Beruflich Dokumente
Kultur Dokumente
Pyrex
glass
quart
z
MicroElectroMechanic
al System Lab.
Cross-section of
powder blasted
channels
MicroElectroMechanic
al System Lab.
Caliper
tech.
Agilent
tech.
MicroElectroMechanic
al System Lab.
Plastic MEMS
Why plastic MEMS?
Soft Lithography
Plastic Biochip
(Digital Bio Technology, Korea)
Bio-detection System
(MicroSystems and BioMEMS Lab at University of Cincinnati)
MicroElectroMechanic
al System Lab.
MicroElectroMechanic
al System Lab.
Soft Lithography
(elastomeric stamp)
Thick
photoresist
SU-8,10
Si surface
after
etching
( ~50 m
thick)
University of Washiton CAM
MicroElectroMechanic
al System Lab.
Lab.
7
Soft Lithography
Micro-transfer Molding(TM)
Micro-molding in
Capillaries(MIMIC)
Replica Molding(REM)
Hot embossing
Plastic injection molding
technique
MicroElectroMechanic
al System Lab.
MicroElectroMechanic
al System Lab.
Micro-molding in Capillaries
(MIMIC)
In MIMIC, a liquid prepolymer or other fluid
capable of subsequent solidification wicks
spontaneously by capillary action into the network
of channels formed by a conformal contact
between a mold and a substrate.
MicroElectroMechanic
al System Lab.
10
Replica Molding(REM)
In REM, a liquid prepolymer is directly cast again as a
mold. After curing the prepolymer, the mold is removed,
leaving a polymer micro- or nano-structure on the
surface. REM is remarkable for its simplicity for
generating nanostructures (>30 nm) or polymers with a
resolution of a few nanometers.
MicroElectroMechanic
al System Lab.
11
Hot embossing
(Laboratory for Micro- and Nanotechnology
Paul Scherrer Institut)
MicroElectroMechanic
al System Lab.
12
MicroElectroMechanic
al System Lab.
13
Plastic Biochip
(Digital Bio Technology, Korea)
Cell-count C-BOX
Dilution palette
Absorbance
tester
RBC filter-RBC
MicroElectroMechanic
hemocytometer
al System Lab.
14
Bio-detection System
(MicroSystems and BioMEMS Lab at University of Cincinnati)
MicroElectroMechanic
al System Lab.
15
Microstereolithography
MicroElectroMechanic
al System Lab.
16
Microstereolithography?
CAD tool
Laser
*.
Slice size
MicroElectroMechanic
al System Lab.
file
l
st
Liquid photopolymer
17
Support
platfor
m
Polymerize
d
layered
model
Microstereolithography
MicroElectroMechanic
al System Lab.
18
Stereolithography?
MicroElectroMechanic
al System Lab.
19
Advantage
Conductiv
e epoxy
Glas
s
Pump
chambe
r
MicroElectroMechanic
al System Lab.
20
PZ
T
Diffuser/nozz
le
Microstructure
(Ikuta Lab., Japan)
Microturbi
ne
Microco
il
Microgear
train
MicroElectroMechanic
al System Lab.
21
Multi-polymer IH Process
(Ikuta Lab., Japan)
Optical
waveguides
MicroElectroMechanic
al System Lab.
22
High-speed Two-photon
Microstereolithography
(Ikuta Lab., Japan)
MicroElectroMechanic
al System Lab.
23
Hybrid IH Process
(Ikuta Lab., Japan)
MicroElectroMechanic
al System Lab.
24
MicroElectroMechanic
al System Lab.
25
Biochemical IC Chip
(Ikuta Lab., Japan)
MicroElectroMechanic
al System Lab.
26
Micro-Electrophoretic Chip
(Sankyo Co., Ltd., Japan)
MicroElectroMechanic
al System Lab.
27
Integral Microstereolithography
Principle(EPFL)
MicroElectroMechanic
al System Lab.
28
Microstructure
(EPFL)
Sprin
g
Micromixer
impell
or
Gea
r
MicroElectroMechanic
al System Lab.
Tub
e
29
Microstereolithography
Pump & Liquid analyzer
Young-Tae Lee
MicroElectroMechanic
al System Lab.
30
Micro-pump
Mechanical
pump
Non-mechanical
pump
Electrohydrodynamic
(EHD)
Magnetohydrodynami
c
(MHD)
Piezoelectric
Electrostatic
Thermopneumat
ic
Magnetic
MicroElectroMechanic
al System Lab.
31
Pump structure
Electrod
e
PZT(0.2
t)
Diaphrag
m
Chamb
er
Pump
direction
Diaphrag
m
(glass)
MicroElectroMechanic
al System Lab.
Conductive
silver
epoxy
PZT
Diffuser/nozz
le
32
Pump
chamber
Fabrication process
PZT
Conductive
epoxy
Glass
Pump
chamber
Diffuser/nozzl
e
MicroElectroMechanic
al System Lab.
33
Plastic
tube
Electrod
e
PZT
disk
Diffuser/nozz
le
MicroElectroMechanic
al System Lab.
34
Diffuser/nozzle
1mm
MicroElectroMechanic
al System Lab.
0.5mm
35
80m
m
MicroElectroMechanic
al System Lab.
36
7
6
5
4
3
2
1
0
0
50
100
150
Supply Voltage(Vp-p)
37
200
250
Frequency response
Pressure headdifference
(Normalized)
0.8
0.6
0.4
0.2
0
0
100
200
Frequency (Hz)
MicroElectroMechanic
al System Lab.
38
300
400
Flow rate
2.5
Flow rate(ml/min)
1.5
0.5
0
100
150
200
Apply voltage(Vp-p)
MicroElectroMechanic
al System Lab.
39
250
Liquid analyzer
Chamb
er
Pum
p
AC
Mixe
r
Sensing
part
Glas
s
MicroElectroMechanic
al System Lab.
Channel
40
Simulation results
Pum
p
Mixe
r
MicroElectroMechanic
al System Lab.
Chamber
Chambe
r
Chann
el
41
Mixe
r
Chambe
r
MicroElectroMechanic
al System Lab.
Mixe
r
PZT
disk
42
Glas
s
1m
m
0.5m
m
MicroElectroMechanic
al System Lab.
Fluidic
direction
43
Characteristics of
the liquid analyzer
1.00E+06
0.8
Resistance(ohm)
Resistance(Mohm)
0.6
0.4
0.2
1.00E+05
0
0
0.2
0.4
0.6
0.8
1.00E- 05
1.00E- 03
0.9% NaCl(liter)
DI water(100ml)+0.9%NaCl(x
liter)
MicroElectroMechanic
al System Lab.
1.00E- 04
44
1.00E+04
1.00E- 02
Mix
er
Pum
p
MicroElectroMechanic
al System Lab.
In
k
45
Output voltage(mV)
NaCl solution
injection
5s
200mV
Time(sec)
MicroElectroMechanic
al System Lab.
46
Electrolysis Phenomenon
2V
5s
Time(sec)
MicroElectroMechanic
al System Lab.
47