch
To use MOSFET as a switch, the device is to operate at the extreme positions in the transfer curve. The device is turned off when Vi < Vt. This is the extreme left position on the transfer curve i.e. Vo = VDD and ID = 0A. The device is turned on when Vi = VDD. This is the extreme right position on the transfer curve i.e. Vo = 0V and ID is maximum.
Operation as a Switch
The MOSFET is behaving as a Logic Inverter. High voltage level is close to VDD and Low voltage level is close to 0V.
make use of the saturation region of the transfer curve. The device is biased at a point in the middle of the transfer curve. The biased point is called Quiescent Point and is denoted by Q. The voltage signal to be amplified is then superimposed on dc bias voltage VIQ.
operation in almost linear segment of the transfer curve. The output voltage Vo will be then proportional to the input voltage Vi. The Linear Amplifier produces the same waveform with the larger factor defined by the voltage gain of the amplifier. Since the slope is negative, the CS-amplifier is an inverting Amplifier.
increased, the output signal will become distorted since the operation will no longer be restricted to the saturation region of transfer curve.
Saturation Region
Vi > Vt Vo > Vi Vt ID (Sat) = k(Vi - Vt)2/2 By putting the value of ID(sat) in the dc bias equation (VO =
Vi = ViQ is as follows.
= VOQ - Vt
Exercise
Consider the following CS circuit. Construct the Voltage Transfer Characteristic for the case when kn(W/L) = 1mA/V2, Vt = 1V, RD =
Exercise (contd.)
In the picture on left, the input signal (Vi) of 150mV peak-to-peak amplitude is applied. The picture on right shows the VTC with superimposed input signal.
two Enhancement-Only NMOS transistors will be studied. This type of inverter is more practical than resistor-loaded inverter since the resistor is thousands of times larger than a MOSFET. Remember, any logic operation can be implemented using just MOSFET devices.
The NO is in cut-off region when VIN < VT,O. The NL is still in saturation region.
VOUT = VDD - VGS,L
Thus the output is VDD degraded by the value of threshold voltage of NL.
operation.
similar manner as the load line equation for the resistorloaded transistor.
Unlike the resistor-loaded inverter, the curve for load transistor (NL) is non-linear.
VGS,O and VDS,O are read from the intersection of
output load curve with the family of curves. These points are then mapped into the VGS,O and VDS,O coordinate axes.
Cut-off Region
VIN = VGS,O VGS,O < VT,O
Saturation Region
VGS,O > VT,O VDS,O VGS,O VT,O
Triode Region
NL is in saturation region and NO is in Linear or Triode
region of operation.
VGS,O > VT,O VDS,O VGS,O VT,O
calculated as follows:
Input Low Voltage (VIL) Input High Voltage (VIH) Midpoint Voltage (VM)
Saturated-Loaded NMOS Inverter. In this section, the behaviour of Linear Enhancement-Only loaded NMOS inverter will be studied. The advantage of using this type of inverter is that the output will be equal to the supplied source voltage rather than degraded by the value of VT,L.
inverter is the use of two separate DC supplies. Hence the type is less practical than the Saturated-loaded NMOS inverter. Again, any logic operation can be implemented using just MOSFET devices.
The NO is in cut-off region when VIN < VT,O. The NL is still in Linear region.
VOUT = VDD - VDS,L
ID,L = kL [(VGS,L VT,L) VDS,L - VDS,L2 / 2] ID,L = kL [(VGG - VDS,O VT,L) (VDD - VDS,O) 2] - (VDD - VDS,O) 2 / 2]
The above equation works in
similar manner as the load line equation for the resistorloaded transistor and Saturated NMOSFET loaded transistor.
VGS,O and VDS,O are read from the intersection of output load curve with the family of curves. These points are then mapped into the VGS,O and VDS,O coordinate axes.
The output does not reach 0V as the input increased to the maximum value of supply voltage.
This can be confirmed
while looking at the family curve of this type of transistor (i.e. VIN = VDD).
Cut-off Region
VIN = VGS,O
VGS,O < VT,O VOH = VDD In resistor-loaded transistor, VOH = VDD. In Saturated-loaded NMOS, VOH = VDD - VT,L.
Saturation Region
VGS,O > VT,O VDS,O VGS,O VT,O VIN = VGS,O VDS,L = VDD - VOUT VGS,L = VGG - VOUT
Triode Region
NL and NO are in Linear or Triode region of operation.
VGS,O > VT,O VDS,O VGS,O VT,O
calculated as follows:
Input Low Voltage (VIL)
Linear Enhancement-only NMOS Inverter. In this section, the behaviour of Linear Enhancement-Depletion loaded NMOS inverter will be studied. The advantage of using this type of inverter is that the output will be equal to the supplied source voltage without the second VGG.
this kind of MOSFET. This type of inverter is more widely used in NMOS digital logic circuits. Again, any logic operation can be implemented using just MOSFET devices.
negative, we have
VGS,L = 0 > VT,L
Thus the load is always active. The region of operation for NL is found by
the equation:
VDS,L > VGS,L- VT,L = - VT,L = | VT,L |
ID,L = kL [(VGS,L VT,L) VDS,L - VDS,L2 / 2] ID,L = -kL [ VT,L (VDD - VDS,O) 2] - (VDD - VDS,O) 2 / 2]
VGS,O and VDS,O are read from the intersection of output load curve with the family of curves. These points are then mapped into the VGS,O and VDS,O coordinate axes.
while looking at the family curve of this type of transistor (i.e. VIN = VDD).
Operation: Enhancement-Depletion
Loaded NMOS Inverter
Analytical Expressions of VTC
Cut-off Region
VIN = VGS,O
VGS,O < VT,O VOH = VDD In resistor-loaded transistor, VOH = VDD. In Saturated-loaded NMOS, VOH = VDD - VT,L. In Linear-loaded NMOS, VOH = VDD.
Operation: Enhancement-Depletion
Loaded NMOS Inverter
Analytical Expressions of VTC
Saturation Region
VGS,O > VT,O VDS,O VGS,O VT,O VIN = VGS,O VDS,L = VDD - VOUT VGS,L = 0V
Operation: Enhancement-Depletion
Loaded NMOS Inverter
Analytical Expressions of VTC
Triode Region
NL and NO are in Saturation and Linear region of
operation respectively.
VGS,O > VT,O VDS,O VGS,O VT,O
Operation: Enhancement-Depletion
Loaded NMOS Inverter Analytical Expressions of VTC
Remaining critical points of VTC can be
calculated as follows:
Input Low Voltage (VIL)
Operation: Enhancement-Depletion
Loaded NMOS Inverter Analytical Expressions of VTC
Midpoint Voltage (VM)
NMOS GATES
NMOS Gates
In this chapter, we describe the design of
multi-input NMOS logic gates such as NAND, NOR, complex AND-OR-Inverts (AOI) and other special function logic gates. Each of these gates has a single Load device in the same fashion as the NMOS inverters.
should have the same channel width (W) and length (L). We have discussed that EnhancementDepletion NMOS inverter is more practical inverter than any other kind.
inverter by following the stacked pull-down configuration of NMOS transistors. There will be a longer pull-down path from the output to ground. That means the length of the two channels will be added. If width and process transconductance parameters remain constant, then
transconductance parameter (ko), low value of ko will increase the VOL. A greater channel width is needed for each transistor to compensate this degradation of VOL. Due to this degradation of performance, the NMOS NOR gates are preferred over NMOS NAND gates. NMOS NAND gates can accommodate more than two inputs (ideally up to 3) by simply adding more NMOS transistors in series to the pull-down sequenced transistors.
on ko.
on ko.
((A+B)(C+D) + E(F+G))
is ON and when Gate voltage is low, the NMOS switch is OFF. This analysis offers the ability of transferring the driving logic voltage from one side of NMOS channel to the other side on CONDITION. NMOS switches are traditionally called Transmission Gates or Pass.