49554087

1.CMP)
2.

3./
4.
5.
6.
7.
 CMP)

CMP=Chemical Mechanic Polish



0.25m
0.25m





 /

/
 /

1.
2.
3.
4.
4.1. /
4.2.


1.

2.

3.


Slurry



(Abrasive)
Fumed
Silica
colloidal Silica(.)Al2O3
MnO2



Dual Damascene

Step-High





Dishing
cmp

Dishing
Erosion
cmp

Erosion



Residual

Micro-ScratchCMP





1.oxide
2.poly
3.metal



1.


2.particle
slurry residual
metal ion contamination

3.Scratch


4.


5.
throughput


1.STI CMP
2.ILD CMP
3.IMD CMP
 STI CMP

LOCOS(local
oxidation of silicon)


CMP


 STI CMP

LOCOS


STI CMP
ILD CMP
IMD CMP

CMP



class1

ppm
1.
2.
3.

1.PH
KOH
cmpFe
ppm
2.Retaining Ring

3.Diamond Disk




CMP
CMP

1.
2.


PVA


zeta



CMPDHF



10

1.CMP
2.
3.
4.STI CMP